Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/1999
04/28/1999CN1215094A Non-balance plane magnetic controlled sputtering cathode and film plating device thereof
04/27/1999US5898752 X-ray analysis apparatus provided with a double collimator mask
04/27/1999US5898269 Electron sources having shielded cathodes
04/27/1999US5898179 Method and apparatus for controlling a workpiece in a vacuum chamber
04/27/1999US5898177 Electron microscope
04/27/1999US5897978 Mask data generating method and mask for an electron beam exposure system
04/27/1999US5897923 Plasma treatment device
04/27/1999US5897753 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
04/27/1999US5897752 Vacuum chamber containing a ring surrounding the wafer substrate clamped to pedestal so that the ring rises up toward target and its electrical bias controls plasma potential
04/27/1999US5897713 Plasma generating apparatus
04/27/1999US5897712 Plasma uniformity control for an inductive plasma source
04/22/1999WO1999020087A2 System for plasma ignition by fast voltage rise
04/22/1999WO1999019898A2 Method and apparatus to produce large inductive plasma for plasma processing
04/22/1999WO1999019537A1 Dual frequency excitation of plasma for film deposition
04/22/1999WO1999019526A2 Apparatus and method for adjusting density distribution of a plasma
04/22/1999WO1999004606A3 Compact microwave downstream plasma system
04/22/1999DE19837516A1 Thin film is formed by a combined sputter and vapor deposition process
04/22/1999DE19813199A1 Plasma generator with microwave waveguide
04/22/1999DE19744060A1 Method for surface treating of substrates
04/22/1999CA2376059A1 Method and apparatus to produce large inductive plasma for plasma processing
04/21/1999EP0910110A2 Method for operating a high power electron beam
04/21/1999EP0910109A1 Objective lens
04/21/1999EP0910108A1 Electron beam lens
04/21/1999EP0909445A1 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
04/21/1999EP0784861B1 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
04/21/1999EP0753081B1 An electron jet vapor deposition system
04/20/1999US5896012 Metal ion plasma generator having magnetic field forming device located such that a triggering is between the magnetic field forming device and an anode
04/20/1999US5895925 Mask used in charged particle beam projecting apparatus and method for dividing pattern
04/20/1999US5895924 Charged particle beam exposure method and apparatus
04/20/1999US5895923 Ion beam shield for implantation systems
04/20/1999US5895919 Gun lens for generating a particle beam
04/20/1999US5895917 Detector objective lens
04/20/1999US5895916 Method and apparatus for adjusting electron beam apparatus
04/20/1999US5895736 Radiating beam uniform in current density through aperture plate to electron resist layer
04/20/1999US5895586 Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
04/20/1999US5895559 To prevent arc jumping and cathode damage
04/20/1999US5895558 Surface treating polymer by applying asymmetrical voltage pulse to affect wettability
04/20/1999US5895551 Plasma etching apparatus
04/20/1999US5895548 High power microwave plasma applicator
04/20/1999US5895531 Apparatus and polymerization gun for coating objects by vacuum deposit
04/15/1999WO1999018594A1 Apparatus for process monitoring of a semiconductor wafer and a method of fabricating same
04/15/1999WO1999018593A1 Method and device for surface-treating substrates
04/15/1999WO1999000689A3 Test slide for microscopes and method for the production of such a slide
04/15/1999DE19752202C1 Micromechanical device production involving ion deposition on substrate region
04/14/1999EP0908924A1 Device for the condensation deposition of a film on a substrate
04/14/1999EP0908923A2 Method and apparatus to produce large inductive plasma for plasma processing
04/14/1999EP0908922A1 Process chamber for plasma processing and apparatus employing said process chamber
04/14/1999EP0908921A1 Process chamber for plasma enhanced chemical vapour deposition and apparatus employing said process chamber
04/14/1999EP0908719A1 Stage unit used for sample positioning and scanning probe microscope with such a stage unit
04/14/1999EP0908535A1 Process for cleaning a substrate and apparatus for carrying out the process
