| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/29/2001 | US6239403 Power segmented electrode |
| 05/29/2001 | US6238937 Determining endpoint in etching processes using principal components analysis of optical emission spectra with thresholding |
| 05/29/2001 | US6238588 High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process |
| 05/29/2001 | US6238587 Method for treating articles with a plasma jet |
| 05/29/2001 | US6238537 Ion assisted deposition source |
| 05/29/2001 | US6238532 Radio-frequency coil for use in an ionized physical vapor deposition apparatus |
| 05/29/2001 | US6238531 Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system |
| 05/29/2001 | US6238528 Sputtering; forming semiconductors |
| 05/29/2001 | US6238527 Thin film forming apparatus and method of forming thin film of compound by using the same |
| 05/29/2001 | US6238526 Ion-beam source with channeling sputterable targets and a method for channeled sputtering |
| 05/29/2001 | US6238512 Plasma generation apparatus |
| 05/29/2001 | US6237528 Showerhead electrode assembly for plasma processing |
| 05/29/2001 | US6237527 System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate |
| 05/29/2001 | US6237526 Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
| 05/25/2001 | WO2001037317A1 Plasma processing system with dynamic gas distribution control |
| 05/25/2001 | WO2001037316A1 Temperature control system for plasma processing apparatus |
| 05/25/2001 | WO2001037315A1 Plasma processing systems and method therefor |
| 05/25/2001 | WO2001037314A1 Materials and gas chemistries for processing systems |
| 05/25/2001 | WO2001037313A1 Plasma processing apparatus with an electrically conductive wall |
| 05/25/2001 | WO2001037312A1 Method and device for treating and coating non-conductive, dielectric surfaces using plasmas excited by microwaves |
| 05/25/2001 | WO2001037311A2 Method and apparatus for controlling the volume of a plasma |
| 05/25/2001 | WO2001037310A2 Method and apparatus for ionized physical vapor deposition |
| 05/25/2001 | WO2001036703A1 System and method for depositing inorganic/organic dielectric films |
| 05/25/2001 | WO2001036701A1 High target utilization magnetic arrangement for a truncated conical sputtering target |
| 05/24/2001 | US20010001413 Method and apparatus for increasing wafer throughput between cleanings in semiconductor processing reactors |
| 05/23/2001 | EP1102305A1 Plasma processing apparatus with an electrically conductive wall |
| 05/23/2001 | EP1102304A2 Particle-optical apparatus including a low-temperature specimen holder |
| 05/23/2001 | EP1102303A2 Electron beam columns |
| 05/23/2001 | EP1102031A2 A pattern dimension measuring method and apparatus |
| 05/23/2001 | EP1101835A1 Method and apparatus for physical vapor deposition using modulated power |
| 05/23/2001 | EP1101834A2 Method of depositing materials on substrates |
| 05/23/2001 | EP1101123A1 Particle beam current monitoring technique |
| 05/23/2001 | DE10024827A1 Electrode arrangement for multi-layer plasma coating of PET bottles or film strip has a cathode material surface divided into active and inactive parts |
| 05/23/2001 | CN1296287A Device for checking semiconductor device |
| 05/23/2001 | CN1296284A Checking method for figure drawing |
| 05/22/2001 | US6236164 Current sensing in vacuum electron devices |
| 05/22/2001 | US6236163 Multiple-beam ion-beam assembly |
| 05/22/2001 | US6236054 Ion source for generating ions of a gas or vapor |
| 05/22/2001 | US6236053 Charged particle detector |
| 05/22/2001 | US6236052 Quadrupole device for projection lithography by means of charged particles |
| 05/22/2001 | US6236043 Electromagnet and magnetic field generating apparatus |
| 05/22/2001 | US6235655 Semiconductor manufacturing system and semiconductor manufacturing method |
| 05/22/2001 | US6235652 High rate silicon dioxide deposition at low pressures |
| 05/22/2001 | US6235646 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 05/22/2001 | US6235450 Overlapping pattern |
| 05/22/2001 | US6235170 Conical sputtering target |
| 05/22/2001 | US6235169 Modulated power for ionized metal plasma deposition |
| 05/22/2001 | US6235164 Low-pressure processing system for magnetic orientation of thin magnetic film |
| 05/22/2001 | US6235163 Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance |
| 05/22/2001 | US6235119 End point window assembly in an etching apparatus for fabricating semiconductor devices |
| 05/22/2001 | US6234219 Liner for use in processing chamber |
| 05/17/2001 | WO2001035440A1 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes |
| 05/17/2001 | WO2001035439A2 Plural foils shaping intensity profile of ion beams |
| 05/17/2001 | WO2001035438A1 Particle beam processing apparatus |
| 05/17/2001 | WO2001035165A1 Data path design for multiple electron beam lithography system |
| 05/17/2001 | WO2001034868A1 Correction method and device for sputtering target/packing plate assembly |
| 05/17/2001 | WO2000031769A9 Detector configuration for efficient secondary electron collection in microcolumns |
| 05/17/2001 | US20010001201 Plasma reactor with coil antenna of plural helical conductors with equally spaced ends |
| 05/17/2001 | US20010001185 Plasma processing apparatus and method of cleaning the apparatus |
| 05/17/2001 | US20010001184 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair |
| 05/17/2001 | US20010001175 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power |
| 05/17/2001 | CA2389501A1 Plural foils shaping intensity profile of ion beams |
| 05/17/2001 | CA2325901A1 An electrode arrangement |
| 05/16/2001 | EP1100117A2 A surface treatment method for a silicon wafer |
| 05/16/2001 | EP1100112A1 Spectrometer objective for particle beam measuring system |
| 05/16/2001 | EP1100111A1 Deflection arrangement for separating two particle beams |
| 05/16/2001 | EP1099779A1 Surface treatment apparatus |
| 05/16/2001 | CN1295628A Method and apparatus for deposition of biaxially textured coatings |
| 05/15/2001 | US6232787 Microstructure defect detection |
| 05/15/2001 | US6232723 Direct current energy discharge system |
| 05/15/2001 | US6232709 Method and apparatus for deflecting and focusing a charged particle stream |
| 05/15/2001 | US6232612 Variable shaped electron beam exposure system and method of writing a pattern by a variable shaped electron beam |
| 05/15/2001 | US6232601 Dynamically compensated objective lens-detection device and method |
| 05/15/2001 | US6232600 Analysis of semiconductor surfaces by secondary ion mass spectrometry |
| 05/15/2001 | US6232236 Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system |
| 05/15/2001 | US6232233 Methods for performing planarization and recess etches and apparatus therefor |
| 05/15/2001 | US6232040 Method of electron beam exposure utilizing emitter with conductive mesh grid |
| 05/15/2001 | US6231777 Surface treatment method and system |
| 05/15/2001 | US6231776 Multi-temperature processing |
| 05/15/2001 | US6231774 Plasma processing method |
| 05/15/2001 | US6231732 Cylindrical carriage sputtering system |
| 05/15/2001 | US6231727 Using a vacuum; applying alternating current |
| 05/15/2001 | US6230652 Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| 05/15/2001 | US6230651 Gas injection system for plasma processing |
| 05/15/2001 | US6230650 Microwave enhanced CVD system under magnetic field |
| 05/10/2001 | WO2001033604A1 Method and apparatus for ion implantation |
| 05/10/2001 | WO2001033603A1 Electron beam apparatus |
| 05/10/2001 | WO2001033232A2 Precision stage |
| 05/10/2001 | WO2001032297A2 Modular chemical treatment system |
| 05/10/2001 | US20010000898 Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions |
| 05/10/2001 | DE19949978A1 Elektronenstoßionenquelle Electron impact ion source |
| 05/10/2001 | DE10050200A1 Ionenimplantationsanlage und Strahlblende dafür Ion implantation system and beam stop it |
| 05/10/2001 | DE10042626A1 Electron beam photolithography device for IC manufacture uses block mask provided with matrix of rectangular aperture patterns and setting aperture pattern used for setting beam deflector |
| 05/10/2001 | CA2325653A1 Tetrode electron gun for electron beam columns |
| 05/09/2001 | EP1098352A2 Apparatus for detecting plasma etch endpoint and method |
| 05/09/2001 | EP1098189A2 Method for detecting an end point for an oxygen free plasma process |
| 05/09/2001 | EP1097464A2 Integrated microcolumn and scanning probe microscope arrays |
| 05/09/2001 | EP1097253A1 Ion energy attenuation |
| 05/09/2001 | CN1294481A Microwave plasma processor and method thereof |
| 05/09/2001 | CN1065572C Target of sputting cathode for vacuum coating equipment and mfg. method thereof |