| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/08/2014 | US20140123897 Plasma generation apparatus, cvd apparatus, and plasma-treated particle generation apparatus |
| 05/08/2014 | US20140123895 Plasma process apparatus and plasma generating device |
| 05/08/2014 | US20140123457 Pre-aligned nozzle/skimmer |
| 05/08/2014 | DE112012003413T5 Rasterelektronenmikroskop Scanning electron microscope |
| 05/08/2014 | DE112012003411T5 Multipolmessvorrichtung Multipolmessvorrichtung |
| 05/08/2014 | DE102013221950A1 Mehrfach-Ladungsträgerteilchenstrahl-Schreibverfahren und Mehrfach-Ladungsträgerteilchenstrahl-Schreibvorrichtung Multiple charged particle beam writing method and multiple charged particle recording device |
| 05/08/2014 | DE102012020478A1 Teilchenstrahlsystem und Verfahren zum Bearbeiten einer TEM-Probe Particle beam system and method for processing a TEM sample |
| 05/07/2014 | EP2727129A2 Multiple-column electron beam apparatus and methods |
| 05/07/2014 | EP2726643A1 Plasma treatment of hollow bodies |
| 05/07/2014 | CN203588974U 一种真空远区等离子体处理装置 A vacuum plasma processing apparatus far zone |
| 05/07/2014 | CN203588973U 一种液体材料等离子体处理装置 The plasma processing apparatus of a liquid material |
| 05/07/2014 | CN203588972U 一种毛细玻璃管内壁等离子体处理装置 One kind of an inner wall of the plasma processing apparatus of the capillary tube |
| 05/07/2014 | CN203588971U 一种改进型颗粒材料旋转等离子体处理装置 An improved particulate material rotating plasma processing apparatus |
| 05/07/2014 | CN203588970U 一种适用于常压环境材料表面等离子体处理装置 An atmospheric environment is suitable for surface plasmon material handling equipment |
| 05/07/2014 | CN203588969U 一种颗粒物料表面等离子体处理装置 Plasma processing the surface of a particulate material means |
| 05/07/2014 | CN203588968U 一种板材物料等离子体处理装置 One kind of a plasma processing apparatus of the sheet material |
| 05/07/2014 | CN1950538B 围绕真空反应室的中央轴排列的可分别控制的电磁线圈组成的阵列 An array of electromagnetic coils can be controlled around the central axis of the vacuum reaction chamber arrangement consisting of |
| 05/07/2014 | CN103782364A 带电粒子线装置、带电粒子线装置的调整方法及试样的检查或试样的观察方法 Method of adjusting the charged particle beam device, the charged particle beam device and a method for sample inspection or observation of the specimen |
| 05/07/2014 | CN103782363A 用于使用了电子束的显微镜或者分析装置的试样加热架、以及使用了该试样加热架的试样加热方法 For heating the sample holder using a microscope or an electron beam analyzing apparatus, and the use of the method of heating the sample is heated sample holder |
| 05/07/2014 | CN103781936A 旋转溅射靶组件 Rotatable sputtering target assembly |
| 05/07/2014 | CN103779259A 一种晶片传输系统的布局 A wafer transfer system layout |
| 05/07/2014 | CN103779166A 一种刻蚀设备反应腔的电极和刻蚀设备 An electrode and etching equipment etching equipment reaction chamber |
| 05/07/2014 | CN103779165A 等离子体设备及工件位置检测方法 Plasma equipment and workpiece position detecting method |
| 05/07/2014 | CN103779164A 一种离子束减速装置 An ion beam deceleration devices |
| 05/07/2014 | CN103779163A 一种晶片离子注入剂量控制方法 A wafer ion implantation dose control methods |
| 05/07/2014 | CN103779162A 一种离子注入机加速器 An ion implanter accelerator |
| 05/07/2014 | CN103779161A 一种离子均匀注入的宽带束扫描方法 Broadband uniform beam scanning method of ion implantation |
| 05/07/2014 | CN103779160A 可配置带电粒子装置 Charged particle device can be configured |
| 05/07/2014 | CN103779159A 与粒子束柱整合的减速场分析器 Integration with the particle beam column retarding field analyzer |
| 05/07/2014 | CN103770126A 一种调节装置及等离子体加工设备 An apparatus and a plasma processing apparatus to adjust |
| 05/07/2014 | CN102017055B 用于制造具有离子刻蚀表面的工件的方法 Ion etching method for producing a workpiece having a surface for |
| 05/07/2014 | CN101593658B 具有集成能量过滤器的带电粒子源 A charged particle source having an integrated energy filter |
| 05/06/2014 | US8716673 Inductively coupled plasma source as an electron beam source for spectroscopic analysis |
| 05/06/2014 | US8716671 Enhanced integrity projection lens assembly |
| 05/06/2014 | US8716662 Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations |
| 05/06/2014 | US8716661 Method for measuring size of specimen |
| 05/06/2014 | US8715789 Chemical vapor deposition for an interior of a hollow article with high aspect ratio |
| 05/06/2014 | US8715471 Magnetron sputter cathode |
| 05/01/2014 | WO2014066873A1 Sample platforms and methods of using them |
| 05/01/2014 | WO2014066375A1 Apparatus for treating ion beam |
| 05/01/2014 | WO2014065663A1 Apparatus and method for inspecting a surface of a sample |
| 05/01/2014 | WO2014065311A1 Charged particle beam device and overlay misalignment measurement method |
| 05/01/2014 | WO2014064290A1 Determining a position of a substrate in lithography |
| 05/01/2014 | US20140117838 Electron-beam device |
| 05/01/2014 | US20140117251 Stage device and control method for stage device |
| 05/01/2014 | US20140117235 Standard wafer and its fabrication method |
| 05/01/2014 | US20140117233 Retarding Field Analyzer Integral with Particle Beam Column |
