| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 03/31/1999 | EP0905272A2 Cathodic arc vapor deposition apparatus (annular cathode) |
| 03/31/1999 | CN2312518Y Low temp. plasma discharging tube |
| 03/31/1999 | CN1212456A Plasma processing method and apparatus |
| 03/31/1999 | CN1212363A Semiconductor wafer temperature measurement and control thereof using gas temperature measurement |
| 03/30/1999 | US5889391 Power supply having combined regulator and pulsing circuits |
| 03/30/1999 | US5889282 Analytical method of auger electron spectroscopy for insulating sample |
| 03/30/1999 | US5889252 Method of and apparatus for independently controlling electric parameters of an impedance matching network |
| 03/30/1999 | US5888907 Plasma processing method |
| 03/30/1999 | US5888699 Reducing dose of charged particle beam applied per unit area of beam limiting portion of mask pattern area to suppress generation of heat from mask |
| 03/30/1999 | US5888682 Method of using a compensation mask to correct particle beam proximity-effect |
| 03/30/1999 | US5888413 Plasma processing method and apparatus |
| 03/30/1999 | US5888338 Magnetron plasma processing apparatus and processing method |
| 03/30/1999 | US5888337 Endpoint detector for plasma etching |
| 03/30/1999 | US5888305 Vacuum coating apparatus with a crucible in the vacuum chamber to hold material to be evaporated |
| 03/25/1999 | WO1999014793A1 Atom probe |
| 03/25/1999 | WO1999014792A1 Adjustment of deposition uniformity in an inductively coupled plasma source |
| 03/25/1999 | WO1999014791A1 Apparatus for sputtering ionized material in a medium to high density plasma |
| 03/25/1999 | WO1999014790A1 Resistive heating of power coil to reduce transient heating/start up effects |
| 03/25/1999 | WO1999014789A1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 03/25/1999 | WO1999014788A1 Shield or ring surrounding semiconductor workpiece in plasma chamber |
| 03/25/1999 | WO1999014787A2 Method for producing plasma by microwave irradiation |
| 03/25/1999 | WO1999014786A1 Apparatus and method for improved scanning efficiency in an ion implanter |
| 03/25/1999 | WO1999014785A1 Electron detectors |
| 03/25/1999 | WO1999014784A2 Vacuum plasma processor having coil with added conducting segments to its peripheral part |
| 03/25/1999 | WO1999014699A1 System and method for monitoring and controlling gas plasma processes |
| 03/25/1999 | WO1999014555A1 Lever arm for a scanning microscope |
| 03/25/1999 | WO1999014394A1 Device and method for detecting and preventing arcing in rf plasma systems |
| 03/25/1999 | WO1999001753A3 Method for detecting an element in a sample |
| 03/25/1999 | DE19740807A1 Method for observing dynamic processes in atomic or molecular systems |
| 03/25/1999 | DE19740763A1 Cantilever arm manufacturing method for atomic force microscope (AFM) |
| 03/25/1999 | DE19739894A1 Plasma workpiece treatment arrangement for surface processing |
| 03/25/1999 | CA2302739A1 Lever arm for a scanning microscope |
| 03/24/1999 | EP0903769A2 Spatially uniform gas supply and pump configuration for large wafer diameters |
| 03/24/1999 | EP0902967A1 High flown vacuum chamber including equipment modules such as plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 03/24/1999 | EP0902962A1 Apparatus for plasma jet treatment of substrates |
| 03/24/1999 | EP0902961A1 Method for treating articles with a plasma jet |
| 03/24/1999 | EP0902960A1 Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 03/24/1999 | EP0712533B1 Probe microscopy |
| 03/24/1999 | EP0444085B1 Improved electron detector for use in a gaseous environment |
| 03/24/1999 | CN1211819A System and method for neturalizing ion beam using water vapor |
| 03/24/1999 | CN1211818A Aperture apparatus used for photolithography and manufacturing method thereof |
| 03/24/1999 | CN1211811A Chemically differentiated imaging by scanning atomic force microscopy |
| 03/23/1999 | US5886473 Surface wave plasma processing apparatus |
| 03/23/1999 | US5886357 Electron-beam writing system comprising a second aperture member including at least one rectangular beam-size adjustment aperture |
| 03/23/1999 | US5886356 Automatic supervision system on the ion beam map for ion implantation process |
| 03/23/1999 | US5885747 Providing charged beam pattern drawing method which can draw auxiliary pattern for compensating for optical proximity effect by use of charged beam pattern drawing apparatus provided with acceleration voltage and beam resolution |
| 03/23/1999 | US5885472 Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof |
| 03/23/1999 | US5885402 Diagnostic head assembly for plasma chamber |
| 03/23/1999 | US5885358 Gas injection slit nozzle for a plasma process reactor |
| 03/23/1999 | US5885357 Process and device for coating a substrate surface with vaporized inorganic material |
