| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/23/2001 | US6176982 Method of applying a coating to a metallic article and an apparatus for applying a coating to a metallic article |
| 01/23/2001 | US6176981 Wafer bias ring controlling the plasma potential in a sustained self-sputtering reactor |
| 01/23/2001 | US6176979 At least two surfaces of electro-conductive material are exposed to the vacuum atmosphere atlest one being inpart covered with a material of lower electroconductivity than the material of surface |
| 01/23/2001 | US6176969 Baffle plate of dry etching apparatus for manufacturing semiconductor devices |
| 01/23/2001 | US6176967 Reactive ion etch chamber wafer masking system |
| 01/23/2001 | US6176933 End point window assembly in an etching apparatus for fabricating semiconductor devices |
| 01/23/2001 | US6176198 Apparatus and method for depositing low K dielectric materials |
| 01/23/2001 | US6176122 Cantilever unit and scanning probe microscope utilizing the cantilever unit |
| 01/18/2001 | WO2001005197A2 High-speed symmetrical plasma treatment system |
| 01/18/2001 | WO2001005020A1 Radio frequency power source for generating an inductively coupled plasma |
| 01/18/2001 | WO2001004931A2 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 01/18/2001 | WO2001004927A2 Methodologies to reduce process sensitivity to the chamber wall condition |
| 01/18/2001 | WO2001004926A1 Methods and apparatus for alignment of ion beam systems using beam current sensors |
| 01/18/2001 | WO2001004611A2 Method and apparatus for enhancing yield of secondary ions |
| 01/18/2001 | WO2000062327A3 Rectangular cathodic arc source and method of steering an arc spot |
| 01/18/2001 | WO2000057450A3 Magnetic immersion lense with detection arrangement |
| 01/18/2001 | DE19925493C1 Linear ausgedehnte Anordnung zur großflächigen Mikrowellenbehandlung und zur großflächigen Plasmaerzeugung Linear extended array for large-scale microwave treatment and for large-scale plasma generation |
| 01/17/2001 | EP1069603A1 Processing apparatus |
| 01/17/2001 | EP1069593A2 Electron microscope |
| 01/17/2001 | EP1068633A1 Method and device for specifically manipulating and depositing particles |
| 01/17/2001 | EP1068632A1 Contamination controlling method and plasma processing chamber |
| 01/17/2001 | EP1068631A1 Use of variable impedance having rotating core to control coil sputter distribution |
| 01/17/2001 | EP1068630A1 Scanning electron microscope |
| 01/17/2001 | CN1280705A Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| 01/17/2001 | CN1280657A Gas panel |
| 01/17/2001 | CN1280631A Apparatus for surface modification of polymer, metal and ceramic materials using ion bean |
| 01/16/2001 | US6175585 Electron beam shielding apparatus and methods for shielding electron beams |
| 01/16/2001 | US6175183 Device for producing plasma |
| 01/16/2001 | US6175122 Method for writing a pattern using multiple variable shaped electron beams |
| 01/16/2001 | US6175121 Block mask and charged particle beam exposure method and apparatus using the same |
| 01/16/2001 | US6175095 Resonant impedance-matching slow-wave ring structure microwave applicator for plasmas |
| 01/16/2001 | US6174450 Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
| 01/16/2001 | US6174407 Apparatus and method for detecting an endpoint of an etching process by transmitting infrared light signals through a semiconductor wafer |
| 01/16/2001 | US6174377 Processing chamber for atomic layer deposition processes |
| 01/16/2001 | US6173674 Plasma reactor with a deposition shield |
| 01/11/2001 | WO2001003159A1 Gas distribution apparatus for semiconductor processing |
| 01/11/2001 | WO2001003158A1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 01/11/2001 | WO2001003157A1 Object inspection and/or modification system and method |
| 01/11/2001 | WO2001003155A1 Method and apparatus for simultaneously depositing and observing materials on a target |
| 01/11/2001 | WO2001003145A1 Apparatus and method for examining specimen with a charged particle beam |
| 01/11/2001 | WO2001002619A1 Sputtering device and film forming method |
| 01/11/2001 | WO2001002618A1 Magnetron unit and sputtering device |
| 01/11/2001 | WO2001002082A1 Electron beam irradiation apparatus and method |
| 01/11/2001 | WO2000052973A3 Plasma reactor having a helicon wave high density plasma source |
| 01/11/2001 | DE19928053A1 Arrangement for generating low temperature plasma with corona discharge supported by magnetic field uses pulsed voltages with frequency below 100 kHz between electrodes, cathodes |
| 01/10/2001 | EP1067578A2 Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance |
| 01/10/2001 | EP1067577A2 Sputtering reactor and method of using an unbalanced magnetron |
| 01/10/2001 | EP1067576A2 Energy filter and electron microscope using the same |
| 01/09/2001 | US6172372 Scanning system with linear gas bearings and active counter-balance options |
