| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/18/1998 | EP0878823A2 Plasma-enhanced chemical vapor deposition apparatus and method M |
| 11/18/1998 | EP0878822A1 Charged Particle beam exposure apparatus having a stage position measurement device |
| 11/18/1998 | EP0878565A1 Etching process and appratus |
| 11/18/1998 | EP0878020A1 Electromagnetic high-frequency or microwave apparatus |
| 11/18/1998 | EP0877930A1 X-ray analysis apparatus provided with a double collimator mask |
| 11/18/1998 | CN1199242A Method and apparatus for plasma processing |
| 11/17/1998 | US5838112 Parallel scan type ion implanter |
| 11/17/1998 | US5838111 Plasma generator with antennas attached to top electrodes |
| 11/17/1998 | US5838096 Cathode having a reservoir and method of manufacturing the same |
| 11/17/1998 | US5838013 Method for monitoring resist charging in a charged particle system |
| 11/17/1998 | US5838012 Charge exchange cell |
| 11/17/1998 | US5838011 Correction device for the correction of lens aberrations in particle-optical apparatus |
| 11/17/1998 | US5838006 Conical baffle for reducing charging drift in a particle beam system |
| 11/17/1998 | US5838004 Particle-optical apparatus comprising a fixed diaphragm for the monochromator filter |
| 11/17/1998 | US5837165 Rare earth hexaboride electron-emitting material |
| 11/17/1998 | US5837093 Apparatus for performing plain etching treatment |
| 11/17/1998 | CA2094519C Sub-micron device fabrication using multiple aperture filter |
| 11/12/1998 | WO1998050938A2 Imaging and/or scanning system with compensation of image degradations resulting from environmental factors |
| 11/12/1998 | WO1998050798A1 Method and device for active compensation of magnetic and electromagnetic disturbance fields |
| 11/12/1998 | WO1998033199A3 Ion accelerator for use in ion implanter |
| 11/11/1998 | EP0877411A1 Magnetron source with magnet assembly |
| 11/11/1998 | EP0877409A2 Resolving power evaluation method and specimen for electron microscope |
| 11/11/1998 | EP0876677A1 Ion source for an ion beam arrangement |
| 11/11/1998 | EP0782744B1 Apparatus and method for sputtering carbon |
| 11/11/1998 | CN1198480A Plasma intensified chemical vapour deposition device and method for making said deposition |
| 11/10/1998 | US5834787 Device for measuring flux and accumulated dose for an ion beam containing a radioactive element |
| 11/10/1998 | US5834786 High current ribbon beam ion implanter |
| 11/10/1998 | US5834783 Electron beam exposure apparatus and method, and device manufacturing method |
| 11/10/1998 | US5834781 Electron source and electron beam-emitting apparatus equipped with same |
| 11/10/1998 | US5834774 Scanning electron microscope |
| 11/10/1998 | US5834769 Atomic beam pattern forming method using atomic beam holography |
| 11/10/1998 | US5834730 Plasma processing equipment and gas discharging device |
| 11/10/1998 | US5833823 Sputter source with a target arrangement and a holding device |
| 11/10/1998 | US5833815 Magnetron cathodes are free to move |
| 11/10/1998 | US5833425 Semiconductor device manufacturing apparatus employing vacuum system |
| 11/05/1998 | WO1998049709A1 Pattern-writing machine |
| 11/05/1998 | WO1998049704A1 Cathode structure and electron gun for cathode ray tubes |
| 11/05/1998 | WO1998049368A1 Method and device for cleaning and activating electrically conductive structures and circuit boards |
| 11/05/1998 | DE19718799A1 Abbildende und/oder in einem Rastermodus abtastende Vorrichtung mit einer Einrichtung zur Kompensation von Abbildungsverschlechterungen, die durch Umgebungseinflüsse verursacht werden Imaging and / or scanning in a raster mode device having a device for compensating deterioration of image caused by environmental influences |
| 11/05/1998 | DE19718649A1 Vorrichtung und Verfahren zur aktiven Kompensation magnetischer und elektromagnetischer Störfelder Apparatus and method for active compensation of magnetic and electromagnetic interference |
| 11/04/1998 | EP0875919A2 Self-cleaning focus ring |
| 11/04/1998 | EP0875918A1 Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter |
| 11/04/1998 | EP0875072A2 Conical baffle for reducing charging drift in a particle beam system |
| 11/04/1998 | CN1198072A Plasma immersion implantation with pulsed anode |
| 11/04/1998 | CN1197848A Vacuum film growth apparatus |
| 11/03/1998 | US5831274 Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus |
| 11/03/1998 | US5831273 Charged particle beam lithography method and apparatus thereof |
| 11/03/1998 | US5831272 Low energy electron beam lithography |
| 11/03/1998 | US5831270 Magnetic deflectors and charged-particle-beam lithography systems incorporating same |
