Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/1999
10/28/1999DE19811081C1 Haltevorrichtung für Photoblanks Holding device for Blanks Photo
10/27/1999EP0952606A1 Dynamically compensated objective lens-detection device and method
10/27/1999EP0951578A1 Precision etching and coating system
10/26/1999US5973447 Gridless ion source for the vacuum processing of materials
10/26/1999US5973333 Charged-particle-beam pattern-transfer apparatus and methods
10/26/1999US5973332 Electron beam exposure method, and device manufacturing method using same
10/26/1999US5973329 Ion generating apparatus for semiconductor manufacturing equipment including magnetic field switching apparatus
10/26/1999US5973323 Apparatus and method for secondary electron emission microscope
10/26/1999US5972772 Electron beam drawing process
10/26/1999US5972185 Cathodic arc vapor deposition apparatus (annular cathode)
10/26/1999US5972163 Plasma cleaning device for substrate
10/26/1999US5972160 Plasma reactor
10/26/1999US5971591 Process detection system for plasma process
10/26/1999US5970908 Apparatus and improved polymerization gun for coating objects by vacuum deposit
10/26/1999US5970907 Plasma processing apparatus
10/21/1999WO1999053733A1 Plasma apparatus for ion energy control
10/21/1999WO1999053520A1 Method and apparatus for igniting a plasma in a plasma processing chamber
10/21/1999WO1999053519A1 Shaped shadow projection for an electron beam column
10/21/1999WO1999053518A1 Detecting registration marks with a low energy electron beam
10/21/1999WO1999053517A1 Magnetic immersion lenses
10/21/1999WO1999053120A1 Reduced impedance chamber
10/21/1999WO1999053118A1 Integrated ion implant scrubber system
10/21/1999DE19816221A1 Treatment of objects, particularly wafers
10/21/1999DE19815456A1 Axial type of electron beam gun for process chamber used to e.g. melt, weld, or evaporate metal
10/21/1999DE19807742A1 Sterilization apparatus for mantle of metal cans
10/21/1999CA2292645A1 Detecting registration marks with a low energy electron beam
10/21/1999CA2291697A1 Shaped shadow projection for an electron beam column
10/20/1999EP0951049A1 Retaining ring, target and its manufacturing procedure
10/20/1999EP0950258A1 Method and device for treating a semiconductor surface
10/20/1999CN1232601A Plasma etching reactor and method for use it in new appeared film
10/20/1999CN1232286A Ion implantation apparatus
10/19/1999US5969805 Method and apparatus employing external light source for endpoint detection
10/19/1999US5969470 Charged particle source
10/19/1999US5969366 Ion implanter with post mass selection deceleration
10/19/1999US5969365 Charged-particle-beam exposure device and charged-particle-beam exposure method
10/19/1999US5969363 Method for processing electron beam sources
10/19/1999US5969362 High-throughput direct-write electron-beam exposure system and method
10/19/1999US5969357 Scanning electron microscope and method for dimension measuring by using the same
10/19/1999US5969356 Double reflection electron emission microscope
10/19/1999US5969355 Focused ion beam optical axis adjustment method and focused ion beam apparatus
10/19/1999US5969354 Electron analyzer with integrated optics
10/19/1999US5969345 Micromachined probes for nanometer scale measurements and methods of making such probes
10/19/1999US5968692 Integrated circuit pattern lithography method capable of reducing the number of shots in partial batch exposure
10/19/1999US5968686 Charged-beam exposure mask and charged-beam exposure method
10/19/1999US5968377 Treatment method in glow-discharge plasma and apparatus thereof
10/19/1999US5968374 Methods and apparatus for controlled partial ashing in a variable-gap plasma processing chamber
10/19/1999US5968328 Device for sputter deposition of thin layers on flat substrates
10/19/1999US5968327 Ionizing sputter device using a coil shield
10/19/1999US5968275 Methods and apparatus for passivating a substrate in a plasma reactor
10/19/1999US5966787 Piezoelectric actuator,
10/14/1999WO1999052126A1 Direct temperature control for a component of a substrate processing chamber
10/14/1999WO1999052125A1 Method and device for specifically manipulating and depositing particles
10/14/1999DE19915572A1 Immersion lens for electron beam projection system