| 05/01/2014 | US20140117232 Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment |
| 05/01/2014 | US20140117231 Automated Mineral Classification |
| 05/01/2014 | US20140117229 Mineral identification using sequential decomposition into elements from mineral definitions |
| 05/01/2014 | US20140117218 Method and apparatus for monitoring electron beam condition of scanning electron microscope |
| 05/01/2014 | US20140116873 Method for creating s/tem sample and sample structure |
| 05/01/2014 | US20140116622 Electrostatic chuck and substrate processing apparatus |
| 05/01/2014 | US20140116621 Plasma processing method and plasma processing apparatus |
| 05/01/2014 | US20140116620 Plasma processing apparatus |
| 04/30/2014 | EP2725603A1 Plasma microwave cavity |
| 04/30/2014 | EP2725602A2 Retarding field analyzer integral with particle beam column |
| 04/30/2014 | EP2724359A2 High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped |
| 04/30/2014 | DE102013111929A1 Plasmaerzeugungsvorrichtungsanordnung, Lichtbogenabschwächungsvorrichtung und Verfahren zum Aufbau einer Plasmaerzeugungsvorrichtungsanordnung Plasma generating device assembly, arc attenuation apparatus and method for establishing a plasma generating device assembly |
| 04/30/2014 | DE102013111744A1 Elektronenstrahl-Belichtungsverfahren Electron beam exposure method |
| 04/30/2014 | DE102013018203A1 Verfahren zur Modifikation der Oberflächen von metallischen Werkstoffen A process for the modification of the surfaces of metallic materials |
| 04/30/2014 | CN203573944U Movable-type radio-frequency glow electrode for nuclear fusion device |
| 04/30/2014 | CN103765772A Method for impedance matching and high frequency power supply |
| 04/30/2014 | CN103765552A Generating, a highly ionized plasma in a plasma chamber |
| 04/30/2014 | CN103765551A Plasma source |
| 04/30/2014 | CN103765550A Plasma immersion ion implantation machine for low-pressure process |
| 04/30/2014 | CN103765549A Multipole measurement apparatus |
| 04/30/2014 | CN103765545A Current limiter for high voltage power supply used with ion implantation system |
| 04/30/2014 | CN103765544A Electric field discharge-type electron source |
| 04/30/2014 | CN103762161A Method and apparatus for processing a semiconductor workpiece |
| 04/30/2014 | CN103762145A High-temperature target chamber system with rotary disk |
| 04/30/2014 | CN103762144A Multiband light source substrate in in-situ sample rod and manufacturing method thereof |
| 04/30/2014 | CN102315065B Beam current transmission system and method |
| 04/30/2014 | CN102067272B Projection lens arrangement |
| 04/29/2014 | US8710468 Method of and apparatus for evaluating an optimal irradiation amount of an electron beam for drawing a pattern onto a sample |
| 04/29/2014 | US8710467 Multi charged particle beam writing apparatus and multi charged particle beam writing method |
| 04/29/2014 | US8710465 Pattern data conversion for lithography system |
| 04/29/2014 | US8710460 Decontamination apparatus and method |
| 04/29/2014 | US8710455 Charged-particle beam lens |
| 04/29/2014 | US8710451 Ion beam system and method of operating ion beam system |
| 04/29/2014 | US8710439 Charged particle beam apparatus |
| 04/29/2014 | US8710438 Scanning transmission electron microscope and axial adjustment method thereof |
| 04/29/2014 | US8709926 Plasma doping method and plasma doping apparatus |
| 04/29/2014 | US8709270 Masking method and apparatus |
| 04/29/2014 | US8709269 Method and system for imaging a cross section of a specimen |
| 04/29/2014 | US8709218 Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method |
| 04/29/2014 | US8709162 Active cooling substrate support |
| 04/29/2014 | CA2743374C Electron microscope device |
| 04/24/2014 | WO2014062886A1 Plasma etching endpoint detection using multivariate analysis |
| 04/24/2014 | WO2014062515A1 Ion source having a shutter assembly |
| 04/24/2014 | WO2014061738A1 Method for removing foreign substances in charged particle beam device, and charged particle beam device |
| 04/24/2014 | WO2014061690A1 Electron microscope |
| 04/24/2014 | WO2014061625A1 Charged particle beam device equipped with cooling mechanism for charged particle beam source, and charged particle beam source |
| 04/24/2014 | WO2014061577A1 Charged-particle radiation apparatus |
| 04/24/2014 | WO2014061524A1 Charged particle beam device and sample preparation method |
| 04/24/2014 | WO2014060660A1 Vacuum chamber elements made of aluminium alloy |
| 04/24/2014 | US20140113234 Lithography apparatus, and method of manufacturing an article |
| 04/24/2014 | US20140113157 Slide part and surface processing method of the same |
| 04/24/2014 | US20140110608 Movement-free bending method for one-dimensional or two-dimensional nanostructure using ion beam |
| 04/24/2014 | US20140110607 Ion implanter power supply which is intended to limit the loading effect |