| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/03/1999 | EP0899772A2 Cathodic arc vapor deposition apparatus |
| 03/03/1999 | EP0899771A2 Energy filter, particularly for electron microscope |
| 03/03/1999 | EP0899561A1 Microscope system equipped with an electron microscope and a scanning probe microscope |
| 03/02/1999 | US5878074 Evaporator crucible and improved method for performing electron-beam evaporation |
| 03/02/1999 | US5877505 Apparatus for determining mark position on wafer |
| 03/02/1999 | US5877496 Apparatus and method for analysis of surface impurities in a very small region |
| 03/02/1999 | US5877032 Process for device fabrication in which the plasma etch is controlled by monitoring optical emission |
| 03/02/1999 | US5876902 Hybrid exposure technique for pattern generation |
| 03/02/1999 | US5876838 Semiconductor integrated circuit processing wafer having a PECVD material layer of improved thickness uniformity |
| 03/02/1999 | US5876576 Apparatus for sputtering magnetic target materials |
| 03/02/1999 | US5876574 Magnet design for a sputtering chamber |
| 03/02/1999 | US5876573 High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition |
| 02/25/1999 | WO1999009583A1 Method and device for plasma etching |
| 02/25/1999 | WO1999009582A1 Object observation device and object observation method |
| 02/25/1999 | WO1999009581A1 Scanning system with linear gas bearings and active counter-balance options |
| 02/25/1999 | WO1998053486A3 Aluminum deposition shield |
| 02/24/1999 | EP0897591A1 Magnet array |
| 02/24/1999 | CN1208954A Method of implanting low doses of ions into substrate |
| 02/24/1999 | CN1208948A Method of preparing charged particle beam drawing data and recording medium on which program thereof is recorded |
| 02/23/1999 | US5874807 Large area plasma processing system (LAPPS) |
| 02/23/1999 | US5874739 Arrangement for shadow-casting lithography |
| 02/23/1999 | US5874735 Scanning electron microscope |
| 02/23/1999 | US5874734 Atomic force microscope for measuring properties of dielectric and insulating layers |
| 02/23/1999 | US5874705 Method of and apparatus for microwave-plasma production |
| 02/23/1999 | US5874704 Low inductance large area coil for an inductively coupled plasma source |
| 02/23/1999 | US5874198 Charged particle beam transfer method |
| 02/23/1999 | US5874014 Durable plasma treatment apparatus and method |
| 02/23/1999 | US5874012 Plasma processing apparatus and plasma processing method |
| 02/23/1999 | US5873989 Methods and apparatus for linear scan magnetron sputtering |
| 02/18/1999 | WO1999008308A1 Plasma vapor deposition with coil sputtering |
| 02/18/1999 | WO1999008307A1 Method for monitoring the performance of an ion implanter using reusable wafers |
| 02/18/1999 | WO1999008306A1 Semiconductor process compensation utilizing non-uniform ion implantation methodology |
| 02/18/1999 | WO1999007914A1 Multi-spectroscopic emission line control for thin film sputtering process |
| 02/18/1999 | WO1999007913A1 Modulated power for ionized metal plasma deposition |
| 02/18/1999 | DE19733520A1 Verfahren zur Nanostrukturierung von amorphen Kohlenstoffschichten Method for nanostructuring of amorphous carbon films |
| 02/17/1999 | EP0897189A2 High pressure magnetron cathode and device comprising same |
| 02/17/1999 | EP0896732A1 Sputtering installation with two longitudinally placed magnetrons |
| 02/17/1999 | CN1208245A Dose control for use in ion implanter |
| 02/16/1999 | US5872426 For generating and maintaining a glow plasma discharge |
| 02/16/1999 | US5872366 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 02/16/1999 | US5872358 For producing a two-dimensional scan image of a sample |
| 02/16/1999 | US5871874 Mask pattern forming method capable of correcting errors by proximity effect and developing process |
| 02/16/1999 | US5871609 Electrode plate and jig for use in plasma etching |
| 02/11/1999 | WO1999007009A1 Method of and machine for pattern writing by an electron beam |
| 02/11/1999 | WO1999006996A1 Method for nano-structuring amorphous carbon layers |
| 02/11/1999 | WO1999006610A1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 02/11/1999 | WO1998052207A3 Central coil design for ionized metal plasma deposition |
