| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/18/1999 | WO1999059185A1 Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
| 11/18/1999 | WO1999059184A1 Method and installation for correcting integrated circuit faults with an ion beam |
| 11/18/1999 | WO1999059183A1 Electron beam exposure method and electron beam exposure apparatus |
| 11/18/1999 | WO1999059182A1 Ion beam apparatus and a method for neutralising space charge in an ion beam |
| 11/18/1999 | WO1999058939A1 Electron microscope and spectroscopy system |
| 11/18/1999 | WO1999058739A1 Oxygen-argon gas mixture for precleaning in vacuum processing system |
| 11/18/1999 | WO1999058737A1 Apparatus for sputter deposition |
| 11/18/1999 | CA2333296A1 Apparatus for sputter deposition |
| 11/17/1999 | EP0957507A1 Apparatus for depositing thin layers on a substrate |
| 11/17/1999 | EP0957184A2 Sputtering control system |
| 11/17/1999 | EP0956580A1 Automatic control of glow discharges with pulsed electrical supply |
| 11/17/1999 | EP0956375A1 Reactive magnetron sputtering apparatus and method |
| 11/17/1999 | CN1235695A Cathode arc source and graphite target |
| 11/17/1999 | CN1235210A Ion implantation control using optical emission spectroscopy |
| 11/17/1999 | CN1046593C 高能电子探测器 High energy electron detector |
| 11/16/1999 | US5986765 Apparatus including compensation mask to correct particle beam proximity-effect |
| 11/16/1999 | US5986274 Charged particle irradiation apparatus and an operating method thereof |
| 11/16/1999 | US5986270 Particle-optical apparatus including a low-temperature specimen holder |
| 11/16/1999 | US5986269 Correction device for correcting chromatic aberration in particle-optical apparatus |
| 11/16/1999 | US5986264 Ion beam preparation device for electron microscopy |
| 11/16/1999 | US5986263 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 11/16/1999 | US5986262 Probe array for a scanning probe microscope |
| 11/16/1999 | US5986261 Tapered structure suitable for microthermocouples microelectrodes, field emission tips and micromagnetic sensors with force sensing capabilities |
| 11/16/1999 | US5985378 Exciting gas; inclining linear array to uniformly coat |
| 11/16/1999 | US5985375 Method for pulsed-plasma enhanced vapor deposition |
| 11/16/1999 | US5985115 Internally cooled target assembly for magnetron sputtering |
| 11/16/1999 | US5985102 Apparatus providing more uniform deposition and surface planarity of target material on wafer using floating collimator with floating shield structure |
| 11/16/1999 | US5985092 Endpoint detection system |
| 11/16/1999 | US5985091 Microwave plasma processing apparatus and microwave plasma processing method |
| 11/16/1999 | US5985089 Plasma etch system |
| 11/16/1999 | US5984505 Block exposure of semiconductor wafer |
| 11/16/1999 | US5983906 Substrate processing apparatus with gas delivery, heaters, plasma system, vacuum and controllling |
| 11/16/1999 | US5983829 Microwave plasma etching apparatus |
| 11/16/1999 | US5983828 Apparatus and method for pulsed plasma processing of a semiconductor substrate |
| 11/16/1999 | US5983713 Scanning probe microscope |
| 11/11/1999 | WO1999057753A1 Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
| 11/11/1999 | WO1999057747A1 Cvd apparatus and process for depositing titanium films |
| 11/11/1999 | WO1999057746A1 Method and apparatus for ionized physical vapor deposition |
| 11/11/1999 | WO1999057745A1 Charged particle beam illumination of blanking aperture array |
| 11/11/1999 | WO1999056624A1 Laser soft docking system for medical treatment system |
| 11/11/1999 | WO1999034396A3 Installation with an electron-cyclotron resonance ion source for doping stents with radioactive and non-radioactive atoms |
| 11/11/1999 | DE19819909A1 Plasma sterilization assembly with inner electrode linked to a high-voltage generator |
| 11/11/1999 | DE19819785A1 Zerstäubungskathode nach dem Magnetron-Prinzip Sputtering cathode magnetron according to the principle |
| 11/11/1999 | CA2296583A1 Charged particle beam illumination of blanking aperture array |
| 11/10/1999 | EP0955666A1 Sputtering cathode according to the magnetron principle |
| 11/10/1999 | EP0955665A2 Plasma chemical vapor deposition apparatus |
| 11/10/1999 | EP0955393A1 Method of multifunctional surface treatment, and device for implementing same |
| 11/10/1999 | EP0954876A1 Process and system for operating magnetron discharges |
| 11/10/1999 | EP0954875A1 Modulator for plasma-immersion ion implantation |
| 11/10/1999 | EP0954620A1 Vapor deposition components and corresponding methods |
| 11/10/1999 | CN1234838A Sheet-form magnetron sputtering device |
