| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/17/2001 | US6218676 Charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects and device fabrication methods using the same |
| 04/17/2001 | US6218675 Charged particle beam irradiation apparatus |
| 04/17/2001 | US6218674 Electron beam projection exposure apparatus |
| 04/17/2001 | US6218671 On-line dynamic corrections adjustment method |
| 04/17/2001 | US6218664 SEM provided with an electrostatic objective and an electrical scanning device |
| 04/17/2001 | US6218663 Process and device for ion thinning in a high resolution transmission electron microscope |
| 04/17/2001 | US6218312 Plasma reactor with heated source of a polymer-hardening precursor material |
| 04/17/2001 | US6218060 Electron beam exposure method and electron beam exposure apparatus |
| 04/17/2001 | US6218058 Charged particle beam transfer mask |
| 04/17/2001 | US6217951 Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device |
| 04/17/2001 | US6217843 Heating metal compound with water in vacuum |
| 04/17/2001 | US6217785 Scavenger for fluorine in the electromagnetically coupled planar plasma apparatus improves the etching of oxides with fluorohydrocarbon etchants with respect to the selectivity of etching of the oxide, gives improved anisotropy |
| 04/17/2001 | US6217730 Sputtering device |
| 04/17/2001 | US6217724 Coated platen design for plasma immersion ion implantation |
| 04/17/2001 | US6217718 Apparatus having plasma generating coil positioned within processing chamber so as to prevent or minimize variations about center axis of processing chamber in quantity of ions delivered to workpiece |
| 04/17/2001 | US6217716 Apparatus and method for improving target erosion in hollow cathode magnetron sputter source |
| 04/17/2001 | US6217715 Coating of vacuum chambers to reduce pump down time and base pressure |
| 04/17/2001 | US6217714 Sputtering apparatus in vacuum chamber having gas supply, having three discrete separated electrodes, with associated targets and magnets, fixed substrate support, variable power supplies connected to electrodes |
| 04/17/2001 | US6217704 Plasma processing apparatus |
| 04/17/2001 | US6217703 Plasma processing apparatus |
| 04/17/2001 | US6217661 Plasma processing apparatus and method |
| 04/17/2001 | US6217272 In-line sputter deposition system |
| 04/17/2001 | US6216632 Plasma processing system |
| 04/17/2001 | CA2162748C Ion generating source for use in an ion implanter |
| 04/17/2001 | CA2089147C Cantilever mount for rotating cylindrical magnetrons |
| 04/12/2001 | WO2001026141A2 Surface structure and method of making, and electrostatic wafer clamp incorporating surface structure |
| 04/12/2001 | WO2001026134A1 Array of multiple charged particle beamlet emitting columns |
| 04/12/2001 | WO2001026133A2 High transmission, low energy beamline apparatus for ion implanter |
| 04/12/2001 | DE19943953A1 Vorrichtung und Verfahren zur Erzeugung eines lokalen Plasmas durch Mikrostrukturelektrodenentladungen mit Mikrowellen Apparatus and method for generating a local plasma by microwave discharge electrodes microstructure |
| 04/12/2001 | DE10049536A1 Ion source arrangement has ion source movable relative to chamber along fixed curve essentially in horizontal plane to enable access to inner wall of chamber |
| 04/11/2001 | EP1091387A2 Coil for sputter deposition |
| 04/11/2001 | EP1091386A2 Illumination system for electron beam lithography tool |
| 04/11/2001 | EP1091385A1 Electron-beam lithography system and alignment method |
| 04/11/2001 | EP1091384A2 Electron beam imaging apparatus |
| 04/11/2001 | EP1091383A2 Electron beam imaging apparatus |
| 04/11/2001 | EP1091016A2 Self ionized plasma for sputtering copper |
| 04/11/2001 | EP1091014A1 Ex-situ coating of refractory metal on IMP coils |
| 04/11/2001 | EP1090414A1 Resin molded article for chamber liner |
| 04/11/2001 | EP1090411A2 Apparatus and method relating to charged particles |
| 04/11/2001 | EP1090410A1 Electron detector |
| 04/11/2001 | EP1090409A1 High sputter and etch resistant window for plasma processing chambers |
| 04/11/2001 | EP1090408A1 Cam-based arrangement for positioning confinement rings in a plasma processing chamber |
| 04/11/2001 | EP1090407A1 Semiconductor process chamber electrode and method for making the same |
| 04/11/2001 | EP1090330A2 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 04/11/2001 | EP1089938A1 Free-standing and aligned carbon nanotubes and synthesis thereof |
| 04/11/2001 | CN1290960A Electronic beam writing method, electronic beam etching equipment and its mask thereof |
