| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/06/2000 | WO2000000741A1 Plasma vacuum pumping cell |
| 01/05/2000 | EP0969495A2 Particle beam apparatus with secondary electron detector |
| 01/05/2000 | EP0969494A1 Apparatus and method for examining specimen with a charged particle beam |
| 01/05/2000 | EP0969493A1 Apparatus and method for examining specimen with a charged particle beam |
| 01/05/2000 | EP0969325A2 Lithographic projection apparatus |
| 01/05/2000 | EP0969238A1 Vacuum tight coupling for tube sections |
| 01/05/2000 | EP0969123A1 Plasma etching device |
| 01/05/2000 | EP0968524A1 Atmospheric-pressure plasma jet |
| 01/05/2000 | EP0968517A1 Sem provided with an electrostatic objective and an electrical scanning device |
| 01/05/2000 | DE4126236C2 Rotierende Magnetron-Kathode und Verwendung einer rotierenden Magnetron-Kathode Rotating magnetron cathode and using a rotating magnetron cathode |
| 01/05/2000 | DE19829760A1 Device for application of microwaves to generate plasmas in vacuum environment with and without use of electron resonance |
| 01/04/2000 | US6011269 Shaped shadow projection for an electron beam column |
| 01/04/2000 | US6011268 Demagnifying projection-optical system for electron beam lithography with aberration control |
| 01/04/2000 | US6011262 Object observing apparatus and method for adjusting the same |
| 01/04/2000 | US6011261 Probe formed of mono-crystalline SI, the manufacturing method thereof, and an information processing device using the probe |
| 01/04/2000 | US6010755 Method and apparatus for forming thin films using dual ECR plasma generators |
| 01/04/2000 | US6010636 Electrode with domes for plasma focusing |
| 01/04/2000 | US6010133 Chamber interfacing O-rings and method for implementing same |
| 01/04/2000 | US6009830 Independent gas feeds in a plasma reactor |
| 01/04/2000 | US6009829 Apparatus for driving the arc in a cathodic arc coater |
| 12/30/1999 | DE19930234A1 Electrostatic deflector used as a subsidiary deflector for an electron beam illumination unit useful for forming fine structure patterns in high density integrated circuits |
| 12/30/1999 | DE19927036A1 Four-pole electron gun for an electron beam exposure apparatus used for drawing patterns on a material to be exposed, particularly a wafer |
| 12/30/1999 | DE19828741A1 Elektronenmikroskop mit einem abbildenden magnetischen Energiefilter Electron microscope with an imaging magnetic energy filter |
| 12/30/1999 | DE19828476A1 Teilchenstrahlgerät Particle beam |
| 12/29/1999 | WO1999067808A1 High sputter, etch resistant window for plasma processing chambers |
| 12/29/1999 | WO1999067807A1 Cam-based arrangement for positioning confinement rings in a plasma processing chamber |
| 12/29/1999 | EP0967844A1 Method for ECR plasma deposition of electron emitting carbon layers under the effect of an applied electric field |
| 12/29/1999 | EP0967630A2 Electron microscope with imaging magnetic filter |
| 12/29/1999 | EP0966756A2 Ion implantation process |
| 12/29/1999 | EP0966753A1 Ultra-high tilt specimen cryotransfer holder for electron microscope |
| 12/29/1999 | EP0966752A1 Correction device for correcting the lens defects in particle-optical apparatus |
| 12/29/1999 | CN1240051A Method for structured energy transmission using electron beams |
| 12/28/1999 | US6008498 Charged particle beam apparatus and method of using the same |
| 12/28/1999 | US6008495 Electron beam exposure device |
| 12/28/1999 | US6008133 Method and apparatus for dry etching |
| 12/28/1999 | US6008130 Polymer adhesive plasma confinement ring |
| 12/28/1999 | US6008060 Detecting registration marks with a low energy electron beam |
| 12/28/1999 | US6007879 Supplying solid material in coating chamber; creating processing plasma by utilizing switch-mode power supply; establishing operating power environment; switching to second operating power environment to achieve non-arc processing |
| 12/28/1999 | US6007674 Stabilizing apparatus for a dry etcher system |
| 12/28/1999 | US6007673 Apparatus and method of producing an electronic device |
| 12/28/1999 | US6007672 Dustless process using an electrode having a specific flatess and a camber of the front surface side of the being recessed and the back is projecting; fine patterns for semiconductor wafers for integrated circuits and optical apparatus |
| 12/28/1999 | US6007671 Having a vacuum chamber where part of an inside wall is silicon oxide; controlling the temperature of the silicon dioxide to prevent hydrogen atoms from deposit and recombining on the internal wall |
| 12/28/1999 | US6006694 Plasma reactor with a deposition shield |
| 12/23/1999 | WO1999066769A1 Plasma processor |
| 12/23/1999 | WO1999066535A2 Apparatus and method relating to charged particles |
| 12/23/1999 | WO1999066533A1 Semiconductor process chamber electrode and method for making the same |
