| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/23/2001 | WO2001061726A1 Method and apparatus for inductively coupled plasma treatment |
| 08/23/2001 | WO2001061725A1 Emission electron microscope |
| 08/23/2001 | WO2001060456A1 Multi-beam multi-column electron beam inspection system |
| 08/23/2001 | US20010016938 Inspection method and inspection system using charged particle beam |
| 08/23/2001 | US20010016430 Method of processing a semiconductor device |
| 08/23/2001 | US20010016299 Absorbs a very low percentage of incident charged particles and hence does not experience excessive temperature increases due to bombardment by and absorption of incident charged particles |
| 08/23/2001 | US20010016295 Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography |
| 08/23/2001 | US20010016294 Methods and devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system |
| 08/23/2001 | US20010016237 Method for the operation of an electron beam |
| 08/23/2001 | US20010016234 Method and system for shielding secondary x-rays from an electron beam irradiating unit |
| 08/23/2001 | US20010016166 Plasma vacuum pumping cell |
| 08/23/2001 | US20010015413 Electron beam drawing process and electron beam drawing apparatus |
| 08/23/2001 | US20010015344 Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD |
| 08/23/2001 | US20010015262 Apparatus and method for plasma treatment |
| 08/23/2001 | US20010015261 Processing method and apparatus for removing oxide film |
| 08/23/2001 | US20010015175 Plasma processing system and apparatus and a sample processing method |
| 08/22/2001 | EP1126504A1 Method and apparatus for inductively coupled plasma treatment |
| 08/22/2001 | EP1126503A1 Microscope with an electron beam for illumination |
| 08/22/2001 | EP1126502A1 Method and system for shielding secondary X-rays from an electron beam irradiating unit |
| 08/22/2001 | EP1125317A2 Chamber liner for semiconductor process chambers |
| 08/22/2001 | EP1125002A1 Systems and methods for two-sided etch of a semiconductor substrate |
| 08/22/2001 | EP1125001A1 An in-line sputter deposition system |
| 08/22/2001 | EP0951578B1 Precision etching and coating system |
| 08/22/2001 | EP0819314B1 Method and device for controlling the energy of at least one charged species bombarding a body immersed in a plasma |
| 08/22/2001 | EP0811238B1 Reactive sputtering device |
| 08/22/2001 | CN1069931C Vacuum sputtering apparatus |
| 08/21/2001 | US6278124 Electron beam blanking method and system for electron beam lithographic processing |
| 08/21/2001 | US6278114 Method and apparatus for measuring dimensions of a feature of a specimen |
| 08/21/2001 | US6278113 Scanning probe microscope |
| 08/21/2001 | US6277542 Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density |
| 08/21/2001 | US6277532 Charged-particle-beam microlithographic methods for correction of reticle distortions |
| 08/21/2001 | US6277531 Charged-particle-beam microlithography apparatus and methods including focal-point correction |
| 08/21/2001 | US6277530 Method for making partial full-wafer pattern for charged particle beam lithography |
| 08/21/2001 | US6277253 External coating of tungsten or tantalum or other refractory metal on IMP coils |
| 08/21/2001 | US6277251 Adjusting the density of plasma contained in a chamber where semiconductor wafers are processed, and etching or depositing a metal layer on a substrate |
| 08/21/2001 | US6277250 Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features |
| 08/21/2001 | US6277249 Integrated process for copper via filling using a magnetron and target producing highly energetic ions |
| 08/21/2001 | US6277237 Chamber liner for semiconductor process chambers |
| 08/16/2001 | WO2001060133A1 Methods and apparatus for operating high energy accelerator in low energy mode |
| 08/16/2001 | WO2001059809A1 An atmospheric pressure plasma system |
| 08/16/2001 | WO2001059808A1 Electron beam emitter for use in an electron beam evaporation source |
| 08/16/2001 | WO2001059807A1 In-situ probe for optimizing electron beam inspection and metrology based on surface potential |
| 08/16/2001 | WO2001059806A1 Through-the-lens collection of secondary particles for a focused ion beam system |
| 08/16/2001 | WO2001059805A1 Multi-column fib for nanofabrication applications |
| 08/16/2001 | WO2001059804A2 Device and method for coupling two circuit components which have different impedances |
| 08/16/2001 | WO2001013410A9 Wafer holder assembly |
| 08/16/2001 | US20010014540 Inserting poultry litter into extruder, pushing through constrictions under pressure, grinding, heating through friction and pressure for predetermined time, forcing through tube having predetermined diameter, pelletizing |
| 08/16/2001 | US20010014520 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units |
| 08/16/2001 | US20010014374 Conductive support and an insulator provided on the upper surface of the support |
| 08/16/2001 | US20010014003 Integrated power modules for plasma processing systems |