| 04/10/2001 | US6215128 Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 04/10/2001 | US6214408 Method for the operation of an electron beam |
| 04/10/2001 | US6214183 Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials |
| 04/10/2001 | US6214162 Plasma processing apparatus |
| 04/10/2001 | US6214161 Method and apparatus for anisotropic etching of substrates |
| 04/10/2001 | US6214160 Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers |
| 04/10/2001 | US6214119 Vacuum substrate processing system having multiple processing chambers and a central load/unload chamber |
| 04/10/2001 | US6213050 Enhanced plasma mode and computer system for plasma immersion ion implantation |
| 04/10/2001 | CA2124344C Corona discharge ionisation source |
| 04/10/2001 | CA2099132C Device and process for the vaporisation of material |
| 04/10/2001 | CA2069767C High accuracy beam blanker |
| 04/05/2001 | WO2001024255A2 Interferometric method for endpointing plasma etch processes |
| 04/05/2001 | WO2001024254A1 Method for determining the endpoint of etch process steps |
| 04/05/2001 | WO2001024221A1 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
| 04/05/2001 | WO2001024220A2 Uniform gas distribution in large area plasma treatment device |
| 04/05/2001 | WO2001024219A1 Method and device for atomic interferometry nanolithography |
| 04/05/2001 | WO2001024218A1 Electron image detector coupled by optical fibers with absorbing outer cladding to reduce blurring |
| 04/05/2001 | WO2001024217A1 Means for achieving uniformity of emission of a large area electron source |
| 04/05/2001 | WO2001024216A2 Pretreated gas distribution plate |
| 04/05/2001 | WO2001023634A1 Rotating magnet array and sputter source |
| 04/05/2001 | WO2000075954A3 Apparatus and method for forming a charged particle beam of arbitrary shape |
| 04/05/2001 | US20010000104 Perforated plasma confinement ring in plasma reactors |
| 04/04/2001 | EP1089319A1 Uniform gas distribution in large area plasma treatment device |
| 04/04/2001 | EP1089318A1 Method for determining the endpoint of etch process steps |
| 04/04/2001 | EP1089001A1 Static pressure gas bearing, stage device using it, and optical device using it |
| 04/04/2001 | EP1088332A2 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 04/04/2001 | EP1088331A1 Cleaning process end point determination using throttle valve position |
| 04/04/2001 | EP1088330A1 Cvd apparatus and process for depositing titanium films |
| 04/04/2001 | EP1088329A1 Method and apparatus for stabilising a plasma |
| 04/04/2001 | EP1088328A1 Method and device for correcting proximity effects |
| 04/04/2001 | EP1088327A1 Transmission electron microscope ccd camera |
| 04/04/2001 | EP1088326A1 Pedestal insulator for a pre-clean chamber |
| 04/04/2001 | EP1088325A1 Methods and apparatus for scanning and focusing an ion beam |
| 04/04/2001 | EP1088319A2 Device for shaping an electron beam, method for producing said device and use thereof |
| 04/04/2001 | EP0839217A4 A plasma enhanced chemical processing reactor and method |
| 04/04/2001 | CN2426212Y Electroacoustic pulse signal collection and process device |
| 04/04/2001 | CN1290399A Device for producing excited/ionized particles in plasma |
| 04/04/2001 | CN1290308A Plasma reactor with a deposition shield |
| 04/04/2001 | CN1290029A Ion implanting device and using method thereof |
| 04/03/2001 | US6211622 Plasma processing equipment |
| 04/03/2001 | US6211621 Energy transfer microwave plasma source |
| 04/03/2001 | US6211528 Electron beam drawing method in which cell projection manner and variably shaped beam manner are used in combination |
| 04/03/2001 | US6211525 Detector devices |
| 04/03/2001 | US6211518 Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments |
| 04/03/2001 | US6211517 Electron beam fault detection of semiconductor devices |
| 04/03/2001 | US6210594 Near substrate reactant homogenization apparatus |
| 04/03/2001 | US6210539 For generating plasma to sputter deposit layer of material in fabrication of semiconductor devices |
| 04/03/2001 | US6210483 Anti-notch thinning heater |
| 04/03/2001 | US6209482 Large area microwave plasma apparatus with adaptable applicator |
| 04/03/2001 | US6209480 Hermetically-sealed inductively-coupled plasma source structure and method of use |
| 03/30/2001 | CA2284368A1 Producing electric arc plasma in a curvilinear plasmaguide and substrate coating |
| 03/29/2001 | WO2001022480A1 Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
| 03/29/2001 | WO2001022479A1 Gas distribution apparatus for semiconductor processing |
| 03/29/2001 | WO2001022471A1 Semiconductor processing equipment having tiled ceramic liner |