| 03/23/1999 | US5885356 Method of reducing residue accumulation in CVD chamber using ceramic lining |
| 03/23/1999 | US5885354 Method and apparatus for processing a specimen |
| 03/23/1999 | CA2021471C Electron beam gun |
| 03/18/1999 | WO1999013500A1 Projection ion beam machining apparatus |
| 03/18/1999 | WO1999013491A1 Vacuum sputtering apparatus |
| 03/18/1999 | WO1999013490A1 Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems |
| 03/18/1999 | WO1999013489A2 Apparatus for improving etch uniformity and methods therefor |
| 03/18/1999 | WO1999013488A1 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 03/18/1999 | WO1998059087A3 Method for bias sputtering |
| 03/18/1999 | WO1998052206A3 Plasma discharge emitter device and array and a method of fabricating same |
| 03/18/1999 | DE19755990C1 Atom probe extraction electrode manufacturing method |
| 03/17/1999 | EP0902464A2 Semiconductor wafer temperature measurement and control thereof using gas temperature measurement |
| 03/17/1999 | EP0902456A2 Corrosion-resistant system and method for a plasma etching apparatus |
| 03/17/1999 | EP0901686A2 Particle-optical apparatus including a low-temperature specimen holder |
| 03/17/1999 | EP0584233B1 Submicron tip structure with opposed tips |
| 03/16/1999 | US5883705 Atomic force microscope for high speed imaging including integral actuator and sensor |
| 03/16/1999 | US5883393 Source inner shield for eaton NV-10 high current implanter |
| 03/16/1999 | US5883391 Ion implantation apparatus and a method of monitoring high energy neutral contamination in an ion implantation process |
| 03/16/1999 | US5882947 Method for probing the error of energy and dosage in the high-energy ion implantation |
| 03/16/1999 | US5882538 Method and apparatus for low energy electron enhanced etching of substrates |
| 03/16/1999 | US5882492 A.C. plasma processing system |
| 03/16/1999 | US5882424 Plasma cleaning of a CVD or etch reactor using a low or mixed frequency excitation field |
| 03/16/1999 | US5882414 Method and apparatus for self-cleaning a blocker plate |
| 03/16/1999 | US5882411 Faceplate thermal choke in a CVD plasma reactor |
| 03/11/1999 | WO1999012184A2 Microwave power applicator for generating reactive chemical species from gaseous reagent species |
| 03/11/1999 | DE19838600A1 Energy filter for electron microscope |
| 03/11/1999 | DE19739527A1 Magnetically filtered vacuum arc plasma source |
| 03/11/1999 | DE19739290A1 Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen Method for eliminating axial aberrations first, second and third order correction of the spherical aberration of the third order in the electron-optical systems |
| 03/11/1999 | DE19738815A1 Cathode plate target segment fixing method |
| 03/11/1999 | DE19738721A1 Plasma treatment equipment |
| 03/10/1999 | EP0901149A2 Secondary electron emission electron shower for an ion implanter |
| 03/10/1999 | EP0901148A2 Biased and serrated extension tube for ion implanter electron shower |
| 03/09/1999 | US5880477 Method of real time control of ionizing radiation dose rate and device for using same |
| 03/09/1999 | US5880467 Microcalorimeter x-ray detectors with x-ray lens |
| 03/09/1999 | US5880034 Reduction of semiconductor structure damage during reactive ion etching |
| 03/09/1999 | US5879860 Method of writing a pattern by an electron beam |
| 03/09/1999 | US5879842 Pattern projection method with charged particle beam utilizing continuous movement of mask and substrate |
| 03/09/1999 | US5879575 Self-cleaning plasma processing reactor |
| 03/09/1999 | US5879573 Method for optimizing a gap for plasma processing |
| 03/09/1999 | US5879524 Composite backing plate for a sputtering target |
| 03/09/1999 | US5879523 Ceramic coated metallic insulator particularly useful in a plasma sputter reactor |
| 03/09/1999 | US5879461 Metered gas control in a substrate processing apparatus |
| 03/04/1999 | WO1999011103A1 Method for controlling plasma processor |
| 03/04/1999 | WO1999010913A1 An apparatus and method for allowing a stable power transmission into a plasma processing chamber |
| 03/04/1999 | WO1999010912A1 Method and system for supplying several electrodes for plasma processes with alternating voltages of predefined phase position |
| 03/04/1999 | WO1999010560A1 Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| 03/04/1999 | DE19738009A1 Electron gun with indirectly heated cathode |
| 03/04/1999 | DE19737244A1 Vorrichtung und Verfahren zur Regelung der Phasenlage von Hochfrequenzelektroden bei Plasmaprozessen Device and method for regulating the phase position of the high-frequency electrodes for plasma processes |
| 03/04/1999 | CA2298697A1 Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| 03/03/1999 | EP0899773A2 Apparatus for driving the arc in a cathodic arc coater |