| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/16/2001 | US6302056 Device for coating substrates with a material vapor in negative pressure or vacuum |
| 10/11/2001 | WO2001076329A1 Apparatus for plasma processing |
| 10/11/2001 | WO2001076326A1 Optical monitoring and control system and method for plasma reactors |
| 10/11/2001 | WO2001075951A1 Multibeam exposure apparatus comprising multiaxis electron lens and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075950A1 Multibeam exposure apparatus comprising multiaxis electron lens, method for manufacturing multiaxis electron lens, and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075949A1 Multibeam exposure apparatus comprising multiaxis electron lens and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075948A1 Multibeam exposure apparatus comprising multiaxis electron lens, multiaxis electron lens for focusing electron beams, and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075947A1 Multibeam exposure apparatus comprising multiaxis electron lens, multiaxis electron lens for focusing electron beams, and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075946A1 Multibeam exposure apparatus comprising multiaxis electron lens, multiaxis electron lens for focusing multiple electron beam, and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075934A2 Integrated full wavelength spectrometer for wafer processing |
| 10/11/2001 | WO2001075932A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 10/11/2001 | WO2001075931A2 Inductively coupled plasma etching apparatus |
| 10/11/2001 | WO2001075930A2 Apparatus and methods for actively controlling rf peak-to-peak voltage in an inductively coupled plasma etching system |
| 10/11/2001 | WO2001075929A1 Scanning electron microscope |
| 10/11/2001 | WO2001075523A2 Method and apparatus for multi-pass, interleaved imaging with offline rasterization |
| 10/11/2001 | WO2001075197A1 Method and apparatus for large-scale diamond polishing |
| 10/11/2001 | WO2001075189A2 Cleaning of a plasma processing system silicon roof |
| 10/11/2001 | WO2001075188A2 Method of and apparatus for gas injection |
| 10/11/2001 | WO2001075187A1 System for driving multiple magnetrons with multiple phase ac |
| 10/11/2001 | WO2001037311A3 Method and apparatus for controlling the volume of a plasma |
| 10/11/2001 | WO2001008288A3 Power supplies having protection circuits |
| 10/11/2001 | US20010029112 Apparatus and method for use in manufacturing a semiconductor device |
| 10/11/2001 | US20010029082 Charged-particle-beam microlithography apparatus including selectable systems for determining alignment-mark position, and device-fabrication methods utilizing same |
| 10/11/2001 | US20010028991 Semiconductors; integrated circuits; lasers |
| 10/11/2001 | US20010028981 Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same |
| 10/11/2001 | US20010028046 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device |
| 10/11/2001 | US20010028044 Multi-beam exposure apparatus using a muti-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device |
| 10/11/2001 | US20010028043 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a multi-axis electron lens and fabrication method of a semiconductor device |
| 10/11/2001 | US20010028042 Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device |
| 10/11/2001 | US20010028039 Method for directing an electron beam onto a target position on a substrate surface |
| 10/11/2001 | US20010028038 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method a semiconductor device |
| 10/11/2001 | US20010028037 Hollow-beam aperture for charged-particle-beam optical systems and microlithography apparatus, andbeam-adjustment methods employing same |
| 10/11/2001 | US20010027917 Ion milling chromium on a quartz substrate without causing defects in the quartz by moving the ion beam initially in a pattern that produces an uneven surface, followed by milling step where beam moves in a pattern of overlapping pixels |
| 10/11/2001 | US20010027843 Plasma treatment method and apparatus |
| 10/11/2001 | EP1145411A3 Power supplies having protection circuits |
| 10/11/2001 | DE10112817A1 Ion extraction apparatus for ion implantation system has electrode manipulator with actuators for adjusting slit width and moving electrode |
| 10/11/2001 | DE10015699A1 Schaltungsanordnung zur Impedanzkompensation Circuit arrangement for impedance compensation |
| 10/11/2001 | DE10015244A1 Procedure for pulse-shaped energy supply in magnetron discharges has after application of voltage, firing of magnetron discharge determined and then separation of voltage source from electrodes of magnetron arrangement |
| 10/10/2001 | EP1143497A1 Plasma etching apparatus |
| 10/10/2001 | EP1143481A1 High density plasma forming device |
| 10/10/2001 | EP1141997A2 Physical vapor deposition of semiconducting and insulating materials |
| 10/10/2001 | EP1141996A1 Hollow cathode array for plasma generation |
| 10/10/2001 | EP1141995A1 Array of multiple charged particle beamlet emitting columns |
| 10/10/2001 | CN1316547A Equipment and method for forming deposition film |
| 10/10/2001 | CN1316309A Process for preparing nm material by dual-glow discharge of hollow cathodes |
| 10/10/2001 | CN1072734C Sputtering apparatus |
