| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/05/1999 | US5961793 Method of reducing generation of particulate matter in a sputtering chamber |
| 10/05/1999 | US5961776 Surface processing apparatus |
| 10/05/1999 | US5961773 Plasma processing apparatus and plasma processing method using the same |
| 10/05/1999 | US5961772 Atmospheric-pressure plasma jet |
| 10/05/1999 | US5961726 Deposited film forming apparatus and electrode for use in it |
| 10/05/1999 | CA2182342C Method for radiofrequency wave etching |
| 09/30/1999 | WO1999049705A1 Plasma processing apparatus |
| 09/30/1999 | WO1999029922A8 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 09/30/1999 | DE19813589A1 Verfahren zur Erzeugung eines gepulsten Elektronenstrahls und Triggerplasmaquelle zur Durchführung des Verfahrens A method for generating a pulsed electron beam and trigger plasma source for performing the method |
| 09/30/1999 | DE19813075A1 Vorrichtung zum Beschichten eines Substrates An apparatus for coating a substrate |
| 09/30/1999 | DE19812987A1 Distance control between probe and specimen for oscillating measurement probe in electron scanning microscopy |
| 09/30/1999 | DE19812558A1 Producing linearly-expanded ECR plasma |
| 09/29/1999 | EP0945892A2 System and method for in-process cleaning of an ion source |
| 09/29/1999 | EP0945524A1 Apparatus for coating a substrate |
| 09/29/1999 | EP0944745A1 Process and device for forming a coating on a substrate by cathode sputtering |
| 09/28/1999 | US5959409 Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfaces |
| 09/28/1999 | US5959396 High current nova dual slit electrode enchancement |
| 09/28/1999 | US5959305 Method and apparatus for monitoring charge neutralization operation |
| 09/28/1999 | US5959303 Generator of ribbon-shaped ion beam |
| 09/28/1999 | US5958799 Ion beam machining in presence of water vapor to quickly sputter away portions photoresist and expose photoresist cross-section without damage to underlying integrated circuit substrate material, then analyzing cross section |
| 09/28/1999 | US5958636 Pattern drawing method using charged particle beams |
| 09/28/1999 | US5958626 Dividing pattern to be projected into plurality of blocks by parting lines including segments connected end-to-end so as to be non-linear |
| 09/28/1999 | US5958258 Plasma processing method in semiconductor processing system |
| 09/28/1999 | US5958193 Collimator magnetically positioned within sputtering chamber and which deflects sputtering material to deposit onto wafer surface with perpendicular trajectory for good step coverage |
| 09/28/1999 | US5958141 Dry etching device |
| 09/28/1999 | US5958139 Plasma etch system |
| 09/23/1999 | WO1999048132A1 An apparatus and method for generating plasma |
| 09/23/1999 | WO1999048131A1 Sputtering apparatus with a coil having overlapping ends |
| 09/23/1999 | WO1999048130A1 Distributed inductively-coupled plasma source |
| 09/23/1999 | WO1999048129A1 Tandem optical scanner/stepper and photoemission converter for electron beam lithography |
| 09/23/1999 | WO1999047978A1 Method and apparatus for direct writing of semiconductor die using microcolumn array |
| 09/23/1999 | WO1999047977A1 Retaining device for photo blanks |
| 09/23/1999 | WO1999047910A2 Method for enhancing the contrast for a transmission electron microscope |
| 09/23/1999 | WO1999047728A1 Method and apparatus for deposition and etching of a dielectric layer |
| 09/23/1999 | WO1999047727A1 Arc-extinguishing circuit and arc-extinguishing method |
| 09/23/1999 | DE19911944A1 Irradiating arrangement for charged particles for scanning electron microscope, X-ray microanalysis device, etc. |
| 09/23/1999 | DE19845329A1 Scanning electron microscope for acquiring images of specimens in high pressure chamber |
| 09/23/1999 | DE19837851C1 Apparatus and method for transferring a sample from a reaction vessel into ultrahigh vacuum |
| 09/23/1999 | DE19811395A1 Method of detecting element in sample |
| 09/23/1999 | CA2288021A1 Method and apparatus for direct writing of semiconductor die using microcolumn array |
| 09/22/1999 | EP0723386B1 Plasma processing device |
| 09/22/1999 | EP0721514B1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 09/21/1999 | US5955829 Cathode for electron gun with band-shaped beams |
| 09/21/1999 | US5955738 Exposure data preparing apparatus, exposure data preparing method and charged particle beam exposure apparatus |
| 09/21/1999 | US5955660 Method of controlling probe microscope |
| 09/21/1999 | US5955383 Invention teaches how to adjust for process variables by using feedback from two strategically placed pressure manometers |
| 09/21/1999 | US5954882 Plasma reactor |
| 09/20/1999 | CA2232798A1 Electron-beam system |
