| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/20/2000 | US6078036 Laser soft docking system for medical treatment system |
| 06/20/2000 | US6077787 Method for radiofrequency wave etching |
| 06/20/2000 | US6077452 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 06/20/2000 | US6077417 Silicon microlens cleaning system |
| 06/20/2000 | US6077407 Sputtering cathode based on the magnetron principle |
| 06/20/2000 | US6077406 Sputtering system |
| 06/20/2000 | US6077403 Sputtering device used in the fabrication of various types of semiconductor articles |
| 06/20/2000 | US6077402 Method and apparatus for generating a plasma to sputter deposit a layer of material in the fabrication of semiconductor devices |
| 06/20/2000 | US6077387 Plasma emission detection for process control via fluorescent relay |
| 06/20/2000 | US6077384 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| 06/20/2000 | US6077357 Orientless wafer processing on an electrostatic chuck |
| 06/20/2000 | US6077353 Pedestal insulator for a pre-clean chamber |
| 06/20/2000 | US6076484 Apparatus and method for microwave plasma process |
| 06/20/2000 | US6076483 Plasma processing apparatus using a partition panel |
| 06/20/2000 | US6076482 Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion |
| 06/20/2000 | US6076481 Plasma processing apparatus and plasma processing method |
| 06/15/2000 | WO2000035256A1 Device for producing a free cold plasma jet |
| 06/15/2000 | WO2000034979A1 Hollow cathode array for plasma generation |
| 06/15/2000 | DE19956725A1 Scanning probe microscope for imaging sample surface; has feedback loop to generate drive signal for controlling probe and imaging device that uses probe signal, drive signal and relation between two signals |
| 06/15/2000 | CA2348653A1 Hollow cathode array for plasma generation |
| 06/14/2000 | EP1009199A1 Method for controlling plasma processor |
| 06/14/2000 | EP1009014A2 A plasma etching control device |
| 06/14/2000 | EP1008674A1 Processor |
| 06/14/2000 | EP1007762A1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 06/14/2000 | EP1007759A1 Modulated power for ionized metal plasma deposition |
| 06/14/2000 | EP0840940B1 Process and device for ion thinning in a high-resolution transmission electron microscope |
| 06/14/2000 | CN1256788A Electron beam aperture element |
| 06/14/2000 | CN1256418A Platform driving method of electronic probe microanalyzer |
| 06/13/2000 | US6075585 Vibrating probe for a scanning probe microscope |
| 06/13/2000 | US6075249 Methods and apparatus for scanning and focusing an ion beam |
| 06/13/2000 | US6075245 High speed electron beam based system for testing large area flat panel displays |
| 06/13/2000 | US6074953 Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers |
| 06/13/2000 | US6074568 Plasma etching used for manufacturing semiconductor devices. |
| 06/13/2000 | US6074538 Thin film forming equipment |
| 06/13/2000 | US6074519 Plasma etching apparatus having a sealing member coupling an upper electrode to an etching chamber |
| 06/13/2000 | US6074518 Plasma processing apparatus |
| 06/13/2000 | US6074516 High sputter, etch resistant window for plasma processing chambers |
| 06/13/2000 | US6074514 High selectivity etch using an external plasma discharge |
| 06/13/2000 | US6074512 Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
| 06/13/2000 | US6073577 Electrode for plasma processes and method for manufacture and use thereof |
| 06/08/2000 | WO2000033369A1 Plasma etching apparatus |
| 06/08/2000 | WO2000033362A1 Method and apparatus for low energy electron enhanced etching of substrates |
| 06/08/2000 | WO2000032851A1 Method and apparatus for low energy electron enhanced etching and cleaning of substrates |
| 06/08/2000 | WO2000032841A1 Apparatus for forming thin film |
| 06/08/2000 | WO2000032839A1 Enhanced plasma mode, method, and system for plasma immersion ion implantation |
| 06/08/2000 | WO2000008670A3 Dose monitor for plasma-monitor ion implantation doping system |
| 06/08/2000 | WO2000008228A9 Dual collimator physical-vapor deposition apparatus |
| 06/08/2000 | DE19952316A1 Verfahren zum Ausbilden einer Siliziumdioxidschicht und Verfahren zum Herstellen eines Dünnfilmtransistors dadurch A method of forming a silicon dioxide layer and method for manufacturing a thin film transistor characterized |
| 06/08/2000 | DE19855726A1 Zerstäubungskathode für die Beschichtung von Substraten Sputtering cathode for coating substrates |
| 06/08/2000 | DE19855629A1 Teilchenoptische Anordnung und Verfahren zur teilchenoptischen Erzeugung von Mikrostrukturen A particle-particle arrangement and method for producing microstructures |
