| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/13/2001 | US6188071 Feedback method for increasing stability of electron beams |
| 02/13/2001 | US6187160 Apparatus for the coating of substrates in a vacuum chamber |
| 02/13/2001 | US6187158 Device for coating plate-shaped substrates |
| 02/13/2001 | US6187072 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
| 02/13/2001 | US6186091 Shielded platen design for plasma immersion ion implantation |
| 02/13/2001 | US6186090 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 02/13/2001 | US6185839 Semiconductor process chamber having improved gas distributor |
| 02/08/2001 | WO2001009923A1 Integrated electron gun and electronics module |
| 02/08/2001 | WO2001009922A1 Electrostatic alignment of a charged particle beam |
| 02/08/2001 | WO2001009921A1 Minimization of electron fogging in electron beam lithography |
| 02/08/2001 | WO2001009920A1 Electron beam column using high numerical aperture illumination of the photocathode |
| 02/08/2001 | WO2001009918A1 Enhanced electron emissive surfaces for a thin film deposition system using ion sources |
| 02/08/2001 | WO2001009916A1 Microcolumn assembly using laser spot welding |
| 02/08/2001 | WO2001009915A1 Diamond supported photocathodes for electron sources |
| 02/08/2001 | WO2001009913A2 Patterned heat conducting photocathode for electron beam source |
| 02/08/2001 | WO2001001443B1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 02/08/2001 | DE10024634A1 Electron beam patterning apparatus for use in manufacture of semiconductor device, sets up adjusting value of shaping lens such that detected position slippage of electron beam is minimum |
| 02/07/2001 | EP1074025A2 X-ray diagnostic system |
| 02/07/2001 | EP1073779A1 Reduced impedance chamber |
| 02/07/2001 | CN1283076A Electrode used for producing plasme body, plasma body processing equipment using said dectrode and plasma body processing using said equipment |
| 02/06/2001 | US6184975 Electrostatic device for correcting chromatic aberration in a particle-optical apparatus |
| 02/06/2001 | US6184687 Plasma process end point determination method and apparatus, and plasma evaluation method and apparatus |
| 02/06/2001 | US6184625 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 02/06/2001 | US6184624 Ion source |
| 02/06/2001 | US6184623 Method for controlling plasma-generating high frequency power, and plasma generating apparatus |
| 02/06/2001 | US6184536 Ion implantation process |
| 02/06/2001 | US6184533 Scanning probe microscope with the stage unit |
| 02/06/2001 | US6184532 Ion source |
| 02/06/2001 | US6184526 Apparatus and method for inspecting predetermined region on surface of specimen using electron beam |
| 02/06/2001 | US6184525 Environmental SEM with a multiple fields for improved secondary electron detection |
| 02/06/2001 | US6184524 Automated set up of an energy filtering transmission electron microscope |
| 02/06/2001 | US6184519 Surface analyzing apparatus with anti-vibration table |
| 02/06/2001 | US6184489 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
| 02/06/2001 | US6184488 Low inductance large area coil for an inductively coupled plasma source |
| 02/06/2001 | US6184146 Plasma producing tools, dual-source plasma etchers, dual-source plasma etching methods, and method of forming planar coil dual-source plasma etchers |
| 02/06/2001 | US6183614 Rotating sputter magnetron assembly |
| 02/06/2001 | US6183612 Sputtering cathode |
| 02/06/2001 | US6183605 Sputtering dielectrics |
| 02/06/2001 | US6182851 Vacuum processing chambers and method for producing |
| 02/06/2001 | US6182605 Apparatus for particle beam induced modification of a specimen |
| 02/06/2001 | US6182604 Hollow cathode for plasma doping system |
| 02/06/2001 | US6182603 Surface-treated shower head for use in a substrate processing chamber |
| 02/06/2001 | US6182602 Inductively coupled HDP-CVD reactor |
| 02/06/2001 | US6182369 Pattern forming apparatus |
| 02/01/2001 | WO2001008288A2 Power supplies having protection circuits |
| 02/01/2001 | WO2000055690A3 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 02/01/2001 | DE19933842A1 Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas Apparatus and method for etching a substrate by means of an inductively coupled plasma |
| 02/01/2001 | DE19933841A1 Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas Apparatus and method for etching a substrate by means of an inductively coupled plasma |
