| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 08/03/1999 | US5932884 Charged-beam exposure system and charged-beam exposure method |
| 08/03/1999 | US5932883 Ion implanter for implanting ion on wafer with low contamination |
| 08/03/1999 | US5932882 Ion implanter with post mass selection deceleration |
| 08/03/1999 | US5932880 Scintillator device and image pickup apparatus using the same |
| 08/03/1999 | US5932116 Power supply for multi-electrode discharge |
| 08/03/1999 | US5932078 Cathodic arc vapor deposition apparatus |
| 08/03/1999 | CA2092756C Plasma cvd method and apparatus therefor |
| 08/03/1999 | CA2034032C Ozone generation by corona discharge at elevated pressures |
| 07/29/1999 | WO1999038189A1 Plasma reactor |
| 07/29/1999 | WO1999038188A1 Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope |
| 07/29/1999 | WO1999038187A1 Electronic low energy scanning microscope and electronic beam-operated recorder based on an integrated planar microlens |
| 07/29/1999 | WO1999019537A9 Dual frequency excitation of plasma for film deposition |
| 07/29/1999 | DE19809663C1 Vacuum plasma coating installation and its application |
| 07/29/1999 | DE19802971A1 Plasma reactor for chemical vapor deposition plasma surface treatment or plasma etching |
| 07/29/1999 | DE19802482A1 Sputter cathode target casting apparatus has a two-layer base plate |
| 07/29/1999 | DE19802409A1 Lens aperture error correction device for electron microscope objective lens |
| 07/28/1999 | EP0932183A1 Linear microwave plasma source with permanent magnets |
| 07/28/1999 | EP0932182A2 Method and an apparatus for testing a substrate |
| 07/28/1999 | EP0932022A1 Method and apparatus for dimension measurement and inspection of structures |
| 07/28/1999 | EP0931853A2 Method of depositing barrier coatings by plasma assisted chemical vapour deposition |
| 07/28/1999 | EP0931851A1 Method for obtaining functional metallic, ceramic or ceramic/metallic layers on the internal wall of hollow bodies |
| 07/28/1999 | EP0931329A1 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 07/28/1999 | EP0931328A1 Method for structured energy transmission using electron beams |
| 07/28/1999 | CA2260510A1 Focused ion beam imaging method |
| 07/27/1999 | US5929717 In a vacuum plasma chamber processing a workpiece |
| 07/27/1999 | US5929457 Charged particle beam transfer apparatus |
| 07/27/1999 | US5929456 Ion implantation system and method adapted for serial wafer processing |
| 07/27/1999 | US5929454 Position detection apparatus, electron beam exposure apparatus, and methods associated with them |
| 07/27/1999 | US5929452 Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same |
| 07/27/1999 | US5929451 Symmetric magnetic doublet for charged particle beam lithography |
| 07/27/1999 | US5929439 Scanning microscope |
| 07/27/1999 | US5929373 To supply power to a device through a wall passage in a vacuum chamber |
| 07/27/1999 | US5928532 Method of detecting end point of plasma processing and apparatus for the same |
| 07/27/1999 | US5928528 Plasma treatment method and plasma treatment system |
| 07/27/1999 | US5927994 Method for manufacturing thin film |
| 07/27/1999 | US5926945 Method for forming a free wound electromagnetic deflection yoke |
| 07/27/1999 | CA2225063A1 Pulsed plate plasma implantation system |
| 07/22/1999 | WO1999036931A2 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 07/22/1999 | WO1999036586A1 Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor |
| 07/22/1999 | WO1999022398A3 Cathode arc source with target feeding apparatus |
| 07/22/1999 | WO1999022395A3 Cathode arc source for metallic and dielectric coatings |
| 07/22/1999 | DE19816220C1 Photomask blank earthing monitoring method for DRAM or logic circuit mfr. |
| 07/21/1999 | EP0930642A1 Apparatus and method for plasma-treating of a substrate |
| 07/21/1999 | EP0930638A1 Scanning electron microscope, production method for semiconductor device by using the same, image forming method |
| 07/21/1999 | EP0930376A1 Method of processing substrate |
| 07/21/1999 | EP0929906A1 An arc chamber for an ion implantation system |
| 07/21/1999 | EP0876677B1 Ion source for an ion beam arrangement |
| 07/20/1999 | US5926743 Process for chlorine trifluoride chamber cleaning |
| 07/20/1999 | US5925886 Ion source and an ion implanting apparatus using it |
| 07/20/1999 | US5925265 Exerting the actions of an electric field and a magnetic field on a processing gas; high etch selectivity between a mask and an underlying layer |
