| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 01/26/1999 | US5863376 Cooling mechanism which cools dielectric member for minimization of process drift |
| 01/26/1999 | US5863339 Chamber etching of plasma processing apparatus |
| 01/26/1999 | CA2040701C Information recording/reproducing apparatus |
| 01/21/1999 | WO1999003313A1 Plasma processing apparatus |
| 01/21/1999 | WO1999003312A1 Method for improved cleaning of substrate processing systems |
| 01/21/1999 | WO1999003125A1 Method and apparatus for neutralising space charge in an ion beam |
| 01/21/1999 | WO1999002754A1 Remote plasma cleaning apparatus |
| 01/21/1999 | WO1999002753A1 Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma |
| 01/20/1999 | EP0892422A2 Improvements in or relating to plasma reactors |
| 01/20/1999 | CN1205440A System and method for detecting neutral particles in ion beam |
| 01/19/1999 | US5862057 Method and apparatus for tuning a process recipe to target dopant concentrations in a doped layer |
| 01/19/1999 | US5861866 LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography |
| 01/19/1999 | US5861752 Method and apparatus for determining of absolute plasma parameters |
| 01/19/1999 | US5861632 Method for monitoring the performance of an ion implanter using reusable wafers |
| 01/19/1999 | US5861630 Thermal decomposition of specified metal borides to emit boron vapor which is ionized in plasma generating chamber |
| 01/19/1999 | US5861601 Microwave plasma processing apparatus and method |
| 01/19/1999 | US5861088 Ring coil surrounding a permanent magnet arranged to the center of the target and a ring associated with the periphery, forms a field line concentrator; arc stability, no contamination effects; arc discharge vaporizers |
| 01/19/1999 | US5861086 Method and apparatus for sputter etch conditioning a ceramic body |
| 01/19/1999 | US5861063 Plasma CVD device |
| 01/14/1999 | WO1999001888A1 Apparatus and method for uniform, low-damage anisotropic plasma processing |
| 01/14/1999 | WO1999001887A1 Plasma processing apparatus |
| 01/14/1999 | WO1999001886A1 Plasma reactor with impingement flow for treating surfaces |
| 01/14/1999 | WO1999001885A1 Electron flood apparatus for neutralising charge build up on a substrate during ion implantation |
| 01/14/1999 | WO1999001753A2 Method for detecting an element in a sample |
| 01/14/1999 | DE19729526A1 Detector for detecting secondary electrons |
| 01/13/1999 | EP0891024A1 Electronic-laser system for outputting radio-frequency signal and pulse laser beam synchronous with radio-frequency signal |
| 01/13/1999 | EP0890975A1 System and method for detecting neutral particles in an ion beam |
| 01/13/1999 | EP0890657A1 Method of implanting low doses of ions into a substrate |
| 01/13/1999 | EP0890296A1 Methods and apparatuses for controlling phase difference in plasma processing systems |
| 01/13/1999 | EP0889976A1 Showerhead for uniform distribution of process gas |
| 01/13/1999 | EP0788653A4 High temperature specimen stage and detector for an environmental scanning electron microscope |
| 01/12/1999 | US5859500 Metal ion plasma generator having rotatable anode plate |
| 01/12/1999 | US5859437 Intelligent supervision system with expert system for ion implantation process |
| 01/12/1999 | US5859404 Method and apparatus for plasma processing a workpiece in an enveloping plasma |
| 01/12/1999 | US5858477 Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon |
| 01/12/1999 | US5858312 Gas excitation device |
| 01/12/1999 | US5858259 Plasma processing apparatus and method |
| 01/12/1999 | US5858258 Plasma processing method |
| 01/12/1999 | US5858183 Titanium nitride |
| 01/12/1999 | US5858180 Magnetic field generator, coating method and apparatus including same, and devices having coating aligned therewith |
| 01/12/1999 | US5858162 Plasma processing apparatus |
| 01/12/1999 | US5857889 Vacuum depositing a high density boron film on a substrate surface |
| 01/12/1999 | US5857341 For use in a microscope having a scanning probe |
| 01/12/1999 | CA2132178C A plasma gun head |
| 01/12/1999 | CA2131670C Electron beam lithography system |
| 01/07/1999 | WO1999000823A1 Toroidal low-field reactive gas source |
| 01/07/1999 | WO1999000821A1 Charged-particle source, control system, and process |
| 01/07/1999 | WO1999000689A2 Test slide for microscopes and method for the production of such a slide |
| 01/07/1999 | WO1999000532A1 Gas injection system for plasma processing apparatus |
| 01/07/1999 | EP0888635A1 Plasma etch system |
