| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/26/2000 | EP0995220A2 Target cathode assembly |
| 04/26/2000 | EP0995219A1 Plasma processing apparatus |
| 04/26/2000 | EP0995218A1 Plasma treater systems and treatment methods |
| 04/26/2000 | EP0995217A1 Scanning wheel for ion implantation process chamber |
| 04/26/2000 | EP0995215A1 Power control apparatus for an ion source having an indirectly heated cathode |
| 04/26/2000 | EP0995214A1 Method and apparatus for neutralising space charge in an ion beam |
| 04/26/2000 | EP0995086A1 Electron microscope and spectroscopy system |
| 04/26/2000 | EP0994973A1 Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma |
| 04/26/2000 | EP0650536B1 Deposition apparatus and method |
| 04/26/2000 | CN1051903C Method and apparatus for ignition of CVD plasmas |
| 04/25/2000 | US6055460 Semiconductor process compensation utilizing non-uniform ion implantation methodology |
| 04/25/2000 | US6054713 Electron beam exposure apparatus |
| 04/25/2000 | US6054333 Real time etch measurements and control using isotopes |
| 04/25/2000 | US6054063 Method for plasma treatment and apparatus for plasma treatment |
| 04/25/2000 | US6054016 Magnetically enhanced microwave plasma generating apparatus |
| 04/25/2000 | US6054013 Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
| 04/25/2000 | US6053241 Cooling method and apparatus for charged particle lenses and deflectors |
| 04/25/2000 | CA2017206C Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile |
| 04/20/2000 | WO2000022670A1 Integrated circuit rewiring using gas-assisted fib etching |
| 04/20/2000 | WO2000022648A1 Ionized metal plasma source, comprising a centrally arranged additional rf coil |
| 04/20/2000 | WO2000022647A1 Coil and coil feedthrough |
| 04/20/2000 | WO2000022646A1 Water-cooled coil for a plasma chamber |
| 04/20/2000 | DE19946447A1 Particle-optical imaging system for lithographical purposes has lens arrangement with ring pre-electrode facing mask holder to form grid lens having negative refractive index with mask foil |
| 04/20/2000 | DE19942484A1 Inspection procedure for exposure of pattern data, involves computing error corresponding to predicted value of pattern width |
| 04/19/2000 | EP0994203A2 Dosimetry cup charge collection in plasma immersion ion implantation |
| 04/19/2000 | EP0993683A1 Electron flood apparatus for neutralising charge build up on a substrate during ion implantation |
| 04/19/2000 | EP0993604A2 Method for detecting an element in a sample |
| 04/18/2000 | US6051917 Electron beam gun |
| 04/18/2000 | US6051839 Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes |
| 04/18/2000 | US6051838 Optical unit |
| 04/18/2000 | US6051834 Electron microscope |
| 04/18/2000 | US6051285 Support member is sufficiently cooled so as to suppress thermal deformation and abnormal discharge, thus enabling to preferably carry out the film formation. |
| 04/18/2000 | US6051284 Chamber monitoring and adjustment by plasma RF metrology |
| 04/18/2000 | US6051151 Apparatus and method of producing a negative ion plasma |
| 04/18/2000 | US6051122 Deposition shield assembly for a semiconductor wafer processing system |
| 04/18/2000 | US6051121 Deposition chamber with a biased substrate configuration |
| 04/18/2000 | US6051120 Thin film forming apparatus |
| 04/18/2000 | US6051114 Use of pulsed-DC wafer bias for filling vias/trenches with metal in HDP physical vapor deposition |
| 04/18/2000 | US6051100 High conductance plasma containment structure |
| 04/18/2000 | US6051099 Apparatus for achieving etch rate uniformity |
| 04/18/2000 | US6051073 Perforated shield for plasma immersion ion implantation |
| 04/18/2000 | US6050218 Dosimetry cup charge collection in plasma immersion ion implantation |
| 04/18/2000 | US6050217 Parallel plate plasma CVD apparatus |
| 04/18/2000 | US6050216 Showerhead electrode for plasma processing |
| 04/13/2000 | DE19947174A1 Mask holder with clamps on disc-shaped frame for exposure of semiconductor wafers in ion lithography |
| 04/12/2000 | EP0993019A2 Method for reducing aliasing effects in scanning beam microscopy |
| 04/12/2000 | EP0992606A2 A method of applying a coating to a metallic article and an apparatus for applying a coating to a metallic article |
| 04/12/2000 | EP0992059A1 Toroidal low-field reactive gas source |
| 04/12/2000 | EP0992058A1 Device for the production of homogenous microwave plasma |
| 04/12/2000 | EP0992057A1 Charged-particle source, control system, and process |
| 04/12/2000 | EP0992053A2 Gated photocathode for controlled single and multiple electron beam emission |
| 04/12/2000 | EP0991971A2 Test slide for microscopes and method for the production of such a slide |
