Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/1999
07/01/1999WO1999033086A1 Techniques for etching a transition metal-containing layer
07/01/1999WO1999033085A1 Correction device for correcting chromatic aberration in particle-optical apparatus
07/01/1999WO1999032686A1 Gas trap for cvd apparatus
07/01/1999WO1999019526A3 Apparatus and method for adjusting density distribution of a plasma
07/01/1999DE19756162A1 Sputtering unit
06/1999
06/30/1999EP0926699A1 Method and apparatus for deflecting charged particles
06/30/1999EP0925605A1 Method and apparatus for etching a semiconductor wafer
06/30/1999EP0925600A1 Thin film electrostatic shield for inductive plasma processing
06/30/1999EP0925599A1 Energy filter, transmission electron microscope and associated method for filtering energy
06/30/1999CN2327067Y Sealed scanning-probe-needle microscope scanner
06/30/1999CN1221460A Temp. controlling method and apparatus for plasma processing chamber
06/30/1999CN1221209A Method of implementing electron beam lithography using uniquely positioned alignment marks and wafer with such alignment marks
06/29/1999US5917579 Block exposure of semiconductor wafer
06/29/1999US5917286 Pulsed direct current power supply configurations for generating plasmas
06/29/1999US5917186 Focused ion beam optical axis adjustment method and focused ion beam apparatus
06/29/1999US5916716 Emulation methodology for critical dimension control in E-Beam lithography
06/29/1999US5916455 Method and apparatus for generating a low pressure plasma
06/29/1999US5916454 Methods and apparatus for reducing byproduct particle generation in a plasma processing chamber
06/29/1999US5916424 Thin film magnetic recording heads and systems and methods for manufacturing the same
06/29/1999CA2106943C Spin-polarized electron emitter having semiconductor opto-electronic layer with split valence band
06/24/1999WO1999031712A1 Ion implanting apparatus and method
06/24/1999WO1999031706A1 Ionic plasma deflection system
06/24/1999WO1999031705A1 Ion implanter, and its method
06/24/1999WO1999031290A1 Magnetron sputtering source
06/24/1999DE19857699A1 Apparatus for producing a magnetic film
06/24/1999DE19756774A1 Microwave plasma source
06/24/1999DE19754986A1 Sputtering cathode
06/23/1999EP0924744A1 Sputtering cathode
06/23/1999EP0924743A1 Detector assembly for a scanning electron microscope
06/23/1999EP0924529A1 Method of producing magnetic force image and scanning probe microscope
06/23/1999EP0924019A2 Apparatus for electron beam welding at atmospheric pressure
06/23/1999EP0710429B1 Method for matching the generator in dipolar low-pressure glow processes
06/23/1999CN1220772A Method and device for plasma treatment
06/23/1999CN1220707A Method for forming carbon film
06/23/1999CA2254515A1 Getter system for purifying the work atmosphere in the processes of physical vapor deposition
06/22/1999US5914494 Arc chamber for an ion implantation system
06/22/1999US5914051 Microwave plasma processing method and apparatus
06/22/1999US5914018 Sputter target for eliminating redeposition on the target sidewall
06/17/1999WO1999030358A2 Ion implantation process
06/17/1999WO1999030348A1 Electron sources utilizing patterned negative electron affinity photocathodes
06/17/1999WO1999030347A1 Method and device for improving surfaces
06/17/1999WO1999030346A1 Particle-optical apparatus provided with an acceleration sensor for the compensation of specimen vibrations
06/17/1999WO1999030345A1 Environmental sem with a magnetic field for improved secondary electron detection
06/17/1999WO1999030344A1 Environmental sem with multipole fields for improved secondary electron detection
06/17/1999WO1999030343A1 Correction device for correcting the lens defects in particle-optical apparatus
06/17/1999WO1999030342A1 Correction device for correcting the spherical aberration in particle-optical apparatus
06/17/1999WO1999029923A1 Plasma reactor with a deposition shield
06/17/1999WO1999029922A1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
