Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2000
10/24/2000US6136139 Plasma processing apparatus
10/24/2000US6135128 Method for in-process cleaning of an ion source
10/19/2000WO2000062329A1 Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines
10/19/2000WO2000062328A1 Method and apparatus for stabilising a plasma
10/19/2000WO2000062327A2 Rectangular cathodic arc source and method of steering an arc spot
10/19/2000WO2000062326A1 Method and apparatus for ion implantation
10/19/2000WO2000062325A1 Method and apparatus for ion implantation
10/19/2000WO2000062324A2 System and method to correct for distortion caused by bulk heating in a substrate
10/19/2000WO2000061384A1 Remote plasma generator
10/19/2000WO2000042632B1 Method and apparatus for generating and confining a reactive gas for etching substrates
10/19/2000WO2000031527A3 Method and system for silicon microlens cleaning
10/19/2000DE19916941A1 Cooling finger, for a sputter deposition cathode, has a blind bore containing a central strip with a bottom edge spaced by a small specified distance from the blind bore bottom
10/19/2000CA2334388A1 System and method to correct for distortion caused by bulk heating in a substrate
10/18/2000EP1045427A2 Target locking system for electron beam lithography
10/18/2000EP1045426A2 Column for charged particle beam device
10/18/2000EP1045425A2 Charged particle beam column
10/18/2000EP1045424A2 Particle beam system with dynamic focusing
10/18/2000EP1045423A2 Electron beam gun
10/18/2000EP1045422A2 Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
10/18/2000EP1044460A1 Electron sources utilizing patterned negative electron affinity photocathodes
10/18/2000EP1044459A1 Plasma device including a powered non-magnetic metal member between a plasma ac excitation source and the plasma
10/18/2000EP1044458A1 Dual face shower head electrode for a magnetron plasma generating apparatus
10/18/2000EP1044379A1 Method for optimizing the magnetic field of a periodic permanent magnet focusing device
10/18/2000EP1044113A1 Plasma discharge device and method with dynamic tuning
10/18/2000CN1270684A System and method for monitoring and controlling gas plasma process
10/18/2000CN1270640A Device and method for detecting and preventing arcing in RF plasma systems
10/17/2000US6133987 Technique for reducing pattern placement error in projection electron-beam lithography
10/17/2000US6133679 Thermal field emission cathode
10/17/2000US6132910 Method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks
10/17/2000US6132805 Can be activated to confine or interrupt plasma distributions, including line-of-sight transmissions between physical-vapor deposition target electrodes and substrates; used to isolate transmissions between process energy source and substrate
10/17/2000US6132632 Method and apparatus for achieving etch rate uniformity in a reactive ion etcher
10/17/2000US6132576 Vacuum sputtering apparatus
10/17/2000US6132575 Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films
10/17/2000US6132566 Device for shielding a plasma energy source from a plasma region during semiconductor processing; method for depositing titanium nitride and titanium onto a workpiece in a plasma chamber
10/17/2000US6132565 Magnetron assembly for sputter deposition of a metal on an electronic substrate
10/17/2000US6132563 Reactive sputtering process
10/17/2000US6132552 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor
10/17/2000US6132551 Inductive RF plasma reactor with overhead coil and conductive laminated RF window beneath the overhead coil
10/17/2000US6132550 Apparatuses for desposition or etching
10/12/2000WO2000060910A1 The method and the apparatus for plasma generation
10/12/2000WO2000060653A1 Plasma treatment device, its maintenance method and its installation method
10/12/2000WO2000060642A1 Pulsed ion source for ion trap mass spectrometer
10/12/2000WO2000060632A2 Electrostatically focused addressable field emission arraychips (afea's) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy
10/12/2000WO2000060415A1 Method for correcting image faults
10/12/2000WO2000000999A9 Elastomer bonded parts for plasma processes and method for manufacture and use thereof
10/11/2000EP1043419A1 A diamond film depositing apparatus and method thereof
10/11/2000EP1042784A1 Wien filter
10/11/2000EP1042783A1 Focus rings and methods therefor
10/11/2000EP1042782A1 Vacuum treatment system
10/11/2000EP1042781A1 Raster scan gaussian beam writing strategy and method for pattern generation
10/11/2000EP1042526A1 Magnetron sputtering source
10/11/2000CN1269692A Plasma source
10/11/2000CN1057349C Plasma processing method and plasma processing apparatus
10/10/2000US6130436 Acceleration and analysis architecture for ion implanter
10/10/2000US6130434 Dissolution stage for an environmental scanning electron microscope
10/10/2000US6130433 Ion source chamber of a high energy implanter with a filtering device
10/10/2000US6130432 Particle beam system with dynamic focusing
10/10/2000US6130429 Miniaturized secondary electron detector
10/10/2000US6130118 Plasma reaction apparatus and plasma reaction
10/10/2000US6129808 Low contamination high density plasma etch chambers and methods for making the same
10/10/2000US6129807 Apparatus for monitoring processing of a substrate
10/10/2000US6129806 Plasma processing apparatus and plasma processing method
10/10/2000US6129044 Apparatus for substrate processing with improved throughput and yield
10/05/2000WO2000059019A1 Plasma processing system
10/05/2000WO2000059018A1 Plasma processing system
10/05/2000WO2000058995A2 Apparatus for improving plasma distribution and performance in an inductively coupled plasma
10/05/2000WO2000058994A1 Method and apparatus for compensating non-uniform wafer processing in plasma processing
10/05/2000WO2000058993A1 Plasma processor with coil having variable rf coupling
10/05/2000WO2000058992A1 Plasma processing method and apparatus with control of rf bias
10/05/2000WO2000058049A1 Arc-free electron gun
10/05/2000DE19907858C1 Vorrichtung zur elektrostatischen Ablenkung eines Korpuskularstrahles Apparatus for electrostatic deflection of a particle beam
10/04/2000EP1041863A1 Plasma cell
10/04/2000EP1041172A2 Method for reducing topography dependent charging effects in a plasma enhanced semiconductor wafer processing system
10/04/2000EP1041171A1 CVD processing chamber
10/04/2000EP1040506A1 Device for producing excited/ionized particles in a plasma
10/04/2000EP1040500A1 A plasma generating apparatus having an electrostatic shield
10/04/2000EP1040292A1 Gas panel
10/04/2000CN1268982A Jet plasma process and apparatus for deposition of coatings thus obtd.
10/03/2000USH1868 Method of and apparatus for controlling plasma potential and eliminating unipolar arcs in plasma chambers
10/03/2000US6127738 Detecting registration marks with low energy electron beam
10/03/2000US6127683 Electron beam drawing apparatus
10/03/2000US6127682 Scanning probe microscope and method of analyzing sample using same
10/03/2000US6127237 Etching end point detecting method based on junction current measurement and etching apparatus
10/03/2000US6126778 Beat frequency modulation for plasma generation
10/03/2000US6125859 Method for improved cleaning of substrate processing systems
10/03/2000US6125788 Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter
10/03/2000US6125522 Manufacturing method for electrostatic deflector
09/2000
09/28/2000WO2000057450A2 Magnetic immersion lense with detection arrangement
09/28/2000WO2000056947A1 Vacuum arc evaporation method, vacuum arc evaporation system, and rotary cutting tool
09/28/2000WO2000056946A1 Wear resistant coating
09/28/2000DE3845007C2 Ion beam generator for semiconductor processing
09/28/2000DE19911900A1 Einrichtung zur Ionenimplantation mit niedrigen Energien Device for ion implantation at low energies
09/28/2000DE19911372A1 Control of electrically charged particle beam with particle source and associated accelerator and downstream electromagnetic beam deflector
09/27/2000EP1039503A2 Electrode
09/27/2000EP1039502A2 Heat protection of sealing o-rings in a microwave plasma generating apparatus
09/27/2000EP1039501A2 Apparatus and method for production of electronic devices
09/27/2000EP1038306A1 Method and device for improving surfaces
09/27/2000EP1038046A1 Plasma reactor with a deposition shield
09/27/2000EP1038045A1 A method and apparatus for magnetically enhanced sputtering
09/27/2000EP0870317B1 Apparatus for controlling matching network of a vacuum plasma processor and memory for same
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