| 02/01/2001 | DE10028327A1 Vorrichtung und Verfahren für bildformende Strahlen aus geladenen Teilchen und Bestrahlungsvorrichtung mit Strahlen aus geladenen Teilchen Apparatus and method for image-forming beams of charged particles and radiation device with beams of charged particles |
| 01/31/2001 | EP1073091A2 Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus |
| 01/31/2001 | EP1073087A2 Ion source |
| 01/31/2001 | EP1072894A2 Capacitive probe for in situ measurement of wafer DC bias voltage |
| 01/31/2001 | EP1072055A1 Means for controlling target erosion and sputtering in a magnetron |
| 01/31/2001 | EP1072054A1 Retaining ring and target and method for producing same |
| 01/31/2001 | EP1071833A2 Method and apparatus for modifying the profile of high-aspect-ratio gaps using differential plasma power |
| 01/31/2001 | CN1282384A Magnetron sputtering source |
| 01/31/2001 | CN1282095A Ion source |
| 01/30/2001 | US6181069 High frequency discharging method and apparatus, and high frequency processing apparatus |
| 01/30/2001 | US6181068 Plasma generating apparatus |
| 01/30/2001 | US6180954 Dual-walled exhaust tubing for vacuum pump |
| 01/30/2001 | US6180947 Multi-element deflection aberration correction for electron beam lithography |
| 01/30/2001 | US6180296 Focused particle beam processing for use in electronic apparatus manufacturing |
| 01/30/2001 | US6180191 Method for plasma deposition of a thin film onto a surface of a container |
| 01/30/2001 | US6180019 Plasma processing apparatus and method |
| 01/30/2001 | US6179974 Apparatus and methods for sputtering |
| 01/30/2001 | US6179973 Apparatus and method for controlling plasma uniformity across a substrate |
| 01/30/2001 | US6179955 Dry etching apparatus for manufacturing semiconductor devices |
| 01/30/2001 | US6178920 Plasma reactor with internal inductive antenna capable of generating helicon wave |
| 01/30/2001 | US6178919 Perforated plasma confinement ring in plasma reactors |
| 01/30/2001 | US6178918 Plasma enhanced chemical processing reactor |
| 01/30/2001 | US6178813 Vibration distortion removal for scanning probe microscopes |
| 01/25/2001 | WO2001006549A1 Exposure method and device therefor |
| 01/25/2001 | WO2001006544A2 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 01/25/2001 | WO2001006540A1 Device and method for etching a substrate using an inductively coupled plasma |
| 01/25/2001 | WO2001006539A1 Device and method for etching a substrate by means of an inductively coupled plasma |
| 01/25/2001 | WO2001006538A1 Adaptive gcib for smoothing surfaces |
| 01/25/2001 | WO2001006537A1 Electron beam shielding apparatus and methods for shielding electron beams |
| 01/25/2001 | WO2001006536A2 Scanning beam instruments |
| 01/25/2001 | WO2001006534A1 Beam source |
| 01/25/2001 | WO2001006402A1 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma |
| 01/25/2001 | WO2000060632A3 Electrostatically focused addressable field emission arraychips (afea's) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| 01/25/2001 | WO2000058995A3 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 01/25/2001 | DE10020714A1 Elektronenstrahl-Belichtungsvorrichtung Electron beam exposure apparatus |
| 01/25/2001 | CA2379913A1 Electron beam shielding apparatus and methods for shielding electron beams |
| 01/24/2001 | EP1071113A2 Plasma reactors for processing semiconductor wafers |
| 01/24/2001 | EP1071112A2 Scanning charged-particle beam instrument |
| 01/24/2001 | EP1070767A1 Method for magnetron sputtering |
| 01/24/2001 | EP1070442A1 Plasma apparatus for ion energy control |
| 01/24/2001 | EP1070342A1 Techniques for forming trenches in a silicon layer of a substrate in a high density plasma processing system |
| 01/24/2001 | EP1070336A1 Direct temperature control for a component of a substrate processing chamber |
| 01/24/2001 | EP1070335A1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 01/24/2001 | EP1070334A1 Precision alignment and assembly of microlenses and microcolumns |
| 01/24/2001 | EP1070155A1 Integrated ion implant scrubber system |
| 01/24/2001 | EP1070154A1 Method and apparatus for deposition of biaxially textured coatings |
| 01/23/2001 | US6177706 Field-effect thin-film transistor device |
| 01/23/2001 | US6177680 Correction of pattern-dependent errors in a particle beam lithography system |
| 01/23/2001 | US6177679 Ion implanter with impurity interceptor which removes undesired impurities from the ion beam |
| 01/23/2001 | US6177670 Method of observing secondary ion image by focused ion beam |
| 01/23/2001 | US6177646 Method and device for plasma treatment |
| 01/23/2001 | US6177148 For coating substrates; homogeneity of coated layer |