| 02/11/1999 | DE19818868A1 Method and apparatus for filtering material vapours containing macro particles |
| 02/11/1999 | DE19734079A1 Cathode for a unit for target sputtering |
| 02/11/1999 | DE19730855C1 Beam generation system for electron gun |
| 02/10/1999 | EP0896201A1 Scanning probe microscope |
| 02/10/1999 | EP0895652A1 Method and apparatus for run-time correction of proximity effects in pattern generation |
| 02/10/1999 | EP0895651A1 Raster shaped beam writing strategy system and method for pattern generation |
| 02/09/1999 | US5869838 For focusing charged particle beams |
| 02/09/1999 | US5869833 For imaging a specimen with a scanning electron microscope |
| 02/09/1999 | US5868914 Magnetron sputtering system |
| 02/09/1999 | US5868897 Device and method for processing a plasma to alter the surface of a substrate using neutrals |
| 02/09/1999 | US5868854 Method and apparatus for processing samples |
| 02/09/1999 | US5868848 Plasma processing apparatus |
| 02/04/1999 | WO1999005506A1 Method and apparatus for preparing samples |
| 02/04/1999 | WO1999005417A1 Hall-current ion source apparatus and method for processing materials |
| 02/04/1999 | DE19728698A1 Method of detecting element in sample |
| 02/03/1999 | EP0895279A1 Manufacture of semiconductor device |
| 02/03/1999 | EP0895266A1 Electron gun with photocathode |
| 02/03/1999 | EP0894332A1 Use of a cleaning process, a cleaning process, a connecting process and work piece pair |
| 02/03/1999 | EP0894320A1 Thin-film magnetic recording heads and systems and methods for manufacturing the same |
| 02/03/1999 | CN1041972C Electric discharge element |
| 02/02/1999 | US5866986 Microwave gas phase plasma source |
| 02/02/1999 | US5866974 Electron beam generator with magnetic cathode-protection unit |
| 02/02/1999 | US5866913 Proximity correction dose modulation for E-beam projection lithography |
| 02/02/1999 | US5866909 Generator of ribbon-shaped ion beam |
| 02/02/1999 | US5866905 Electron microscope |
| 02/02/1999 | US5866904 Scanning electron microscope and method for dimension measuring by using the same |
| 02/02/1999 | US5866903 Equipment and process for quantitative x-ray analysis and medium with quantitative x-ray analysis program recorded |
| 02/02/1999 | US5866300 Method of and system for exposing pattern on object by charged particle beam |
| 02/02/1999 | US5865970 Permanent magnet strucure for use in a sputtering magnetron |
| 02/02/1999 | US5865937 Broad-band adjustable power ratio phase-inverting plasma reactor |
| 02/02/1999 | US5865896 High density plasma CVD reactor with combined inductive and capacitive coupling |
| 01/28/1999 | WO1999004608A1 Device for exciting a gas by surface wave plasma |
| 01/28/1999 | WO1999004606A2 Compact microwave downstream plasma system |
| 01/28/1999 | WO1999004412A2 Target cathode assembly |
| 01/28/1999 | WO1999004411A1 Plasma treater systems and treatment methods |
| 01/28/1999 | WO1999004410A1 Scanning wheel for ion implantation process chamber |
| 01/28/1999 | WO1999004409A1 Power control apparatus for an ion source having an indirectly heated cathode |
| 01/28/1999 | WO1999004058A1 Sheet-form magnetron sputtering device |
| 01/28/1999 | DE19732002A1 Magnetron cathode for a target sputtering unit |
| 01/28/1999 | DE19731025A1 Magnetron Magnetron |
| 01/28/1999 | DE19726663A1 Vorrichtung zur Erzeugung von homogenen Mikrowellenplasmen Device for generating microwave plasmas homogeneous |
| 01/28/1999 | CA2295729A1 Plasma treater systems and treatment methods |
| 01/27/1999 | EP0893944A1 System and method for neutralizing an ion beam using water vapor |
| 01/27/1999 | EP0893816A2 Corpuscular beam apparatus |
| 01/27/1999 | EP0892984A1 Magnet array for magnetrons |
| 01/27/1999 | EP0892860A1 Cathodic sputtering device |
| 01/27/1999 | CN1206220A Accelerator-decelerator electrostatic lens for variably focusing and mass resolving ion beam in ion implanter |
| 01/26/1999 | US5864143 High current ion implanter and method of ion implant by the implanter |
| 01/26/1999 | US5864142 Electron beam exposure apparatus and method of controlling same |
| 01/26/1999 | US5864138 Electron Microscope |
| 01/26/1999 | US5863841 Plasma diffusion control apparatus |
| 01/26/1999 | US5863682 Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing |
| 01/26/1999 | US5863399 Device for cathode sputtering |