| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/28/2000 | WO2000079839A1 Method and apparatus for forming polycrystalline particles |
| 12/28/2000 | WO2000079579A2 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 12/28/2000 | WO2000079568A2 Plasma reactor with multiple small internal inductive antennas |
| 12/28/2000 | WO2000079567A1 Process and apparatus for implanting oxygen ions silicon wafers |
| 12/28/2000 | WO2000079566A1 Alignment of low-energy electron beams using magnetic fields |
| 12/28/2000 | WO2000079565A1 Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current |
| 12/28/2000 | WO2000079564A2 Plasma reactor with internal inductive antenna capable of generating helicon wave |
| 12/28/2000 | WO2000079342A2 Pyrometric dose correction for proximity heating of resists during electron beam lithography |
| 12/28/2000 | WO2000052731A3 Goniometer |
| 12/28/2000 | DE19928876A1 Vorrichtung zur lokalen Erzeugung eines Plasmas in einer Behandlungskammer durch Mikrowellenanregung Device for local generation of a plasma in a treatment chamber by microwave excitation |
| 12/28/2000 | CA2376015A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 12/28/2000 | CA2375847A1 Method and apparatus for forming polycrystalline particles |
| 12/27/2000 | EP1063691A2 A dry-etching method and an equipment for dry-etching |
| 12/27/2000 | EP1063690A1 Plasma processing apparatus and plasma processing method |
| 12/27/2000 | EP1063679A1 Erosion profile compensated magnetron with moving magnet assembly |
| 12/27/2000 | EP1063678A2 Device for microwave powered plasma generation in a cavity |
| 12/27/2000 | EP1063677A1 Charged particle beam device |
| 12/27/2000 | EP1063676A2 Device and procedure for energy and angle selected electron spectroscopy |
| 12/27/2000 | EP1063670A2 Bonded article with improved work function uniformity and method for making the same |
| 12/27/2000 | EP1063669A2 Cathode with improved work function and method for making the same |
| 12/27/2000 | EP1062679A1 Plasma etching installation |
| 12/27/2000 | EP1062678A2 Method and system for silicon microlens cleaning |
| 12/27/2000 | CN1060000C Multi-azimuth monitor with mini optical fibre rod |
| 12/26/2000 | US6166387 Electron beam exposure apparatus and method |
| 12/26/2000 | US6166386 Micro-processing method using a probe |
| 12/26/2000 | US6166380 Resolving power evaluation method and specimen for electron microscope |
| 12/26/2000 | US6165377 Plasma etching method and apparatus |
| 12/26/2000 | US6165334 Dry etching apparatus |
| 12/26/2000 | US6165313 Downstream plasma reactor system with an improved plasma tube sealing configuration |
| 12/26/2000 | US6165311 Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 12/26/2000 | US6165274 Plasma processing apparatus and method |
| 12/26/2000 | US6164241 Multiple coil antenna for inductively-coupled plasma generation systems |
| 12/26/2000 | US6164240 Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field |
| 12/21/2000 | WO2000077819A1 Electrostatic corrector for eliminating the chromatic aberration of particle lenses |
| 12/21/2000 | WO2000077504A1 Electrically-charged particle energy analysers |
| 12/21/2000 | WO2000077273A1 Inverted field circular magnetron sputtering device |
| 12/21/2000 | WO2000076583A1 Method apparatus and article of manufacture for a branding diamond branding with a focused ion beam |
| 12/21/2000 | DE19958857A1 Sputtering cathode has a cathode base body which has cooling medium chambers covered by targets |
| 12/21/2000 | DE19926927A1 Elektrostatischer Korrektor zur Beseitigung des Farbfehlers von Teilchenlinsen Electrostatic corrector to eliminate the chromatic aberration of particle lenses |
| 12/20/2000 | EP1061551A2 Scanning charged-particle beam instrument and method of observing specimen image therewith |
| 12/20/2000 | EP1061550A2 System and method for cleaning contaminated surfaces in an ion implanter |
| 12/20/2000 | EP1061358A2 Apparatus and method for reviewing defects on an object |
| 12/20/2000 | EP1060501A1 Method and apparatus for predicting plasma-process surface profiles |
| 12/20/2000 | EP1060500A1 An apparatus and method for controlling a beam shape |
| 12/20/2000 | EP1060499A1 Device and method for forming lithographic patterns using an interferometer |
| 12/20/2000 | EP1060498A1 A method and apparatus that determines charged particle beam shape codes |
| 12/20/2000 | EP1060288A1 Pcvd apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 12/20/2000 | EP0737256B1 Microwave plasma reactor |
| 12/19/2000 | US6163033 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 12/19/2000 | US6163007 Microwave plasma generating apparatus with improved heat protection of sealing O-rings |
