| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/29/2001 | WO2001022470A1 Ion beam vacuum sputtering apparatus and method |
| 03/29/2001 | WO2001022469A1 Electron-optical lens arrangement with an axis that can be largely displaced |
| 03/29/2001 | WO2001022468A1 High bandwidth recoiless microactuator |
| 03/29/2001 | WO2001022465A1 Plasma source of linear ion beam |
| 03/29/2001 | WO2001022169A1 System to reduce heat-induced distortion of photomasks during lithography |
| 03/29/2001 | WO2001021526A1 Micromanipulation method |
| 03/29/2001 | WO2000070117A8 Low-temperature compatible wide-pressure-range plasma flow device |
| 03/29/2001 | DE19947935A1 Apparatus for magnetron sputtering comprises targets surrounded by a plasma electrode open to the substrate and peripheral to its sputtering surface |
| 03/29/2001 | DE19945344A1 Teilchenoptisches Beleuchtungs- und Abbildungssystem mit einer Kondensor-Objektiv-Einfeldlinse Particle-optical illuminating and imaging system with a condenser-objective single field lens |
| 03/28/2001 | EP1087421A2 Method and apparatus for providing a stable plasma |
| 03/28/2001 | EP1087420A2 Device for particle-optical illumination and imaging comprising a single field condensor-ojective lens |
| 03/28/2001 | EP1087033A1 Extended life sputter targets |
| 03/28/2001 | EP1086482A1 Gas distribution system |
| 03/28/2001 | EP1086481A1 Chamber having improved process monitoring window |
| 03/28/2001 | EP1086480A1 Planar electron emitter (pee) |
| 03/28/2001 | EP1086260A1 Oxygen-argon gas mixture for precleaning in vacuum processing system |
| 03/28/2001 | CN1289442A Magnetic engraving method, in particular for magnetic or magneto-optical recording |
| 03/27/2001 | US6208095 Compact helical resonator coil for ion implanter linear accelerator |
| 03/27/2001 | US6208091 Current sensing in vacuum electron devices |
| 03/27/2001 | US6207965 Apparatus and method for electron beam lithography and semiconductor device |
| 03/27/2001 | US6207964 Continuously variable aperture for high-energy ion implanter |
| 03/27/2001 | US6207963 Ion beam implantation using conical magnetic scanning |
| 03/27/2001 | US6207962 Charged-particle-beam microlithography apparatus and methods exhibiting reduced thermal deformation of mark-defining member |
| 03/27/2001 | US6207959 Ion implanter |
| 03/27/2001 | US6207117 Suppressing a beam drift caused by the accumulated carbon compounds by using deflector electrodes of the beam column containing a granular or porous precious metal oxidation catalyst; drawing of high accuracy; lithography; wafers |
| 03/27/2001 | US6207029 Apparatus for vapor deposition and evaporator |
| 03/27/2001 | US6207028 Sputtering device with a cathode with permanent magnet system |
| 03/27/2001 | US6207026 Cooling system coupled to process chamber comprising cooling cavity, rotating member disposed therein having upper and lower surfaces with two or more magnet pieces disposed between surfaces, motor coupled to rotating member, deflection member |
| 03/27/2001 | US6207008 Detecting intensity of light emission; calibration |
| 03/27/2001 | US6207007 Plasma processing system |
| 03/27/2001 | US6207006 Vacuum processing apparatus |
| 03/27/2001 | US6206972 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 03/27/2001 | US6205948 Modulator for plasma-immersion ion implantation |
| 03/22/2001 | WO2001020640A1 Device and method for generating a local plasma by micro-structure electrode discharges with microwaves |
| 03/22/2001 | WO2000079342A3 Pyrometric dose correction for proximity heating of resists during electron beam lithography |
| 03/22/2001 | DE19944857A1 Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse Electron-optical lens array with wide sliding axis |
| 03/21/2001 | CN1288584A Plasma treatment for producing electron emitter |
| 03/20/2001 | US6204607 Plasma source with multiple magnetic flux sources each having a ferromagnetic core |
| 03/20/2001 | US6204606 Slotted waveguide structure for generating plasma discharges |
| 03/20/2001 | US6204604 Method and apparatus for controlling electrostatic coupling to plasmas |
| 03/20/2001 | US6204603 Coaxial resonator microwave plasma generator |
| 03/20/2001 | US6204511 Electron beam image picturing method and image picturing device |
| 03/20/2001 | US6204509 Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction |
| 03/20/2001 | US6204508 Toroidal filament for plasma generation |
| 03/20/2001 | US6204197 Semiconductor device, manufacturing method, and system |
| 03/20/2001 | US6203898 Article comprising a substrate having a silicone coating |
| 03/20/2001 | US6203862 Processing systems with dual ion sources |
| 03/20/2001 | US6203661 Brim and gas escape for non-contact wafer holder |
| 03/20/2001 | US6203657 Inductively coupled plasma downstream strip module |
