| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/01/2000 | US6096174 Cathode sputtering; applying voltage to sustain gas discharge plasma between anode and cathode; rhythmic interruptions to short circuit; ion bombardment |
| 08/01/2000 | US6096160 Helicon wave plasma processing apparatus |
| 08/01/2000 | US6095159 Impressing radio frequency voltage across coil to establish standing wave thereacross; selecting voltage profile for standing wave so as to control location and amount of capacitive coupling; controlling circuit parameter |
| 08/01/2000 | US6095083 Vacuum processing chamber having multi-mode access |
| 07/27/2000 | WO2000044207A1 Method for the excitation of a plasma and a use of the method |
| 07/27/2000 | WO2000043568A1 Microwave plasma cvd apparatus |
| 07/27/2000 | WO2000043566A1 Plasma processing system and method |
| 07/27/2000 | WO2000008670A9 Dose monitor for plasma-monitor ion implantation doping system |
| 07/27/2000 | WO2000000992A9 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 07/27/2000 | DE19959845A1 Plasma generator, for plasma-assisted coating of a tubular component, comprises an induction coil around a protective tube with end closure flanges enclosing the component |
| 07/27/2000 | DE19958789A1 Electron beam tester for semiconductor, produces image of semiconductor from secondary electron emitted from semiconductor |
| 07/27/2000 | DE19928085A1 Verfahren zur Herstellung einer Ablenkaperturmatrix für Elektronenstrahl-Belichtungsvorrichtungen, Naßätzverfahren und -apparatur zur Herstellung der Aperturmatrix und Elektronenstrahl-Belichtungsvorrichtung mit der Aperturmatrix A process for preparing a Ablenkaperturmatrix for electron beam exposure devices, and wet etching to prepare the -apparatur Aperturmatrix and electron beam exposure apparatus with the Aperturmatrix |
| 07/27/2000 | DE19859906C1 Verfahren zur Gefügeanalyse an polykristallinen Festkörperproben Method for the structural analysis of polycrystalline solid samples |
| 07/26/2000 | EP1022933A2 Plasma generator |
| 07/26/2000 | EP1022766A1 Particle beam apparatus |
| 07/26/2000 | EP1021592A1 Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| 07/26/2000 | CN1261458A Pattern film repair using a gas assisted focused particle beam system |
| 07/25/2000 | US6094471 X-ray diagnostic system |
| 07/25/2000 | US6094010 Electron gun with photocathode and folded coolant path |
| 07/25/2000 | US6093932 Method of writing any patterns on a resist by an electron beam exposure and electron beam exposure system |
| 07/25/2000 | US6093931 Pattern-forming method and lithographic system |
| 07/25/2000 | US6093930 Automatic probe replacement in a scanning probe microscope |
| 07/25/2000 | US6093660 Inductively coupled plasma chemical vapor deposition technology |
| 07/25/2000 | US6093625 Apparatus for and methods of implanting desired chemical species in semiconductor substrates |
| 07/25/2000 | US6093512 Method and apparatus for dimension measurement and inspection of structures utilizing corpuscular beam |
| 07/25/2000 | US6093457 Controlling pressure in vacuum chamber by exhausting and supplying gas; high frequency power to one end of a conductor configured as a vortex; grounding an end of second conductor; electromagnetic waves from conductors generate plasma |
| 07/25/2000 | US6093456 Beam stop apparatus for an ion implanter |
| 07/25/2000 | US6093332 Flowing etchant source gas into plasma processing chamber, gas including fluorocarbon and nonreactive gases, providing radio frequency power wave form to electrode associated with plasma processing chamber, forming plasma, depositing polymer |
| 07/25/2000 | US6093293 Magnetron sputtering source |
| 07/25/2000 | US6093290 Method of generating a reciprocating plurality of magnetic fluxes on a target |
| 07/25/2000 | US6093281 Baffle plate design for decreasing conductance lost during precipitation of polymer precursors in plasma etching chambers |
| 07/25/2000 | US6092485 Apparatus and method for processing substrate |
| 07/20/2000 | WO2000042633A1 A method and apparatus of continuously monitoring and recording parameters associated with pulsed ion beam surface treatment processes |
| 07/20/2000 | WO2000042632A1 Method and apparatus for generating and confining a reactive gas for etching substrates |
| 07/20/2000 | WO2000003421A9 Improved endpoint detection for substrate fabrication processes |
| 07/19/2000 | EP1020892A1 Apparatus for the deposition of coatings on a substrate using a magnetically confined inductively coupled plasma source |
| 07/19/2000 | EP1020541A2 Vacuum arc evaporation source and deposition apparatus |
| 07/19/2000 | EP1019946A2 Device for coating panel-shaped substrates |
| 07/19/2000 | EP1019945A1 Method and device for surface-treating substrates |
| 07/19/2000 | EP1019944A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| 07/19/2000 | EP1019943A1 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process |
| 07/19/2000 | EP1019942A1 Electron beam microscope using electron beam patterns |
| 07/19/2000 | EP1019563A1 Dual frequency excitation of plasma for film deposition |
| 07/19/2000 | CN1260842A Method and apparatus for low pressure sputtering |
| 07/19/2000 | CN1054652C Apparatus for rapid plasma treatments and method |
| 07/18/2000 | US6091249 Method and apparatus for detecting defects in wafers |
| 07/18/2000 | US6091202 Electron beam exposure apparatus with non-orthogonal electron emitting element matrix |
| 07/18/2000 | US6091193 Mesh grid with protruding portion |
| 07/18/2000 | US6091187 High emittance electron source having high illumination uniformity |
| 07/18/2000 | US6091072 Piece-wise processing of very large semiconductor designs |
| 07/18/2000 | US6091046 Bonding and sputtering target by variable polarity plasma arc welding |
| 07/18/2000 | US6091045 Plasma processing apparatus utilizing a microwave window having a thinner inner area |
| 07/18/2000 | US6090528 Generating electron beam; shaping by directing it through square aperture in lamina having serrated edge encircling aperture; projecting electron beam as square or rectangular spot onto potoresist layered on substrate |
| 07/18/2000 | US6090527 Forming latent images on electron beam resist by charged particles obtained by transmitting electron beam through electron beam exposure mask |
| 07/18/2000 | US6090457 Apparatus for forming a thin film provided with a sputtering target and a vapour source |
| 07/18/2000 | US6090456 Effective for coating zinc sulfide and zinc selenide infrared windows |
| 07/18/2000 | US6089472 Shower head |
| 07/18/2000 | US6089186 Vacuum coating forming device |
| 07/18/2000 | US6089185 Thin film forming apparatus |
| 07/18/2000 | US6089181 Plasma processing apparatus |
| 07/18/2000 | CA2067309C Process and apparatus for plasma cvd coating or plasma treating substrates |
| 07/13/2000 | WO2000041212A1 Gas injection system for plasma processing |
| 07/13/2000 | WO2000041211A1 Method and apparatus for etch rate stabilization |
| 07/13/2000 | WO2000041210A1 Plasma etching installation |
| 07/13/2000 | WO2000041209A1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 07/13/2000 | WO2000041208A1 An apparatus and method for controlling a beam shape |
| 07/13/2000 | WO2000041207A1 A method and apparatus that determines charged particle beam shape codes |
| 07/13/2000 | WO2000041206A1 Element mapping device, scanning transmission electron microscope, and element mapping method |
| 07/13/2000 | WO2000041205A1 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus |
| 07/13/2000 | WO2000040772A1 Processing chamber for atomic layer deposition processes |
| 07/13/2000 | WO2000040771A1 Large area plasma source |
| 07/13/2000 | WO2000040770A1 Diffusion bonded sputter target assembly and method of making same |
| 07/13/2000 | WO2000040292A2 Method and apparatus for imaging through 3-dimensional tracking of protons |
| 07/13/2000 | WO2000017906A3 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
| 07/13/2000 | DE19860828A1 Ion implantation equipment used for semiconductor manufacture, includes main controller which detects current level to generate control signal based on which ion implantation turbine pump operation is controlled |
| 07/13/2000 | DE19853093A1 Verfahren und Anordnung zur Belichtung eines Substrates Method and apparatus for exposing a substrate |
| 07/13/2000 | DE10000365A1 Methods for semiconductor testing using low voltage particle beam by locking up second surface locks and first surface and comparing registered image with reference in order to identify faults in checked substrate |
| 07/13/2000 | DE10000364A1 Defect detection method for patterned substrates, intended for detection of defects in voltage contrast of semiconductor wafers obtained using electron microscopes |
| 07/13/2000 | DE10000361A1 Means for detection of microstructure defects in semiconductor wafers around through contact holes using a charged particle beam scanning system which involves negatively charging the zone around the contact hole prior to scanning |
| 07/13/2000 | DE10000019A1 Sputter deposition unit, useful for depositing titanium and titanium nitride coatings on semiconductor wafers, has a non-target material surface for receiving and re-sputtering target material onto a workpiece periphery |
| 07/13/2000 | CA2322972A1 A method and apparatus that determines charged particle beam shape codes |
| 07/13/2000 | CA2322966A1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 07/13/2000 | CA2322778A1 An apparatus and method for controlling a beam shape |
| 07/12/2000 | EP1018757A1 Charged particle beam emitting device |
| 07/12/2000 | EP1018140A1 Electron sources having shielded cathodes |
| 07/12/2000 | EP1018139A1 Adjustment of deposition uniformity in an inductively coupled plasma source |
| 07/12/2000 | EP1018137A2 Charged particle beam emitting assembly |
| 07/12/2000 | EP1018136A2 Imaging and/or raster-mode scanning system provided with a device for compensating the image degradations resulting from environmental factors |
| 07/12/2000 | EP1018135A2 Vacuum plasma processor having coil with added conducting segments to its peripheral part |
| 07/12/2000 | EP1018088A1 System and method for monitoring and controlling gas plasma processes |
| 07/12/2000 | EP1017876A1 Gas injection system for plasma processing apparatus |
| 07/12/2000 | EP1017875A1 Remote plasma cleaning apparatus |
| 07/12/2000 | EP0928495B1 Ion source for generating ions of a gas or vapour |
| 07/12/2000 | EP0880794B1 Ion beam shield for implantation systems |
| 07/12/2000 | CN1260009A Method for producing coated workpieces, uses and installation for the method |
| 07/11/2000 | US6088520 Method of producing highly precise charged beam drawing data divided into plurality of drawing fields |
| 07/11/2000 | US6088320 Micro-mechanically fabricated read/write head with a strengthening shell on the tip shaft |
| 07/11/2000 | US6088096 End-point detector for plasma etcher |
| 07/11/2000 | US6087778 Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna |
| 07/11/2000 | US6087669 Charged-particle-beam projection-microlithography apparatus and transfer methods |