Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/2014
04/24/2014US20140110598 Ion source device and method for providing ion source
04/24/2014US20140110577 Particle beam system and method of processing a tem-sample
04/24/2014US20140110375 Surface processing device and surface processing method
04/24/2014US20140110061 Plasma processing apparatus
04/24/2014US20140110060 Adjusting substrate temperature to improve cd uniformity
04/24/2014DE202012012908U1 Anordnung eines Vakuumlichtbogenverdampfers Arrangement of a vacuum arc evaporator
04/24/2014DE112012002764T5 Ladungsteilchenstrahlvorrichtung Charged particle
04/24/2014DE112012002668T5 Rasterelektronenmikroskop und Rastertransmissionselektronenmikroskop Scanning electron microscopy and scanning transmission electron microscope
04/24/2014DE112012001937T5 Spin-Drehvorrichtung Spin-rotation device
04/24/2014DE102012020636A1 Bandförmiger Chopper für einen Teilchenstrahl A tape-like chopper for a particle
04/24/2014DE102011082900B4 Substratbehandlungsanlage mit austauschbarem Rohrtarget und Rohrtarget-Hebezeug dazu The substrate processing system with replaceable tubular target and tube target hoist to
04/23/2014EP2722868A1 Octopole device and method for spot size improvement
04/23/2014EP2722867A2 Configurable charged-particle beam apparatus
04/23/2014EP2722866A1 Configurable charged-particle beam apparatus
04/23/2014EP2722865A1 Beam pulsing device for use in charged-particle microscopy
04/23/2014EP2722661A2 Particle beam system and method of processing a TEM-sample
04/23/2014EP2721909A1 Device for providing a flow of plasma
04/23/2014EP2721193A1 Method and device for manufacturing a barrier layer on a flexible substrate
04/23/2014CN203562396U Powder material surface plasma processing device
04/23/2014CN203562395U Continuous material surface normal pressure plasma processing device
04/23/2014CN203562394U Plasma circular processing device
04/23/2014CN203562393U Granular material surface plasma processing device
04/23/2014CN203562392U Improved type powder material surface plasma processing device
04/23/2014CN203562391U Carbon black surface atmospheric plasma treatment device
04/23/2014CN203562390U Monitoring device for ion implanter and ion implanter system
04/23/2014CN203562389U Special electron gun for electron beam bombardment furnace
04/23/2014CN103748655A Carbon spark evaporation
04/23/2014CN103748654A Permanent magnet lens array
04/23/2014CN103748653A Emitter, gas field ionization ion source, and ion beam device
04/23/2014CN103745945A Deep silicon through hole etching apparatus and deep silicon through hole etching method
04/23/2014CN103745904A Dry etcher and etching method for same
04/23/2014CN103745903A Plasma treatment device
04/23/2014CN103745902A PECVD processing device and method for carrying out PECVD processing on substrate
04/22/2014US8704195 Method for setting a position of a carrier element in a particle beam device
04/22/2014US8704176 Charged particle microscope providing depth-resolved imagery
04/22/2014US8704175 Scanning electron microscope
04/22/2014US8703051 Sanitizing headsets during a period of non-use
04/22/2014CA2504620C Method and apparatus for three-dimensional imaging in the fourier domain
04/17/2014WO2014058642A1 Inductively coupled plasma ion source chamber with dopant material shield
04/17/2014WO2014057918A1 Ion-beam device
04/17/2014WO2014057570A1 Method for manufacturing electron source
04/17/2014WO2014057345A2 Ion guide for mass spectrometry
04/17/2014WO2014056968A1 Apparatus and method for applying surface coatings
04/17/2014WO2012122036A3 Electrostatic lenses and systems including the same
04/17/2014US20140107959 Electron beam apparatus for inspecting a pattern on a sample using multiple electron beams
04/17/2014US20140106477 Method of endpoint detection of plasma etching process using multivariate analysis
04/17/2014US20140106279 Drawing apparatus, and method of manufacturing article
04/17/2014US20140106268 Irradiation apparatus, drawing apparatus, and method of manufacturing article
04/17/2014US20140106086 Method of smoothing solid surface with gas cluster ion beam and solid surface smoothing apparatus
04/17/2014US20140103808 Method for controlling ion energy in radio frequency plasmas
04/17/2014US20140103793 Ion generation apparatus and electric equipment using the same
