| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/13/2001 | DE10010831A1 Low pressure microwave plasma treatment method for plastic bottles involves filling bottles with process gas and subjecting to microwaves from a plasma in a vacuum chamber |
| 09/13/2001 | DE10010706A1 Hollow cathode sputter ion source for generating high intensity ion beams has electromagnet, externally heated cathode, cooled anti-cathode, cooled anode for Penning plasma |
| 09/13/2001 | DE10008482A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/12/2001 | EP1132946A1 Ion beam processing apparatus |
| 09/12/2001 | EP1132945A2 Method and device for producing curved lines on an irradiation sensitive resist |
| 09/12/2001 | EP1132944A2 Method of aligning an electron beam with a target position on a substrate surface |
| 09/12/2001 | EP1132495A1 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 09/12/2001 | EP1131679A1 System to reduce heat-induced distortion of photomasks during lithography |
| 09/12/2001 | EP1036207B1 Device for processing workpieces in low pressured plasma |
| 09/12/2001 | EP0979420B1 Method and device for active compensation of magnetic and electromagnetic disturbance fields |
| 09/12/2001 | EP0778902B1 Jet plasma deposition process and apparatus |
| 09/12/2001 | EP0680384B1 Microwave energized process for the preparation of high quality semiconductor material |
| 09/12/2001 | CN1312954A Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 09/12/2001 | CN1312578A Ion source and operation method thereof |
| 09/11/2001 | US6288493 Antenna device for generating inductively coupled plasma |
| 09/11/2001 | US6288407 Electron beam-writing apparatus and electron beam-writing method |
| 09/11/2001 | US6288406 Electron beam lithography system having variable writing speed |
| 09/11/2001 | US6288405 Method for determining ultra shallow junction dosimetry |
| 09/11/2001 | US6288404 Proximity lithography device |
| 09/11/2001 | US6288403 Decaborane ionizer |
| 09/11/2001 | US6288402 High sensitivity charge amplifier for ion beam uniformity monitor |
| 09/11/2001 | US6288401 Electrostatic alignment of a charged particle beam |
| 09/11/2001 | US6288394 Highly charged ion based time of flight emission microscope |
| 09/11/2001 | US6288393 Automated method of circuit analysis |
| 09/11/2001 | US6287981 Electrode for generating a plasma and a plasma processing apparatus using the same |
| 09/11/2001 | US6287980 Plasma processing method and plasma processing apparatus |
| 09/11/2001 | US6287976 Plasma processing methods and apparatus |
| 09/11/2001 | US6287876 Reticle-substrate alignment methods for charged-particle-beam microlithography, and associated semiconductor-device manufacturing methods |
| 09/11/2001 | US6287731 Methods for making microlithography masks utilizing temperature control |
| 09/11/2001 | US6287635 High rate silicon deposition method at low pressures |
| 09/11/2001 | US6287435 Method and apparatus for ionized physical vapor deposition |
| 09/11/2001 | US6287004 Fluid bearing operable in a vacuum region |
| 09/11/2001 | US6286454 Plasma process device |
| 09/11/2001 | US6286453 Shield design for IBC deposition |
| 09/11/2001 | US6286451 Dome: shape and temperature controlled surfaces |
| 09/11/2001 | CA2195366C Process and imaging a ferroelectric printing form and printing head |
| 09/07/2001 | WO2001065895A2 Electrically controlled plasma uniformity in a high density plasma source |
| 09/07/2001 | WO2001065596A2 Method for controlling uniformity of treatment of a surface of material for microelectronics with an electrically charged particle beam and equipment therefor |
| 09/07/2001 | WO2001065588A2 Method and apparatus for performing highly ionized, low energy physical vapor deposition |
| 09/07/2001 | WO2001065587A1 Method and device for plasma-treating the surface of substrates by ion bombardment |
| 09/07/2001 | WO2001065314A2 Patterning methods and systems using reflected interference patterns |
| 09/07/2001 | WO2000046831A9 Precision alignment and assembly of microlenses and microcolumns |
| 09/07/2001 | CA2353490A1 Method and apparatus for low energy electron enhanced etching of substrates in an ac or dc plasma environment |
| 09/06/2001 | US20010019881 Plasma processing apparatus and method |
| 09/06/2001 | US20010019812 Charged-particle-beam microlithography apparatus and methods for exposing a segmented reticle |
| 09/06/2001 | US20010019777 Heat resistant, noncracking, corrosion resistance |
| 09/06/2001 | US20010019237 Plasma processing apparatus |
| 09/06/2001 | US20010019109 Scanning electron microscope |
| 09/06/2001 | US20010019108 Analysis of semiconductor surfaces by secondary ion mass spectrometry |
