| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/01/1999 | US5909658 Pattern data processing system |
| 06/01/1999 | US5909086 Plasma generator for generating unipolar plasma |
| 06/01/1999 | US5909032 Apparatus and method for a modular electron beam system for the treatment of surfaces |
| 06/01/1999 | US5909031 Ion implanter electron shower having enhanced secondary electron emission |
| 06/01/1999 | US5908733 The present invention relates to electron beam exposure, and more particularly to that for drawing such a pattern as an ic (integrated circuit) directly on a semiconductor wafer. |
| 06/01/1999 | US5908565 Line plasma vapor phase deposition apparatus and method |
| 06/01/1999 | US5908539 Plasma polymerization |
| 06/01/1999 | CA2129403C Ion implanting apparatus and ion implanting method |
| 05/27/1999 | WO1999026277A1 Systems and methods for plasma enhanced processing of semiconductor wafers |
| 05/27/1999 | WO1999026274A1 Planar magnetron with moving magnet assembly |
| 05/27/1999 | WO1999026273A1 Secondary particle detector |
| 05/27/1999 | WO1999026272A1 Particle beam device |
| 05/27/1999 | WO1999026267A1 A plasma generating apparatus having an electrostatic shield |
| 05/27/1999 | WO1999025494A1 All-surface biasable and/or temperature-controlled electrostatically-shielded rf plasma source |
| 05/27/1999 | WO1999012184A3 Microwave power applicator for generating reactive chemical species from gaseous reagent species |
| 05/27/1999 | WO1999004606A9 Compact microwave downstream plasma system |
| 05/27/1999 | CA2310678A1 Planar magnetron with moving magnet assembly |
| 05/26/1999 | EP0918351A1 Improved planar magnetron with moving magnet assembly |
| 05/26/1999 | EP0918350A1 A scanning electron microscope and method for controlling a scanning electron microscope |
| 05/26/1999 | EP0917725A1 Automated adjustment of an energy filtering transmissiion electron microscope |
| 05/26/1999 | EP0753201B1 A sputter method and a sputtering target |
| 05/26/1999 | CN1217390A Sputting film-plating apparatus |
| 05/25/1999 | US5907221 Inductively coupled plasma reactor with an inductive coil antenna having independent loops |
| 05/25/1999 | US5907220 Magnetron for low pressure full face erosion |
| 05/25/1999 | US5907158 Broad range ion implanter |
| 05/25/1999 | US5907157 Method and apparatus for preparing specimen |
| 05/25/1999 | US5907154 Ionization device |
| 05/25/1999 | US5906902 Manufacturing system error detection |
| 05/25/1999 | US5906688 Heating to oxidize stainless steel surface preteated by purging surface moisture using anhydrous inert gas |
| 05/25/1999 | CA2131669C Reticle having a number of subfields |
| 05/25/1999 | CA2114020C Color synthesizing scanning electron microscope |
| 05/20/1999 | WO1999025000A1 Ion implantation apparatus and method of implanting ions to prevent charge build up on a substrate |
| 05/20/1999 | WO1999024640A1 Method for monitoring foreign matter of plasma treating device |
| 05/20/1999 | DE19750270A1 Sputtering cathode |
| 05/19/1999 | EP0917178A1 Secondary corpuscule detector and its arrangement in a corpuscular beam apparatus |
| 05/19/1999 | EP0917177A1 Corpuscular beam apparatus |
| 05/19/1999 | EP0916154A1 Double window exhaust arrangement for wafer plasma processor |
| 05/19/1999 | EP0916153A1 Device for producing plasma |
| 05/18/1999 | US5905267 Electron beam exposure apparatus and method of controlling same |
| 05/18/1999 | US5905266 Charged particle beam system with optical microscope |
| 05/18/1999 | US5904800 Semiconductor wafer processing chamber for reducing particles deposited onto the semiconductor wafer |
| 05/18/1999 | US5904799 Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks |
| 05/18/1999 | US5904780 Plasma etching apparatus for semiconductors |
| 05/18/1999 | US5904779 Wafer electrical discharge control by wafer lifter system |
| 05/18/1999 | US5904778 Silicon carbide composite article particularly useful for plasma reactors |
| 05/18/1999 | US5904571 Methods and apparatus for reducing charging during plasma processing |
| 05/14/1999 | WO1999023685A1 Method and apparatus for ion beam scanning in an ion implanter |
| 05/14/1999 | WO1999023684A1 Apparatus and method for secondary electron emission microscope |
| 05/14/1999 | WO1999023472A1 Method and apparatus employing external light source for endpoint detection |
