| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/05/2000 | US6156663 Method and apparatus for plasma processing |
| 12/05/2000 | US6156657 Pressing substrate onto holder in film forming apparatus; heating with lamp; separately introducing two active substances; vaporizing; forming metal film and depositing on substrate; exhausting unreacted active substances |
| 12/05/2000 | US6156464 Scanning-type charged-particle beam exposure methods including scan-velocity error detection and correction |
| 12/05/2000 | US6156172 Facing target type sputtering apparatus |
| 12/05/2000 | US6156170 Magnetron sputtering apparatus |
| 12/05/2000 | US6156162 Power supply for dielectric barrier discharge plasma |
| 12/05/2000 | US6156154 Apparatus for etching discs and pallets prior to sputter deposition |
| 12/05/2000 | US6156152 Plasma processing apparatus |
| 12/05/2000 | US6156151 Plasma processing apparatus |
| 12/05/2000 | US6155542 Vibration damping apparatus and method |
| 12/05/2000 | US6155203 Apparatus for control of deposit build-up on an inner surface of a plasma processing chamber |
| 12/05/2000 | US6155202 Plasma processing apparatus, matching box, and feeder |
| 12/05/2000 | US6155201 Plasma processing apparatus and plasma processing method |
| 12/05/2000 | US6155200 ECR plasma generator and an ECR system using the generator |
| 12/05/2000 | US6155199 Parallel-antenna transformer-coupled plasma generation system |
| 12/05/2000 | US6155198 A vapor deposition processing chamber comprising a radio frequency signal connected to a showerhead and a second radio frequency signal connected to a wafer support |
| 11/30/2000 | WO2000072355A1 Apparatus and methods for secondary electron emission microscopy with dual beam |
| 11/30/2000 | WO2000072048A1 Faraday cup for determination of power density distribution of electron beams |
| 11/30/2000 | WO2000071774A1 Vacuum treatment installation and method for producing workpieces |
| 11/30/2000 | DE19924266A1 Target transport system, for replacing used cathodic sputtering targets, comprises an angle-piece which can pivot about a vertical axis for target transfer to outside a vessel |
| 11/30/2000 | DE19924094A1 Vacuum arc evaporator, for coating substrates with electrical, electronic or optical metal or metal compound layers, has an insulated anode surrounded on all sides by evaporated cathode material |
| 11/30/2000 | DE19923018A1 Plasma treatment apparatus, for strip materials or linked individual flat substrates, comprises a screened rectangular passage with a wound internal conductor enclosing a moving workpiece |
| 11/30/2000 | DE19922498A1 Vorrichtung zum einseitigen Ätzen einer Halbleiterscheibe Device for one-sided etching of a semiconductor wafer |
| 11/30/2000 | DE10025589A1 Stage apparatus for holding workpiece e.g. semiconductor wafer has magnetic motor for moving stage along X-axis and nonmagnetic motor for moving stage along Y-axis |
| 11/29/2000 | EP1056114A2 Ion implantation apparatus |
| 11/29/2000 | EP1056113A2 Ion implanter and a method of implanting ions |
| 11/29/2000 | EP1055250A1 Plasma processing apparatus |
| 11/29/2000 | EP1055249A1 Plasma assisted processing chamber with separate control of species density |
| 11/29/2000 | EP1055013A1 Cathode arc vapor deposition |
| 11/29/2000 | EP0840551A4 Microwave cvd method for deposition of robust barrier coatings |
| 11/29/2000 | EP0755547A4 Ultrahigh vacuum focused ion beam micromill and articles therefrom |
| 11/29/2000 | EP0746870B1 Irradiation system utilizing conveyor-transported article carriers |
| 11/29/2000 | CN1274823A Gas-conveying quantitative distributing pipe |
| 11/29/2000 | CN1058998C Integrated sputter target assembly and manufacture thereof |
| 11/28/2000 | US6153977 ECR type plasma generating apparatus |
| 11/28/2000 | US6153891 Method and apparatus providing a circuit edit structure through the back side of an integrated circuit die |
| 11/28/2000 | US6153885 Toroidal charged particle deflector with high mechanical stability and accuracy |
| 11/28/2000 | US6153849 Method and apparatus for preventing etch rate drop after machine idle in plasma etch chamber |
| 11/28/2000 | US6153340 Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects |
| 11/28/2000 | US6153115 Monitor of plasma processes with multivariate statistical analysis of plasma emission spectra |
| 11/28/2000 | US6153068 Parallel plate sputtering device with RF powered auxiliary electrodes and applied external magnetic field |
| 11/28/2000 | US6153067 Method for combined treatment of an object with an ion beam and a magnetron plasma with a combined magnetron-plasma and ion-beam source |
| 11/28/2000 | US6152071 High-frequency introducing means, plasma treatment apparatus, and plasma treatment method |
| 11/27/2000 | CA2273294A1 Magnetron sputtering gun |
| 11/23/2000 | WO2000070668A1 Etching end-point detecting method |
