| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/24/2000 | EP1003200A1 High temperature specimen stage and detector for an environmental scanning electron microscope |
| 05/24/2000 | EP1002888A2 Method and apparatus for high frequency plasma treatment of a substrate |
| 05/24/2000 | EP1002331A1 Plasma vapor deposition with coil sputtering |
| 05/24/2000 | EP1002330A1 Method for monitoring the performance of an ion implanter using reusable wafers |
| 05/24/2000 | EP1002329A1 Semiconductor process compensation utilizing non-uniform ion implantation methodology |
| 05/24/2000 | CN1254250A Plasma processing device and plasma processing method using said device |
| 05/23/2000 | US6067164 Method and apparatus for automatic adjustment of electron optics system and astigmatism correction in electron optics device |
| 05/23/2000 | US6066855 Charged-particle-beam optical system exhibiting aberration correction |
| 05/23/2000 | US6066854 Method of writing cross pattern in adjacent areas of layer sensitive to charged particle beam for improving stitching accuracy without sacrifice of throughput |
| 05/23/2000 | US6066853 Electron-optical system exhibiting reduced aberration |
| 05/23/2000 | US6066852 Electron energy filter |
| 05/23/2000 | US6066849 Scanning electron beam microscope |
| 05/23/2000 | US6066826 Apparatus for plasma treatment of moving webs |
| 05/23/2000 | US6066242 Conical sputtering target |
| 05/23/2000 | US6066241 Pickling (etching) process and device |
| 05/23/2000 | US6065425 Plasma process apparatus and plasma process method |
| 05/18/2000 | WO2000028572A1 Apparatus for producing charged particle beam |
| 05/18/2000 | WO2000028571A1 Method for examining and/or modifying surface structures of a sample |
| 05/18/2000 | WO2000028104A1 Sputtering apparatus and process for high rate coatings |
| 05/18/2000 | DE19852833A1 Scanning microscope probe distance evaluation method, e.g. for scanning near-field optical microscopy; uses detected oscillation amplitude, frequency or phase of probe subjected to lateral and superimposed vertical oscillation |
| 05/18/2000 | DE19851622A1 Verfahren zum Untersuchen und/oder zum Modifizieren von Oberflächenstrukturen einer Probe A method for investigating and / or modifying a sample surface structures |
| 05/17/2000 | EP1001449A1 Deposited film forming system and process |
| 05/17/2000 | EP1001448A2 Thin film DC plasma processing system |
| 05/17/2000 | EP1000437A1 Method of and machine for pattern writing by an electron beam |
| 05/17/2000 | EP1000425A2 Method for nano-structuring amorphous carbon layers |
| 05/17/2000 | EP0808477B1 Fabrication and use of a sub-micron dimensional standard |
| 05/17/2000 | CN1253659A Cathode structure and electron gun for cathode ray tubes |
| 05/17/2000 | CN1253291A Electron probe differential analyzer |
| 05/16/2000 | US6064686 Arc-free electron gun |
| 05/16/2000 | US6064071 Charged-particle-beam optical systems |
| 05/16/2000 | US6063454 Oscillator; transmission the impedance matching voltage through capacitors |
| 05/16/2000 | US6063441 Vapor deposition |
| 05/16/2000 | US6063236 Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system |
| 05/16/2000 | US6063235 Gas discharge apparatus for wafer etching systems |
| 05/16/2000 | US6063233 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 05/16/2000 | US6062163 Plasma initiating assembly |
| 05/11/2000 | WO2000026950A1 Method and device for ion implanting |
| 05/11/2000 | WO2000026939A1 Apparatus for coupling power through a workpiece in a semiconductor wafer processing system |
| 05/11/2000 | WO2000026938A1 Apparatus for ion implantation |
| 05/11/2000 | WO2000026435A1 Apparatus and method for depositing low k dielectric materials |
| 05/11/2000 | WO2000026434A1 Improved corrosion resistant coating |
| 05/11/2000 | WO2000026430A1 Sputtering apparatus |
| 05/11/2000 | WO2000008671A3 Device for coating panel-shaped substrates |
| 05/11/2000 | WO2000000992A3 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 05/11/2000 | DE19951147A1 Determining surface inclination at electron beam incident point with scanning electron microscope involves deriving angle from measured emissions using calibrated relationship |
| 05/11/2000 | DE19847848C1 Vorrichtung und Erzeugung angeregter/ionisierter Teilchen in einem Plasma Device and generating excited / ionized particles in a plasma |
| 05/10/2000 | EP0999573A1 Beam column for charged particle device |
| 05/10/2000 | EP0999572A2 Electrostatic deflector for electron beam exposure apparatus |
| 05/10/2000 | EP0838080B1 Sample analyzer |
| 05/09/2000 | US6061085 Camera system for a transmission electron microscope |
| 05/09/2000 | US6060837 Method of and apparatus for minimizing plasma instability in an rf processor |
| 05/09/2000 | US6060836 Plasma generating apparatus and ion source using the same |
