| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/08/2001 | EP0832497A4 System and method for producing superimposed static and time-varying magnetic fields |
| 08/08/2001 | CN1307671A Vacuum tight coupling for tube sections |
| 08/08/2001 | CN1069439C Surface treatment method and system |
| 08/07/2001 | US6272392 Methodology for extracting effective lens aberrations using a neural network |
| 08/07/2001 | US6271852 boundary processing of oblique overlapping graphics to achieve dimensionally accurate electron beam irradiation |
| 08/07/2001 | US6271531 Charged beam drawing apparatus and method thereof |
| 08/07/2001 | US6271530 Apparatus for reducing distortion in fluid bearing surfaces |
| 08/07/2001 | US6271529 Ion implantation with charge neutralization |
| 08/07/2001 | US6271519 Analysis of semiconductor surfaces by secondary ion mass spectrometry |
| 08/07/2001 | US6271498 Apparatus for vaporizing liquid raw material and method of cleaning CVD apparatus |
| 08/07/2001 | US6271148 Method for improved remote microwave plasma source for use with substrate processing system |
| 08/07/2001 | US6271129 Method for forming a gap filling refractory metal layer having reduced stress |
| 08/07/2001 | US6270862 Placing substrate on substrate holder in processing chamber, wherein an interior surface of a dielectric member forming a wall of process chamber faces substrate holder; supplying process gas into chamber; energizing to deposit film |
| 08/07/2001 | US6270859 Plasma treatment of titanium nitride formed by chemical vapor deposition |
| 08/07/2001 | US6270857 Method of modifying a surface of an insulator |
| 08/07/2001 | US6270687 RF plasma method |
| 08/07/2001 | US6270633 Comprising: a target, a magnetron magnet, a chimney, a disc shaped dome, a substrate; for depositing a gigantic magneto-resistive film |
| 08/07/2001 | US6270618 Plasma processing apparatus |
| 08/07/2001 | US6270617 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 08/07/2001 | US6269765 Collection devices for plasma immersion ion implantation |
| 08/02/2001 | WO2001056058A1 Method of forming regular array of microscopic structures on a substrate |
| 08/02/2001 | WO2001056057A1 Method for detecting geometrical-optical aberrations |
| 08/02/2001 | WO2001056056A2 Objective lens for a charged particle beam device |
| 08/02/2001 | WO2001055475A2 System and method for deposition of coatings on a substrate |
| 08/02/2001 | US20010010841 Forming a covering layer of a material different to a substance of the sample surface, forming a protective layer by spraying and irridiating the vicinity of cross-section to be observed with ion beam so as to open hole for observation |
| 08/02/2001 | US20010010362 Methods and devices for achieving alignment of a beam-propagation axis with a center of an aperture in a charged-particle-beam optical system |
| 08/02/2001 | US20010010359 Methods and apparatus for improving resolution and reducing noise in an image detector for an electron microscope |
| 08/02/2001 | US20010010358 Transmission electron microscope equipped with energy filter |
| 08/02/2001 | US20010010357 Scanning electron microscope |
| 08/02/2001 | US20010010257 Gas injection system for plasma processing |
| 08/02/2001 | US20010010255 Dry etching endpoint detection system |
| 08/02/2001 | US20010010228 Method of protecting quartz hardware from etching during plasma-enhanced cleaning of a semiconductor processing chamber |
| 08/02/2001 | US20010010207 Plasma process apparatus |
| 08/02/2001 | DE10100746A1 Vorrichtung und Verfahren zum Bilden von Filmen Apparatus and method for forming films |
| 08/02/2001 | DE10003127A1 Verfahren zur Ermittlung geometrisch optischer Abbildungsfehler Method for determining geometric optical aberrations |
| 08/01/2001 | EP1120820A2 Method and apparatus for forming interconnect |
| 08/01/2001 | EP1120811A2 Planar-type magnetron sputtering apparatus |
| 08/01/2001 | EP1120810A1 Column for a charged particle beam device |
| 08/01/2001 | EP1120809A1 Objective lens for a charged particle beam device |
| 08/01/2001 | EP1120024A1 Slotted waveguide structure for generating plasma discharges |
| 08/01/2001 | EP0739536B1 Charged particle projector system |
| 08/01/2001 | CN1306202A Method for detecting single microparticle of sulfate and nitrate |
| 07/31/2001 | US6269472 Optical proximity correction method and apparatus |
| 07/31/2001 | US6268700 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 07/31/2001 | US6268609 Apparatus and method for reducing heating of a workpiece in ion implantation |
| 07/31/2001 | US6268606 Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up |
| 07/31/2001 | US6268582 ECR plasma CVD apparatus |
