| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/02/2001 | US6296976 Compensation of within-subfield linewidth variation in e-beam projection lithography |
| 10/02/2001 | US6296925 Aperture for charged beam drawing machine and method for forming the same |
| 10/02/2001 | US6296747 Baffled perforated shield in a plasma sputtering reactor |
| 10/02/2001 | US6296743 Direct current sputtering; negatively biased target; positively biased anode; oxidation; plasma discharge |
| 10/02/2001 | US6296742 Method and apparatus for magnetically enhanced sputtering |
| 10/02/2001 | US6296255 Sealing mechanism for sealing a vacuum chamber |
| 09/27/2001 | WO2001072093A2 Plasma accelerator arrangement |
| 09/27/2001 | WO2001071790A1 Method of manufacturing semiconductor device |
| 09/27/2001 | WO2001071782A1 Electron beam lithography device and drawing method using electron beams |
| 09/27/2001 | WO2001071766A1 Column simultaneously focusing a particle beam and an optical beam |
| 09/27/2001 | WO2001071765A2 Plasma reactor with overhead rf electrode tuned to the plasma |
| 09/27/2001 | WO2001033232A3 Precision stage |
| 09/27/2001 | WO2001031681A8 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system |
| 09/27/2001 | WO2000079564A3 Plasma reactor with internal inductive antenna capable of generating helicon wave |
| 09/27/2001 | US20010025205 Construction of a film on a semiconductor wafer |
| 09/27/2001 | US20010023926 Method of forming a quadrupole device for projection lithography by means of charged particles |
| 09/27/2001 | US20010023822 Ion plating device and ion plating method |
| 09/27/2001 | US20010023744 Plasma treatment method and apparatus |
| 09/27/2001 | US20010023743 Apparatus and method for pulsed plasma processing of a semiconductor substrate |
| 09/27/2001 | US20010023742 Plasma reactor for the treatment of large size substrates |
| 09/27/2001 | US20010023741 Inductively coupled plasma downstream strip module |
| 09/27/2001 | US20010023663 Mechanically softened tissues and towels; increased surface fuzziness |
| 09/27/2001 | DE10056564A1 Plasma-activated surface treatment involves placing insulator between two electrodes with no shape-locking contact in defined surface areas |
| 09/27/2001 | DE10008483A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/26/2001 | EP1137054A1 Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
| 09/26/2001 | EP1137042A2 Plasma processing chamber |
| 09/26/2001 | EP1135789A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 09/26/2001 | EP1029340A4 Apparatus and method for secondary electron emission microscope |
| 09/26/2001 | EP1019942A4 Electron beam microscope using electron beam patterns |
| 09/26/2001 | EP0902962B1 Apparatus for plasma jet treatment of substrates |
| 09/26/2001 | EP0754289B1 Measurement of AFM cantilever deflection with high frequency radiation and dopant profiler |
| 09/26/2001 | CN1315051A Device for shaping an electron beam, method for producing said device and use thereof |
| 09/26/2001 | CN1315002A High resolution analytical probe station |
| 09/25/2001 | US6294862 Multi-cusp ion source |
| 09/25/2001 | US6294780 Pulsed ion source for ion trap mass spectrometer |
| 09/25/2001 | US6294466 HDP-CVD apparatus and process for depositing titanium films for semiconductor devices |
| 09/25/2001 | US6294227 Method of forming protective film on plastic part for vehicle-use and apparatus |
| 09/25/2001 | US6293310 Gas panel |
| 09/25/2001 | US6293291 Method and apparatus for the treatment of objects, preferably wafers |
| 09/25/2001 | US6293222 Remote-plasma-CVD method for coating or for treating large-surface substrates and apparatus for performing same |
| 09/20/2001 | WO2001069644A1 Method and device for the plasma-activated surface treatment and use of the inventive method |
| 09/20/2001 | WO2001069643A1 Charged particle beam scanning device |
| 09/20/2001 | WO2001069642A2 Plasma deposition method and system |
| 09/20/2001 | WO2001068941A1 Method and implementing device for a chemical reaction |
| 09/20/2001 | WO2001068938A1 Method and apparatus for repairing lithography masks using a charged particle beam system |
| 09/20/2001 | WO2001068934A1 Method and apparatus for performing high pressure physical vapor deposition |
| 09/20/2001 | WO2001035165A8 Data path design for multiple electron beam lithography system |
| 09/20/2001 | WO2000003421A8 Improved endpoint detection for substrate fabrication processes |
| 09/20/2001 | US20010022996 Deposited-film formation apparatus, and deposited-film formation process |
| 09/20/2001 | US20010022991 Vacuum container; electrolytic cell |
| 09/20/2001 | US20010022347 Electron emitters for lithography tools |