| 08/16/2001 | US20010013581 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 08/16/2001 | US20010013578 Ion implantation equipment and implantation method thereof |
| 08/16/2001 | US20010013504 Plasma treatment method and apparatus |
| 08/16/2001 | US20010013470 Mirrortron sputtering apparatus |
| 08/16/2001 | US20010013371 Gas panel |
| 08/16/2001 | EP1124251A2 Electron energy filter with magnetic deflection unit |
| 08/16/2001 | EP1124129A2 Device and method for two-dimensional detection of particles or electromagnetic radiation |
| 08/16/2001 | EP1123558A1 Schottky emitter having extended life |
| 08/16/2001 | EP1123422A1 Electron beam physical vapor deposition apparatus and method |
| 08/16/2001 | DE10004824A1 Production of substrates coated with a layer consisting of two different heavy elements comprises magnetron sputtering a target made of a compound of the two elements |
| 08/16/2001 | DE10004391A1 Verfahren zur Durchführung eines Plasmaätzprozesses A method for performing a plasma etching process |
| 08/15/2001 | CN1308771A Method and apparatus for ionized physical vapor deposition |
| 08/15/2001 | CN1308689A Method and apparatus for increasing wafer throughput between cleanings in semiconductor processing reactors |
| 08/14/2001 | US6275604 Method and apparatus for generating semiconductor exposure data |
| 08/14/2001 | US6274876 Inspection apparatus and method using particle beam and the particle-beam-applied apparatus |
| 08/14/2001 | US6274875 Fluid bearing vacuum seal assembly |
| 08/14/2001 | US6274502 Method for plasma etching |
| 08/14/2001 | US6274290 Raster scan gaussian beam writing strategy and method for pattern generation |
| 08/14/2001 | US6274058 Remote plasma cleaning method for processing chambers |
| 08/14/2001 | US6274008 Sputtering, magnetron producing a large volume of plasma, preferably a high-density plasma, long travel path allows large fraction of the sputtered atoms to be ionized so their energy can be controlled by substrate biasing. simultaneous |
| 08/14/2001 | US6273991 Apparatus for plasma ion trimming of frequency devices |
| 08/14/2001 | US6273958 Substrate support for plasma processing |
| 08/14/2001 | US6273022 Distributed inductively-coupled plasma source |
| 08/14/2001 | CA2194742C Process and device for coating a substrate surface |
| 08/09/2001 | WO2001058223A1 Plasma processing system and method |
| 08/09/2001 | WO2001057912A1 Magnetic array for sputtering system |
| 08/09/2001 | WO2001057911A1 Method for carrying out a plasma etching process |
| 08/09/2001 | WO2001057910A1 Optical column for charged particle beam device |
| 08/09/2001 | WO2001057909A1 Object carrier for a particle-optical apparatus |
| 08/09/2001 | WO2001057908A2 A method and apparatus for implanting semiconductor wafer substrates |
| 08/09/2001 | WO2001057596A1 Active reticle, method for making and controlling same, ion projecting lithography using same and equipment therefor |
| 08/09/2001 | WO2001057288A1 Electron beam physical vapor deposition apparatus and viewport therefor |
| 08/09/2001 | WO1999054694A9 Method and apparatus for monitoring plasma processing operations |
| 08/09/2001 | US20010012069 Confocal microscope with a motorized scanning table |
| 08/09/2001 | US20010011887 Micro-mechanical probes for charge sensing |
| 08/09/2001 | US20010011707 Object carrier for a particle-optical apparatus |
| 08/09/2001 | US20010011702 Electron beam apparatus |
| 08/09/2001 | US20010011700 Method of forming a micro-aperture, projection having a micro-aperture, probe or multi-probe having such a projection and surface scanner, aligner or information processor comprising such a probe |
| 08/09/2001 | US20010011526 Processing chamber for atomic layer deposition processes |
| 08/09/2001 | US20010011525 Microwave plasma processing system |
| 08/09/2001 | DE10103341A1 Plasma treatment device used for etching and cleaning the surface of a wafer comprises an upper electrode and a lower electrode arranged in a vacuum chamber, a high frequency supply |
| 08/09/2001 | DE10005347A1 Device with magnetic deflecting areas and w-shaped beam guide for filtering electron energy includes four magnetic deflecting areas separated from each other by drift tracks in an area free of magnetic fields. |
| 08/09/2001 | DE10004492A1 Elektronenmikroskop mit grüner Leuchtstoffzubereitung Electron microscope with green phosphor composition |
| 08/09/2001 | DE10004491A1 Elektronenmikroskop mit grün lumineszierendem Leuchtschirm Electron microscope with green luminescent phosphor screen |
| 08/08/2001 | EP1122762A2 Power delivery system |
| 08/08/2001 | EP1122761A1 Optical column for charged particle beam device |
| 08/08/2001 | EP1122337A2 Apparatus and method for forming deposited film |
| 08/08/2001 | EP1122336A2 Apparatus and method for forming a deposited film by means of plasma CVD |
| 08/08/2001 | EP1121706A1 Integrated power modules for plasma processing systems |
| 08/08/2001 | EP1121704A1 Electron beam aperture element with beam shielding |