Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2000
11/14/2000US6145438 Method and apparatus for direct writing of semiconductor die using microcolumn array
11/14/2000CA2139637C Dose modulation and pixel deflection for raster scan lithography
11/09/2000WO2000067291A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/09/2000WO2000067290A2 Integrated microcolumn and scanning probe microscope arrays
11/09/2000WO2000067289A1 Apparatus and method for reducing charge accumulation on a substrate
11/09/2000WO2000066804A1 Device for treating a container with microwave plasma
11/09/2000WO2000031769A3 Detector configuration for efficient secondary electron collection in microcolumns
11/09/2000DE19920304A1 Target used for sputtering cathodes of vacuum deposition devices has protrusions extending into the target material
11/09/2000CA2336670A1 Integrated microcolumn and scanning probe microscope arrays
11/09/2000CA2336557A1 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/09/2000CA2336369A1 Apparatus and method for reducing charge accumulation on a substrate
11/08/2000EP1050395A2 Open uv/vuv excimer radiator and method for surface modification of polymers
11/08/2000EP1050064A2 Implantation of radioactive ?32 p atoms
11/08/2000EP1050062A1 Precision alignment of microcolumn tip to a micron-size extractor aperture
11/08/2000EP1050056A1 Magnetic engraving method, in particular for magnetic or magneto-optical recording
11/08/2000EP0897591B1 Magnet array
11/08/2000CN1272953A Dual face shower head magnetron, plasma generating apparatus and method for coating substrate
11/07/2000US6145118 Plotting pattern data production method electron beam plotting method substrate working method and electron beam plotting apparatus
11/07/2000US6144894 Method of activating a magnetron generator within a remote plasma source of a semiconductor wafer processing system
11/07/2000US6144760 Exposure data correction method, exposing method, photomask, semiconductor device, exposure data correction apparatus, exposure apparatus, and manufacturing apparatus of semiconductor device
11/07/2000US6144443 Apparatus and method for measuring crystal lattice strain
11/07/2000US6144037 Capacitor charging sensor
11/07/2000US6143140 Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field
11/07/2000US6143129 Inductive plasma reactor
11/07/2000US6143125 Apparatus and method for dry etching
11/07/2000US6143124 Apparatus and method for generating a plasma from an electromagnetic field having a lissajous pattern
11/07/2000US6143084 Apparatus and method for generating plasma
11/07/2000US6142539 Gas panel
11/07/2000US6142096 Electronic device manufacturing apparatus and method for manufacturing electronic device
11/02/2000WO2000065632A2 Method for decontaminating yeast
11/02/2000WO2000065631A2 Apparatus and method for exposing a substrate to plasma radicals
11/02/2000WO2000065406A1 Method of correcting phase shift mask and focused ion beam device
11/02/2000WO2000065306A1 Method of measuring film thickness
11/02/2000WO2000018980A9 An in-line sputter deposition system
11/02/2000WO1999067808A9 High sputter, etch resistant window for plasma processing chambers
11/02/2000EP1049133A2 Enhancing adhesion of deposits on exposed surfaces in process chamber
11/02/2000EP1049132A1 Method and apparatus for imaging a surface potential
11/02/2000EP1049131A1 Particle beam apparatus for tilted observation of a specimen
11/02/2000EP1048071A1 Integrated circuit rewiring using gas-assisted fib etching
11/02/2000EP0809857B1 Generator of ribbon-shaped ion beam
11/02/2000DE19918790A1 High frequency electrical transmission, for use with high frequency generator, e.g. 13.56 MHz, includes a waveguide in the transfer path such that the high frequency is transferred in the form of helical waves
11/02/2000DE10011666A1 Charged particle beam exposure apparatus for integrated circuit manufacture shortens settling time to point at which beam has bean deflected to defined position
11/02/2000CA2367493A1 Method for decontaminating yeast
11/01/2000CN1271870A Mask used in electron beam exposure and manufacturing method and manufacturing method of semi-conductor device
11/01/2000CN1271784A Method of depositing film on substrate surface and substrate made by said method
10/2000
10/31/2000US6140773 Automated control of linear constricted plasma source array
10/31/2000US6140657 Sterilization by low energy electron beam