| 07/20/1999 | US5925212 Apparatus and method for attaining repeatable temperature versus time profiles for plasma heated interactive parts used in mass production plasma processing |
| 07/15/1999 | WO1999035667A1 Plasma treatment for producing electron emitters |
| 07/15/1999 | WO1999035666A1 Method of and apparatus for minimizing plasma instability in an rf processor |
| 07/15/1999 | WO1999035657A1 Magnetic engraving method, in particular for magnetic or magneto-optical recording |
| 07/15/1999 | WO1999035304A1 Pcvd apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 07/15/1999 | WO1999035302A1 Coaxial resonant multiport microwave applicator for an ecr plasma source |
| 07/15/1999 | WO1999028520A3 Device for processing workpieces in low pressured plasma |
| 07/15/1999 | CA2318350A1 Magnetic engraving method, in particular for magnetic or magneto-optical recording |
| 07/14/1999 | EP0929093A2 Plasma processor for large workpieces |
| 07/14/1999 | EP0928495A1 Ion source for generating ions of a gas or vapour |
| 07/14/1999 | CN1222981A Apertured nonplanar electrodes and forming methods |
| 07/13/1999 | US5923678 Pattern data generating system |
| 07/13/1999 | US5923040 Wafer sample retainer for an electron microscope |
| 07/13/1999 | US5923034 Pattern transfer mask, mask inspection method and a mask inspection apparatus |
| 07/13/1999 | US5922278 Method and apparatus for inactivating contaminants in biological fluid |
| 07/13/1999 | US5922223 Plasma processing method and apparatus |
| 07/13/1999 | US5922182 Apparatus for coating substrates especially with magnetizable materials |
| 07/13/1999 | US5922180 Targets, shielding plate, emitters |
| 07/13/1999 | US5922179 Apparatus for etching and coating sample specimens for microscopic analysis |
| 07/13/1999 | US5922176 Spark eliminating sputtering target and method for using and making same |
| 07/13/1999 | US5922134 Simultaneous discharge device |
| 07/10/1999 | WO1999050651A1 Pattern inspection device |
| 07/08/1999 | WO1999034418A1 Exposure apparatus, method of producing the apparatus, and exposure method, and device and method of manufacturing the device |
| 07/08/1999 | WO1999034401A1 Wien filter |
| 07/08/1999 | WO1999034399A1 Plasma device including a powered non-magnetic metal member between a plasma ac excitation source and the plasma |
| 07/08/1999 | WO1999034398A1 Vacuum treatment system |
| 07/08/1999 | WO1999034397A1 Sem provided with an electrostatic objective and an electrical scanning device |
| 07/08/1999 | WO1999034396A2 Installation with an electron-cyclotron resonance ion source for doping stents with radioactive and non-radioactive atoms |
| 07/08/1999 | WO1999034229A1 Method for optimizing the magnetic field of a periodic permanent magnet focusing device |
| 07/08/1999 | WO1999034030A1 A novel approach to optimizing an ild argon sputter process |
| 07/08/1999 | WO1999033673A1 Plasma discharge device and method with dynamic tuning |
| 07/08/1999 | WO1999020087A3 System for plasma ignition by fast voltage rise |
| 07/08/1999 | DE19757852A1 Implantation von radioaktiven ·3··2·P-Atomen Implantation of radioactive · 3 · · 2 · P atoms |
| 07/08/1999 | CA2314953A1 Implantation of radioactive p32 atoms |
| 07/07/1999 | EP0928012A2 Optical proximity correction method and apparatus |
| 07/07/1999 | EP0927880A1 Method and apparatus for preparing samples |
| 07/07/1999 | CN1222204A Reactive magnetron sputtering appts. and method |
| 07/07/1999 | CN1221807A In-situ monitoring plasma etching apparatus, its in-situ monitoring method, and in-situ cleaning method for removing residues in plasma ething chamber |
| 07/07/1999 | CN1221804A Ion chemical heat treatment appts. |
| 07/06/1999 | US5920077 Charged particle beam exposure system |
| 07/06/1999 | US5920076 Ion beam apparatus |
| 07/06/1999 | US5920073 For a particle beam device |
| 07/06/1999 | US5920068 Analysis of semiconductor surfaces by secondary ion mass spectrometry |
| 07/06/1999 | US5919382 Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
| 07/06/1999 | US5919345 Uniform film thickness deposition of sputtered materials |
| 07/06/1999 | US5919336 Apparatus for fabricating semiconductor device and method for fabricating semiconductor device |
| 07/06/1999 | US5919332 Plasma processing apparatus |
| 07/06/1999 | CA2123479C Anode structure for magnetron sputtering systems |
| 07/01/1999 | WO1999033088A1 Device for using a low pressure discharge |
| 07/01/1999 | WO1999033087A1 Focus rings and methods therefor |