10/14/1999DE19904487A1 Measuring axis symmetrical electric or magnetic fields produced by electric or magnetic field generator
10/13/1999EP0949656A2 Apparatus and method for microwave plasma process
10/13/1999EP0949655A2 Method for transferring patterns with charged particle beam
10/13/1999EP0949654A2 Method for transferring patterns with charged particle beam
10/13/1999EP0949653A2 Electron beam apparatus
10/13/1999EP0949652A1 Method of generating real-time stereo images of specimens using a scanning particle microscope
10/13/1999EP0949352A1 Plasma CVD apparatus
10/13/1999EP0948805A1 Wafer electrical discharge control by wafer lifter system
10/13/1999EP0948671A1 Method for preparation of metal intercalated fullerene-like metal chalcogenides
10/12/1999US5966586 Endpoint detection methods in plasma etch processes and apparatus therefor
10/12/1999US5966200 Charged particle beam exposure apparatus
10/12/1999US5965895 Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure
10/12/1999US5965894 Method of operating a particle-optical apparatus
10/12/1999US5965885 Probe scanning apparatus for probe microscope
10/12/1999US5965881 Scanning probe microscope and processing apparatus
10/12/1999US5965034 High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced
10/12/1999US5964989 Ionized PVD device and method of manufacturing semiconductor device
10/12/1999US5964949 ICP reactor having a conically-shaped plasma-generating section
10/12/1999US5964947 Removable pumping channel liners within a chemical vapor deposition chamber
10/12/1999CA2144082C Toxic remediation system and method
10/07/1999WO1999050897A1 Techniques for forming trenches in a silicon layer of a substrate in a high density plasma processing system
10/07/1999WO1999050886A1 Contamination controlling method and plasma processing chamber
10/07/1999WO1999050885A1 Parallel-antenna transformer-coupled plasma generation systems
10/07/1999WO1999050884A1 Use of variable impedance having rotating core to control coil sputter distribution
10/07/1999WO1999050883A1 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor
10/07/1999WO1999050878A2 Method for generating a pulsed electron beam and a trigger plasma source for carrying out said method
10/07/1999WO1999050874A2 Gated photocathode for controlled single and multiple electron beam emission
10/07/1999WO1999050475A1 A high temperature ceramic heater assembly with rf capability
10/07/1999WO1999050471A1 Method and apparatus for deposition of biaxially textured coatings
10/07/1999DE19860224A1 Verfahren zur Erzeugung von Echtzeit-Stereobildern von Werkstoffproben mittels Teilchenstrahl-Rastermikroskop A method for generating real-time stereo images of samples of material by means of particle-beam scanning microscope
10/07/1999DE19841528A1 Irradiation data production device for semiconductor production using layout templates and electron beam irradiation of surfaces
10/07/1999DE19814871A1 Verfahren und Vorrichtung zur gezielten Teilchenmanipulierung und -deposition Method and device for particle manipulation and targeted -deposition
10/07/1999CA2289131A1 Gated photocathode for controlled single and multiple electron beam emission
10/06/1999EP0948028A2 Method and device for visualizing surface characteristics of microscopic objects
10/06/1999EP0947603A2 Film depositing method and apparatus
10/06/1999EP0947047A1 Method of and apparatus for matching a load to a source
10/06/1999EP0946966A1 Device for cathodic sputtering
10/06/1999EP0946965A1 Device and method for cathodic sputtering
10/06/1999EP0946779A1 Process and device for coating the internal face of metal buildings components
10/06/1999EP0946414A1 Microwave plasma chemical synthesis of ultrafine powders
10/06/1999CN1230689A Voltage-current probe with high matching directivity
10/05/1999US5962961 Thermal field emission electron gun
10/05/1999US5962859 Multiple variable shaped electron beam system with lithographic structure
10/05/1999US5962858 Method of implanting low doses of ions into a substrate
10/05/1999US5962083 Methods of depositing films on polymer substrates
10/05/1999US5961851 Microwave plasma discharge device
10/05/1999US5961850 Plasma processing method and apparatus
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