| 10/09/2001 | US6301510 Method and apparatus to calibrate a semi-empirical process simulator |
| 10/09/2001 | US6300756 Micro-mechanical probes for charge sensing |
| 10/09/2001 | US6300755 Enhanced modified faraday cup for determination of power density distribution of electron beams |
| 10/09/2001 | US6300643 Dose monitor for plasma doping system |
| 10/09/2001 | US6300642 Method for monitoring Faraday cup operation in an ion implantation apparatus |
| 10/09/2001 | US6300630 Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping |
| 10/09/2001 | US6300628 Focused ion beam machining method and device thereof |
| 10/09/2001 | US6300227 Enhanced plasma mode and system for plasma immersion ion implantation |
| 10/09/2001 | US6299948 Introducing treatment gas comprising one or more components into a treatment reactor, the treatment reactor comprising two exciting electrodes; applying voltage to electrodes to cause discharge in a region of the treatment gas |
| 10/09/2001 | US6299725 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 10/09/2001 | US6298806 Device for exciting a gas by a surface wave plasma |
| 10/04/2001 | WO2001074123A1 Apparatus for detecting plasma anomalous discharge and method of detecting the same |
| 10/04/2001 | WO2001073940A2 Circuit arrangement for impedance compensation |
| 10/04/2001 | WO2001073815A1 Uniform charged particle exposure device and method using translatable stage and faraday cup |
| 10/04/2001 | WO2001073814A2 Method and apparatus for controlling power delivered to a multiple segment electrode |
| 10/04/2001 | WO2001073813A2 Method and apparatus for varying a magnetic field to control a volume of a plasma |
| 10/04/2001 | WO2001073812A2 Method and apparatus for forming inner magnetic bucket to control a volume of a plasma |
| 10/04/2001 | WO2001022465A8 Plasma source of linear ion beam |
| 10/04/2001 | WO2001009913A3 Patterned heat conducting photocathode for electron beam source |
| 10/04/2001 | US20010027026 Gas distribution apparatus for semiconductor processing |
| 10/04/2001 | US20010027015 Ion-implanting method and ion-implanting apparatus |
| 10/04/2001 | US20010026575 Plasma processing system |
| 10/04/2001 | US20010025932 Charged-particle-beam microlithography apparatus and methods including shielding of the beam from extraneous magnetic fields |
| 10/04/2001 | US20010025931 Charged particle beam system and chamber of charged particle beam system |
| 10/04/2001 | US20010025929 Secondary electron filtering method, defect detection method and device manufacturing method using the same method |
| 10/04/2001 | US20010025925 Charged particle beam system and pattern slant observing method |
| 10/04/2001 | US20010025921 Digital measuring scanner |
| 10/04/2001 | US20010025691 Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe |
| 10/04/2001 | US20010025645 Injecting plasma forming gas; moving susceptor vertically in face of wafer while applying radio frequency electric power; controlling plasma position and density |
| 10/04/2001 | US20010025607 Microwave plasma reactor and method |
| 10/04/2001 | US20010025606 Plasma CVD apparatus and dry cleaning method of the same |
| 10/04/2001 | US20010025601 Apparatus and method for forming a deposited film by means of plasma CVD |
| 10/04/2001 | EP1139398A1 Method and apparatus for surface treatment |
| 10/04/2001 | EP1139386A2 Monitoring an effluent from a chamber |
| 10/04/2001 | EP1139385A2 Scanning electron microscope |
| 10/04/2001 | EP1139384A2 Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method |
| 10/04/2001 | EP1139091A1 Electron spectrometer with deflection unit |
| 10/04/2001 | EP1138055A1 Semiconductor processing equipment having tiled ceramic liner |
| 10/04/2001 | DE10114949A1 Thin film phase plate, phase contrast electron microscope with a thin film phase plate and method for preventing the charging of the phase plate increases contrast in electron microscope images while removing image distortion. |
| 10/04/2001 | DE10014956A1 Device for charging and discharging an electron beam device in an electron beam welding apparatus comprises a sluice chamber connected to a process chamber so that a transport path runs through the sluice chamber into the process chamber |
| 10/04/2001 | DE10014034A1 Plasma-Beschleuniger-Anordnung Plasma accelerator configuration |
| 10/04/2001 | DE10008486A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 10/03/2001 | CN1316096A Feedthrough overlap coil |
| 10/03/2001 | CN1316095A Improved stationary uniformity ring design |
| 10/03/2001 | CN1316021A ESRF chamber cooling system and process |
| 10/03/2001 | CN1315587A Device and method for forming deposition film by plasma CVD method |
| 10/02/2001 | US6297595 Method and apparatus for generating a plasma |
| 10/02/2001 | US6297594 Plasma source ion implanting apparatus using the same |
| 10/02/2001 | US6297584 Precision alignment of microcolumn tip to a micron-size extractor aperture |
| 10/02/2001 | US6297510 Ion implant dose control |
| 10/02/2001 | US6297503 Method of detecting semiconductor defects |
| 10/02/2001 | US6297468 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 10/02/2001 | US6297165 Etching and cleaning methods |
| 10/02/2001 | US6297064 End point detecting method for semiconductor plasma processing |