| 11/23/2000 | WO2000070659A1 Plasma processing methods and apparatus |
| 11/23/2000 | WO2000070646A1 Secondary electron spectroscopy method and system |
| 11/23/2000 | WO2000070117A1 Low-temperature compatible wide-pressure-range plasma flow device |
| 11/22/2000 | EP1054443A2 Wafer etching method |
| 11/22/2000 | EP1054438A2 System and method for cleaning silicon-coated surfaces in an ion implanter |
| 11/22/2000 | EP1054436A2 Device for etching a single side of a wafer |
| 11/22/2000 | EP1054433A1 Plasma doping system and plasma doping method |
| 11/22/2000 | EP1054432A1 Device for plasma polymerizing batches of hollow workpieces in plural pieces processing |
| 11/22/2000 | EP1054311A1 Gas delivery metering tube |
| 11/22/2000 | EP1053660A1 Device for producing a free cold plasma jet |
| 11/22/2000 | EP1053563A1 Methods for reducing mask erosion during plasma etching |
| 11/22/2000 | EP1053562A1 Focused particle beam systems and methods using a tilt column |
| 11/22/2000 | CN1274395A Dual frequency excitation of plasma for film deposition |
| 11/21/2000 | USRE36964 Device manufacture involving lithographic processing |
| 11/21/2000 | US6151532 Method and apparatus for predicting plasma-process surface profiles |
| 11/21/2000 | US6151101 Charged-particle-beam projection-exposure apparatus and methods exhibiting increased throughtput |
| 11/21/2000 | US6150763 Inductively-coupled high density plasma producing apparatus and plasma processing equipment provided with the same |
| 11/21/2000 | US6150762 Method of manufacturing cathode for plasma etching apparatus using chemical surface treatment with potassium hydroxide (KOH), and cathode manufactured thereby |
| 11/21/2000 | US6150755 Charged particle source with liquid electrode |
| 11/21/2000 | US6150657 Energy filter and electron microscope equipped with the energy filter |
| 11/21/2000 | US6150628 Toroidal low-field reactive gas source |
| 11/21/2000 | US6150280 Electron-beam cell projection aperture formation method |
| 11/21/2000 | US6149784 Sputtering chamber shield promoting reliable plasma ignition |
| 11/21/2000 | US6149783 Vacuum treatment apparatus |
| 11/21/2000 | US6149776 Copper sputtering target |
| 11/21/2000 | US6149761 Etching apparatus and etching system using the method thereof |
| 11/21/2000 | US6149760 Plasma processing apparatus |
| 11/21/2000 | US6149730 Apparatus for forming films of a semiconductor device, a method of manufacturing a semiconductor device, and a method of forming thin films of a semiconductor |
| 11/21/2000 | US6148765 Electrode for plasma processes and method for manufacture and use thereof |
| 11/21/2000 | CA2308758A1 Gas delivery metering tube |
| 11/16/2000 | WO2000068986A1 Method and apparatus for vacuum treatment |
| 11/16/2000 | WO2000068985A1 Apparatus for plasma processing |
| 11/16/2000 | WO2000068970A1 Electron beam apparatus, and inspection of electron gun |
| 11/16/2000 | WO2000068451A2 Magnetron negative ion sputter source |
| 11/16/2000 | WO2000039838A3 Method for igniting a plasma inside a plasma processing reactor |
| 11/15/2000 | EP1052681A2 A method and apparatus for processing wafers |
| 11/15/2000 | EP1052680A1 Pulse mode electron generator |
| 11/15/2000 | EP1052679A1 Corpuscular beam device |
| 11/15/2000 | EP1052678A2 Electron guns for lithography tools |
| 11/15/2000 | EP1052677A2 Electron emitters for lithography tools |
| 11/15/2000 | EP1052676A2 System and method for cleaning contaminated surfaces in an ion implanter |
| 11/15/2000 | EP1052672A1 Time-of-flight mass spectrometer ion source for gas sample analysis |
| 11/15/2000 | EP1052419A2 Apparatus for reducing distortion in fluidbearing surfaces |
| 11/15/2000 | EP1051729A1 Plasma reactor |
| 11/15/2000 | EP1012863A4 Glow plasma discharge device |
| 11/14/2000 | US6147452 AC glow plasma discharge device having an electrode covered with apertured dielectric |
| 11/14/2000 | US6147355 Pattern forming method |
| 11/14/2000 | US6146797 Focused ion beam lithography method with sample inspection through oblique angle tilt |
| 11/14/2000 | US6146724 A laminate comprising a silicon oxide barrier layer, forming a container, such that the barrier layer is on the interior of the container; gas impermeability, resists impact, and resists abrasion |
| 11/14/2000 | US6146714 Method of forming metal, ceramic or ceramic/metal layers on inner surfaces of hollow bodies using pulsed laser deposition |
| 11/14/2000 | US6146509 Inverted field circular magnetron sputtering device |
| 11/14/2000 | US6146508 Sputtering method and apparatus with small diameter RF coil |
| 11/14/2000 | US6146492 Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning method |
| 11/14/2000 | US6146462 Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
| 11/14/2000 | US6145469 Plasma processing apparatus and processing method |