Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/1998
12/22/1998US5851343 Protective shield around the inner edge of endpoint window in a plasma etching chamber
12/17/1998WO1998057351A1 Collimator for high takeoff angle energy dispersive spectroscopy (eds) detectors
12/17/1998WO1998057350A1 Methods and apparatus for improving resolution and reducing noise in an image detector for an electron microscope
12/17/1998DE19826259A1 Plasma CVD process application
12/17/1998DE19727647A1 Cathodic sputtering apparatus with adjustable target
12/16/1998EP0884761A1 Sputtering apparatus with a rotating magnet array
12/16/1998EP0884760A2 Electron-beam excited plasma generator
12/16/1998EP0884759A1 Secondary ion mass spectrometer with apertured mask
12/16/1998EP0884617A1 Scanning near-field optic/atomic-force microscope, probe for use in same, and method of fabricating said probe
12/16/1998EP0884613A2 Apparatus for photo writing apodised Bragg gratings
12/16/1998EP0883892A1 Vacuum compatible linear motion device
12/16/1998EP0883891A2 Method of operating a particle-optical apparatus
12/16/1998EP0653103A4 Dose modulation and pixel deflection for raster scan lithography.
12/16/1998CN1201870A Dual-walled exhaust tubing for vacuum pump
12/15/1998US5850083 Charged particle beam lithograph apparatus
12/15/1998US5850038 Scanning probe microscope incorporating an optical microscope
12/15/1998US5849455 Plasma processing method and plasma processing apparatus
12/15/1998US5849437 Electron beam exposure mask and method of manufacturing the same and electron beam exposure method
12/15/1998US5849436 Block mask and charged particle beam exposure method and apparatus using the same
12/15/1998US5849372 RF plasma reactor and methods of generating RF plasma
12/15/1998US5849162 Sputtering device and method for reactive for reactive sputtering
12/15/1998US5849136 High frequency semiconductor wafer processing apparatus and method
12/15/1998US5849135 Particulate contamination removal from wafers using plasmas and mechanical agitation
12/15/1998US5849093 Process for surface treatment with ions
12/15/1998US5849092 Process for chlorine trifluoride chamber cleaning
12/10/1998WO1998056027A1 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
12/10/1998WO1998055666A1 Shield for sputter coating method and apparatus
12/09/1998EP0883159A2 Plasma processing apparatus
12/09/1998EP0883158A1 Scanning electron microscope
12/09/1998EP0883157A1 Optical system with an axially moveable apertured plate
12/09/1998EP0881918A2 Tetracarbon
12/09/1998EP0792447B1 Specimen holder and apparatus for two-sided ion milling system
12/09/1998CN1201165A Electronic beam exposure method using moving platform
12/08/1998US5847959 Method and apparatus for run-time correction of proximity effects in pattern generation
12/08/1998US5847402 Charged particle beam pattern transfer apparatus and method
12/08/1998US5847399 Deflection system
12/08/1998US5847388 Collimator for high takeoff angle energy dispersive spectroscopy (EDS) detectors
12/08/1998US5847387 Support device and stage assembly for a scanned-probe microscope
12/08/1998US5847383 Approaching device of scanning probe microscope
12/08/1998US5846885 Plasma treatment method
12/08/1998US5846883 Method for multi-zone high-density inductively-coupled plasma generation
12/08/1998US5846608 Process for ion-supported vacuum coating
12/08/1998US5846375 Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment
12/08/1998US5846373 Method for monitoring process endpoints in a plasma chamber and a process monitoring arrangement in a plasma chamber
12/08/1998US5846332 Thermally floating pedestal collar in a chemical vapor deposition chamber
12/08/1998US5846331 Plasma processing apparatus
12/08/1998US5846329 Plasma processing apparatus
12/03/1998WO1998054750A1 Electron sources having shielded cathodes
12/03/1998WO1998054749A1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
12/03/1998WO1998054748A1 Device for producing plasma
12/03/1998WO1998054747A1 Device and method for ion beam etching
12/03/1998WO1998054746A1 Scintillating fiducial patterns
12/03/1998WO1998054620A1 Lithography system