| 11/03/1998 | US5831265 Scanning electron microscope |
| 11/03/1998 | US5830808 Plasma reactor with magnet for protecting an electroacoustic chuck from the plasma |
| 11/03/1998 | US5830612 Masking; scanning, calibration; high density integrated circuits |
| 11/03/1998 | US5830331 Apparatus and method for sputtering carbon |
| 11/03/1998 | US5830330 Method and apparatus for low pressure sputtering |
| 11/03/1998 | US5830327 Rotating magnet sputter sources having a broad erosion pattern, relatively small source to substrate distance to extend target life, and good deposition thickness uniformity. |
| 11/03/1998 | US5830310 Apparatus and method for detecting end point of post treatment |
| 10/29/1998 | WO1998048444A1 Method and apparatus for ionized sputtering of materials |
| 10/29/1998 | WO1998048443A1 Multi-beam array electron optics |
| 10/29/1998 | WO1998048442A1 Apparatus and method for a modular electron beam system for the treatment of surfaces |
| 10/29/1998 | WO1998048441A1 Method for carrying out a nanometrical reaction and device for realising the same |
| 10/29/1998 | WO1998048268A1 Method for carrying out the electrical breakdown of a gaseous dielectric in a highly non-uniform field |
| 10/29/1998 | WO1998048263A1 Method for monitoring the parameters of film coatings and surfaces during their modification process and device for realising the same |
| 10/29/1998 | WO1998048074A1 Metered gas control in a substrate processing apparatus |
| 10/29/1998 | WO1998048073A1 Plasma processing system utilizing combined anode/ion source |
| 10/29/1998 | DE19717698A1 Verfahren und Vorrichtung zur Reinigung von Aktivierung von elektrischen Leiterbahnen und Platinenoberflächen Method and apparatus for the purification of activation of electric conductors and platinum surfaces |
| 10/29/1998 | DE19717127A1 Excitation of gas discharge with short voltage pulses |
| 10/29/1998 | CA2288911A1 Apparatus and method for a modular electron beam system for the treatment of surfaces |
| 10/29/1998 | CA2233205A1 Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter |
| 10/28/1998 | EP0874386A2 Apparatus and process for remote microwave plasma generation |
| 10/28/1998 | EP0874065A1 Improved magnet design for a sputtering chamber |
| 10/28/1998 | EP0873574A1 Method to determine depth profiles in an area of thin coating |
| 10/28/1998 | EP0873573A2 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 10/28/1998 | EP0873431A1 Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
| 10/28/1998 | EP0873430A1 Sputtering device and liquid-cooled target assembly therefor |
| 10/28/1998 | CN1197283A Method of aligning semiconductor substrate with base stage and apparatus for doing the same |
| 10/27/1998 | US5828175 Circuitry for operating a glow discharge path |
| 10/27/1998 | US5828070 System and method for cooling workpieces processed by an ion implantation system |
| 10/27/1998 | US5828064 Field emission environmental scanning electron microscope |
| 10/27/1998 | US5827435 Plasma processing method and equipment used therefor |
| 10/22/1998 | WO1998047172A1 Pattern film repair using a gas assisted focused particle beam system |
| 10/22/1998 | WO1998047168A1 Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
| 10/22/1998 | WO1998047167A1 An electron beam lithography system |
| 10/22/1998 | WO1998047049A1 Apertured nonplanar electrodes and forming methods |
| 10/22/1998 | WO1998046808A1 Processor |
| 10/22/1998 | WO1998046807A1 Method and device for pvd coating |
| 10/22/1998 | WO1998037739A3 Induction plasma source including convex dome-shaped induction coil |
| 10/22/1998 | WO1998021744A3 Gas panel |
| 10/22/1998 | DE19816914A1 Scanning microscope with stage observing=evaluating parameters of sample surface |
| 10/22/1998 | DE19814245A1 Electron beam exposure method |
| 10/22/1998 | DE19715647A1 Control of reactive precipitation of coatings onto substrates with elongate magnetron |
| 10/22/1998 | CA2286638A1 Pattern film repair using a gas assisted focused particle beam system |
| 10/21/1998 | EP0872873A2 Scanning electron microscope |
| 10/21/1998 | EP0872164A1 Device for the production of plasmas by microwaves |
| 10/21/1998 | EP0871975A1 Power segmented electrode |
| 10/21/1998 | EP0871974A1 Xy displacement device |
| 10/21/1998 | EP0871972A1 Electron beam device with single crystal window and matching anode |
| 10/21/1998 | EP0871843A2 Apparatus and method for temperature control of workpieces in vacuum |
| 10/21/1998 | EP0871795A1 A scalable helicon wave plasma processing device with a non-cylindrical source chamber |
| 10/21/1998 | CN1196503A Pattern exposure method using electron beam |
| 10/20/1998 | US5825123 Method and apparatus for deflecting a charged particle stream |