| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/14/2001 | US20010003298 Comprising primary electrode chargeable to form plasma of the gas in the chamber, dielectric covering primary electrode, dielectric having surface adapted to receive substrate and having a conduit therethrough |
| 06/14/2001 | US20010003271 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 06/14/2001 | US20010003270 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 06/13/2001 | EP1107653A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 06/13/2001 | EP1107283A2 Negative ion filter |
| 06/13/2001 | EP1107282A2 Method and apparatus for semiconductor wafer process monitoring |
| 06/13/2001 | EP1106709A2 Pulsed-mode RF bias for side-wall coverage improvement |
| 06/13/2001 | EP1105917A1 Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 06/13/2001 | EP1105914A1 Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current |
| 06/13/2001 | EP1105913A1 Electron microscope |
| 06/13/2001 | EP1105908A1 Ion beam generation apparatus |
| 06/13/2001 | EP1105703A1 Method and apparatus for monitoring plasma processing operations |
| 06/13/2001 | EP1105547A1 Dual collimator physical-vapor deposition apparatus |
| 06/13/2001 | EP0925599B1 Energy filter, transmission electron microscope and associated method for filtering energy |
| 06/13/2001 | EP0824604A4 Apparatus for reducing arcing during sputtering |
| 06/13/2001 | EP0809859B1 Multiple tier collimator system for enhanced step coverage and uniformity |
| 06/13/2001 | DE19957169A1 Plasmaätzverfahren mit gepulster Substratelektrodenleistung Plasma etching with pulsed substrate electrode performance |
| 06/13/2001 | CN1067118C Magnetic controlled tube sputtering apparatus |
| 06/12/2001 | US6246567 Apparatus for igniting a plasma in a plasma processing chamber |
| 06/12/2001 | US6246190 Integrated electron gun and electronics module |
| 06/12/2001 | US6246175 Large area microwave plasma generator |
| 06/12/2001 | US6246065 Electron beam projection exposure apparatus |
| 06/12/2001 | US6246064 Electron beam drawing apparatus |
| 06/12/2001 | US6246060 Apparatus for holding and aligning a scanning electron microscope sample |
| 06/12/2001 | US6246058 Correction device for correcting chromatic aberration in particle-optical apparatus |
| 06/12/2001 | US6246054 Scanning probe microscope suitable for observing the sidewalls of steps in a specimen and measuring the tilt angle of the sidewalls |
| 06/12/2001 | US6246053 Non-contact autofocus height detector for lithography systems |
| 06/12/2001 | US6245648 Method of forming semiconducting materials and barriers |
| 06/12/2001 | US6245394 Film growth method and film growth apparatus capable of forming magnesium oxide film with increased film growth speed |
| 06/12/2001 | US6245280 Method and apparatus for forming polycrystalline particles |
| 06/12/2001 | US6245202 Plasma treatment device |
| 06/12/2001 | US6245192 Gas distribution apparatus for semiconductor processing |
| 06/12/2001 | US6245190 Plasma processing system and plasma processing method |
| 06/12/2001 | US6244211 Plasma processing apparatus |
| 06/12/2001 | US6244210 Strength coil for ionized copper plasma deposition |
| 06/07/2001 | WO2001041183A1 Dose monitor for plasma doping system |
| 06/07/2001 | WO2001041182A1 Plasma processor, cluster tool, and method of controlling plasma |
| 06/07/2001 | WO2001041181A1 Gas cluster ion beam smoother apparatus |
| 06/07/2001 | WO2001041180A1 Detector for a scanning electron microscope with variable pressure and a scanning electron microscope comprising a detector of this type |
| 06/07/2001 | WO2001040735A1 Analyzer/observer |
| 06/07/2001 | WO2001040540A1 Improved reactor with heated and textured electrodes and surfaces |
| 06/07/2001 | WO2001040532A2 Gas cluster ion beam low mass ion filter |
| 06/07/2001 | WO2001004927A3 Methodologies to reduce process sensitivity to the chamber wall condition |
| 06/07/2001 | US20010003014 Plasma CVD apparatus and plasma CVD method |
| 06/07/2001 | US20010002698 Scanning electron microscope |
| 06/07/2001 | US20010002697 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 06/07/2001 | US20010002613 Birm and gas escape for non-contact wafer holder |
| 06/07/2001 | US20010002601 Liner for use in processing chamber |
| 06/07/2001 | US20010002584 Susceptor adapted to secure work piece thereon, radio frequency source overlying susceptor provides inductive discharge to form plasma from gas within chamber, magnetic source provides focused magnetic field lines toward susceptor |
| 06/07/2001 | US20010002582 Showerhead diffuser with flexibility to adjust gas distribution flux in a number of different ways, allowing a diffuser to be dialed-in to account for many gas parameters such as reactivity |
| 06/07/2001 | DE19955428A1 Electron beam vaporizer, used for vaporizing aluminum, comprises high temperature container made of electrically-conducting ceramic for receiving vaporized material inserted into liquid-cooled crucible |
