| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/19/2001 | US20010008805 Useful for continuously producing negative ions in high density and also negative ions can be made incident on the semiconductor substrate to be processed to conduct ashing, etching and cleaning of the substrate to remove impurities |
| 07/19/2001 | US20010008798 Plasma treatment system and method |
| 07/19/2001 | US20010008274 Device fabrication methods using charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects |
| 07/19/2001 | US20010008272 Measuring instrument and method for measuring features on a substrate |
| 07/19/2001 | US20010008208 Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation |
| 07/19/2001 | US20010008173 Plasma etching system |
| 07/19/2001 | US20010008171 Plasma processing apparatus for semiconductors |
| 07/19/2001 | US20010008123 Integrated ion implant scrubber system |
| 07/19/2001 | US20010008122 Plasma processing apparatus |
| 07/19/2001 | DE19961906A1 Digital scanning measurement unit, e.g. scanning tunnel microscope; has differential element, analogue to digital converter and computer to form absolute image signal values from difference signals |
| 07/19/2001 | DE10001277A1 Elektronenoptischer Korrektor zur Beseitigung der Bildfehler dritter Ordnung Electron optical corrector to eliminate the aberrations of the third order |
| 07/19/2001 | CA2393283A1 Liner for semiconductor etching chamber |
| 07/18/2001 | EP1117125A1 Scanning electron microscope |
| 07/18/2001 | EP1116932A2 Measuring apparatus and method for measuring structures on a substrat |
| 07/18/2001 | EP0867036B1 Method and device for pre-treatment of substrates |
| 07/18/2001 | CN1304165A Method and equipment of ion implantation |
| 07/18/2001 | CN1303953A Process and apparatus for forming ionizing film |
| 07/18/2001 | CN1068677C 原子力显微镜 AFM |
| 07/18/2001 | CN1068639C Apparatus for deposition of film on substrate |
| 07/17/2001 | US6262638 Tunable and matchable resonator coil assembly for ion implanter linear accelerator |
| 07/17/2001 | US6262539 Cathode arc source with target feeding apparatus |
| 07/17/2001 | US6262538 High density plasma tool with adjustable uniformity and stochastic electron heating for reduced gas cracking |
| 07/17/2001 | US6262523 Large area atmospheric-pressure plasma jet |
| 07/17/2001 | US6262430 Integrated system for frontside navigation and access of multi-layer integrated circuits |
| 07/17/2001 | US6262429 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 07/17/2001 | US6262428 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 07/17/2001 | US6262427 Variable transmission reticle for charged particle beam lithography tool |
| 07/17/2001 | US6262425 Curvilinear axis set-up for charged particle lithography |
| 07/17/2001 | US6261428 Magnetron plasma process apparatus |
| 07/17/2001 | US6261421 Particle-free cathodic arc carbon ion source |
| 07/17/2001 | US6261406 Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface |
| 07/17/2001 | US6261375 Plasma processing methods and apparatus |
| 07/17/2001 | US6261374 Clog resistant gas delivery system |
| 07/17/2001 | US6260510 PCVD apparatus and method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 07/12/2001 | WO2001050498A1 Linear drive system for use in a plasma processing system |
| 07/12/2001 | WO2001050497A1 Electrode assembly |
| 07/12/2001 | WO2001050496A1 Automated high-density plasma (hdp) workpiece temperature control |
| 07/12/2001 | WO2001050495A1 Method and device for treating a threadlike body surface |
| 07/12/2001 | WO2001049893A1 Vacuum coating device |
| 07/12/2001 | US20010007778 Continuous monitoring synchronization signals |
| 07/12/2001 | US20010007302 Cooling sputtering surfaces and coil |
| 07/12/2001 | US20010007245 Hf-plasma coating chamber or pecvd coating chamber, its use and method of plating cds using the chamber |
| 07/12/2001 | DE19962198A1 Bestrahlungseinrichtung mit einem hochflexiblen Membranbalg Irradiation facility with a highly flexible bellows |
| 07/12/2001 | DE19960401A1 Electrode for plasma source is helical winding on tubular bearer with distance between windings greater than that between adjacent dark spaces formed by gas discharges |
| 07/12/2001 | DE10065348A1 Ion implantation arrangement alters beam deflection frequency according to at least one of ion type and beam energy, alters minimum scan number according to deflection frequency change |
| 07/12/2001 | DE10060002A1 Vorrichtung zur Oberflächenbehandlung Surface treatment apparatus |
| 07/11/2001 | EP1115147A1 Plasma process device |
| 07/11/2001 | EP1115141A1 Method and device for the surface treatment of a filamentary body |
| 07/11/2001 | EP1115140A2 Plasma processing apparatus |
| 07/11/2001 | EP1114805A1 Plasma-resistant member and plasma treatment apparatus using the same |
| 07/11/2001 | EP1114436A2 Physical vapor processing of a surface with non-uniformity compensation |
| 07/11/2001 | EP1114435A1 Method for examining and/or modifying surface structures of a sample |
| 07/11/2001 | EP1114434A1 Ac glow plasma discharge device having an electrode covered with apertured dielectric |
| 07/11/2001 | EP1114201A1 Device and method for the vacuum plasma processing of objects |
