| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/06/2001 | US6198224 Microwave plasma generator with the short cross-sectional side of the resonator parallel to the chamber axis |
| 03/06/2001 | US6198109 Aperture apparatus used for photolithography and method of fabricating the same |
| 03/06/2001 | US6198095 Apparatus and method for imaging a particle beam |
| 03/06/2001 | US6198067 Plasma processing device for circuit supports |
| 03/06/2001 | US6197699 In situ dry cleaning process for poly gate etch |
| 03/06/2001 | US6197246 Hot-press sintering ceramic molding and electrostatic chucking electrode comprising a planar bulk metal under pressure applied in a thickness direction of said electrode, embedding electrode in dense substrate made of a monolithic sinter |
| 03/06/2001 | US6197166 Method for inductively-coupled-plasma-enhanced ionized physical-vapor deposition |
| 03/06/2001 | US6197165 Method and apparatus for ionized physical vapor deposition |
| 03/06/2001 | US6197151 Plasma processing apparatus and plasma processing method |
| 03/06/2001 | US6197116 Plasma processing system |
| 03/06/2001 | US6196889 Method and apparatus for use an electron gun employing a thermionic source of electrons |
| 03/06/2001 | US6196155 Plasma processing apparatus and method of cleaning the apparatus |
| 03/01/2001 | WO2001015212A1 Plasma processing apparatus and method of plasma processing |
| 03/01/2001 | WO2001015209A1 Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
| 03/01/2001 | WO2001015200A1 Implanting system and method |
| 03/01/2001 | WO2001015192A1 Schottky emitter having extended life |
| 03/01/2001 | WO2000079579A3 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 03/01/2001 | WO2000058995B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 03/01/2001 | DE10036217A1 Coordinate table mechanism for semiconductor lithography device has sliding shafts fitted with table surface within vacuum chamber supported by pressurized gas bearings |
| 02/28/2001 | EP1079671A2 Antenna device for generating inductively coupled plasma |
| 02/28/2001 | EP1079425A1 Process and device for vacuum plasma treatment of substrate |
| 02/28/2001 | EP1079423A1 Apparatus for gas processing |
| 02/28/2001 | EP1079415A1 Substrate (plasma) processing taking account of optical instabilities |
| 02/28/2001 | EP1078389A1 Reduction of metal oxide in dual frequency plasma etch chamber |
| 02/28/2001 | EP1078388A1 Method and installation for correcting integrated circuit faults with an ion beam |
| 02/28/2001 | EP1078387A1 Ion beam apparatus and a method for neutralising space charge in an ion beam |
| 02/28/2001 | EP1078301A1 Retaining device for photo blanks |
| 02/28/2001 | EP1078111A1 Apparatus for sputter deposition |
| 02/28/2001 | CN1285612A Electronic Beam exposure mask, Exposure method and equipment and method for making semiconductor device |
| 02/28/2001 | CN1285419A Electric arc type evaparation source |
| 02/28/2001 | CN1285253A Electric arc type ion plating device |
| 02/27/2001 | US6195214 Microcolumn assembly using laser spot welding |
| 02/27/2001 | US6194835 Device for producing plasma |
| 02/27/2001 | US6194734 Method and system for operating a variable aperture in an ion implanter |
| 02/27/2001 | US6194732 Charged-particle-beam exposure methods with beam parallelism detection and correction |
| 02/27/2001 | US6194730 Electrostatic lens |
| 02/27/2001 | US6194729 Particle beam apparatus |
| 02/27/2001 | US6194719 Methods and apparatus for improving resolution and reducing noise in an image detector for an electron microscope |
| 02/27/2001 | US6194718 Method for reducing aliasing effects in scanning beam microscopy |
| 02/27/2001 | US6194680 Microwave plasma processing method |
| 02/27/2001 | US6194322 Electrode for plasma processes and method for a manufacture and use thereof |
| 02/27/2001 | US6194102 Mask for transferring a pattern to a substrate, comprising sub-fields including pattern lines and interconnection patterns which include transmitting pattern segments with widths that change monotonically in a longitudinal direction |
| 02/27/2001 | US6194038 Variations in gas flow concentration |
| 02/27/2001 | US6193855 Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage |
| 02/27/2001 | US6193854 Extended plasma is formed over a very high percentage of the surface of the target, thereby creating an erosion profile that is highly uniform and encompasses essentially the entire face of the target; maximizes utilization of target |
| 02/27/2001 | US6193836 Center gas feed apparatus for a high density plasma reactor |
| 02/27/2001 | US6193802 Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| 02/27/2001 | US6192938 Gas panel |
| 02/27/2001 | US6192898 Method and apparatus for cleaning a chamber |
| 02/27/2001 | US6192829 Antenna coil assemblies for substrate processing chambers |