| 06/07/2001 | DE10030145A1 Semiconductor wafer testing method involves irradiating charged particle on small region of wafer containing maximum opening defect, based on position data |
| 06/06/2001 | CN1298203A Mask detecting apparatus and method |
| 06/06/2001 | CN1066851C 磁场阴极 Cathode magnetic field |
| 06/05/2001 | USRE37203 Feedback control for scanning tunnel microscopes |
| 06/05/2001 | US6243487 Pattern exposure method using electron beam |
| 06/05/2001 | US6242751 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 06/05/2001 | US6242750 Ion implantation device |
| 06/05/2001 | US6242749 Ion-beam source with uniform distribution of ion-current density on the surface of an object being treated |
| 06/05/2001 | US6242748 Methods and apparatus for mounting an X-ray detecting unit to an electron microscope |
| 06/05/2001 | US6242747 Method and system for optimizing linac operational parameters |
| 06/05/2001 | US6242737 Microscopic system equipt with an electron microscope and a scanning probe microscope |
| 06/05/2001 | US6242360 Plasma processing system apparatus, and method for delivering RF power to a plasma processing |
| 06/05/2001 | US6242053 Process for coating plastic containers or glass containers by means of a PCVD coating process |
| 06/05/2001 | US6241845 Apparatus for reducing process drift in inductive coupled plasma etching such as oxide layer |
| 05/31/2001 | WO2001039560A1 Device for hybrid plasma processing |
| 05/31/2001 | WO2001039559A1 Method and apparatus for plasma treatment |
| 05/31/2001 | WO2001039261A1 Method for plasma etching with pulsed substrate electrode power |
| 05/31/2001 | WO2001039243A1 Electron optics for multi-beam electron beam lithography tool |
| 05/31/2001 | WO2001038602A1 Compound vapor spraying device and focusing ion beam device using it |
| 05/31/2001 | WO2001038597A2 Method for regulating sputtering processes |
| 05/31/2001 | WO2000003421A3 Improved endpoint detection for substrate fabrication processes |
| 05/31/2001 | WO1999066533A9 Semiconductor process chamber electrode and method for making the same |
| 05/31/2001 | US20010002301 Projection-exposure methods and apparatus exhibiting increased throughput |
| 05/31/2001 | US20010002284 Providing vaporized organic component from one source, wherein vaporized organic material is capable of condensing in vacuum, providing plasma from other source, causing vaporized organic material to condense and polymerize on surface |
| 05/31/2001 | US20010002002 Deposition apparatus |
| 05/31/2001 | DE19957824A1 Manufacturing very fine tips in sub nanometer range involves heat treating heterogeneous starting material, cooling base body, coarse and fine removal of material from base body |
| 05/31/2001 | DE19955671A1 Device for generating plasma in treatment chamber has dividing plate between treatment chamber, antenna chamber in which plasma is not generated owing to higher pressure/gas filling |
| 05/31/2001 | DE10057079A1 Device for corpuscular beam exposure subjects pattern on specimen to corpuscular beam whilst feeding low pressure ozone into vacuum chamber at pressure below that of the atmosphere |
| 05/31/2001 | DE10056482A1 Semiconductor industry ionic beam former having particle source filter passed reduced energy offsets and dispensing unwanted energy field. |
| 05/30/2001 | EP1104019A1 Method and device for real time control of the thickness of an integrated circuit layer |
| 05/30/2001 | EP1104018A2 Optimized optical system design for endpoint detection |
| 05/30/2001 | EP1103860A1 Electron-beam lithography system and alignment method |
| 05/30/2001 | EP1103632A1 Apparatus and method for processing semiconductor substrates |
| 05/30/2001 | EP1103631A2 Apparatus and method for depositing material on a substrate |
| 05/30/2001 | EP1103630A1 Electrode assembly |
| 05/30/2001 | EP1103065A1 Workpiece vibration damper |
| 05/30/2001 | EP1103063A2 Dose monitor for plasma-immersion ion implantation doping system |
| 05/30/2001 | EP1102870A1 Gas distributor plate for a processing apparatus |
| 05/30/2001 | EP1102869A1 Esrf chamber cooling system and process |
| 05/30/2001 | EP1102616A1 Esrf coolant degassing process |
| 05/30/2001 | CN1297575A Means for controlling target erosion and sputtering in magnetron |
| 05/30/2001 | CN1297491A Reduced impedance chamber |
| 05/30/2001 | CN1297251A Electronic beam exposure method and used mask, and electronic beam exposure system |
| 05/29/2001 | US6239553 RF plasma source for material processing |
| 05/29/2001 | US6239541 RFQ accelerator and ion implanter to guide beam through electrode-defined passage using radio frequency electric fields |
| 05/29/2001 | US6239441 Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device |
| 05/29/2001 | US6239440 Arc chamber for an ion implantation system |
| 05/29/2001 | US6239430 Particle beam apparatus with energy filter |
| 05/29/2001 | US6239404 Plasma processing apparatus |