| 07/11/2001 | EP1113980A1 Aperture in a semiconductor material, and the production and use thereof |
| 07/11/2001 | EP1113898A4 Permanent magnet ecr plasma source with magnetic field optimization |
| 07/11/2001 | EP1113898A1 Permanent magnet ecr plasma source with magnetic field optimization |
| 07/11/2001 | EP0983394B1 Method and apparatus for low pressure sputtering |
| 07/11/2001 | CN1303516A Resin molder article for chamber liner |
| 07/10/2001 | US6259334 Methods for controlling an RF matching network |
| 07/10/2001 | US6259209 Plasma processing apparatus with coils in dielectric windows |
| 07/10/2001 | US6259106 Apparatus and method for controlling a beam shape |
| 07/10/2001 | US6259105 System and method for cleaning silicon-coated surfaces in an ion implanter |
| 07/10/2001 | US6259102 Direct current gas-discharge ion-beam source with quadrupole magnetic separating system |
| 07/10/2001 | US6259094 Electron beam inspection method and apparatus |
| 07/10/2001 | US6259093 Surface analyzing apparatus |
| 07/10/2001 | US6258511 Dividing pattern to be transferred; forming stripes; masking; exposuring zones; transferring light source |
| 07/10/2001 | US6258287 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
| 07/10/2001 | US6258217 For depositing metal and metal-reactive gas coatings onto a substrate |
| 07/10/2001 | US6258204 Electrically planar upper electrode cover |
| 07/10/2001 | US6257168 Elevated stationary uniformity ring design |
| 07/05/2001 | WO2001048794A2 Enhanced etching/smoothing of dielectric surfaces |
| 07/05/2001 | WO2001048792A1 Plasma reactor with dry clean antenna and method |
| 07/05/2001 | WO2001048791A1 Method of manufacturing an electrode for a plasma reactor and such an electrode |
| 07/05/2001 | WO2001048789A1 Plasma processing methods |
| 07/05/2001 | WO2001048788A1 Arrangement for coupling microwave energy into a treatment chamber |
| 07/05/2001 | WO2001048787A1 Multi-electron -beam lithography apparatus with mutually different beam limiting apertures |
| 07/05/2001 | WO2001047646A1 System for automatic control of the wall bombardment to control wall deposition |
| 07/05/2001 | WO2001006544A3 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 07/05/2001 | WO2000067291A3 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 07/05/2001 | WO2000003169A3 Manifold system of removable components for distribution of fluids |
| 07/05/2001 | US20010006708 Evaporator can be rotated about the main axis of a bore to allow the evaporation point to be adapted to various vapor coating conditions and substrate shapes without removing connections and connecting lines |
| 07/05/2001 | US20010006216 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation |
| 07/05/2001 | US20010006213 "Specimen-carrier accessory device for the stereoscopic analysis by scanning electron microscope" |
| 07/05/2001 | US20010006169 Method for improving ash rate uniformity in photoresist ashing process equipment |
| 07/05/2001 | US20010006096 Comprising central vacuum chamber, substrate processing chambers arranged about sides of central vacuum chamber, queuing station disposed on side of central chamber vacuum locks, arm assembly for receiving and distributing substrates |
| 07/05/2001 | US20010006094 Vacuum processing apparatus for semiconductor process |
| 07/05/2001 | US20010006093 For making raw material gas plasma by generating plasma in a casing provided with plasma generation means, raw material gas inlet and substrate support table, by plasma generation means and treatment of surface of substrate placed on table |
| 07/05/2001 | US20010006070 Surface-treated shower head for use in a substrate processing chamber |
| 07/05/2001 | DE19963874A1 Device for depositing thin layers by means of cathode sputtering comprises an auxiliary electrode provided in the plasma chamber which is subjected to a high frequency |
| 07/05/2001 | DE19962890A1 Apparatus for cathodic sputtering used in production of layers on substrate in vacuum chamber has components made of non-magnetic material arranged outside of apparatus, sputtering cathode, yoke, pole piece and substrate to be coated |
| 07/05/2001 | DE19962889A1 Apparatus for cathodic sputtering used in the production of layers on a substrate in a vacuum chamber has screening elements in the region of the sputtering cathode, the yoke, pole piece and/or the substrate to be coated |
| 07/05/2001 | DE19961104A1 Verfahren und Vorrichtung zur Überwachung von Ätzkammern Method and device for monitoring etch chambers |
| 07/05/2001 | DE19815456C2 Verfahren zum Betreiben einer Elektronenkanone A method of operating an electron gun |
| 07/04/2001 | EP1113482A1 High energy electron diffraction apparatus |
| 07/04/2001 | EP1113088A1 Method and apparatus for coating by plasma sputtering |
| 07/04/2001 | EP1112588A1 Electromagnetic field generator and method of operation |
| 07/04/2001 | EP1112587A1 Device and method for etching a substrate by means of an inductively coupled plasma |
| 07/04/2001 | CN1301880A Self ionizing plasma for sputter copper |
| 07/03/2001 | US6255693 Ion implantation with programmable energy, angle, and beam current |