| 12/23/1999 | WO1999066532A1 Cleaning process end point determination using throttle valve position |
| 12/23/1999 | WO1999066531A1 Plasma processing apparatus |
| 12/23/1999 | WO1999066530A1 Method and device for correcting proximity effects |
| 12/23/1999 | WO1999066529A1 Transmission electron microscope ccd camera |
| 12/23/1999 | WO1999066528A1 Methods and apparatus for scanning and focusing an ion beam |
| 12/23/1999 | WO1999066221A1 Static pressure gas bearing, stage device using it, and optical device using it |
| 12/23/1999 | WO1999065821A1 Free-standing and aligned carbon nanotubes and synthesis thereof |
| 12/23/1999 | DE19860704A1 Semiconductor wafer inspecting method using a scanning electron microscope (SEM) |
| 12/23/1999 | DE19827587A1 Double-magnetron sputtering unit for large area reactive plasma-enhanced deposition of e.g. light absorbing layers on metal strips for solar absorbers or heat reflective layers on window glass |
| 12/23/1999 | DE19827461A1 Vorrichtung zum Beschichten von Substraten in einer Vakuumkammer Device for coating substrates in a vacuum chamber |
| 12/23/1999 | CA2335449A1 Free-standing and aligned carbon nanotubes and synthesis thereof |
| 12/22/1999 | EP0966021A2 Device for coating substrates in a vacuum chamber |
| 12/22/1999 | EP0966020A2 Method and apparatus for monitoring charge neutralization operation |
| 12/22/1999 | CN1239587A Plasma etch system |
| 12/22/1999 | CN1239321A Apparatus and method for contact failure inspection in semiconductor devices |
| 12/21/1999 | US6005910 Holding mechanism, and exposure apparatus using the mechanism |
| 12/21/1999 | US6005349 Method for generating and maintaining a glow plasma discharge |
| 12/21/1999 | US6005253 Scanning energy implantation |
| 12/21/1999 | US6005250 Illumination deflection system for E-beam projection |
| 12/21/1999 | US6005247 Electron beam microscope using electron beam patterns |
| 12/21/1999 | US6005218 Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas |
| 12/21/1999 | US6005217 Microwave plasma processing method for preventing the production of etch residue |
| 12/21/1999 | US6004726 Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev |
| 12/21/1999 | US6004437 Thin-film magnetic recording head manufacturing method |
| 12/21/1999 | US6003526 Cleaning a plasma etch chamber |
| 12/16/1999 | WO1999065057A1 Gas distribution system |
| 12/16/1999 | WO1999065056A1 Chamber having improved process monitoring window |
| 12/16/1999 | WO1999065050A1 Planar electron emitter (pee) |
| 12/16/1999 | WO1999064644A1 Ion energy attenuation |
| 12/16/1999 | DE19826297A1 Apparatus and method for avoiding arcing by active arc suppression during sputtering |
| 12/16/1999 | DE19824783A1 Vorrichtung zur Formung eines Elektronenstrahls, Verfahren zur Herstellung der Vorrichtung und Anwendung Device for shaping an electron beam, methods of manufacture of the device and application |
| 12/16/1999 | CA2332556A1 Planar electron emitter (pee) |
| 12/15/1999 | EP0964426A2 Ion dosage measurement apparatus for an ion beam implanter and method |
| 12/15/1999 | EP0964425A2 Apparatus for processing a work piece with a uniformly neutralised ion beam |
| 12/15/1999 | EP0964074A2 Ion implantation control using optical emission spectroscopy |
| 12/15/1999 | EP0830708B1 Plasma processing system with reduced particle contamination |
| 12/15/1999 | EP0792571B1 Method and device for measuring ion flow in a plasma |
| 12/15/1999 | CN1238552A Auxiliary device for testing electronic microscope |
| 12/15/1999 | CN1238551A Beam generation apparatus |
| 12/14/1999 | US6002988 Method for optimizing the magnetic field of a periodic permanent magnet focusing device |
| 12/14/1999 | US6002136 Microscope specimen holder and grid arrangement for in-situ and ex-situ repeated analysis |
| 12/14/1999 | US6002135 Magnetic lens and deflector with inner and outer pole pieces with conical inner pole piece |
| 12/14/1999 | US6002128 Sample analyzer |
| 12/14/1999 | US6001432 Apparatus for forming films on a substrate |
| 12/14/1999 | US6001267 Plasma enchanced chemical method |
| 12/14/1999 | US6001224 Enhanced reactive DC sputtering system |
| 12/14/1999 | US6000360 Plasma processing apparatus |
| 12/14/1999 | CA2048470C Plasma processing apparatus having an electrode enclosing the space between cathode and anode |
| 12/09/1999 | WO1999063586A1 Plasma processing apparatus |
| 12/09/1999 | WO1999063584A1 Resin molded article for chamber liner |
| 12/09/1999 | WO1999063572A1 Acceleration and analysis architecture for ion implanter |
| 12/09/1999 | WO1999063571A1 Pedestal insulator for a pre-clean chamber |
| 12/09/1999 | WO1999063566A2 Device for shaping an electron beam, method for producing said device and use thereof |
| 12/09/1999 | WO1999048130A9 Distributed inductively-coupled plasma source |