| 01/09/2001 | US6172365 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 01/09/2001 | US6172364 Charged particle beam irradiation apparatus |
| 01/09/2001 | US6172363 Method and apparatus for inspecting integrated circuit pattern |
| 01/09/2001 | US6172321 Method and apparatus for plasma processing apparatus |
| 01/09/2001 | US6171760 Lithography method and system in which a photoresist film is irradiated with light while the charged particle beam is applied |
| 01/09/2001 | US6171461 Sputtering cathode |
| 01/09/2001 | US6171438 Plasma processing apparatus and plasma processing method |
| 01/09/2001 | US6171165 Precision alignment of microcolumn tip to a micron-size extractor aperture |
| 01/09/2001 | US6170492 Monitoring a position of a valve regulating a gas outlet of the chamber; in the process of making integrated circuit and flat panel display fabrication |
| 01/09/2001 | US6170432 Showerhead electrode assembly for plasma processing |
| 01/09/2001 | US6170431 Plasma reactor with a deposition shield |
| 01/09/2001 | US6170430 Gas feedthrough with electrostatic discharge characteristic |
| 01/09/2001 | US6170429 Chamber liner for semiconductor process chambers |
| 01/09/2001 | US6170428 Symmetric tunable inductively coupled HDP-CVD reactor |
| 01/09/2001 | CA2069329C Method for coating substrates with silicon based compounds |
| 01/04/2001 | WO2001001467A1 Method and apparatus for processing fine particle dust in plasma |
| 01/04/2001 | WO2001001445A1 Techniques for improving etch rate uniformity |
| 01/04/2001 | WO2001001444A1 Elevated stationary uniformity ring |
| 01/04/2001 | WO2001001443A1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 01/04/2001 | WO2001001442A1 A plasma reaction chamber component having improved temperature uniformity |
| 01/04/2001 | WO2001001441A1 Plasma processing system, apparatus, and method for delivering rf power to a plasma processing chamber |
| 01/04/2001 | WO2001001440A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 01/04/2001 | WO2001001439A1 Charged particle device |
| 01/04/2001 | WO2001001438A1 Ion beam generation apparatus |
| 01/04/2001 | WO2001000900A1 Device for monitoring intended or unavoidable layer deposits and corresponding method |
| 01/04/2001 | WO2000052732A3 Active species control with time-modulated plasma |
| 01/04/2001 | DE19929185A1 Vorrichtung und Verfahren zur energie- und winkelaufgelösten Elektronenspektroskopie Apparatus and method for energy- and angle-resolved electron spectroscopy |
| 01/04/2001 | DE19927806A1 Vorrichtung und Verfahren zum Hochratenätzen eines Substrates mit einer Plasmaätzanlage und Vorrichtung und Verfahren zum Zünden eines Plasmas und Hochregeln oder Pulsen der Plasmaleistung Apparatus and method for Hochratenätzen a substrate with a plasma etching system and apparatus and method for igniting a plasma and high rules or pulsing the plasma power |
| 01/04/2001 | DE10029840A1 Schottky emission cathode used in electron beam lithography has a heating wire, a single crystal needle, and a supply of zirconium dioxide and a phase-stabilizing element |
| 01/03/2001 | EP1065696A2 Ion implantation apparatus and ion source and ion source subassembly for use in ion implantation apparatus |
| 01/03/2001 | EP1065502A1 Method for carrying out the electrical breakdown of a gaseous dielectric in a highly non-uniform field |
| 01/03/2001 | EP1065295A1 Plasma cleaning method for processing chambers |
| 01/03/2001 | EP1064713A2 Exposure device having a planar motor |
| 01/03/2001 | EP1064672A1 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
| 01/03/2001 | EP1064671A1 An apparatus and method for generating plasma |
| 01/03/2001 | EP1064670A1 Sputtering apparatus with a coil having overlapping ends |
| 01/03/2001 | EP1064536A2 Method for enhancing the contrast for a transmission electron microscope |
| 01/03/2001 | EP1064416A1 Method and apparatus for deposition and etching of a dielectric layer |
| 01/03/2001 | EP0828618A4 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 01/03/2001 | EP0746857A4 Scanning probe microscope |
| 01/03/2001 | CN1278750A All-surface biosable and/or temperatures-controlled electrostatically-shielded rf plasma source |
| 01/02/2001 | US6169288 Laser ablation type ion source |
| 01/02/2001 | US6169015 Method and apparatus for controlling the dosage of ions implanted into a semiconductor wafer |
| 01/02/2001 | US6168698 Apparatus for coating a substrate |
| 01/02/2001 | US6168696 Non-knurled induction coil for ionized metal deposition, sputtering apparatus including same, and method of constructing the apparatus |
| 01/02/2001 | US6168690 Methods and apparatus for physical vapor deposition |
| 01/02/2001 | US6167837 Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor |
| 01/02/2001 | US6167836 Plasma-enhanced chemical vapor deposition apparatus |
| 01/02/2001 | US6167835 Two chamber plasma processing apparatus |
| 12/28/2000 | WO2000079844A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 12/28/2000 | WO2000079843A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |