| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/30/2000 | CN1265066A Diamond marking |
| 08/29/2000 | US6111680 Transmitting a signal using duty cycle modulation |
| 08/29/2000 | US6111260 Method and apparatus for in situ anneal during ion implant |
| 08/29/2000 | US6111253 Transmission electron microscope |
| 08/29/2000 | US6110752 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 08/29/2000 | US6110627 Microlithography methods, especially such methods for projection-transferring, onto the surface of a semiconductor wafer. |
| 08/29/2000 | US6110542 Method for forming a film |
| 08/29/2000 | US6110540 Plasma apparatus and method |
| 08/29/2000 | US6110395 Method and structure for controlling plasma uniformity |
| 08/29/2000 | US6110337 Sputtering method and apparatus with optical monitoring |
| 08/29/2000 | US6110336 High pressure magnetron cathode assembly and sputtering apparatus utilizing same |
| 08/29/2000 | US6110287 Plasma processing method and plasma processing apparatus |
| 08/29/2000 | US6109208 Plasma generating apparatus with multiple microwave introducing means |
| 08/29/2000 | US6109206 Remote plasma source for chamber cleaning |
| 08/24/2000 | WO2000049638A1 Apparatus and method for electrostatically shielding an inductively coupled rf plasma source and facilitating ignition of a plasma |
| 08/24/2000 | WO1999063566A3 Device for shaping an electron beam, method for producing said device and use thereof |
| 08/24/2000 | WO1999053823A3 X-ray diagnostic system |
| 08/23/2000 | EP1030345A2 Plasma treatment equipment and impedance measurement tool |
| 08/23/2000 | EP1030344A2 Continuously variable aperture for high-energy ion implanter |
| 08/23/2000 | EP1030343A2 Method & system for operating a variable aperture in an ion implanter |
| 08/23/2000 | EP1030222A2 Lithographic projection apparatus |
| 08/23/2000 | EP1029341A1 Monitor of plasma processes with multivariate statistical analysis of plasma emission spectra |
| 08/23/2000 | EP1029340A1 Apparatus and method for secondary electron emission microscope |
| 08/23/2000 | EP1029231A1 Method and apparatus employing external light source for endpoint detection |
| 08/23/2000 | EP1029099A2 Apparatus and method for adjusting density distribution of a plasma |
| 08/23/2000 | CN1264432A Method and device for vacuum-coating substrate |
| 08/23/2000 | CN1263952A Device for forming vacuum coating |
| 08/22/2000 | US6107637 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
| 08/22/2000 | US6107636 Electron beam exposure apparatus and its control method |
| 08/22/2000 | US6107633 Electron beam lens |
| 08/22/2000 | US6107629 Method to determine depth profiles in an area of thin coating |
| 08/22/2000 | US6107207 Procedure for generating information for producing a pattern defined by design information |
| 08/22/2000 | US6106737 Plasma treatment method utilizing an amplitude-modulated high frequency power |
| 08/22/2000 | US6106734 Micromachine manufacture using gas beam crystallization |
| 08/22/2000 | US6106683 Grazing angle plasma polisher (GAPP) |
| 08/22/2000 | US6106676 Method and apparatus for reactive sputtering employing two control loops |
| 08/22/2000 | US6106663 Semiconductor process chamber electrode |
| 08/22/2000 | US6106660 Etching machine having lower electrode bias voltage source |
| 08/22/2000 | US6106659 Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials |
| 08/22/2000 | US6106629 Impurity doping apparatus |
| 08/22/2000 | US6106625 Reactor useful for chemical vapor deposition of titanium nitride |
| 08/22/2000 | US6105589 Oxidative cleaning method and apparatus for electron microscopes using an air plasma as an oxygen radical source |
| 08/22/2000 | US6105534 Apparatus for plasma jet treatment of substrates |
| 08/22/2000 | US6105518 Durable plasma treatment apparatus and method |
| 08/22/2000 | US6105435 Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same |
| 08/22/2000 | CA2208162C Reactive pvd with neg pump |
| 08/17/2000 | WO2000048435A1 Method of plasma enhanced chemical vapor deposition of diamond |
| 08/17/2000 | WO2000048226A1 High-density plasma source for ionized metal deposition |
| 08/17/2000 | WO2000048225A1 Charged particle ray exposure device and method of manufacturing semiconductor device |
| 08/17/2000 | WO2000048224A1 Electron gun and electron beam exposure device |
| 08/17/2000 | WO2000018979A8 Sputter deposition apparatus |
| 08/16/2000 | EP1028452A2 Scanning electron microscope |
| 08/16/2000 | EP1027718A1 Method and apparatus for ion beam scanning in an ion implanter |
| 08/16/2000 | EP1027475A1 Large area microwave plasma apparatus with adaptable applicator |
| 08/16/2000 | EP0730532B1 Topology induced plasma enhancement for etched uniformity improvement |