| 05/09/2000 | US6060718 Ion source having wide output current operating range |
| 05/09/2000 | US6060717 Charged particle beam exposure method and charged particle beam exposure apparatus therefor |
| 05/09/2000 | US6060716 Electron beam lithography method |
| 05/09/2000 | US6060715 Method and apparatus for ion beam scanning in an ion implanter |
| 05/09/2000 | US6060711 Charged-particle optical systems and pattern transfer apparatus comprising same |
| 05/09/2000 | US6060707 Apparatus and method for analyzing microscopic area |
| 05/09/2000 | US6060329 Method for plasma treatment and apparatus for plasma treatment |
| 05/09/2000 | US6060328 Methods and arrangements for determining an endpoint for an in-situ local interconnect etching process |
| 05/09/2000 | US6060131 Method of forming a thin film by plasma chemical vapor deposition |
| 05/09/2000 | US6059945 Sputter target for eliminating redeposition on the target sidewall |
| 05/09/2000 | US6059935 Discharge method and apparatus for generating plasmas |
| 05/09/2000 | US6058751 Free-wheeling lock |
| 05/04/2000 | WO2000025557A1 Microwave plasma generating apparatus, method for decomposing or ganic halide, and system for decomposing organic halide |
| 05/04/2000 | WO2000025344A1 Method for monitoring alternating current discharge on a double electrode |
| 05/04/2000 | WO2000025343A1 Raster scan gaussian beam writing strategy and method for pattern generation |
| 05/04/2000 | DE19950381A1 Verfahren und Vorrichtungen zum Sputtern Methods and apparatus for sputtering |
| 05/04/2000 | DE19946112A1 Electron beam test device and adjustment for testing electronic devices accurately determines slice level of S-curve used in determination of secondary electron current |
| 05/04/2000 | DE19848636A1 Verfahren zur Überwachung einer Wechselspannungs-Entladung an einer Doppelelektrode A method for monitoring an AC voltage discharge on a double electrode |
| 05/04/2000 | CA2316302A1 Raster scan gaussian beam writing strategy and method for pattern generation |
| 05/03/2000 | EP0997927A2 Microwave applicator with annular waveguide, plasma processing apparatus having the same, and plasma processing method |
| 05/03/2000 | EP0997926A2 Plasma treatment apparatus and method |
| 05/03/2000 | EP0997554A1 Plasma cvd method, plasma cvd apparatus, and electrode |
| 05/03/2000 | EP0996762A2 Method for bias sputtering |
| 05/03/2000 | EP0745147B1 Method and apparatus for coating a substrate |
| 05/02/2000 | US6057907 Method of and system for exposing pattern on object by charged particle beam |
| 05/02/2000 | US6057645 Plasma discharge device with dynamic tuning by a movable microwave trap |
| 05/02/2000 | US6057553 Portable high resolution scanning electron microscope column using permanent magnet electron lenses |
| 05/02/2000 | US6057547 Scanning probe microscope with scan correction |
| 05/02/2000 | US6057546 Kinematically mounted probe holder for scanning probe microscope |
| 05/02/2000 | US6057545 Time-to-flight mass spectrometers and convergent lenses for ion beams |
| 05/02/2000 | US6056848 Thin film electrostatic shield for inductive plasma processing |
| 05/02/2000 | US6056785 Electron-beam data generating apparatus |
| 05/02/2000 | US6055928 Plasma immersion ion processor for fabricating semiconductor integrated circuits |
| 05/02/2000 | US6055719 Method for manufacturing an electrostatic deflector |
| 05/02/2000 | CA2077902C Arc diverter |
| 04/27/2000 | WO2000024031A1 Device for producing excited/ionized particles in a plasma |
| 04/27/2000 | WO2000024030A2 Improved alignment of a thermal field emission electron source and application in a microcolumn |
| 04/27/2000 | WO2000023633A1 Shutter for thin-film processing equipment |
| 04/27/2000 | WO1999066535A3 Apparatus and method relating to charged particles |
| 04/27/2000 | DE19951317A1 Sealing mechanism for a vacuum chamber used in the production of semiconductors, comprises a rotating shaft support, fluid penetrations, an air suction unit and a filter |
| 04/27/2000 | DE19834733C1 Vorrichtung und Verfahren zur Beschichtung und/oder Oberflächenmodifizierung von Gegenständen im Vakuum mittels eines Plasmas Apparatus and method for coating and / or surface modification of articles by means of a plasma in a vacuum |
| 04/26/2000 | EP0996316A1 Tunable and matchable resonator coil assembly for ion implanter linear accelerator |
| 04/26/2000 | EP0996143A2 Technique for reducing pattern placement error in projection electron-beam lithography |
| 04/26/2000 | EP0996142A2 Electron-beam lithography method and electron-beam lithography system |
| 04/26/2000 | EP0995345A1 Vorrichtung zur anregung |
| 04/26/2000 | EP0995344A1 Plasma processing apparatus |
| 04/26/2000 | EP0995343A2 Compact microwave downstream plasma system |
| 04/26/2000 | EP0995342A1 Method for improved cleaning of substrate processing systems |