| 02/27/2001 | US6192828 Thin film forming device for forming silicon thin film having crystallinity |
| 02/27/2001 | US6192827 Double slit-valve doors for plasma processing |
| 02/22/2001 | WO2001013419A1 Processing apparatus and processing method |
| 02/22/2001 | WO2001013410A1 Wafer holder assembly |
| 02/22/2001 | WO2001013404A1 Diamond coated parts in a plasma reactor |
| 02/22/2001 | WO2001013403A1 Inductively coupled plasma process chamber with shield electrode interposed between antenna and dielectric window |
| 02/22/2001 | WO2001013402A1 Electric supply unit for plasma installations |
| 02/22/2001 | WO2001012873A1 Pulsed plasma processing method and apparatus |
| 02/22/2001 | WO2001012863A1 Steel sheet for heat shrink band and method for producing the same |
| 02/22/2001 | WO2001012350A1 Cleaning surfaces with a thermal-non-equilibrium glow discharge plasma at high pressure |
| 02/22/2001 | WO2000075281A9 Supercritical fluid-assisted nebulization and bubble drying |
| 02/22/2001 | DE19939687A1 Large-area electron beam radiation exposure dose determination for microelectronics layout, involves dividing the total surface area into several disjunctive part-areas with different structural widths |
| 02/21/2001 | EP1076911A1 Method and apparatus for ionized physical vapor deposition |
| 02/21/2001 | CN1285008A PCVD apparatus and a method of manufacturing optical flber, preform rod and jacket tube as well as the optical fiber manufactured therewith |
| 02/20/2001 | US6192510 Method of preparing a partial one-shot electron beam exposure mask and method of direct-writing patterns by use of a partial one-shot electron beam exposure mask |
| 02/20/2001 | US6192287 Method and apparatus for fault detection and control |
| 02/20/2001 | US6191598 High resolution analytical probe station |
| 02/20/2001 | US6191532 Arrangement for producing plasma |
| 02/20/2001 | US6191427 Ion implantation system and method suitable for low energy ion beam implantation |
| 02/20/2001 | US6191423 Correction device for correcting the spherical aberration in particle-optical apparatus |
| 02/20/2001 | US6190927 Method and apparatus for detecting optimal endpoints in plasma etch processes |
| 02/20/2001 | US6190609 High intensity light source; killing viruses in blood |
| 02/20/2001 | US6190517 Magnet array |
| 02/20/2001 | US6190513 Coupling radio frequency energy from coil-shield into plasma to ionize material; reducing eddy currents using slitted shield |
| 02/20/2001 | US6190512 Soft plasma ignition in plasma processing chambers |
| 02/20/2001 | US6190496 Plasma etch reactor and method for emerging films |
| 02/20/2001 | US6190495 Magnetron plasma processing apparatus |
| 02/20/2001 | US6190062 Cleaning chamber built into SEM for plasma or gaseous phase cleaning |
| 02/20/2001 | US6189570 Gas panel |
| 02/20/2001 | US6189485 Plasma CVD apparatus suitable for manufacturing solar cell and the like |
| 02/20/2001 | US6189484 Plasma reactor having a helicon wave high density plasma source |
| 02/20/2001 | US6189483 Process kit |
| 02/20/2001 | US6189482 High temperature, high flow rate chemical vapor deposition apparatus and related methods |
| 02/20/2001 | US6189481 Microwave plasma processing apparatus |
| 02/20/2001 | CA1341184C Method and apparatus for the plasma etching substrate cleaning or deposition of materials by d.c. glow discharge |
| 02/15/2001 | WO2001011659A1 System and method for providing implant dose uniformity across the surface of a substrate |
| 02/15/2001 | WO2001011658A1 Plasma reactor for treating substrates having large surfaces |
| 02/15/2001 | WO2001011657A1 Correction for systematic, low spatial frequency critical dimension variations in lithography |
| 02/15/2001 | WO2001011656A1 Calibration of a scanning electron microscope |
| 02/15/2001 | WO2001011655A1 Methods and apparatus for mounting an x-ray detecting unit to an electron microscope |
| 02/15/2001 | WO2001011650A1 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
| 02/15/2001 | WO2001011108A1 Electron beam physical vapor deposition apparatus and method |
| 02/15/2001 | WO2000065632A3 Method for decontaminating yeast |
| 02/15/2001 | WO2000065631A3 Apparatus and method for exposing a substrate to plasma radicals |
| 02/15/2001 | WO2000062324A3 System and method to correct for distortion caused by bulk heating in a substrate |
| 02/14/2001 | EP1076352A2 High-density plasma source for ionized metal deposition |
| 02/14/2001 | EP1075707A1 Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
| 02/13/2001 | US6189135 Method of generating electron-beam data for creating a mask |
| 02/13/2001 | US6188564 Method and apparatus for compensating non-uniform wafer processing in plasma processing chamber |
| 02/13/2001 | US6188074 Charged particle beam exposure apparatus |