Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
03/2014
03/26/2014CN103681200A Liquid material plasma treating device
03/26/2014CN103681199A Vacuum far-zone plasma processing device
03/26/2014CN103681198A Improved granular material rotating plasma processing device
03/26/2014CN103681197A Device for treating plasmas on inner wall of capillary glass tube
03/26/2014CN103681196A Plasma processing apparatus and plasma processing method
03/26/2014CN103681195A Adjustment of power and frequency based on three or more states
03/26/2014CN103681194A Edge ramping
03/26/2014CN103681193A System and method for differential etching
03/26/2014CN103681192A Plasma etching method and silicon shallow trench isolation method
03/26/2014CN103681191A Broad beam uniformity adjusting device of ion implanter
03/26/2014CN103681190A Automated method for coincident alignment of a laser beam and a charged particle beam
03/26/2014CN103681189A Method of performing tomographic imaging of a sample in a charged-particle microscope
03/26/2014CN103681188A Method of investigating and correcting aberrations in charged-particle lens system
03/26/2014CN103681187A Imaging sample in TEM equipped with phase plate
03/26/2014CN103681186A Method of using a compound particle-optical lens
03/26/2014CN103681185A Electrostatic chuck and plasma treatment device
03/26/2014CN103681184A Ion implanter electrodes
03/26/2014CN103681183A Ion generation method and ion source
03/26/2014CN103681182A Heating device and plasma processing equipment
03/26/2014CN103650699A Plasma treatment device for seeds and treatment method of plasma treatment device
03/26/2014CN102362337B Plasma processing apparatus and method of producing amorphous silicon thin film using same
03/26/2014CN102160140B Plasma power supply arrangement
03/26/2014CN101322218B Method for focusing electron beam in electron column
03/25/2014US8680491 Method of controlling ion implantation apparatus
03/25/2014US8680490 Solar cell, solar cell manufacturing device, and method for manufacturing the same
03/25/2014US8680466 Electron microscope, and specimen holding method
03/25/2014US8680465 Charged particle beam apparatus and film thickness measurement method
03/25/2014US8680424 Microwave plasma processing device
03/25/2014US8679307 Method and apparatus for preparing specimens for microscopy
03/25/2014CA2526257C Device for area-based surface treatment of an article by electric dielectric barrier discharge
03/20/2014WO2014043557A1 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
03/20/2014WO2014043061A2 Internal rf antenna with dielectric insulation
03/20/2014WO2014042538A1 Integrated optical and charged particle inspection apparatus
03/20/2014WO2014042531A2 Double tilt holder and multicontact device
03/20/2014WO2014041927A1 Charged-particle-beam device and method for correcting aberration
03/20/2014WO2014041882A1 Charged particle beam device and sample observation method
03/20/2014WO2014041876A1 Charged particle beam device and sample observation method
03/20/2014WO2014041345A1 Plasma source
03/20/2014WO2014041280A1 Device for generating plasma having a high range along an axis by electron cyclotron resonance (ecr) from a gaseous medium
03/20/2014WO2014040295A1 Device for detecting ion beam profile density distribution and ion beam uniformity distribution in real time
03/20/2014WO2014040100A1 Tubular target
03/20/2014US20140077684 Particle sources and methods for manufacturing the same
03/20/2014US20140077103 Charged particle beam writing apparatus and charged particle beam writing method
03/20/2014US20140077098 Charged particle beam irradiation apparatus
03/20/2014US20140077080 X-ray Detector for Electron Microscope
03/20/2014US20140077079 Electron beam irradiation apparatus
03/20/2014US20140077077 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
03/20/2014US20140076717 Charged particle beam device and sample production method
03/20/2014US20140076234 Multi chamber processing system
03/20/2014DE102009061093B3 Electron beam unit i.e. electron emitter, for creation of expanded irradiation field of electrons for e.g. set of applications, has secondary element whose recess corresponds to size of aperture that exhibits larger diameter than recess
03/19/2014EP2709138A1 Chamber for physical vapor deposition