10/31/2000US6140656 Ion implantation apparatus, ion implantation method and semiconductor device
10/31/2000US6140655 Method for water vapor enhanced charged-particle-beam machining
10/31/2000US6140654 Charged beam lithography apparatus and method thereof
10/31/2000US6140645 Transmission electron microscope having energy filter
10/31/2000US6140644 Inspection apparatus and method using a particle beam
10/31/2000US6140642 Imaging energy filter equipped with distortion corrector
10/31/2000US6140021 Charged particle beam transfer method
10/31/2000US6139964 Plasma enhancement apparatus and method for physical vapor deposition
10/31/2000US6139923 Method and apparatus for reducing particle contamination in a substrate processing chamber
10/31/2000US6139706 Sputter cathode
10/31/2000US6139696 Method and apparatus for forming a layer on a substrate
10/31/2000US6139681 Plasma assisted process vessel cleaner
10/31/2000US6139679 Coil and coil feedthrough
10/31/2000CA2214921C Apparatus for depositing barrier film on three dimensional articles
10/26/2000WO2000063947A1 Temperature controller for plasma processing
10/26/2000WO2000063943A1 Large area atmospheric-pressure plasma jet
10/26/2000DE19900437A1 Surface coating and/or implantation of solid objects or human or animal tissue is carried out using one or more laser beams coaxial with ion beam from electron cyclotron resonance ion source
10/26/2000CA2370991A1 Large area atmospheric-pressure plasma jet
10/25/2000EP1047289A2 RF plasma source for material processing
10/25/2000EP1047119A2 Process of crystallizing semiconductor thin film and laser irradiation system
10/25/2000EP1047105A2 Ion implanter
10/25/2000EP1047104A1 Apparatus for particle beam induced modification of a specimen
10/25/2000EP1047103A2 ION implant dose control
10/25/2000EP1047102A2 Ion implanter with vacuum piston counterbalance
10/25/2000EP1047101A2 Ion implanter
10/25/2000EP1046881A1 Alignment and handover calibration with hole shadows and ion implanter with e-chuck and gripper
10/25/2000EP1046827A2 Apparatus for reducing distortion in fluid bearing surfaces
10/25/2000EP1046729A1 CVD processing chamber
10/25/2000EP1046727A2 Method of film deposition on substrate surface and substrate produced by the method
10/25/2000EP1046186A1 Plasma treatment for producing electron emitters
10/25/2000EP1046185A1 Projection lithography device utilizing charged particles
10/25/2000EP1046184A1 Quadrupole device for projection lithography by means of charged particles
10/25/2000EP1046183A1 Ion implantation device arranged to select neutral ions from the ion beam
10/25/2000CN1271461A Method and device for pattern writing by an electron beam
10/25/2000CN1271460A Improvement relating to charged particle beam
10/25/2000CN1271176A Electronic beam photetching process and its device
10/24/2000US6138054 Control system employing fiber optic communication link for semiconductor processing apparatus
10/24/2000US6137231 Constricted glow discharge plasma source
10/24/2000US6137120 Semiconductor device and method of fabricating the same
10/24/2000US6137113 Electron beam exposure method and apparatus
10/24/2000US6137112 Time of flight energy measurement apparatus for an ion beam implanter
10/24/2000US6137111 Charged particle-beam exposure device and charged-particle-beam exposure method
10/24/2000US6136721 Method and apparatus for dry etching
10/24/2000US6136720 Plasma processing tools dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers
10/24/2000US6136388 Substrate processing chamber with tunable impedance
10/24/2000US6136387 A plasma processing system, for attracting only positive ions from a plasma and repelling electrons and negative ions to the plasma, thereby forming a positive ion flow directed toward a target object
10/24/2000US6136256 Method and apparatus for controlling dust particle agglomerates
10/24/2000US6136214 Plasma processing method and apparatus
10/24/2000US6136167 Portable apparatus for thin deposition
10/24/2000US6136166 Apparatus for producing a uniform magnetic field over a large surface area of a wafer
10/24/2000US6136165 Apparatus for inductively-coupled-plasma-enhanced ionized physical-vapor deposition
10/24/2000US6136164 Apparatus for detecting position of collimator in sputtering processing chamber
10/24/2000US6136140 Plasma processing apparatus
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