| 09/16/1999 | WO1999046798A1 Scanning electron microscope |
| 09/16/1999 | WO1999046797A1 Scanning electron microscope |
| 09/16/1999 | DE19814205C1 Visualization method for surface characteristics of micro object e.g. for microelectronics, micro chemistry, micro optics or micro mechanics |
| 09/16/1999 | DE19810588A1 Structure for storing information and for selectively binding molecules |
| 09/15/1999 | EP0942453A2 Monitoring of plasma constituents using optical emission spectroscopy |
| 09/14/1999 | US5952667 Variable-axis stigmator lens and charged-particle-beam microlithography apparatus comprising same |
| 09/14/1999 | US5952658 Method and system for judging milling end point for use in charged particle beam milling system |
| 09/14/1999 | US5952656 Energy filter |
| 09/14/1999 | US5952245 Method for processing samples |
| 09/14/1999 | US5952155 Creating exposure patterns with high accuracy |
| 09/14/1999 | US5952133 Methods for evaluating image-forming characteristics of a projection-optical system used in a charged-particle-beam microlithography apparatus |
| 09/14/1999 | US5951887 Plasma processing apparatus and plasma processing method |
| 09/14/1999 | US5951886 Apparatus for electron beam welding at atmospheric pressure |
| 09/14/1999 | US5951814 A portion of electrode consumed by plasma is formed of metal silicon or glassy carbon and the remaining portion is formed of a carbon material covered with a film of glassy carbon material; capable of reducing dust generation |
| 09/14/1999 | US5951773 Inductively coupled plasma chemical vapor deposition apparatus |
| 09/14/1999 | US5951196 Frictional mount for engaging a monitor in a process chamber and method of using |
| 09/10/1999 | WO1999045585A1 Plasma processing apparatus and plasma processing method |
| 09/10/1999 | WO1999045584A1 Processing apparatus |
| 09/10/1999 | WO1999045567A1 Method and apparatus for predicting plasma-process surface profiles |
| 09/10/1999 | WO1999045566A1 Device and method for forming lithographic patterns using an interferometer |
| 09/10/1999 | WO1999045565A1 Electron-beam microcolumn as a general purpose scanning electron microscope |
| 09/10/1999 | WO1999045168A1 Plasma cvd method, plasma cvd apparatus, and electrode |
| 09/10/1999 | WO1999022396A3 Enhanced macroparticle filter and cathode arc source |
| 09/10/1999 | CA2286804A1 Electron-beam microcolumn as a general purpose scanning electron microscope |
| 09/08/1999 | EP0940839A2 Etching or coating devices |
| 09/08/1999 | EP0940838A2 In situ removal of contaminants from the interior surfaces of an ion beam implanter |
| 09/08/1999 | EP0940482A2 Vacuum plasma coating apparatus and its use |
| 09/08/1999 | EP0939972A1 Plasma etch reactor and method |
| 09/08/1999 | EP0939969A1 Scanning electron microscope |
| 09/08/1999 | EP0939968A1 Electronic cyclotron resonance source for the production of ions with multiple charge in a hostile medium |
| 09/08/1999 | CN1228196A Plasma etch reactor and method |
| 09/08/1999 | CN1227961A Focussed ion beam apparatus and control method for same |
| 09/08/1999 | CN1227881A Magnetic filter for ion source |
| 09/07/1999 | US5949079 Method of and an apparatus for electron beam exposure |
| 09/07/1999 | US5949078 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 09/07/1999 | US5949076 Charged beam applying apparatus |
| 09/07/1999 | US5948704 High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 09/07/1999 | US5948485 Plasma deposition method and an apparatus therefor |
| 09/07/1999 | US5948224 Method of controlling a treatment process and vacuum treatment apparatus |
| 09/07/1999 | US5948217 Method and apparatus for endpointing while milling an integrated circuit |
| 09/07/1999 | US5948215 Method and apparatus for ionized sputtering |
| 09/07/1999 | US5948168 Distributed microwave plasma reactor for semiconductor processing |
| 09/07/1999 | US5948167 Thin film deposition apparatus |
| 09/02/1999 | WO1999044220A1 Cooling system with antifreeze for cooling magnetron for process chamber of processing system |
| 09/02/1999 | WO1999044219A1 Low pressure inductively coupled high density plasma reactor |
| 09/02/1999 | WO1999043864A1 Vacuum deposition apparatus using electron beams |
| 09/02/1999 | DE19808206A1 Low pressure gas discharge treatment of wafers for lacquer removal, cleaning or etching |
| 09/01/1999 | EP0939428A2 Voltage-current probe with high matching directivity |
| 09/01/1999 | EP0939423A1 Ion source having wide output current operating range |
| 09/01/1999 | EP0939422A2 Magnetic filter for ion source |
| 09/01/1999 | EP0938741A1 Vacuum plasma processor having coil whth intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 09/01/1999 | EP0938740A1 Particle controlling method and plasma processing chamber |