| 09/06/2001 | US20010019016 For use in semiconductor fabrication; recessing the coil reduces deposition of material onto the coil, reducing particulate matter shed by the coil onto the workpiece |
| 09/06/2001 | US20010018951 Plasma processing apparatus and plasma processing method |
| 09/06/2001 | DE10008485A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/06/2001 | DE10007650A1 Mikroskop mit einem Elektronenstrahl zur Beleuchtung Microscope with an electron beam to illuminate |
| 09/05/2001 | EP1130948A1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 09/05/2001 | EP1130624A2 Coil and coil support for generating a plasma |
| 09/05/2001 | EP1130623A1 Apparatus for ion implantation |
| 09/05/2001 | EP1129466A1 Device and method for generating a local plasma by micro-structure electrode discharges with microwaves |
| 09/05/2001 | EP0562035B2 Minimization of particle generation in cvd reactors and methods |
| 09/05/2001 | CN1311707A ESRF coolant degassing process |
| 09/04/2001 | US6285133 Ion implanter with multi-level vacuum |
| 09/04/2001 | US6284674 Plasma processing device and a method of plasma process |
| 09/04/2001 | US6284673 Method for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 09/04/2001 | US6284659 Method of minimizing defect sources inside high density plasma reactor |
| 09/04/2001 | US6284110 Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines |
| 09/04/2001 | US6284106 Method of producing flat panels |
| 09/04/2001 | US6284093 Shield or ring surrounding semiconductor workpiece in plasma chamber |
| 09/04/2001 | US6283130 Plasma cleaning method and placement area protector used in the method |
| 09/04/2001 | US6283060 Plasma CVD apparatus |
| 08/30/2001 | WO2001063982A1 High-frequency matching network |
| 08/30/2001 | WO2001063981A1 High frequency plasma source |
| 08/30/2001 | WO2001063660A1 Apparatus for detecting defect in device and method of detecting defect |
| 08/30/2001 | WO2001063643A1 Method for controlling plasma density or the distribution thereof |
| 08/30/2001 | WO2001063642A1 Multi-zone rf electrode for capacitive plasma sources |
| 08/30/2001 | WO2001063266A2 System for imaging a cross-section of a substrate |
| 08/30/2001 | WO2001063204A1 Method for increasing the measurement information available from a transmission electron microscope and a transmission electron microscopy device |
| 08/30/2001 | WO2001063003A1 Device and method for carrying out plasma enhanced surface treatment of substrates in a vacuum |
| 08/30/2001 | WO2001063000A2 Method and apparatus for depositing films |
| 08/30/2001 | WO2000039837A8 Perforated plasma confinement ring in plasma reactors |
| 08/30/2001 | US20010018272 Plasma treatment apparatus and method |
| 08/30/2001 | US20010017739 Multi-beam lithography apparatus with mutually different beam limiting apertures |
| 08/30/2001 | US20010017524 Plasma processing system |
| 08/30/2001 | US20010017488 Circuit for automatically inverting electrical lines connected to a device upon detection of a miswired condition to allow for operation of device even if miswired |
| 08/30/2001 | US20010017355 Electron beam lithography apparatus and lithography method |
| 08/30/2001 | US20010017353 Ion source and operation method thereof |
| 08/30/2001 | US20010017109 Enhanced plasma mode and system for plasma immersion ion implantation |
| 08/29/2001 | EP1128414A1 Modulated power for ionized metal plasma deposition |
| 08/29/2001 | EP1128413A1 Method of observing image and scanning electron microscope |
| 08/28/2001 | US6281512 Ion implantation system having direct and alternating current sources |
| 08/28/2001 | US6281509 Method and apparatus for imaging through 3-dimensional tracking of protons |
| 08/28/2001 | US6281508 Precision alignment and assembly of microlenses and microcolumns |
| 08/28/2001 | US6281496 Observing/forming method with focused ion beam and apparatus therefor |
| 08/28/2001 | US6281495 Method of producing magnetic force image and scanning probe microscope |
| 08/28/2001 | US6281469 Capacitively coupled RF-plasma reactor |
| 08/28/2001 | US6280585 Sputtering apparatus for filling pores of a circular substrate |
| 08/28/2001 | US6280579 Applying power to bias target; detecting fluctuations in power being applied to target; providing target misalignment indication signal as function of detected power fluctuations |
| 08/28/2001 | US6280563 Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma |
| 08/28/2001 | US6279504 Plasma CVD system |
| 08/23/2001 | WO2001062053A2 Active control of electron temperature in an electrostatically shielded radio frequency plasma source |
| 08/23/2001 | WO2001061728A1 Method and apparatus for plasma deposition |
| 08/23/2001 | WO2001061727A1 Method and device for attenuating harmonics in semiconductor plasma processing systems |