| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/08/2000 | US6021665 Cantilever tracking type scanning probe microscope |
| 02/03/2000 | WO2000005745A1 Physical vapor processing of a surface with non-uniformity compensation |
| 02/03/2000 | WO2000005744A1 Ion implantation beam monitor |
| 02/03/2000 | WO1999062097A8 Dissolution stage for an environmental scanning electron microscope |
| 02/03/2000 | DE19834592A1 Vorrichtung zum Beschichten von plattenförmigen Substraten Device for coating disc-shaped substrates |
| 02/03/2000 | DE19827819A1 Electron beam exposure device control method uses address grid defined by stepping widths of positioning and format control systems provided with positioning and format correction systems |
| 02/02/2000 | EP0977243A2 Plasma etching apparatus using halogen type gas plasma |
| 02/02/2000 | EP0976846A1 Thin film forming device for forming silicon thin film having crystallinity |
| 02/02/2000 | EP0976152A1 Pattern film repair using a gas assisted focused particle beam system |
| 02/02/2000 | EP0976141A1 Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
| 02/02/2000 | EP0975819A1 Apparatus and method for inductively-coupled-plasma-enhanced ionized physical-vapor deposition |
| 02/02/2000 | EP0975818A1 Method and device for pvd coating |
| 02/02/2000 | EP0946414A4 Microwave plasma chemical synthesis of ultrafine powders |
| 02/02/2000 | EP0795197B1 Method of reconstructing an image in a particle-optical apparatus |
| 02/02/2000 | EP0753200B1 Improved environmental scanning electron microscope |
| 02/02/2000 | CN1243599A Vapour deposition coating apparatus |
| 02/02/2000 | CN1243330A System and method for cleaning ion source in course of using |
| 02/01/2000 | US6020746 Method and apparatus for probing an integrated circuit through the back side of an integrated circuit die |
| 02/01/2000 | US6020686 Inductively and multi-capacitively coupled plasma reactor |
| 02/01/2000 | US6020592 Dose monitor for plasma doping system |
| 02/01/2000 | US6020570 Plasma processing apparatus |
| 02/01/2000 | US6020092 Partial one-shot electron beam exposure mask and method of forming a partial one-shot electron beam exposure pattern |
| 02/01/2000 | US6019060 Cam-based arrangement for positioning confinement rings in a plasma processing chamber |
| 01/27/2000 | DE19934049A1 Multi-column lithography system using charged particle radiation-like electron rays has control unit for adjusting waiting time for each intensifier connected to main deflectors |
| 01/27/2000 | DE19932014A1 Pattern data correction controller for one column of a multi-column electron beam exposure apparatus used for e.g. pattering a semiconductor wafer |
| 01/27/2000 | DE19929096A1 Electron gun |
| 01/27/2000 | DE19830404A1 Apparatus for sputter coating of substrates with use of variable plasma potential has an additional electrode in at least one plasma space between magnetrons and substrate |
| 01/27/2000 | DE19826583A1 Method for measuring gaseous chemical constituents in process reactor serving for treatment of electrical components, measurements taking place in situ by means of at least one residual gas analysis unit communicating with process chamber |
| 01/26/2000 | EP0975006A2 Plasma density measuring method, probe used for measuring plasma density and plasma density measuring apparatus |
| 01/26/2000 | EP0975005A2 Method for controlling plasma-generating high frequency power, and plasma generating apparatus |
| 01/26/2000 | EP0975004A2 Method for measuring distribution of beams of charged particles and methods relating thereto |
| 01/26/2000 | EP0813745B1 Electron beam pattern-writing column |
| 01/26/2000 | EP0791226B1 Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment |
| 01/26/2000 | EP0758408A4 Rectangular vacuum-arc plasma source |
| 01/26/2000 | EP0725975B1 Detection system for measuring high aspect ratio |
| 01/26/2000 | EP0722513B1 Treatment of surfaces by barrier discharge |
| 01/26/2000 | EP0667921B1 Microwave apparatus for depositing thin films |
| 01/26/2000 | CN1242594A Method for implanting negative hydrogen ion and implanting apparatus |
| 01/26/2000 | CN1242253A Electron beam irradiation device |
| 01/25/2000 | US6017825 Etch rate loading improvement |
| 01/25/2000 | US6017414 Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers |
| 01/25/2000 | US6016766 Microwave plasma processor |
| 01/25/2000 | US6016765 Plasma processing apparatus |
| 01/20/2000 | WO2000003421A2 Improved endpoint detection for substrate fabrication processes |
| 01/20/2000 | WO2000003415A1 Rf matching network with distributed outputs |
| 01/20/2000 | WO2000003414A1 Feedthrough overlap coil |
| 01/20/2000 | WO2000003413A1 Method for observing specimen and device therefor |
| 01/20/2000 | WO2000003301A2 Exposure device having a planar motor |