03/19/2014EP2708875A1 Method of performing tomographic imaging of a sample in a charged-particle microscope
03/19/2014EP2708874A1 Method of performing tomographic imaging of a sample in a charged-particle microscope
03/19/2014EP2708870A2 Ion beam sample preparation thermal management apparatus and methods
03/19/2014EP2707893A1 Microscopy imaging method and system
03/19/2014CN103650098A Inductively coupled RF plasma source with magnetic confinement and faraday shielding
03/19/2014CN103650097A Charged particle multi-beamlet apparatus
03/19/2014CN103650096A Charged particle beam device
03/19/2014CN103649836A Network architecture and protocol for cluster of lithography machines
03/19/2014CN103649366A Plasma treatment of hollow bodies
03/19/2014CN103646892A A method for monitoring an ion implantation angle
03/19/2014CN103646843A Particle material surface plasma processing device
03/19/2014CN103646842A Carbon black surface atmospheric plasma processing device
03/19/2014CN103646841A A plasma etching device
03/19/2014CN103646840A Wafer fixing device for pre-cooling cavity of ion implantation machine
03/19/2014CN103646839A Metal net for bearing and fixing TEM sample
03/19/2014CN102487029B Electrostatic chuck and plasma device therewith
03/19/2014CN102471880B System and method for selectively controlling ion composition of ion sources
03/19/2014CN102347207B System for plasma process
03/19/2014CN102280338B Plasma processing device and dielectric window structure thereof
03/19/2014CN102194639B Plasma treatment device and plasma treatment method
03/19/2014CN102054649B Plasma processing apparatus and plasma processing method
03/18/2014US8674324 Charged particle beam apparatus and sample transporting apparatus
03/18/2014US8674323 Forming an electron microscope sample from high-pressure frozen material
03/18/2014US8674321 Microplasma ion source for focused ion beam applications
03/18/2014US8673450 Graphite member for beam-line internal member of ion implantation apparatus
03/18/2014CA2764215C Ozone generating apparatus
03/13/2014WO2014039647A1 Plasma treatment system
03/13/2014WO2014038287A1 Member for charged particle beam devices, charged particle beam device, and diaphragm member
03/13/2014WO2014037736A1 Method of coating and etching
03/13/2014WO2014037101A1 Plasma treatment device and method for treating at least one substrate
03/13/2014US20140074419 Three-dimensional mapping using scanning electron microscope images
03/13/2014US20140072721 Method for Modifying a Surface of a Substrate using Ion Bombardment
03/13/2014US20140070689 Substrate treatment installation
03/13/2014US20140070112 Charged-particle beam exposure apparatus and method of manufacturing article
03/13/2014US20140070099 Particle beam microscope for generating material data
03/13/2014US20140070098 Method of Using a Compound Particle-Optical Lens
03/13/2014US20140069585 Plasma etching apparatus
03/13/2014DE102012215945A1 Teilchenstrahlgerät und Verfahren zum Betrieb eines Teilchenstrahlgeräts Particle beam device and method of operating a particle beam
03/13/2014DE102012017950A1 Partikelstrahlmikroskop zur Erzeugung von Materialbestandteilen Particle beam microscope for the production of material components
03/13/2014DE102009061727A1 Electron beam unit i.e. electron emitter, for creation of expanded irradiation field of electrons for e.g. set of applications, has secondary element whose recess corresponds to size of aperture that exhibits larger diameter than recess
03/12/2014EP2706556A2 A method for coincident alignment of a laser beam and a charged particle beam
03/12/2014EP2706555A2 Particle beam microscope for generating material data and method of operating such a microscope
03/12/2014EP2706554A1 Method of using a compound particle-optical lens
03/12/2014EP2706553A2 Particle beam device and method for operating a particle beam device
03/12/2014EP2705522A1 Glow discharge apparatus and method with lateral rotating arc cathodes
03/12/2014CN203481182U Etching equipment
03/12/2014CN203481181U Cavity lining of plasma etching equipment
03/12/2014CN103635987A Sample creation device, creation method, and charged particle beam device using same
03/12/2014CN103633003A Static chuck
1 ... 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 ... 469