12/03/1998DE19722272A1 Vorrichtung zur Erzeugung von Plasma A device for generating plasma
12/03/1998DE19722056A1 Method and apparatus for production of thin layers by low pressure gas discharge in a hollow cathode
12/02/1998EP0881662A1 Plasma processing apparatus and plasma processing method
12/02/1998EP0881542A1 Lithography system
12/02/1998EP0881197A2 Method and apparatus for coating glass or plastic containers using PCVD for coating
12/02/1998EP0880798A1 System and method for cooling workpieces processed by an ion implantation system
12/02/1998EP0880797A1 Ion implantation system for implanting workpieces
12/02/1998EP0880795A1 Process for control of the energy distribution in bipolar low-pressure glow processes
12/02/1998EP0880794A1 Ion beam shield for implantation systems
12/02/1998EP0880793A1 Large area uniform ion beam formation
12/02/1998EP0880792A1 Loadlock assembly for an ion implantation system
12/02/1998EP0812368B1 Reactive sputtering process
12/02/1998EP0731981B1 Particle-optical apparatus comprising an electron source with a needle and a membrane-like extraction electrode
12/02/1998EP0663019B1 Topographically precise thin film coating system
12/02/1998CN1200381A Method and equipment for metallising plastic container or glass container
12/01/1998US5843800 Gettering of particles from an electro-negative plasma with insulating chuck
12/01/1998US5843623 Low profile substrate ground probe
12/01/1998US5843603 Method of evaluating shaped beam of charged beam writer and method of forming pattern
12/01/1998US5843293 Arc-type evaporator
12/01/1998US5843236 Plasma processing apparatus for radiating microwave from rectangular waveguide through long slot to plasma chamber
11/1998
11/26/1998WO1998053486A2 Aluminum deposition shield
11/26/1998WO1998053482A1 Apparatus for coupling power through a workpiece in a semiconductor wafer processing system
11/26/1998WO1998053481A1 Electron beam aperture element
11/26/1998WO1998053117A1 Apparatus and method for sputter depositing dielectric films on a substrate
11/26/1998WO1998053116A1 Method and apparatus for low pressure sputtering
11/26/1998WO1998052774A1 Diamond marking
11/26/1998WO1998032153A3 Electron beam dose control for scanning electron microscopy andcritical dimension measurement instruments
11/25/1998EP0880164A1 Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method
11/25/1998EP0880163A2 Plasma processing method and apparatus
11/25/1998EP0880162A2 Dual walled exhaust tubing for vacuum pump
11/25/1998EP0880161A1 Electron flood apparatus for neutralising charge build-up on a substrate during ion implantation
11/25/1998EP0880043A2 Scanning near field optical microscope
11/25/1998EP0534935B1 Method and apparatus for generating particle beams
11/24/1998US5841235 Source for the generation of large area pulsed ion and electron beams
11/24/1998US5841145 Method of and system for exposing pattern on object by charged particle beam
11/24/1998US5840167 Sputtering deposition apparatus and method utilizing charged particles
11/24/1998US5840163 Filtered cathodic arc evaporation of a rectangular plasma cathode mounted in a rectangular plasma duct; useful for coating or ion implantation on a long or large substrate
11/24/1998CA2084110C Arc suppressor for electron gun
11/24/1998CA2071085C Rolling element cage constraint
11/19/1998WO1998052390A1 Method and apparatus for a large volume plasma processor that can utilize any feedstock material
11/19/1998WO1998052208A1 Method and apparatus for producing a uniform density plasma above a substrate
11/19/1998WO1998052207A2 Central coil design for ionized metal plasma deposition
11/19/1998WO1998052206A2 Plasma discharge emitter device and array and a method of fabricating same
11/18/1998EP0878827A1 Sample analysis method
11/18/1998EP0878826A2 Use of variable impedance to control coil sputter distribution
11/18/1998EP0878825A2 Use of a variable impedance to control RF coil heating, substrate heating, and film deposition uniformity in a plasma reactor
11/18/1998EP0878824A2 Method and apparatus for etching a workpiece
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