04/14/1999EP0908531A2 Apparatus and method for forming a thin film of a compound
04/14/1999CN1213848A Spatially uniform gas supply and pump configuration for large wafer diameters
04/13/1999US5894132 Charged-particle-beam projection-exposure apparatus with focus and tilt adjustments
04/13/1999US5894131 Implanting at least one of arsenic, boron, phosphorous into a substrate
04/13/1999US5894124 Scanning electron microscope and its analogous device
04/13/1999US5894057 Defining the positin of stripe field and sub-field, with respect to mask or wafer surface, developing drawing pattern definition data overlapping the stripe field defined
04/13/1999US5893962 Electrode unit for in-situ cleaning in thermal CVD apparatus
04/08/1999WO1999017336A1 Insulating ceramic coated metallic part in a plasma sputter reactor
04/08/1999WO1999017335A1 Dual face shower head electrode for a magnetron plasma generating apparatus
04/08/1999WO1999017334A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
04/08/1999WO1999017333A1 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process
04/08/1999WO1999017332A1 Electron beam microscope using electron beam patterns
04/08/1999WO1999017125A1 Method and apparatus for probing an integrated circuit through the back side of an integrated circuit die
04/08/1999WO1999016928A1 Large area microwave plasma apparatus with adaptable applicator
04/08/1999WO1999016925A1 Improved methods and apparatus for physical vapor deposition
04/08/1999WO1999004412A3 Target cathode assembly
04/08/1999CA2304613A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
04/08/1999CA2304224A1 Large area microwave plasma apparatus with adaptable applicator
04/07/1999EP0907076A2 Methods of fabricating integrated, aligned tunneling tip pairs
04/07/1999EP0906716A1 Circuit for reversing polarity on electrodes
04/07/1999EP0906637A1 Gas delivery systems for particle beam processing
04/07/1999EP0906636A1 Highly tetrahedral amorphous carbon films and methods for their production
04/07/1999EP0906589A1 Apertured nonplanar electrodes and forming methods
04/07/1999CN2313295Y Assembling device for filament assemble of electron microscope
04/07/1999CN1213317A Method and apparatus for inactivating contaminants in biological fluid
04/07/1999CN1213157A Methods for performing planarization and recess etches and apparatus therefor
04/06/1999US5892328 High-power, plasma-based, reactive species generator
04/06/1999US5892237 Charged particle beam exposure method and apparatus
04/06/1999US5892236 Part for ion implantation device
04/06/1999US5892235 Apparatus and method for doping
04/06/1999US5892231 Virtual mask digital electron beam lithography
04/06/1999US5892230 Scintillating fiducial patterns
04/06/1999US5892224 Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams
04/06/1999US5892223 Multilayer microtip probe and method
04/06/1999US5892198 Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same
04/06/1999US5891350 Adjusting DC bias voltage in plasma chambers
04/06/1999US5891349 Plasma enhanced CVD apparatus and process, and dry etching apparatus and process
04/06/1999US5891348 Process gas focusing apparatus and method
04/06/1999US5891312 Forming a thin metal coating on a substrate
04/06/1999US5891311 Sputter coating system and method using substrate electrode
04/06/1999US5891253 Corrosion resistant apparatus
04/06/1999US5891252 Plasma processing apparatus
04/01/1999WO1999016117A1 Method and apparatus for plasma processing, and method for manufacturing semiconductor substrate
04/01/1999WO1999016108A2 Method and apparatus for fault detection and control
04/01/1999WO1999016101A2 Charged particle beam emitting assembly
04/01/1999WO1999015884A1 Monolayer analysis using dynamic secondary ion mass spectrometry
04/01/1999WO1999015711A1 Laminate comprising a barrier layer of silicon oxide
04/01/1999DE19741708A1 Apparatus for coating a substrate with thin layers
04/01/1999DE19740792A1 Verfahren zur Erzeugung eines Plasmas durch Einstrahlung von Mikrowellen A method of generating a plasma by microwave irradiation
03/1999
03/31/1999EP0905758A2 Methods for performing planarization and recess etches and apparatus therefor