| 06/08/2000 | DE19853822A1 Electron tomographic method of nondestructive testing and reconstruction of three-dimensional structures in solid e.g. for semiconductor testing or medical applications |
| 06/07/2000 | EP1006761A1 Plasma processor |
| 06/07/2000 | EP1006558A1 Sputtering cathode for substrate deposition |
| 06/07/2000 | EP1006557A2 Apparatus for generating and utilizing magnetically neutral line discharge type plasma |
| 06/07/2000 | EP1006556A1 Particle-optical device and method for producing microstructures |
| 06/07/2000 | CN1255554A Deposited film forming system and method thereof |
| 06/07/2000 | CN1053230C Microwave enhanced CVD system and method under magnetic field |
| 06/07/2000 | CN1053229C Microwave enhanced CVD system and method under magnetic field |
| 06/06/2000 | US6072185 Charged-particle-beam exposure device and method capable of high-speed data reading |
| 06/06/2000 | US6072184 Charged-particle-beam projection methods |
| 06/06/2000 | US6072183 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
| 06/06/2000 | US6072147 Plasma processing system |
| 06/06/2000 | US6071828 Semiconductor device manufacturing method including plasma etching step |
| 06/06/2000 | US6071658 Forming a pattern on the mask, dividing the mask into patches and calculating the light intensity then exposure to electron beams |
| 06/06/2000 | US6071595 Substrate with low secondary emissions |
| 06/06/2000 | US6071390 Sputtering apparatus |
| 06/06/2000 | US6071375 Gas purge protection of sensors and windows in a gas phase processing reactor |
| 06/06/2000 | US6071372 RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 06/06/2000 | US6071350 Semiconductor device manufacturing apparatus employing vacuum system |
| 06/06/2000 | US6070735 Sputtering apparatus simulation method |
| 06/06/2000 | US6070552 Substrate processing apparatus |
| 06/02/2000 | WO2000031773A1 Method and apparatus for optical detection of effluent composition |
| 06/02/2000 | WO2000031770A1 Precision alignment of microcolumn tip to a micron-size extractor aperture |
| 06/02/2000 | WO2000031769A2 Detector configuration for efficient secondary electron collection in microcolumns |
| 06/02/2000 | WO2000031527A2 Method and system for silicon microlens cleaning |
| 06/02/2000 | CA2324408A1 Precision alignment of microcolumn tip to a micron-size extractor aperture |
| 06/02/2000 | CA2318787A1 Silicon microlens cleaning system |
| 05/31/2000 | EP1004136A1 Plasma processing apparatus |
| 05/31/2000 | EP1004135A1 Scanning system with linear gas bearings and active counter-balance options |
| 05/31/2000 | CN1254943A Electronic beam exposure system |
| 05/30/2000 | US6069971 Pattern comparison inspection system and method employing gray level bit map |
| 05/30/2000 | US6069684 Electron beam projection lithography system (EBPS) |
| 05/30/2000 | US6069364 Electron beam drawing apparatus and method of the same |
| 05/30/2000 | US6069363 Magnetic-electrostatic symmetric doublet projection lens |
| 05/30/2000 | US6069356 Scanning electron microscope |
| 05/30/2000 | US6069088 Method for prolonging life time of a plasma etching chamber |
| 05/30/2000 | US6069035 Techniques for etching a transition metal-containing layer |
| 05/30/2000 | US6068783 In-situ and non-intrusive method for monitoring plasma etch chamber condition utilizing spectroscopic technique |
| 05/30/2000 | US6068742 Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source |
| 05/30/2000 | US6068703 Gas mixing apparatus and method |
| 05/30/2000 | US6067930 Coaxial plasma processing apparatus |
| 05/25/2000 | WO2000030149A1 Apparatus for providing rf return current path control in a semiconductor wafer processing system |
| 05/25/2000 | WO2000030148A1 Integrated power modules for plasma processing systems |
| 05/25/2000 | WO2000030147A1 Method and apparatus for ionized physical vapor deposition |
| 05/25/2000 | WO2000030146A1 Method and device for exposing a substrate to light |
| 05/25/2000 | WO2000019495A3 Chamber liner for semiconductor process chambers |
| 05/25/2000 | WO2000003301A9 Exposure device having a planar motor |
| 05/25/2000 | DE19953300A1 Instrument for detecting charged particles; has high energy particle detector that deflects low energy particles to low energy particle detector using negatively biased casing |
| 05/25/2000 | DE19952169A1 Magnetic lens for electron microscope or ion beam microscope has aligned openings for passage of charged particle beam provided in outer and inner lens poles attached to respective pole shoe yokes |
| 05/24/2000 | EP1003201A2 Electron beam exposure apparatus and exposure method |