| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/20/1998 | US5825040 Bright beam method for super-resolution in e-beam lithography |
| 10/20/1998 | US5825039 For scanning a beam over an area of interest on a workpiece |
| 10/20/1998 | US5825038 For treating a workpiece |
| 10/20/1998 | US5825035 Processing method and apparatus using focused ion beam generating means |
| 10/20/1998 | US5825034 Method of compensation for electron beam dose |
| 10/20/1998 | US5824988 Reactor and method for the treatment of particulate matter by electrical discharge |
| 10/20/1998 | US5824607 Plasma confinement for an inductively coupled plasma reactor |
| 10/20/1998 | US5824606 Methods and apparatuses for controlling phase difference in plasma processing systems |
| 10/20/1998 | US5824605 Gas dispersion window for plasma apparatus and method of use thereof |
| 10/20/1998 | US5824602 Helicon wave excitation to produce energetic electrons for manufacturing semiconductors |
| 10/20/1998 | US5824441 Integrated circuits |
| 10/20/1998 | US5824437 Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device |
| 10/20/1998 | US5824197 With concave, curved shape away from target spaced to reducenumber of magnetic fieild lines intersectimg the shield |
| 10/20/1998 | US5824158 Chemical vapor deposition using inductively coupled plasma and system therefor |
| 10/15/1998 | WO1998045871A1 Producing electric arc plasma in a curvilinear plasmaguide and substrate coating |
| 10/15/1998 | DE19816480A1 Scanning microscope with orthogonally displaced scanning head |
| 10/15/1998 | DE19754821A1 Verfahren und Vorrichtung für eine PVD-Beschichtung Method and apparatus for a PVD coating |
| 10/14/1998 | EP0871200A2 Low temperature etch process utilizing power splitting between electrodes in an RF plasma reactor |
| 10/14/1998 | EP0871199A2 Processes depending on plasma generation |
| 10/14/1998 | EP0871166A1 Apparatus for machining, recording, or reproducing, using scanning probe microscope |
| 10/14/1998 | EP0871071A2 Method and apparatus for charged particle beam exposure |
| 10/14/1998 | EP0871052A1 Confocal microscope with movable scanning table |
| 10/14/1998 | EP0870317A1 Apparatus for controlling matching network of a vacuum plasma processor and memory for same |
| 10/14/1998 | EP0870316A1 Composite concentric-gap magnetic lens and deflector with conical pole pieces |
| 10/14/1998 | EP0777909B1 Electron beam generator |
| 10/14/1998 | EP0583473B1 Method and device for treatment of articles in gas-discharge plasma |
| 10/14/1998 | CN1195882A Method and apparatus for ion implantation |
| 10/14/1998 | CN1040251C Method and apparatus for background correction in analysis of specimen surface |
| 10/13/1998 | US5822172 Apparatus and method for temperature control of workpieces in vacuum |
| 10/13/1998 | US5821677 Ion source block filament with laybrinth conductive path |
| 10/13/1998 | US5821550 For writing a circuit pattern of a workpiece |
| 10/13/1998 | US5821545 Heated stage for a scanning probe microscope |
| 10/13/1998 | US5821544 Vapor deposited free-standing, rigid diamond film; chemical resistance, thermoconductivity |
| 10/13/1998 | US5821543 Transverse-structure electrostatic charged particle beam lens |
| 10/13/1998 | US5821542 Particle beam imaging system having hollow beam illumination |
| 10/13/1998 | US5821409 Scanning near-field optic/atomic-force microscope with observing function in liquid |
| 10/13/1998 | US5820947 Plasma processing method and apparatus |
| 10/13/1998 | US5820723 Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 10/13/1998 | US5820680 Vacuum evaporator |
| 10/13/1998 | US5819434 Etch enhancement using an improved gas distribution plate |
| 10/13/1998 | CA2111770C Information recording and reproducing apparatus for recording and reproducing information by using a probe electrode |
| 10/10/1998 | CA2231224A1 Apparatus for machining, recording, and reproducing, using scanning probe microscope |
| 10/08/1998 | WO1998044767A1 Rfq accelerator and ion implanter |
| 10/08/1998 | WO1998044535A1 Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber |
| 10/08/1998 | WO1998044498A1 Electric or electronic component and application as non volatile memory and device with surface acoustic waves |
| 10/07/1998 | EP0869535A2 A method to generate ionized metal plasma using electron beams and magnetic field |
| 10/07/1998 | EP0869329A2 Torsion type probe and scanning probe microscope using the same |
| 10/07/1998 | EP0868836A1 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher |
| 10/07/1998 | EP0868739A1 Correction device for correcting chromatic aberration in particle-optical apparatus |