06/17/1999WO1999016101A3 Charged particle beam emitting assembly
06/17/1999DE19857368A1 Spin polarizing scanning electron microscope
06/17/1999DE19755837A1 Sputtering unit employs an electrically isolated substrate edge mask
06/17/1999DE19755448A1 Sputtering cathode for production of thin layers on substrates in a vacuum chamber
06/17/1999DE19753684C1 Einrichtung zur Behandlung von Werkstücken in einem Niederdruck-Plasma Device for treating workpieces in a low pressure plasma
06/17/1999CA2312777A1 Plasma reactor with a deposition shield
06/16/1999EP0922930A1 Scanning probe microscope with integrated deflection sensor
06/16/1999EP0922294A1 High current ribbon beam ion implanter
06/16/1999EP0922122A1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process
06/16/1999EP0824759B1 Ion beam preparation device for electron microscopy
06/16/1999EP0751972A4 Polymer surface treatment with pulsed particle beams
06/15/1999US5912471 Apparatus and method for monitoring the coating process of a thermal coating apparatus
06/15/1999US5912469 Charged-particle-beam microlithography apparatus
06/15/1999US5912468 Charged particle beam exposure system
06/15/1999US5912467 Charged particle beam exposure apparatus
06/15/1999US5912462 For displaying an image of an irradiated region of a sample
06/15/1999US5912461 Probe scanning mechanism for a scanning probe microscope
06/15/1999US5912096 Accuracy
06/15/1999US5911861 Coating station
06/15/1999US5911852 Plasma processing apparatus
06/15/1999US5911832 Plasma immersion implantation with pulsed anode
06/15/1999CA2146369C Microwave apparatus for depositing thin films
06/10/1999WO1999029146A1 Method and apparatus for monitoring and adjusting chamber impedance
06/10/1999WO1999028945A1 A processing chamber and method for confining plasma
06/10/1999WO1999028533A1 Mixed frequency cvd process and apparatus
06/10/1999WO1999028528A1 High rate deposition of amorphous silicon films
06/10/1999WO1999028527A1 Method and apparatus for forming a metal layer
06/10/1999WO1999028525A1 Substrate processing chamber with tunable impedance
06/10/1999WO1999028524A1 Use of an asymmetric waveform to control ion bombardment during substrate processing
06/10/1999WO1999028520A2 Device for processing workpieces in low pressured plasma
06/10/1999WO1998059088A9 Sputter coating system and method using substrate electrode
06/10/1999DE19854198A1 Substrate plasma processor with processing chamber for the substrate
06/10/1999DE19752802A1 Radiation generation system for axial electron guns, e.g. for welding, evaporation or machining
06/09/1999EP0921714A1 Rfq accelerator and ion implanter
06/09/1999EP0921556A2 Thin film forming apparatus
06/09/1999EP0921555A2 A method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks
06/09/1999EP0920709A1 Electron optical lens system with a slot-shaped aperture cross section
06/09/1999CN1218978A Stereoscopic display method for scanning type probe microscope
06/08/1999USRE36224 Microwave plasma processing process and apparatus
06/08/1999US5910658 Method and system for changed particle beam exposure
06/08/1999US5910657 Electron beam exposure apparatus for scanning electron microscopy
06/08/1999US5910221 Bonded silicon carbide parts in a plasma reactor
06/03/1999WO1999027758A1 Plasma processing apparatus having rotating magnets
06/03/1999WO1999027559A1 Radiofrequency gaseous detection device (rf-gdd)
06/03/1999WO1999027558A1 Electrostatic device for correcting chromatic aberration in a particle-optical apparatus
06/03/1999WO1999027259A1 Differential pumping via core of annular supersonic jet
06/03/1999WO1999027153A1 Apparatus and method for inductively-coupled-plasma-enhanced ionized physical-vapor deposition
06/03/1999WO1999014784A3 Vacuum plasma processor having coil with added conducting segments to its peripheral part
06/02/1999EP0919066A1 Magnetron
06/02/1999EP0918886A1 Method for forming a carbon film
06/02/1999EP0806052B1 Plasma reactor
06/02/1999EP0615123B1 Method and apparatus for surface analysis
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