| 05/12/1999 | EP0914670A2 Cathode arc source and graphite target |
| 05/12/1999 | EP0914669A1 Detector devices |
| 05/12/1999 | EP0914496A1 Microwave applicator for an electron cyclotron resonance plasma source |
| 05/12/1999 | EP0914495A1 Target arrangement with a circular disk |
| 05/12/1999 | DE19755902C1 Plasma surface treatment process involves hollow cathode self-cleaning |
| 05/11/1999 | US5903106 Plasma generating apparatus having an electrostatic shield |
| 05/11/1999 | US5903009 Biased and serrated extension tube for ion implanter electron shower |
| 05/11/1999 | US5902494 Method and apparatus for reducing particle generation by limiting DC bias spike |
| 05/11/1999 | US5902466 Sputtering apparatus with magnetic orienting device for thin film deposition |
| 05/11/1999 | US5902462 Useful for producing highly dense, wear resistance coatings which are free of macroparticles |
| 05/11/1999 | US5902461 Apparatus and method for enhancing uniformity of a metal film formed on a substrate with the aid of an inductively coupled plasma |
| 05/11/1999 | US5902405 Plasma processing apparatus |
| 05/11/1999 | US5902404 Resonant chamber applicator for remote plasma source |
| 05/11/1999 | US5902403 Method and apparatus for cleaning a chamber |
| 05/06/1999 | WO1999022398A2 Cathode arc source with target feeding apparatus |
| 05/06/1999 | WO1999022397A1 Arc monitoring |
| 05/06/1999 | WO1999022396A2 Enhanced macroparticle filter and cathode arc source |
| 05/06/1999 | WO1999022395A2 Cathode arc source for metallic and dielectric coatings |
| 05/06/1999 | WO1999022165A1 Gas panel |
| 05/06/1999 | WO1999014787A3 Method for producing plasma by microwave irradiation |
| 05/06/1999 | WO1999013489A3 Apparatus for improving etch uniformity and methods therefor |
| 05/06/1999 | EP0913074A1 Plasma etch reactor and method for emerging films |
| 05/06/1999 | EP0462209B1 Electron cyclotron resonance plasma source and method of operation |
| 05/06/1999 | DE19851097A1 Mechanically adjustable electrostatic lens |
| 05/06/1999 | DE19747923A1 Sputtering cathode |
| 05/06/1999 | DE19747164A1 Substrate disc processing apparatus for simulation of silicon micro process |
| 05/06/1999 | CA2307663A1 Gas panel |
| 05/05/1999 | CN1215912A Plasm processing device and method |
| 05/04/1999 | US5900937 Optical interferometer using beam energy modulation to measure surface topology |
| 05/04/1999 | US5900667 Operating a solid state particle detector within a magnetic deflection field so as to minimize eddy currents |
| 05/04/1999 | US5900629 Scanning electron microscope |
| 05/04/1999 | US5900284 Plasma generating device and method |
| 05/04/1999 | US5900162 Plasma etching method and apparatus |
| 05/04/1999 | US5900161 Apparatus and method for detecting end point of post treatment |
| 05/04/1999 | US5900104 Plasma system for enhancing the surface of a material |
| 05/04/1999 | US5900103 Plasma treatment method and apparatus |
| 05/04/1999 | US5900065 Apparatus for the plasma-chemical deposition of polycrystalline diamond |
| 05/04/1999 | US5900064 Plasma process chamber |
| 05/04/1999 | US5900063 Method and apparatus for coating a substrate |
| 04/29/1999 | WO1999021210A1 Monitor of plasma processes with multivariate statistical analysis of plasma emission spectra |
| 04/29/1999 | WO1999020812A1 Method for cleaning an etching chamber |
| 04/29/1999 | WO1998059087A9 Method for bias sputtering |
| 04/29/1999 | WO1998050938A3 Imaging and/or scanning system with compensation of image degradations resulting from environmental factors |
| 04/29/1999 | DE19818840A1 Electron beam exposure method in LSI manufacture |
| 04/28/1999 | EP0911863A2 Plasma process control system comprising a programmable process controller and an external computer for downloading a control program to the process controller |
| 04/28/1999 | EP0911862A2 Apparatus and method for microwave plasma process |
| 04/28/1999 | EP0911861A1 Filament for ion implanter plasma shower |
| 04/28/1999 | EP0911860A2 Particle beam apparatus with energy filter |
| 04/28/1999 | EP0910686A1 Temperature controlling method and apparatus for a plasma processing chamber |
| 04/28/1999 | EP0792381B1 Process for coating substrates and a device for carrying out said process |
| 04/28/1999 | EP0769202B1 Liquid metal ion source |