Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/1999
09/01/1999EP0938634A2 Gas panel
09/01/1999EP0938596A1 Apparatus for reducing polymer deposition on substrate support
09/01/1999EP0938595A1 Process and device for coating substrates by gas flow sputtering
09/01/1999CN1227668A Method and apparatus for etching a semiconductor wafer
09/01/1999CN1227275A Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation
08/1999
08/31/1999US5946082 Interference removal
08/31/1999US5945683 Electron beam exposure device
08/31/1999US5945682 Space-saving ion-implantation system installed both in and adjacent to a semiconductor manufacturing line
08/31/1999US5945681 Ion implanting apparatus capable of preventing discharge flaw production on reverse side surface of wafer
08/31/1999US5945677 Focused ion beam system
08/31/1999US5945672 Gaseous backscattered electron detector for an environmental scanning electron microscope
08/31/1999US5945671 Scanning probe microscope and micro-area processing machine both having micro-positioning mechanism
08/31/1999US5945353 Plasma processing method
08/31/1999US5945351 Protective chambers with covers for semiconductors and etching
08/31/1999US5945177 Plasma vapor deposition using pulsed microwave power at or above threshold value at which plasma having reduced microwave permeability is ignited, for halogen lamps, thermal, optical and mechanical properties
08/31/1999US5945008 Method and apparatus for plasma control
08/31/1999US5944968 Sputtering apparatus
08/31/1999US5944967 Dual target cathode assembly with shielding
08/31/1999US5944942 Varying multipole plasma source
08/31/1999US5944902 Plasma source for HDP-CVD chamber
08/31/1999US5944899 Inductively coupled plasma processing chamber
08/26/1999WO1999043018A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
08/26/1999WO1999043017A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods
08/26/1999WO1999034399B1 Plasma device including a powered non-magnetic metal member between a plasma ac excitation source and the plasma
08/26/1999WO1999030358A3 Ion implantation process
08/26/1999DE19904829A1 Portable vacuum installation for production of thin metal coatings
08/25/1999EP0938134A2 Plasma processing method
08/25/1999EP0937308A1 Micromachining using high energy light ions
08/25/1999EP0937307A1 Charged particle source
08/25/1999EP0789840B1 Current/voltage transformer for the detection of the electron current in a scanning tunnelling-electron microscope
08/24/1999US5943594 Method for extended ion implanter source lifetime with control mechanism
08/24/1999US5943548 Method of analyzing a wafer in a semiconductor device fabrication process
08/24/1999US5942889 Capacitive probe for in situ measurement of wafer DC bias voltage
08/24/1999US5942855 Monolithic miniaturized inductively coupled plasma source
08/24/1999US5942854 Electron-beam excited plasma generator with side orifices in the discharge chamber
08/24/1999US5942760 Method of forming a semiconductor device utilizing scalpel mask, and mask therefor
08/24/1999US5942075 Plasma processing apparatus
08/24/1999US5942074 Single-piece gas director for plasma reactors
08/24/1999US5942042 Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system
08/24/1999US5942039 Self-cleaning focus ring
08/19/1999WO1999041766A1 Reactor for chemical vapor deposition of titanium
08/19/1999WO1999041765A1 Focused particle beam systems and methods using a tilt column
08/19/1999WO1999041426A1 Reactor for chemical vapor deposition
08/19/1999WO1999041425A1 Cathode arc vapor deposition
08/19/1999CA2320149A1 Focused particle beam systems and methods using a tilt column
08/18/1999EP0936658A2 Charged particle beam exposure method and apparatus
08/18/1999EP0936284A2 Method and apparatus for producing thin films
08/18/1999CN1226339A Magnetron
08/18/1999CN1226128A Apparatus and method for producing high voltage for gas ionization
08/17/1999US5940724 Method for extended ion implanter source lifetime
08/17/1999US5939886 Plasma monitoring and control method and system
08/17/1999US5939831 Methods and apparatus for pre-stabilized plasma generation for microwave clean applications
08/17/1999US5939725 Electron beam exposure apparatus
08/17/1999US5939720 Scanning electron microscope
08/17/1999US5939623 Atomic force microscope
