| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/07/2000 | US6033585 Method and apparatus for preventing lightup of gas distribution holes |
| 03/07/2000 | US6033483 Electrically insulating sealing structure and its method of use in a high vacuum physical vapor deposition apparatus |
| 03/07/2000 | US6033482 Method for igniting a plasma in a plasma processing chamber |
| 03/07/2000 | US6033481 Plasma processing apparatus |
| 03/02/2000 | WO2000011702A1 Automated set up of an energy filtering transmission electron microscope |
| 03/02/2000 | WO1999006996B1 Method for nano-structuring amorphous carbon layers |
| 03/02/2000 | DE19939040A1 Magnetron sputtering apparatus with auxiliary magnetic pole |
| 03/02/2000 | DE19842945C1 Electron beam tube e.g. for electron beam welding systems |
| 03/02/2000 | DE19838553A1 Faraday collector for measuring ion currents in mass spectrometers has a cup with solid graphite walls |
| 03/02/2000 | DE19639240C2 Magnetronzerstäubungsquelle und deren Verwendung Magnetron sputtering and the use thereof |
| 03/01/2000 | EP0981830A1 Charged particle beam illumination of blanking aperture array |
| 03/01/2000 | EP0981829A1 Electrostatic device for correcting chromatic aberration in a particle-optical apparatus |
| 03/01/2000 | EP0981828A1 Electron beam aperture element |
| 03/01/2000 | EP0920709B1 Electron optical lens system with a slot-shaped aperture cross section |
| 03/01/2000 | EP0873573A4 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 03/01/2000 | EP0871972A4 Electron beam device with single crystal window and matching anode |
| 03/01/2000 | EP0839383A4 Tapered structure suitable for microthermocouples microelectrodes, field emission tips and micromagnetic sensors with force sensing capabilities |
| 02/29/2000 | US6031551 Process for imaging a ferroelectric printing form and printing head |
| 02/29/2000 | US6031240 Method and apparatus for ion implantation |
| 02/29/2000 | US6031239 Filtered cathodic arc source |
| 02/29/2000 | US6031230 Reflected electron detector and a scanning electron microscope device using it |
| 02/29/2000 | US6031229 Automatic sequencing of FIB operations |
| 02/29/2000 | US6031198 Plasma processing method and apparatus |
| 02/29/2000 | US6030667 Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma |
| 02/29/2000 | US6030508 Reduced variations in gas density by using a smooth baffle disk screwed into the sputtering shield to a depth sufficient to firmly attach to the inside of the sputtering shield and at a fixed distance; disperses uniformly; antideposit agents |
| 02/29/2000 | US6030489 Apparatus for controlling etch rate when using consumable electrodes during plasma etching |
| 02/29/2000 | US6030486 Magnetically confined plasma reactor for processing a semiconductor wafer |
| 02/29/2000 | US6029602 Apparatus and method for efficient and compact remote microwave plasma generation |
| 02/29/2000 | CA2117119C Method and structure for electronically measuring beam parameters |
| 02/24/2000 | WO2000010192A1 Plasma density and etch rate enhancing semiconductor processing chamber |
| 02/24/2000 | WO2000010191A1 Double tilt and rotate specimen holder for a transmission electron microscope |
| 02/24/2000 | DE19900179C1 Installation for etching substrates by high-density plasmas comprises a phase delay line causing the supply voltages at both ends of the inductively coupled plasma coil to be in counter-phase with one another |
| 02/24/2000 | DE19853121C1 Treatment of substrates made of insulating materials in high-frequency plasmas involves production of a thin electrically conductive surface layer and using this layer as a high-frequency discharge electrode |
| 02/24/2000 | DE19838211A1 Dynamic compensation of induction effects in electron optical devices especially for electron beam lithography using raster microscopes |
| 02/24/2000 | DE19836125A1 Zerstäubungsvorrichtung mit einer Kathode mit Permanentmagnetanordnung Sputtering with a cathode with permanent magnet arrangement |
| 02/23/2000 | EP0981150A2 Device for depositing thin layers on substrates |
| 02/23/2000 | EP0980584A1 Electron-beam microcolumn as a general purpose scanning electron microscope |
| 02/23/2000 | EP0980541A1 Method and apparatus for direct writing of semiconductor die using microcolumn array |
| 02/23/2000 | CN1245540A Method for preparation of metal intercalated fullerene-like metal chalcogenides |
| 02/22/2000 | US6028662 Adjustment of particle beam landing angle |
| 02/22/2000 | US6028615 Plasma discharge emitter device and array |
| 02/22/2000 | US6028395 Vacuum plasma processor having coil with added conducting segments to its peripheral part |
| 02/22/2000 | US6028394 Cold electron plasma reactive ion etching using a rotating electromagnetic filter |
| 02/22/2000 | US6028317 Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same |
| 02/22/2000 | US6028286 Method for igniting a plasma inside a plasma processing reactor |
| 02/22/2000 | US6028285 High density plasma source for semiconductor processing |