| 03/20/2001 | US6203637 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair |
| 03/20/2001 | US6203620 Hermetically-sealed inductively-coupled plasma source structure and method of use |
| 03/20/2001 | US6202590 Plasma apparatus for fabricating semiconductor devices |
| 03/20/2001 | US6202589 Grounding mechanism which maintains a low resistance electrical ground path between a plate electrode and an etch chamber |
| 03/15/2001 | WO2001019144A1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 03/15/2001 | WO2001018858A1 Magnetron plasma processing apparatus |
| 03/15/2001 | WO2001018845A1 Method of determining etch endpoint using principal components analysis of optical emission spectra |
| 03/15/2001 | WO2001018844A1 Processing method using focused ion beam |
| 03/15/2001 | WO2001018843A1 Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample |
| 03/15/2001 | WO2000075393A8 Carbon plasma pulsed source |
| 03/15/2001 | DE19937859A1 Elektrische Versorgungseinheit für Plasmaanlagen Electrical supply unit for plasma systems |
| 03/15/2001 | DE19937621A1 Pulse-shaped energy supply method for low pressure plasma by aperiodically setting on and/or off times of pulses using random principle |
| 03/15/2001 | DE10004787A1 Vacuum deposition apparatus comprises a tubular magnetron and a process chamber having a lid with an open box shape with an upper side and wall sides which extend between the upper side and the upper wall of the process chamber |
| 03/14/2001 | EP1083587A2 Apparatus and method for reducing heating of a workpiece in ion implantation |
| 03/14/2001 | EP1082750A1 Pulsed ion source for ion trap mass spectrometer |
| 03/14/2001 | EP1082747A1 Acceleration and analysis architecture for ion implanter |
| 03/14/2001 | EP0865715A4 Process depending on plasma discharges sustained by inductive coupling |
| 03/14/2001 | EP0757598A4 Pulsed ion beam assisted deposition |
| 03/13/2001 | US6201598 Charged-particle-beam microlithographic exposure apparatus and reticles for use with same |
| 03/13/2001 | US6201251 Compensation of space charge in a particle beam system |
| 03/13/2001 | US6201241 Organic substance analyzer |
| 03/13/2001 | US6201240 SEM image enhancement using narrow band detection and color assignment |
| 03/13/2001 | US6201208 Method and apparatus for plasma processing with control of ion energy distribution at the substrates |
| 03/13/2001 | US6200911 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power |
| 03/13/2001 | US6200710 Methods for producing segmented reticles |
| 03/13/2001 | US6200652 Method for nucleation and deposition of diamond using hot-filament DC plasma |
| 03/13/2001 | US6200651 Forming dielectric |
| 03/13/2001 | US6200431 Reactive sputtering apparatus and process for forming thin film using same |
| 03/13/2001 | US6200415 Load controlled rapid assembly clamp ring |
| 03/13/2001 | US6200412 Chemical vapor deposition system including dedicated cleaning gas injection |
| 03/13/2001 | US6199506 Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture |
| 03/13/2001 | US6199505 Plasma processing apparatus |
| 03/13/2001 | US6199259 Autoclave bonding of sputtering target assembly |
| 03/08/2001 | WO2001016394A1 Stable high rate reactive sputtering |
| 03/08/2001 | WO2001016393A1 Method and apparatus for deposition of thin films |
| 03/08/2001 | WO2000067290A3 Integrated microcolumn and scanning probe microscope arrays |
| 03/08/2001 | DE19943741A1 Plasma assisted chemical vapor deposition of silicon nitride, from silane, ammonia, and inert carrier gas, employs optimized gas flowrates |
| 03/08/2001 | DE19941542A1 Automatic tuning method and device for HF impedance matching network for plasma process uses cyclic measurement of electrical parameters and adjustment of tuning components in alternation |
| 03/07/2001 | EP1081749A1 Protective member for inner surface of chamber and plasma processing apparatus |
| 03/07/2001 | EP1081742A2 Charged particle beam evaluation method |
| 03/07/2001 | EP1081741A2 Focusing method and system |
| 03/07/2001 | EP1081248A2 ARC type evaporation source |
| 03/07/2001 | EP1081247A2 Arc type ion plating apparatus |
| 03/07/2001 | EP1080614A1 Apparatus for coupling power into a body of gas |
| 03/07/2001 | EP1080482A1 Method and apparatus for low energy ion implantation |
| 03/07/2001 | EP1080481A1 Dissolution stage for an environmental scanning electron microscope |
| 03/07/2001 | EP1079868A1 Methods and apparatus for inactivating contaminants in biological fluid |
| 03/07/2001 | EP1079735A1 Laser soft docking system for medical treatment system |
| 03/07/2001 | EP1065502A4 Method for carrying out the electrical breakdown of a gaseous dielectric in a highly non-uniform field |
| 03/07/2001 | CN1062916C Sputtering pole |
| 03/06/2001 | US6198299 High Resolution analytical probe station |