| 07/31/2001 | US6267852 Method of forming a sputtering apparatus |
| 07/31/2001 | US6267851 Tilted sputtering target with shield to block contaminants |
| 07/31/2001 | US6267074 Plasma treatment systems |
| 07/26/2001 | WO2001054164A1 Impedance adapted microwave energy coupling device |
| 07/26/2001 | WO2001054163A1 Shaped and low density focused ion beams |
| 07/26/2001 | WO2001054162A1 Column for a charged particle beam device |
| 07/26/2001 | WO2001053891A1 Method for ionic lithography, high contrast coating, equipment and reticle therefor |
| 07/26/2001 | WO2001053564A1 Method and apparatus for neutralization of ion beam using ac or dc ion source |
| 07/26/2001 | WO2001053562A1 Conical sputtering target |
| 07/26/2001 | US20010009459 Method and apparatus employing external light source for endpoint detection |
| 07/26/2001 | US20010009267 Electromagnet and magnetic field generating apparatus |
| 07/26/2001 | US20010009225 Method and device for pvd coating |
| 07/26/2001 | US20010009224 Planar-type magnetron sputtering apparatus |
| 07/26/2001 | US20010009221 Film-forming apparatus and film-forming method |
| 07/26/2001 | US20010009220 Forming plasma in space facing substrate surface; imposing pulse voltage of lower frequency than the oscillation frequency of plasma ions on substrate causing thin film to be produced on substrate |
| 07/26/2001 | US20010009177 Systems and methods for two-sided etch of a semiconductor substrate |
| 07/26/2001 | US20010009139 Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system |
| 07/26/2001 | DE10048646A1 Mask component used in electron beam lithography system, has electroconductive antioxidation layer which is formed on surface of base material with area irradiated by charged particle beam |
| 07/26/2001 | DE10002586A1 Device for generating electron beams has a beam-generating unit in a casing with its top part separated from its bottom part by a base plate consisting of a heated cathode and a Wehnelt electrode surrounding the cathode. |
| 07/26/2001 | DE10001936A1 Microwave internal plasma-coating apparatus for bottles, has microwave coupling system at one end, opposite coaxial waveguide including gas supply tube |
| 07/25/2001 | EP1119033A1 Plasma processing method |
| 07/25/2001 | EP1119030A1 Plasma reactor |
| 07/25/2001 | EP1119017A2 Vault shaped target and high-field magnetron |
| 07/25/2001 | EP1119016A2 Gas shower unit for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus |
| 07/25/2001 | EP1118693A2 Suspended gas distribution manifold for plasma chamber |
| 07/25/2001 | EP1118692A1 Remote plasma apparatus |
| 07/25/2001 | EP1118113A1 Methods and apparatus for determining an etch endpoint in a plasma processing system |
| 07/25/2001 | EP1118095A1 Vacuum treatment chamber and method for treating surfaces |
| 07/25/2001 | EP1118094A1 Method and apparatus for producing a uniform density plasma above a substrate |
| 07/25/2001 | EP1118093A1 Integrated electron gun and electronics module |
| 07/25/2001 | EP1117850A1 Sputter deposition apparatus |
| 07/25/2001 | CN2440264Y Single-electric-charge state ECR ion source |
| 07/25/2001 | CN1305636A Planar electron emitter (PEE) |
| 07/25/2001 | CN1305225A Device inspection apparatus and inspection method |
| 07/25/2001 | CN1068813C Electromechanical positioning unit |
| 07/24/2001 | US6265831 Plasma processing method and apparatus with control of rf bias |
| 07/24/2001 | US6265812 Electron multiplier |
| 07/24/2001 | US6265722 Organic field ionization source |
| 07/24/2001 | US6265719 Inspection method and apparatus using electron beam |
| 07/24/2001 | US6265718 Scanning probe microscope with scan correction |
| 07/24/2001 | US6265033 Method for optically coupled vapor deposition |
| 07/24/2001 | US6265031 Method for plasma processing by shaping an induced electric field |
| 07/24/2001 | US6264852 Substrate process chamber and processing method |
| 07/24/2001 | US6264812 Method and apparatus for generating a plasma |
| 07/24/2001 | US6264803 Apparatus and method for sputtering |
| 07/24/2001 | US6264788 Plasma treatment method and apparatus |
| 07/24/2001 | US6263830 Microwave choke for remote plasma generator |
| 07/19/2001 | WO2001052303A1 Liner for semiconductor etching chamber |
| 07/19/2001 | WO2001052302A1 Segmented electrode assembly and method for plasma processing |
| 07/19/2001 | WO2001052301A1 Electron-optical corrector for eliminating third-order aberrations |
| 07/19/2001 | WO2001051296A1 Pumping system for reducing the effects of wafer outgasing on beam purity in an ion implanter |
| 07/19/2001 | WO2001051183A1 Enhanced faraday cup for diagnostic measurements in an ion implanter |
| 07/19/2001 | US20010008806 Process for producing a semiconductor device |