| 08/16/2000 | EP0628212B1 Dc power supply for a plasma processing system |
| 08/15/2000 | US6104035 Electron-beam exposure apparatus and method |
| 08/15/2000 | US6104034 Objective lens |
| 08/15/2000 | US6104030 Optical probe having tapered wave guide and scanning near-field optical microscope utilizing optical probe |
| 08/15/2000 | US6104025 Ion implanting apparatus capable of preventing discharge flaw production on reverse side surface of wafer |
| 08/15/2000 | US6103434 Data processing of converting drawing data on a semiconductor device pattern on a chip into a predetermined size and shape; dividing the converted drawing data into multiple fields |
| 08/15/2000 | US6103079 Anti-leakage apparatus |
| 08/15/2000 | US6103074 Placing in vacuum chamber; depressurization; applying anti-parallel magnetic field; arc discharging |
| 08/15/2000 | US6103070 Insulative, inter-turn shield positioned at a channel defining coil windings; confining generated plasma |
| 08/15/2000 | US6101972 Plasma processing system and method |
| 08/15/2000 | US6101971 Ion implantation control using charge collection, optical emission spectroscopy and mass analysis |
| 08/15/2000 | US6101970 Plasma processing apparatus |
| 08/15/2000 | US6101969 Plasma-generating electrode device, an electrode-embedded article, and a method of manufacturing thereof |
| 08/10/2000 | WO2000047023A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source |
| 08/10/2000 | WO2000046846A1 Charged particle beam exposure apparatus and exposure method |
| 08/10/2000 | WO2000046845A1 Method for detecting alignment mark in charged particle beam exposure apparatus |
| 08/10/2000 | WO2000046831A1 Precision alignment and assembly of microlenses and microcolumns |
| 08/10/2000 | WO2000046830A1 Diaphragm plate and its processing method |
| 08/10/2000 | WO2000046418A1 Device for coating substrates with a vaporized material under low pressure or in a vacuum using a vaporized material source |
| 08/10/2000 | WO2000000998A3 Electrode for plasma processes and method for manufacture and use thereof |
| 08/10/2000 | CA2324243A1 Precision alignment and assembly of microlenses and microcolumns |
| 08/09/2000 | EP1026723A2 Vacuum coating forming device |
| 08/09/2000 | EP1025276A1 Device and method for detecting and preventing arcing in rf plasma systems |
| 08/08/2000 | USRE36810 Plasma processing apparatus and method |
| 08/08/2000 | US6100536 Electron flood apparatus for neutralizing charge build-up on a substrate during ion implantation |
| 08/08/2000 | US6100524 Torsion type probe and scanning probe microscope using the same |
| 08/08/2000 | US6099917 Pretreatment of oxide substrates and radiation reactive n2+ ion beams on oxide substrates |
| 08/08/2000 | US6099747 Grounding counter electrode and connecting substrate electrode to high frequence power source; introducing gas to form layer on wafer; chamber etching of apparatus; disconnecting from grounding and power; introducing fluorocarbon gas |
| 08/08/2000 | US6099706 Magnetic film forming apparatus which applies a parallel magnetic field across a substrate |
| 08/08/2000 | US6099687 Etching system |
| 08/08/2000 | US6099649 Chemical vapor deposition hot-trap for unreacted precursor conversion and effluent removal |
| 08/08/2000 | US6098568 Mixed frequency CVD apparatus |
| 08/03/2000 | WO2000045623A1 Atmospheric steady-state glow-discharge plasma |
| 08/03/2000 | WO2000045427A1 Method and apparatus for plasma processing |
| 08/03/2000 | WO2000007030A9 Particle beam current monitoring technique |
| 08/03/2000 | DE19902146A1 Plasma generation method for generating impervious/dense plasmas in vacuum processes, includes applying direct current between hollow cathode, its ring anode where discharge current follows constantly to set up impervious/dense plasma |
| 08/02/2000 | EP1024519A2 Ion beam implantation using conical magnetic scanning |
| 08/02/2000 | EP1023819A2 System for plasma ignition by fast voltage rise |
| 08/02/2000 | CN1261927A Apparatus and method for nucleotion and deposition of diamond using hot-filament DC plasma |
| 08/01/2000 | US6097157 System for ion energy control during plasma processing |
| 08/01/2000 | US6097028 Energy filter |
| 08/01/2000 | US6096462 Coulomb effect induced shifts in focal-point position, and changes in image magnification, projected-image rotation, and astigmatic blur and distortions are corrected by applying electric current supplied to correction lenses and stigmators |
| 08/01/2000 | US6096232 Dry etching system and dry etching method using plasma |
| 08/01/2000 | US6096180 Cathodic sputtering device |
| 08/01/2000 | US6096176 Applying bias voltage to wafer while helicon wave plasma of high density generated between target and wafer by antenna |