| 01/20/2000 | WO2000003169A2 Manifold system of removable components for distribution of fluids |
| 01/20/2000 | WO2000003065A1 Surface treatment apparatus |
| 01/20/2000 | WO2000003064A1 Gas distributor plate for a processing apparatus |
| 01/20/2000 | WO2000003059A1 Systems and methods for two-sided etch of a semiconductor substrate |
| 01/20/2000 | WO2000003055A1 Shield for ionized physical vapor deposition apparatus |
| 01/20/2000 | DE19933213A1 Apparatus and method for surface treatment of semiconductor substrates, involving collection, detection, analysis and evaluation of infrared (or near infrared) radiation from substrates for purposes of control of treatment conditions |
| 01/20/2000 | DE19932429A1 Blanking aperture array (BAA) arrangement for electron beam lithography |
| 01/19/2000 | EP0973186A2 Lithographic apparatus |
| 01/19/2000 | EP0972299A1 Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber |
| 01/19/2000 | EP0972298A1 Producing electric arc plasma in a curvilinear plasmaguide and substrate coating |
| 01/19/2000 | EP0972284A1 Electric or electronic component and application as non volatile memory and device with surface acoustic waves |
| 01/19/2000 | EP0972092A1 Multipurpose processing chamber for chemical vapor deposition processes |
| 01/19/2000 | CN1241800A Method for operation of high-power electron beam |
| 01/19/2000 | CN1241798A Ion source having wide output current operating range |
| 01/18/2000 | US6016131 Inductively coupled plasma reactor with an inductive coil antenna having independent loops |
| 01/18/2000 | US6016036 Magnetic filter for ion source |
| 01/18/2000 | US6015975 Method and apparatus for charged particle beam exposure |
| 01/18/2000 | US6015973 Energy Filter |
| 01/18/2000 | US6015643 Mask used in charged particle beam projecting apparatus |
| 01/18/2000 | US6015594 Method and apparatus for forming a film by sputtering process |
| 01/18/2000 | US6015591 Deposition method |
| 01/18/2000 | US6015476 Plasma reactor magnet with independently controllable parallel axial current-carrying elements |
| 01/18/2000 | US6015465 Temperature control system for semiconductor process chamber |
| 01/18/2000 | US6014979 Sacrificial collar maintained around substrate to add or remove species from process gas |
| 01/18/2000 | US6014943 Plasma process device |
| 01/13/2000 | WO2000002230A1 Electron detector |
| 01/13/2000 | WO2000002229A1 Ion implantation beam monitor |
| 01/13/2000 | WO2000002228A1 Double slit-valve doors for plasma processing |
| 01/13/2000 | WO1999047910A3 Method for enhancing the contrast for a transmission electron microscope |
| 01/13/2000 | DE19856307C1 Apparatus for producing a free cold plasma jet |
| 01/13/2000 | DE19841012C1 Apparatus for plasma-activated vapor coating of substrates in vacuum |
| 01/13/2000 | DE19830402A1 Medium to high frequency PECVD process for functional layer deposition on a moving substrate |
| 01/13/2000 | DE19825056C1 Circuit for supplying electrical energy to plasma can feed high power to unipolar or bipolar pulsed plasma with switching region in range 20 to 100 kHz with conventional IGBT switch |
| 01/12/2000 | EP0971388A2 Device and procedure for PVD coating of multiple layers on substrates |
| 01/12/2000 | EP0971387A1 Electronic low energy scanning microscope and electronic beam-operated recorder based on an integrated planar microlens |
| 01/12/2000 | EP0970503A1 Gaseous backscattered electron detector for an environmental scanning electron microscope |
| 01/12/2000 | EP0970261A1 Magnesium oxide sputtering apparatus |
| 01/12/2000 | CN2358552Y Ion-beam scanning device for magnet |
| 01/12/2000 | CN1241022A Method and apparatus for monitoring charge neutralization operation |
| 01/11/2000 | US6014203 Digital electron lithography with field emission array (FEA) |
| 01/11/2000 | US6014200 High throughput electron beam lithography system |
| 01/11/2000 | US6013984 Ion energy attenuation method by determining the required number of ion collisions |
| 01/11/2000 | US6013159 Particle trap in a magnetron sputtering chamber |
| 01/11/2000 | US6013155 Gas injection system for plasma processing |
| 01/11/2000 | US6012413 Electron beam source for use with varying sizes of crucibles |
| 01/11/2000 | CA2102384C High impedance plasma ion implantation method and apparatus |
| 01/11/2000 | CA2089099C Broad beam flux density control |
| 01/06/2000 | WO2000000999A1 Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 01/06/2000 | WO2000000998A2 Electrode for plasma processes and method for manufacture and use thereof |
| 01/06/2000 | WO2000000993A1 Multiple coil antenna for inductively-coupled plasma generation systems |
| 01/06/2000 | WO2000000992A2 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 01/06/2000 | WO2000000766A1 Vacuum tight coupling for tube sections |