| 04/12/2000 | EP0650629B1 Reading and writing stored information by means of electrochemistry |
| 04/11/2000 | US6049660 Simulation method in lithographic process |
| 04/11/2000 | US6049162 Pulsed electron beam source and its use |
| 04/11/2000 | US6049085 Charged particle beam exposure method and method for making patterns on wafer |
| 04/11/2000 | US6049084 Charged-particle-beam optical system |
| 04/11/2000 | US6049078 Transmitting tip for scanning tunneling microscopy system |
| 04/11/2000 | US6048798 Apparatus for reducing process drift in inductive coupled plasma etching such as oxide layer |
| 04/11/2000 | US6048435 Plasma etch reactor and method for emerging films |
| 04/11/2000 | US6047713 Flowing a cleaning gas into a vacuum chamber, positioning throttle valve so that deposited sufaces of valve are exposed to interior of the chamber, ingiting a plasma of cleaning gas to etch away unwanted film deposited on the throttle valve |
| 04/06/2000 | WO2000019784A1 Slotted waveguide structure for generating plasma discharges |
| 04/06/2000 | WO2000019520A1 Methods and apparatus for determining an etch endpoint in a plasma processing system |
| 04/06/2000 | WO2000019501A1 Method and apparatus for plasma processing |
| 04/06/2000 | WO2000019495A2 Chamber liner for semiconductor process chambers |
| 04/06/2000 | WO2000019483A1 Vacuum treatment chamber and method for treating surfaces |
| 04/06/2000 | WO2000019482A1 Scanning electron microscope |
| 04/06/2000 | WO2000019481A2 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 04/06/2000 | WO2000018980A1 An in-line sputter deposition system |
| 04/06/2000 | WO2000018979A1 Sputter deposition apparatus |
| 04/06/2000 | CA2347417A1 Slotted waveguide structure for generating plasma discharges |
| 04/05/2000 | EP0990252A1 Detecting registration marks with a low energy electron beam |
| 04/05/2000 | EP0990251A2 Central coil design for ionized metal plasma deposition |
| 04/05/2000 | EP0990061A1 Method and device for vacuum-coating a substrate |
| 04/04/2000 | US6047116 Method for generating exposure data for lithographic apparatus |
| 04/04/2000 | US6046796 Methodology for improved semiconductor process monitoring using optical emission spectroscopy |
| 04/04/2000 | US6046546 Stabilizer for switch-mode powered RF plasma |
| 04/04/2000 | US6046459 Method and system for charged particle beam exposure |
| 04/04/2000 | US6046457 Charged particle beam apparatus having anticontamination means |
| 04/04/2000 | US6046448 Scanning near field optical microscope based on the use of polarized light |
| 04/04/2000 | US6045672 Sputtering apparatus |
| 04/04/2000 | US6045670 Back sputtering shield |
| 04/04/2000 | US6045618 Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| 04/04/2000 | US6044792 Plasma CVD apparatus |
| 04/04/2000 | CA2115605C Differential virtual ground beam blanker |
| 04/04/2000 | CA2061160C Low aberration field emission electron gun |
| 03/30/2000 | WO2000017920A1 Plasma processing method |
| 03/30/2000 | WO2000017906A2 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 03/30/2000 | WO2000017905A1 Ion implantation device arranged to select neutral ions from the ion beam |
| 03/30/2000 | WO2000005745A8 Physical vapor processing of a surface with non-uniformity compensation |
| 03/30/2000 | DE19943053A1 Plasma device for semiconductor component manufacture has capacitance compensator for maintaining constant overall chuck capacitance between chuck and earth terminal |
| 03/30/2000 | DE19936199A1 Plasma reactor has an electromagnet coil arranged around the antenna neighboring the substrate with a current supply connected to the coil |
| 03/30/2000 | DE19934076A1 Ion or electron beam exposure apparatus for semiconductor wafer |
| 03/30/2000 | DE19932880A1 Verfahren zur Herstellung von Nanometerstrukturen auf Halbleiteroberflächen A process for producing nanometer structures on semiconductor surfaces |
| 03/30/2000 | DE19850218C1 Vorrichtung und Verfahren zur Beschichtung von Substraten im Vakuum Apparatus and method for coating substrates in vacuo |
| 03/30/2000 | DE19840833A1 Geometrical correction of structure faults in structure manufacture on substrate caused by proximity effect in electron beam lithography process |
| 03/29/2000 | EP0989595A2 Device for processing a surface of a substrate |
| 03/29/2000 | EP0989584A1 Device for reducing the energy width of a particle beam and a particle beam apparatus with such a device |
| 03/29/2000 | EP0989583A1 Method and device for focusing a charged particle beam |
| 03/29/2000 | EP0989399A1 Apparatus and method for measuring crystal lattice strain |