| 12/19/2000 | US6163006 Permanent magnet ECR plasma source with magnetic field optimization |
| 12/19/2000 | US6162709 Use of an asymmetric waveform to control ion bombardment during substrate processing |
| 12/19/2000 | US6162581 Shaping aperture image can be vibrated |
| 12/19/2000 | US6162566 Includes a thin-film portion having an aperture pattern forming region and a supporting frame portion; for use in electron-beam exposure, ion-beam exposure, x-ray exposure |
| 12/19/2000 | US6162405 Metal can with walls with an electroconductive layer, a reactor for the container, a vacuum pump connected to the reactor and internal and external electrode to connected to the layer; high potential difference; efficient |
| 12/19/2000 | US6162332 Grounding detection circuit |
| 12/19/2000 | US6162323 Plasma processing apparatus |
| 12/19/2000 | US6162008 Wafer orientation sensor |
| 12/19/2000 | US6161499 Apparatus and method for nucleation and deposition of diamond using hot-filament DC plasma |
| 12/19/2000 | US6161498 Plasma processing device and a method of plasma process |
| 12/14/2000 | WO2000075974A1 Method for engraving a thin dielectric layer on a silicon substrate and equipment for carrying out said method |
| 12/14/2000 | WO2000075973A1 Plasma processing device, window member for the plasma processing device and electrode plate for the plasma processing device |
| 12/14/2000 | WO2000075970A1 Substrate support for plasma processing |
| 12/14/2000 | WO2000075969A1 Wafer orientation sensor |
| 12/14/2000 | WO2000075955A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 12/14/2000 | WO2000075954A2 Apparatus and method for forming a charged particle beam of arbitrary shape |
| 12/14/2000 | WO2000075393A2 Carbon plasma pulsed source |
| 12/14/2000 | WO2000075281A2 Supercritical fluid-assisted nebulization and bubble drying |
| 12/14/2000 | WO2000040292A3 Method and apparatus for imaging through 3-dimensional tracking of protons |
| 12/14/2000 | CA2375677A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 12/13/2000 | EP1058944A1 Cooling system with antifreeze for cooling magnetron for process chamber of processing system |
| 12/13/2000 | EP1058943A1 Sem for transmission operation with a location-sensitive detector |
| 12/13/2000 | CN1276625A Charging measuring device |
| 12/13/2000 | CN1059474C Collimator and mfg. method therefor |
| 12/12/2000 | US6160350 Ion plating apparatus |
| 12/12/2000 | US6160262 Method and apparatus for deflecting charged particles |
| 12/12/2000 | US6159867 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 12/12/2000 | US6159644 Method of fabricating semiconductor circuit devices utilizing multiple exposures |
| 12/12/2000 | US6159351 Magnet array for magnetrons |
| 12/12/2000 | US6159332 System for etching polysilicon in fabricating semiconductor device |
| 12/12/2000 | US6159297 Semiconductor process chamber and processing method |
| 12/12/2000 | US6158384 Plasma reactor with multiple small internal inductive antennas |
| 12/12/2000 | US6158383 Plasma processing method and apparatus |
| 12/07/2000 | WO2000074127A1 Plasma process device |
| 12/07/2000 | WO2000074098A1 Thin-film electron source, display and device |
| 12/07/2000 | WO2000073531A2 Copper sputtering target assembly and method of making same |
| 12/07/2000 | DE19925577A1 Magnetron cathode for coating surfaces of substrates consists of an annular target with a plate-like configuration arranged around a central part of a first yoke part arranged as a stator |
| 12/06/2000 | EP1058489A2 Method and apparatus for generating a plasma |
| 12/06/2000 | EP1058287A2 Magnetic energy filter |
| 12/06/2000 | EP1057207A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods |
| 12/06/2000 | EP1057206A1 Low pressure inductively coupled high density plasma reactor |
| 12/06/2000 | EP1057205A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 12/06/2000 | EP1057204A1 Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope |
| 12/06/2000 | EP1057203A1 Particle-optical apparatus involving detection of auger electrons |
| 12/06/2000 | EP1057202A1 Method and device for exposing a substrate to light |
| 12/06/2000 | CN1275937A Apparatus and method for adjusting density distribution of a plasma |
| 12/05/2000 | US6157867 Method and system for on-line monitoring plasma chamber condition by comparing intensity of certain wavelength |
| 12/05/2000 | US6157039 Charged particle beam illumination of blanking aperture array |
| 12/05/2000 | US6157032 Sample shape determination by measurement of surface slope with a scanning electron microscope |
| 12/05/2000 | US6156667 Methods and apparatus for plasma processing |