04/17/2014US20140103225 Beam pulsing device for use in charged-particle microscopy
04/17/2014US20140103223 Charged particle beam lens
04/17/2014US20140103208 Electron microscope
04/17/2014US20140102638 Plasma processing apparatus
04/17/2014DE112012003182T5 Ladungsteilchenstrahlvorrichtung, Verfahren zum Einstellen einer Ladungsteilchenstrahlvorrichtung und Verfahren zum Untersuchen oder Betrachten einer Probe A charged particle beam, a charged particle beam device and method of adjusting method for inspecting or observing a specimen
04/17/2014DE112012003062T5 lonenstrahlvorrichtung lonenstrahlvorrichtung
04/17/2014DE102012217761A1 Verfahren zur Vermeidung von Artefakten beim Serial Block Face Imaging Method to avoid artefacts when the serial block face imaging
04/17/2014DE102009028013B9 Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät Particle beam with a diaphragm unit and method for adjusting a beam current in a particle beam
04/17/2014DE102008048785B4 Magnetronanordnung mit abgeschirmter Targethalterung Magnetron with shielded target holder
04/16/2014EP2720249A2 Arc evaporation chamber with a vacuum arc evaporation source
04/16/2014EP2720248A2 Vacuum arc evaporation source, and arc evaporation chamber with a vacuum arc evaporation source
04/16/2014EP2720247A2 Improved ion source
04/16/2014EP2718959A2 Improvements to the application of coating materials
04/16/2014EP2718958A2 Plasma immersion ion implantation machine for low-pressure process
04/16/2014EP2718957A2 Method and device for generating an arc detection signal and arc detection arrangement
04/16/2014EP2718956A1 Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
04/16/2014EP2718477A1 Rotary sputter target assembly
04/16/2014CN203553097U Dry etching device
04/16/2014CN103733300A Apparatus and method for three dimensional ion processing
04/16/2014CN103733299A Scanning electron microscope
04/16/2014CN103733298A Charged particle beam apparatus
04/16/2014CN103733296A Ion beam device
04/16/2014CN103733023A Method for estimating shape before shrink, and CD-SEM apparatus
04/16/2014CN103732785A Cathodic arc deposition
04/16/2014CN103730393A Gas intake device of plasma etching equipment
04/16/2014CN103730392A Gas supply system of semiconductor processing device
04/16/2014CN103730348A Method for reducing plasma etcher cavity pollution in back hole process
04/16/2014CN103730322A Improved normal pressure plasma processing device
04/16/2014CN103730321A Device for processing chip plasma surface
04/16/2014CN103730320A Micro-hollow-cathode plasma processing device
04/16/2014CN103730319A Novel powder plasma processing device
04/16/2014CN103730318A Wafer edge protection ring and method for reducing particles at wafer edge
04/16/2014CN103730317A Gas introducing apparatus and inductively coupled plasma processing apparatus
04/16/2014CN103730316A Plasma treatment method and plasma treatment device
04/16/2014CN103730315A Method for improving etching process of plasma
04/16/2014CN103730314A Gas ion source gas inlet real-time control system
04/16/2014CN103730313A Substrate power supply used in in-situ sample holder, photoelectric dual-function chip and method for manufacturing photoelectric dual-function chip
04/16/2014CN103730312A Sample platform for nanomechanic test system and using method thereof
04/16/2014CN103730311A 阴极发光装置 Cathodoluminescence device
04/16/2014CN103723672A Device containing nano-pipet and fabrication method thereof
04/16/2014CN102534513B Rectangular plane cathode arc evaporation source of combination magnetic fields
04/16/2014CN102280337B Reactive ion etching equipment and method
04/15/2014USRE44840 Method for detecting particles and defects and inspection equipment thereof
04/15/2014US8698109 Method and system for controlling critical dimension and roughness in resist features
04/15/2014US8698108 Ion beam measurement system and method
04/15/2014US8698107 Technique and apparatus for monitoring ion mass, energy, and angle in processing systems
04/15/2014US8698103 Measuring device for determination of at least one parameter of a blood sample
04/15/2014US8698100 System and apparatus for sanitizing a door opening device or other point of contact
04/15/2014US8698081 Pattern inspection apparatus and pattern inspection method
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