| 10/07/1998 | CN1195261A End cap for indirectly heated cathode of ion source |
| 10/07/1998 | CN1195035A Thin-film deposition apparatus using cathodic arc discharge |
| 10/06/1998 | US5818217 Electron beam irradiating apparatus and electric signal detecting apparatus |
| 10/06/1998 | US5818042 Apparatus for creating three-dimensional physical models of characteristics of microscopic objects |
| 10/06/1998 | US5817534 RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers |
| 10/06/1998 | US5817442 Pattern projection method with charged particle beam utilizing continuous movement to perform projection |
| 10/01/1998 | WO1998043274A1 Method of and apparatus for the electron beam treatment of powders and aggregates in pneumatic transfer |
| 10/01/1998 | WO1998042890A1 Magnesium oxide sputtering apparatus |
| 10/01/1998 | DE19755159A1 Thin-film coating installation |
| 09/30/1998 | EP0867913A1 Plasma processing system and plasma processing method |
| 09/30/1998 | EP0867036A1 Method and device for pre-treatment of substrates |
| 09/30/1998 | EP0562035B1 Minimization of particle generation in cvd reactors and methods |
| 09/29/1998 | US5815388 Polarity reversing circuit having energy compensation |
| 09/29/1998 | US5814823 System and method for setecing neutral particles in an ion bean |
| 09/29/1998 | US5814822 Ion implanter and ion implanting method using the same |
| 09/29/1998 | US5814819 System and method for neutralizing an ion beam using water vapor |
| 09/29/1998 | US5814815 Phase-contrast electron microscope and phase plate therefor |
| 09/29/1998 | US5814814 Electron microscope |
| 09/29/1998 | US5814423 Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask |
| 09/29/1998 | US5814195 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current |
| 09/29/1998 | US5814154 Short-coupled-path extender for plasma source |
| 09/24/1998 | WO1998042014A1 Improved methods and apparatus for controlled partial ashing in a variable-gap plasma processing chamber |
| 09/24/1998 | WO1998042012A1 Method and device for plasma treatment |
| 09/24/1998 | WO1998042002A1 Glow plasma discharge device |
| 09/24/1998 | WO1998041666A1 Method for forming a carbon film |
| 09/24/1998 | DE19711347A1 Electromagnetic device for plasma-assisted coating process |
| 09/23/1998 | EP0865716A1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
| 09/23/1998 | EP0865715A1 Process depending on plasma discharges sustained by inductive coupling |
| 09/23/1998 | EP0865663A1 HF-PLASMA COATING CHAMBER OR PECVD COATING CHAMBER, ITS USE AND METHOD OF PLATING CDs USING THE CHAMBER |
| 09/23/1998 | EP0865662A1 Mounting a solid state particle detector within a magnetic deflection field |
| 09/23/1998 | CN1193810A Charged particle beam exposure method and method for making patterns on wafer |
| 09/23/1998 | CN1193555A Pulsed plate plasma implantation system |
| 09/22/1998 | US5812412 Charged beam pattern data generating method and a charged beam pattern data generating apparatus |
| 09/22/1998 | US5811823 For treating a workpiece by directing an ion beam at a workpiece |
| 09/22/1998 | US5811820 Apparatus for irradiating a substrate with ions |
| 09/22/1998 | US5811819 Electron beam source and its manufacturing method and electron beam source apparatus and electron beam apparatus using the same |
| 09/22/1998 | US5811806 Electron-beam biprism |
| 09/22/1998 | US5811805 Charged particle guide apparatus and image viewing apparatus for charged particle microscope using the same |
| 09/22/1998 | US5811804 Electron microscope with raman spectroscopy |
| 09/22/1998 | US5811803 Electron microscope |
| 09/22/1998 | US5811801 Omega-type energy filter |
| 09/22/1998 | US5811195 Corrosion-resistant aluminum article for semiconductor processing equipment |
| 09/22/1998 | US5811022 Inductive plasma reactor |
| 09/22/1998 | US5811017 Cantilever for use in a scanning probe microscope and method of manufacturing the same |
| 09/22/1998 | US5810982 Preferential sputtering of insulators from conductive targets |
| 09/22/1998 | US5810963 Plasma processing apparatus and method |
| 09/22/1998 | US5810937 Using ceramic wafer to protect susceptor during cleaning of a processing chamber |
| 09/22/1998 | US5810936 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 09/22/1998 | US5810932 Plasma generating apparatus used for fabrication of semiconductor device |
| 09/22/1998 | CA2116497C Information recording and reproducing apparatus using probe |
| 09/22/1998 | CA2041495C Cvd apparatus containing single u-shaped discharge electrode held in parallel with a substrate |