08/17/1999US5938943 Near Substrate reactant Homogenization apparatus
08/17/1999US5938883 Plasma processing apparatus
08/17/1999US5938854 Exposing surface with contaminants to steady state radio frequency uniform glow dischage plasma for set period of time
08/17/1999US5937541 Semiconductor wafer temperature measurement and control thereof using gas temperature measurement
08/12/1999WO1999040617A1 End point detecting method for semiconductor plasma processing
08/12/1999WO1999040609A1 Plasma assisted processing chamber with separate control of species density
08/12/1999WO1999040608A1 High selectivity etch using an external plasma discharge
08/12/1999WO1999040607A1 Methods for reducing mask erosion during plasma etching
08/12/1999WO1999039860A1 Permanent magnet ecr plasma source with magnetic field optimization
08/12/1999WO1999023684A9 Apparatus and method for secondary electron emission microscope
08/12/1999DE19839612A1 Plasma generator, esp. for processes such as etching, cleaning and thin film production on semiconducting surfaces
08/12/1999DE19805471A1 Method for repairing target base plates
08/11/1999EP0935137A1 Scanning probe microscope
08/11/1999EP0934600A1 Ion gun
08/11/1999CN1225747A Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
08/11/1999CN1225482A Sputtering apparatus simulation method
08/10/1999US5936413 Method and device for measuring an ion flow in a plasma
08/10/1999US5936352 Plasma processing apparatus for producing plasma at low electron temperatures
08/10/1999US5936257 Thin-film electron emitter device having a multi-layer top electrode for suppressing degradation of an insulating layer and application apparatus using the same
08/10/1999US5936252 Charged particle beam performance measurement system and method thereof
08/10/1999US5936251 Liquid metal ion source
08/10/1999US5936244 Electron microscope and electron microscopy method
08/10/1999US5935874 Techniques for forming trenches in a silicon layer of a substrate in a high density plasma processing system
08/10/1999US5935744 Method of drawing patterns through electron beam exposure utilizing target subpatterns and varied exposure quantity
08/10/1999US5935455 Method and an electrode system for excitation of a plasma
08/10/1999US5935397 Physical vapor deposition chamber
08/10/1999US5935391 Disposing rod-like and ring-like electrodes in vacuum container; tube to be processed is disposed continuous to ring-like electrode and predetermined vacuum is set; electric power and magnetic field are applied to supply plasma to tube
08/10/1999US5935374 Electronic device fabrication apparatus
08/10/1999US5935373 Plasma processing apparatus
08/10/1999US5935335 Film-forming apparatus and film-forming method
08/10/1999US5935334 High temperature deposition, heating and efficient cleaning for forming dielectric films having thickness uniformity, good gap fill capability, high density, low moisture, and other desired characteristics.
08/10/1999US5934965 Apertured nonplanar electrodes and forming methods
08/05/1999WO1999039385A1 Method for hydrogen passivation and multichamber hollow cathode apparatus
08/05/1999WO1999039367A1 Gaseous backscattered electron detector for an environmental scanning electron microscope
08/05/1999WO1999019898A3 Method and apparatus to produce large inductive plasma for plasma processing
08/05/1999DE19804838A1 Plasma-assisted particle surface modification especially for sputter coating, activation and etching of catalyst particles
08/04/1999EP0933803A1 Method of plasma treatment
08/04/1999EP0933444A1 Sheet-form magnetron sputtering device
08/04/1999EP0932911A2 Control mechanisms for dosimetry control in ion implantation systems
08/04/1999CN1224987A Process detection system for plasma process
08/03/1999US5933440 Electronic-laser system for outputting radio-frequency signal and pulse laser beam synchronous with radio-frequency signal
08/03/1999US5933217 For transferring a recticle pattern image to a substrate
08/03/1999US5933212 Delineating method employing electron ray beam
08/03/1999US5933211 Charged beam lithography apparatus and method thereof
08/03/1999US5932966 Electron sources utilizing patterned negative electron affinity photocathodes
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