| 02/22/2000 | US6027841 Charged-particle-beam projection-exposure method exhibiting aberration reduction through multiple deflector use |
| 02/22/2000 | US6027670 Rare earth hexaboride electron-emitting material |
| 02/22/2000 | US6027662 Materials processing by separately generated process medium constituents |
| 02/22/2000 | US6027619 Fabrication of field emission array with filtered vacuum cathodic arc deposition |
| 02/22/2000 | US6027606 Center gas feed apparatus for a high density plasma reactor |
| 02/22/2000 | US6027603 Inductively coupled planar source for substantially uniform plasma flux |
| 02/22/2000 | US6027601 Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor |
| 02/22/2000 | US6026763 Thin-film deposition apparatus using cathodic arc discharge |
| 02/22/2000 | US6026762 Apparatus for improved remote microwave plasma source for use with substrate processing systems |
| 02/17/2000 | WO2000008676A1 Workpiece vibration damper |
| 02/17/2000 | WO2000008671A2 Device for coating panel-shaped substrates |
| 02/17/2000 | WO2000008670A2 Dose monitor for plasma-monitor ion implantation doping system |
| 02/17/2000 | WO2000008229A1 Esrf chamber cooling system and process |
| 02/17/2000 | WO2000008228A1 Dual collimator physical-vapor deposition apparatus |
| 02/17/2000 | WO2000008227A1 Device and method for the vacuum plasma processing of objects |
| 02/17/2000 | WO2000007688A1 Esrf coolant degassing process |
| 02/17/2000 | WO1999050874A3 Gated photocathode for controlled single and multiple electron beam emission |
| 02/17/2000 | DE19929278A1 Negative hydrogen ion beam injection method on substrate |
| 02/17/2000 | DE19837045A1 Vorrichtung zum Beschichten von Substraten mit dünnen Schichten Apparatus for coating substrates with thin layers |
| 02/17/2000 | CA2339359A1 Workpiece vibration damper |
| 02/16/2000 | EP0980090A2 Sputtering device with a cathode comprising a permanent magnet assembly |
| 02/16/2000 | EP0980088A1 Toroidal filament for plasma generation |
| 02/16/2000 | EP0979420A1 Method and device for active compensation of magnetic and electromagnetic disturbance fields |
| 02/15/2000 | US6025602 Ion implantation system for implanting workpieces |
| 02/15/2000 | US6025600 Method for astigmatism correction in charged particle beam systems |
| 02/15/2000 | US6025593 Scanning electron microscope |
| 02/15/2000 | US6025592 High temperature specimen stage and detector for an environmental scanning electron microscope |
| 02/15/2000 | US6025252 Semiconductor device and method of fabricating the same |
| 02/15/2000 | US6024844 Enhanced reactive DC sputtering system |
| 02/15/2000 | US6024831 Detecting an intensity of a predetermined wavelength of radiation produced by the plasma process to electrically generate an output signal |
| 02/15/2000 | US6024827 Plasma processing apparatus |
| 02/15/2000 | US6024826 Plasma reactor with heated source of a polymer-hardening precursor material |
| 02/15/2000 | US6024105 Semiconductor manufacturing device and method of removing particles therefrom |
| 02/15/2000 | US6024045 Apparatus for fabricating semiconductor device and method for fabricating semiconductor device |
| 02/15/2000 | US6024044 Dual frequency excitation of plasma for film deposition |
| 02/10/2000 | WO2000007216A1 A ceramic composition for an apparatus and method for processing a substrate |
| 02/10/2000 | WO2000007215A2 A method of allowing a stable power transmission into a plasma processing chamber |
| 02/10/2000 | WO2000007030A1 Particle beam current monitoring technique |
| 02/10/2000 | DE19833904A1 Sample stage positioner offering lift and tilt down to picometer range under low temperatures comprises metal bellows containing expansible medium and electrical heater |
| 02/09/2000 | EP0978138A1 Method and apparatus for ionized sputtering of materials |
| 02/09/2000 | EP0978137A1 Apparatus and method for a modular electron beam system for the treatment of surfaces |
| 02/09/2000 | EP0977906A1 Metered gas control in a substrate processing apparatus |
| 02/09/2000 | EP0977904A1 Plasma processing system utilizing combined anode/ion source |
| 02/09/2000 | EP0977903A1 Vacuum deposition apparatus using electron beams |
| 02/09/2000 | EP0512082B1 Power-supply circuit for pulse-operated vacuum-arc devices |
| 02/08/2000 | US6023067 Blanking system for electron beam projection system |
| 02/08/2000 | US6023060 T-shaped electron-beam microcolumn as a general purpose scanning electron microscope |
| 02/08/2000 | US6023038 Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system |
| 02/08/2000 | US6022483 System and method for controlling pressure |
| 02/08/2000 | US6022461 Sputtering apparatus |
| 02/08/2000 | US6022460 Enhanced inductively coupled plasma reactor |
| 02/08/2000 | US6022446 Shallow magnetic fields for generating circulating electrons to enhance plasma processing |
| 02/08/2000 | US6022258 ARC chamber for an ion implantation system |
| 02/08/2000 | US6021672 Simultaneous in-situ optical sensing of pressure and etch rate in plasma etch chamber |