| 09/20/2001 | US20010022346 Scanning electron microscope |
| 09/20/2001 | US20010022293 Plasma processing equipment and plasma processing method using the same |
| 09/20/2001 | US20010022271 Electron trap formed by magnetron field of sputter source increases ratio of heavy to light metal deposition along surface of substrate, counteracting demixing |
| 09/20/2001 | US20010022158 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
| 09/20/2001 | US20010022157 Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield |
| 09/20/2001 | DE10012314A1 Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem Detector system for a particle beam apparatus and particle beam device with such a detector system |
| 09/20/2001 | DE10010523A1 Ion beam system for tumor tissue irradiation has two irradiation systems provided with asymmetrical and symmetrical scanning units |
| 09/20/2001 | DE10010126A1 Plasma treatment of substrate surfaces by ion bombardment involves generating plasma from gas using spark ignited and maintained by alternating voltage |
| 09/20/2001 | DE10008484A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/20/2001 | CA2402150A1 Method and implementing device for a chemical reaction |
| 09/19/2001 | EP1134774A2 Plasma processing apparatus |
| 09/19/2001 | EP1134773A2 Method and apparatus for generating a plasma and semiconductor device fabrication method and apparatus |
| 09/19/2001 | EP1134772A1 Detector system for a corpuscular beam apparatus and corpuscular beam apparatus with such a detector system |
| 09/19/2001 | EP1134771A1 Apparatus for producing a flux of charge carriers |
| 09/19/2001 | EP1134297A1 Steel sheet for heat shrink band and method for producing the same |
| 09/19/2001 | EP1133785A2 Detector configuration for efficient secondary electron collection in microcolumns |
| 09/19/2001 | EP1133652A2 Manifold system of removable components for distribution of fluids |
| 09/19/2001 | EP1133581A1 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
| 09/19/2001 | CN1313409A Method for forming electric conductive region by ion implanation |
| 09/18/2001 | US6291999 Plasma monitoring apparatus |
| 09/18/2001 | US6291940 Blanker array for a multipixel electron source |
| 09/18/2001 | US6291938 Methods and apparatus for igniting and sustaining inductively coupled plasma |
| 09/18/2001 | US6291937 High frequency coupler, and plasma processing apparatus and method |
| 09/18/2001 | US6291828 Glass-like insulator for electrically isolating electrodes from ion implanter housing |
| 09/18/2001 | US6291827 Insulating apparatus for a conductive line |
| 09/18/2001 | US6291823 Ion-induced electron emission microscopy |
| 09/18/2001 | US6291819 Method of calibrating an electron beam system for lithography |
| 09/18/2001 | US6291793 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 09/18/2001 | US6291119 Exposure to rescattered electron beams, compensation exposure dosage |
| 09/18/2001 | US6291029 Plasma processing method |
| 09/18/2001 | US6290826 Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly |
| 09/18/2001 | US6290825 High-density plasma source for ionized metal deposition |
| 09/18/2001 | US6290807 Apparatus and method for microwave plasma process |
| 09/18/2001 | US6290806 Plasma reactor |
| 09/18/2001 | US6289842 Plasma enhanced chemical vapor deposition system |
| 09/13/2001 | WO2001067830A1 Quartz antenna with hollow conductor |
| 09/13/2001 | WO2001067502A2 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 09/13/2001 | WO2001067501A1 Apparatus and method for reducing differential sputter rates |
| 09/13/2001 | WO2001067484A1 Magnetron sputter ion plating system |
| 09/13/2001 | WO2001067483A1 Scanning electron microscope |
| 09/13/2001 | WO2001067482A1 Hollow cathode sputter ion source for generating high-intensity ion beams |
| 09/13/2001 | WO2001066822A1 Method and device for coating substrates |
| 09/13/2001 | WO2001066187A1 Ion beam system for irradiating tumour tissues |
| 09/13/2001 | WO2001049893A8 Vacuum coating device |
| 09/13/2001 | US20010021550 Plasma processing method and apparatus |
| 09/13/2001 | US20010021422 Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus |
| 09/13/2001 | US20010021015 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process |
| 09/13/2001 | DE10011202A1 Verfahren zur Ausrichtung eines Elektronenstrahls auf eine Zielposition an einer Substratoberfläche A method for aligning an electron beam to a target position on a substrate surface |
| 09/13/2001 | DE10011201A1 Photosensitive resist exposure method for electron beam lithography uses stepped displacement of substrate in coordinate directions with regulation of electron beam energy after each displacement |