| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/09/1999 | DE19825404A1 Needle probe for scanning probe microscope, having toughened carbon, metallic or organometallic coating |
| 12/09/1999 | DE19825125A1 Vorrichtung zur Erzeugung von Plasma A device for generating plasma |
| 12/09/1999 | CA2330050A1 Resin molded article for chamber liner |
| 12/08/1999 | EP0963141A2 Device for plasma generation |
| 12/08/1999 | EP0962958A1 Ion scattering spectrometer |
| 12/08/1999 | EP0962547A1 Improved ion beam sputtering |
| 12/08/1999 | EP0962025A1 Correction device for correcting chromatic aberration in particle-optical apparatus |
| 12/08/1999 | EP0860019B1 Pulsed electron beam source and use thereof |
| 12/07/1999 | US5998986 Method of cleaning probe of probe card and probe-cleaning apparatus |
| 12/07/1999 | US5998933 RF plasma inductor with closed ferrite core |
| 12/07/1999 | US5998932 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 12/07/1999 | US5998931 Method and apparatus for controlling electrostatic coupling to plasmas |
| 12/07/1999 | US5998798 Ion dosage measurement apparatus for an ion beam implanter and method |
| 12/07/1999 | US5998797 Mask for electron beam exposure and electron beam drawing method |
| 12/07/1999 | US5998795 Electron beam pattern-writing column |
| 12/07/1999 | US5998790 Transmission electron microscope CCD camera |
| 12/07/1999 | US5998097 Fabrication method employing energy beam source |
| 12/07/1999 | US5997705 Rectangular filtered arc plasma source |
| 12/07/1999 | US5997697 Magnetron sputtering source and method of use thereof |
| 12/07/1999 | US5997687 Plasma processing apparatus |
| 12/07/1999 | US5997686 Process for setting a working rate distribution in an etching or plasma CVD apparatus |
| 12/07/1999 | US5997685 Corrosion-resistant apparatus |
| 12/07/1999 | US5996528 Method and apparatus for flowing gases into a manifold at high potential |
| 12/07/1999 | CA2008941C Tunnel probe and apparatus for simultaneously measuring electrochemical reaction and a tunneling current |
| 12/02/1999 | WO1999062308A1 Apparatus for coupling power into a body of gas |
| 12/02/1999 | WO1999062099A1 Gas distributor for a semiconductor process chamber |
| 12/02/1999 | WO1999062098A1 Method and apparatus for low energy ion implantation |
| 12/02/1999 | WO1999062097A1 Dissolution stage for an environmental scanning electron microscope |
| 12/02/1999 | WO1999061675A1 Method and apparatus for increasing wafer throughput between cleanings in semiconductor processing reactors |
| 12/02/1999 | WO1999054908A8 Crystalline gas distributor for semiconductor plasma etch chamber |
| 12/02/1999 | DE19824077A1 Vorrichtung zur Erzeugung von Plasma A device for generating plasma |
| 12/02/1999 | DE19823265A1 Image generation method for raster scanning microscope |
| 12/02/1999 | DE19821802A1 Ion or electron beam source for e.g. for multi-cusp ion source |
| 12/02/1999 | CA2333530A1 Method and apparatus for increasing wafer throughput between cleanings in semiconductor processing reactors |
| 12/02/1999 | CA2332860A1 Apparatus for coupling power into a body of gas |
| 12/01/1999 | EP0961528A2 Device for plasma generation |
| 12/01/1999 | EP0961308A2 Quartz glass member for use in dry etching and dry etching system equipped with the same |
| 12/01/1999 | EP0961307A2 Plasma CVD apparatus |
| 12/01/1999 | EP0960429A1 Correction device for correcting the spherical aberration in particle-optical apparatus |
| 12/01/1999 | EP0842307A4 System for the plasma treatment of large area substrates |
| 12/01/1999 | EP0809717B1 Gas manifold for an off-axis sputter apparatus |
| 12/01/1999 | EP0760159B1 Fast magnetic scanning of heavy ion beams |
| 12/01/1999 | CN1236976A Electron-beam cell projection aperture formation method |
| 11/30/1999 | US5994820 Electromechanical positioning unit |
| 11/30/1999 | US5994709 Charged-particle-beam exposure apparatus exhibiting aberration control |
| 11/30/1999 | US5994708 Demagnifying charged-particle lithography apparatus |
| 11/30/1999 | US5994704 Electromagnetic deflector |
| 11/30/1999 | US5994703 Printed sheet for deflection coils |
| 11/30/1999 | US5994698 Microprobe, preparation thereof and electronic device by use of said microprobe |
| 11/30/1999 | US5994662 Unique baffle to deflect remote plasma clean gases |
| 11/30/1999 | US5994236 Plasma source with process nonuniformity improved using ferromagnetic cores |
| 11/30/1999 | US5994030 Pattern-forming method and lithographic system |
| 11/30/1999 | US5993919 Method of synthesizing diamond |
| 11/30/1999 | US5993916 Circulating heat exchange medium in vacuum chamber, heating a heater pedestal having surface for supporting substrate, flowing gas into chamber to deposit film |
| 11/30/1999 | US5993622 Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition |
| 11/30/1999 | US5993615 Method and apparatus for detecting arcs |
| 11/30/1999 | US5993613 Method and apparatus for periodic polarity reversal during an active state |
| 11/30/1999 | US5993598 Magnetron |
| 11/30/1999 | US5993597 Single-crystal or polycrystalline silicon, which has an electric resistance of 0.0001-40 omega cm, whose crystal faces are (100), which is doped with boron or phosphorus, whose surface has been acid etched & vacuum heat treated |
| 11/30/1999 | US5993596 Glassy carbon which is characterized by a thickness greater than 4.5 mm and a thermal conductivity greater than 5 w/m.multidot.k at 300k. |
| 11/30/1999 | US5993594 Silicon nitride liner, focus ring and/or gas distribution plate, the member having an exposed surface adjacent the substrate holder being effective to minimize particle contamination during processing of substrates. |
| 11/30/1999 | US5992463 Gas panel |
| 11/30/1999 | US5992046 Semiconductor wafer temperature measurement and control thereof using gas temperature measurement |
| 11/25/1999 | WO1999060617A1 Sputtering apparatus and magnetron unit |
| 11/25/1999 | WO1999060601A1 Reduction of metal oxide in dual frequency plasma etch chamber |
| 11/25/1999 | WO1999059645A1 Methods and apparatus for inactivating contaminants in biological fluid |
| 11/25/1999 | DE19922758A1 Production of a lithographic drawing using electron or ion beam |
| 11/25/1999 | DE19922653A1 Focussed ion beam control method for semiconductor device manufacture |
| 11/25/1999 | DE19922545A1 Multicolumn electron-beam lithography system |
| 11/25/1999 | DE19822877A1 Electric plug connection for substrate coating installations |
| 11/25/1999 | DE19822634A1 Nano-atomic force microscope for rapid and sensitive surface interatomic or intermolecular force measurement |
| 11/24/1999 | EP0959487A2 Multi-cusp ion source |
| 11/24/1999 | EP0959151A2 Thin film forming apparatus |
| 11/24/1999 | EP0958592A1 Digital direct write electron beam lithography |
| 11/24/1999 | EP0958591A1 Environmental sem with a magnetic field for improved secondary electron detection |
| 11/24/1999 | EP0958590A1 Environmental sem with multipole fields for improved secondary electron detection |
| 11/24/1999 | EP0958401A1 Apparatus and method for high density plasma chemical vapor deposition |
| 11/24/1999 | EP0958400A1 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 11/24/1999 | EP0958398A1 Methods and apparatus for sputtering with rotating magnet sputter sources |
| 11/24/1999 | EP0872164B1 Device for the production of plasmas by microwaves |
| 11/24/1999 | EP0797688B1 Method for deposition of diamondlike carbon films |
| 11/23/1999 | US5990668 A.C. power supply having combined regulator and pulsing circuits |
| 11/23/1999 | US5990608 Electron gun having a cathode with limited electron discharge region |
| 11/23/1999 | US5990483 Particle detection and particle detector devices |
| 11/23/1999 | US5990480 KLM marker display controller for EPMA or the like |
| 11/23/1999 | US5990477 Apparatus for machining, recording, and reproducing, using scanning probe microscope |
| 11/23/1999 | US5990476 Control of surface potential of insulating specimens in surface analysis |
| 11/23/1999 | US5990017 Plasma reactor with heated source of a polymer-hardening precursor material |
| 11/23/1999 | US5989929 Reactor for etching, fluorocarbon gas supply means, plasma generator, adjustable means for changing the oxygen concentration disposed to have a surface exposed; preventing etch stop layer during formation of deep holes |
| 11/23/1999 | US5989928 Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device |
| 11/23/1999 | US5989779 Micro-fabrication including material removal and deposition on a three-dimensional workpiece using a beam source having three electrodes on a manipulator which enables the beam source to be directed at any orientation angle |
| 11/23/1999 | US5989760 Method of processing a substrate utilizing specific chuck |
| 11/23/1999 | US5989759 Pattern forming method using alignment from latent image or base pattern on substrate |
| 11/23/1999 | US5989753 To suppress projection errors where patterns are connected together; includes irradiation amount reduction, where irradiation is reduced in the periphery of small regions corresponding to the distance from the center of small region |
| 11/23/1999 | US5989722 Reduced pressure device and method of making |
| 11/23/1999 | US5989349 Diagnostic pedestal assembly for a semiconductor wafer processing system |
| 11/23/1999 | US5988187 Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports |
| 11/23/1999 | US5988104 Plasma treatment system |
| 11/23/1999 | US5988103 Apparatus for plasma source ion implantation and deposition for cylindrical surfaces |
| 11/18/1999 | WO1999059384A1 Processing system with dual ion sources |