| 11/10/1999 | CN1046318C Apparatus and process for a glow discharge |
| 11/09/1999 | US5982101 Charged-particle source, control system, and process using gating to extract the ion beam |
| 11/09/1999 | US5982100 Inductively coupled plasma reactor |
| 11/09/1999 | US5981963 Electron-beam system |
| 11/09/1999 | US5981962 Distributed direct write lithography system using multiple variable shaped electron beams |
| 11/09/1999 | US5981961 Apparatus and method for improved scanning efficiency in an ion implanter |
| 11/09/1999 | US5981960 Charged particle beam exposure method and apparatus therefor |
| 11/09/1999 | US5981954 Electron beam exposure apparatus |
| 11/09/1999 | US5981948 Transmission electron microscope and method of observing element distribution |
| 11/09/1999 | US5981947 Apparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methods |
| 11/09/1999 | US5981899 Capacitively coupled RF-plasma reactor |
| 11/09/1999 | US5981118 Providing single scanning stage where samples are mounted and providing a balancing stage, scanning said scanning stage based on exposure data; scanning balancing stage so that barycenter of both stages become a fixed point |
| 11/09/1999 | US5980769 Plasma etching method |
| 11/09/1999 | US5980766 Process optimization in gas phase dry etching |
| 11/09/1999 | US5980707 Apparatus and method for a magnetron cathode with moving magnet assembly |
| 11/09/1999 | US5980702 Sputtering apparatus for improved step coverage |
| 11/09/1999 | US5980688 Plasma reactors and method of cleaning a plasma reactor |
| 11/09/1999 | US5980687 Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field |
| 11/09/1999 | US5980686 System and method for gas distribution in a dry etch process |
| 11/09/1999 | US5980638 Double window exhaust arrangement for wafer plasma processor |
| 11/04/1999 | WO1999056309A1 Protective member for inner surface of chamber and plasma processing apparatus |
| 11/04/1999 | WO1999056276A2 Thin-film magnetic recording head manufacture using selective imaging |
| 11/04/1999 | DE19830223C1 Magnetron sputtering unit for multilayer coating of substrates especially in small to medium runs or in laboratories |
| 11/03/1999 | EP0953204A1 Capacitively coupled rf-plasma reactor |
| 11/03/1999 | EP0953203A2 Electron bean dose control for scanning electron microscopy and critical dimension measurement instruments |
| 11/03/1999 | EP0953202A1 Particle beam device |
| 11/03/1999 | CN1233668A Monitoring of plasma constitutents using optical emission spectroscopy |
| 11/02/1999 | US5977553 Mechanism for preventing metallic ion contamination of a wafer in ion implantation equipment |
| 11/02/1999 | US5977550 Charged-particle-beam optical systems |
| 11/02/1999 | US5977549 Apparatus and method of producing dual ion/electron source |
| 11/02/1999 | US5977548 Charged particle beam exposure system and method |
| 11/02/1999 | US5976992 Method of supplying excited oxygen |
| 11/02/1999 | US5976980 Method and apparatus providing a mechanical probe structure in an integrated circuit die |
| 11/02/1999 | US5976334 Reliable sustained self-sputtering |
| 11/02/1999 | US5976328 Pattern forming method using charged particle beam process and charged particle beam processing system |
| 11/02/1999 | US5976309 Electrode assembly for plasma reactor |
| 11/02/1999 | US5976308 High density plasma CVD and etching reactor |
| 11/02/1999 | US5976259 Semiconductor device, manufacturing method, and system |
| 11/02/1999 | US5976257 Apparatus for continuously forming a large area deposited film by means of microwave plasma CVD process |
| 11/02/1999 | US5975014 Coaxial resonant multi-port microwave applicator for an ECR plasma source |
| 11/02/1999 | US5975013 Vacuum plasma processor having coil with small magnetic field in its center |
| 11/02/1999 | US5975012 Deposition apparatus |
| 10/28/1999 | WO1999054911A1 Means for controlling target erosion and sputtering in a magnetron |
| 10/28/1999 | WO1999054910A1 Retaining ring and target and method for producing same |
| 10/28/1999 | WO1999054909A1 Smaller diameter coil to enhance uniformity of metal film formed by inductively coupled plasma deposition |
| 10/28/1999 | WO1999054908A1 Crystalline gas distributor for semiconductor plasma etch chamber |
| 10/28/1999 | WO1999054694A1 Method and apparatus for monitoring plasma processing operations |
| 10/28/1999 | WO1999053823A2 X-ray diagnostic system |
| 10/28/1999 | DE19818440A1 Method of generating data for the production of a structure defined by design data, e.g. for electron beam lithography, overcomes some disadvantages with respect to increase in layout complexity and data quantity to be processed |