| 01/07/1999 | EP0888464A1 Target, magnetron source with said target, and process for producing said target |
| 01/07/1999 | EP0888463A1 Means for vacuum coating of bulk material |
| 01/07/1999 | EP0672296A4 Scanning techniques in particle beam devices for reducing the effects of surface charge accumulation. |
| 01/07/1999 | DE19758343A1 Procedure for impedance matching during coating of uncoated glass substrate with silicon dioxide |
| 01/07/1999 | DE19728357A1 Stabilising deformation of probe tip in raster force microscope |
| 01/05/1999 | US5856677 Pattern projection method with charged particle beam and charged particle beam projection system |
| 01/05/1999 | US5856676 Water-removing exhaust system for an ion implanter and a method for using the same |
| 01/05/1999 | US5856674 Filament for ion implanter plasma shower |
| 01/05/1999 | US5855745 Vacuum pump for controlling pressure |
| 01/05/1999 | US5855744 Non-planar magnet tracking during magnetron sputtering |
| 01/05/1999 | US5855725 Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system |
| 01/05/1999 | US5855686 Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment |
| 01/05/1999 | US5855685 Plasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD method |
| 01/05/1999 | US5855684 Method for the plasma assisted high vacuum physical vapor coating of parts with wear resistant coatings and equipment for carrying out the method |
| 01/05/1999 | US5855683 Thin film deposition apparatus |
| 01/05/1999 | US5855675 Multipurpose processing chamber for chemical vapor deposition processes |
| 12/30/1998 | WO1998059367A1 Plasma reactor for passivating a substrate |
| 12/30/1998 | WO1998059359A1 Device for the production of homogenous microwave plasma |
| 12/30/1998 | WO1998059088A1 Sputter coating system and method using substrate electrode |
| 12/30/1998 | WO1998059087A2 Method for bias sputtering |
| 12/30/1998 | EP0887845A2 Processing method and apparatus for removing oxide film |
| 12/30/1998 | EP0887836A2 Electronic device fabrication apparatus |
| 12/30/1998 | EP0887835A2 Diagnostic pedestal assembly for a semiconductor wafer processing system |
| 12/30/1998 | EP0886880A1 Method and apparatus for the coating of workpieces |
| 12/30/1998 | CN1203443A Method and apparatus of removing sample adsorbed by static electricity from sample stage |
| 12/29/1998 | US5854490 For emitting an electron beam traveling along a beam axis |
| 12/29/1998 | US5854488 Ion beam machining method and device thereof |
| 12/29/1998 | US5854487 Scanning probe microscope providing unobstructed top down and bottom up views |
| 12/29/1998 | US5854138 Reduced-particle method of processing a semiconductor and/or integrated circuit |
| 12/29/1998 | US5853816 Method of coating a sputter cathode with a layer of material to be applied to a substrate by sputtering |
| 12/29/1998 | US5853607 CVD processing chamber |
| 12/29/1998 | US5853523 Plasma-etching electrode plate |
| 12/29/1998 | US5853521 Multi-cathode electron beam plasma etcher |
| 12/23/1998 | WO1998058100A1 Method and device for vacuum-coating a substrate |
| 12/23/1998 | WO1998058099A1 Method for producing coated workpieces, uses and installation for the method |
| 12/23/1998 | WO1998058098A1 Magnetic parts and method for using same |
| 12/23/1998 | WO1998058095A1 Method for plasma-activated electron beam evaporation and device for carrying out said method |
| 12/23/1998 | EP0886298A2 Method and apparatus of removing a sample adsorbed by static electricity from the sample stage |
| 12/23/1998 | EP0885455A1 Device for generating powerful microwave plasmas |
| 12/23/1998 | EP0885018A1 Method and apparatus for inactivating contaminants in biological fluid |
| 12/23/1998 | EP0809721B1 Method and apparatus for producing single crystal carbon films |
| 12/22/1998 | US5852298 Micro-processing apparatus and method therefor |
| 12/22/1998 | US5852297 Focused ion beam apparatus and method for irradiating focused ion beam |
| 12/22/1998 | US5852275 Heating system, vacuum process chamber comprising such a heating system and operation of such a vacuum process chamber |
| 12/22/1998 | US5851902 Semiconductor layer structure and recording medium for a large capacity memory |
| 12/22/1998 | US5851842 Measurement system and measurement method |
| 12/22/1998 | US5851725 Exposure of lithographic resists by metastable rare gas atoms |
| 12/22/1998 | US5851600 Plasma process method and apparatus |
| 12/22/1998 | US5851413 Gas delivery systems for particle beam processing |
| 12/22/1998 | US5851365 Low pressure reactive magnetron sputtering apparatus and method |