| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/14/2001 | EP0667034B1 Magnetic field cathode |
| 11/14/2001 | CN1322007A Plasma processing device |
| 11/14/2001 | CN1322004A Electronic spin analyzer |
| 11/14/2001 | CN1321973A Electron beam irradiating device and method, first generation disk, press mould and recording medium |
| 11/13/2001 | US6317866 Method of preparing charged particle beam drawing data and recording medium on which program thereof is recorded |
| 11/13/2001 | US6316369 Corrosion-resistant system and method for a plasma etching apparatus |
| 11/13/2001 | US6316164 Electron beam lithography, exposure patterns, shapes and pixels |
| 11/13/2001 | US6316163 Patterns for data layer, light exposure, separation and performing patterns |
| 11/13/2001 | US6316152 OPC method to improve e-beam writing time |
| 11/13/2001 | US6315874 Method of depositing thin film of metal oxide by magnetron sputtering apparatus |
| 11/13/2001 | US6315872 Coil for sputter deposition |
| 11/08/2001 | WO2001084611A1 Apparatus for treating the surface with neutral particle beams |
| 11/08/2001 | WO2001084593A2 A lens for a scanning electron microscope |
| 11/08/2001 | WO2001084592A1 Multi beam charged particle device |
| 11/08/2001 | WO2001084591A2 Pulsed rf power delivery for plasma processing |
| 11/08/2001 | WO2001084590A2 Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn |
| 11/08/2001 | WO2001084130A2 A nanotube-based electron emission device and systems using the same |
| 11/08/2001 | WO2001083852A1 Method and apparatus for distributing gas within high density plasma process chamber to ensure uniform plasma |
| 11/08/2001 | WO2001083238A1 System and method for adjusting the properties of a device by gcib processing |
| 11/08/2001 | WO2001082958A2 Methods of producing membrane vesicles |
| 11/08/2001 | US20010038263 Gate photocathode for controlled single and multiple electron beam emission |
| 11/08/2001 | US20010038080 Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same |
| 11/08/2001 | US20010038079 Method and apparatus for irradiating low energy ion beam on polymers |
| 11/08/2001 | US20010037939 Impurity introducing apparatus and method |
| 11/08/2001 | US20010037861 Plasma processing apparatus and method |
| 11/08/2001 | US20010037857 Plasma processing apparatus |
| 11/08/2001 | US20010037817 Arc chamber for an ion implantation system |
| 11/08/2001 | US20010037770 Plasma processing apparatus and processing method |
| 11/08/2001 | DE10119766A1 Radio frequency plasma reactor has distribution chamber with wall opposite metal plate with gas inlet openings distributed along wall and connected to at least one gas feed line to reactor |
| 11/08/2001 | CA2407225A1 Methods of producing membrane vesicles |
| 11/07/2001 | EP1152646A1 Method and apparatus for plasma treatment |
| 11/07/2001 | EP1152436A2 Charged particle irradiation apparatus and operating method thereof |
| 11/07/2001 | EP1152417A2 Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium |
| 11/07/2001 | EP1151465A1 High-density plasma source for ionized metal deposition |
| 11/07/2001 | EP1151464A1 Method and apparatus for a coaxial optical microscope with focused ion beam |
| 11/07/2001 | EP1151147A1 Plasma deposition method and apparatus with magnetic bucket and concentric plasma and material source |
| 11/07/2001 | EP0857224A4 Durable plasma treatment apparatus and method |
| 11/07/2001 | CN1321332A Plasma polymerizing apparatus having electrode with lot of uniform edges |
| 11/07/2001 | CN1321326A Device and method for generating local plasma by micro-structure electrode discharges with microwaves |
| 11/07/2001 | CN1320948A Internal surface ion implantation apparatus |
| 11/07/2001 | CN1320947A DC plasma ion implantation apparatus with grounded conducting net |
| 11/07/2001 | CN1074583C Drycorrosion apparatus |
| 11/07/2001 | CN1074582C Apparatus for coating substrates in vacuum |
| 11/06/2001 | US6314554 Method of generating mask pattern data for graphics and apparatus for the same |
| 11/06/2001 | US6313905 Apparatus and method for defining a pattern on a substrate |
| 11/06/2001 | US6313584 Electrical impedance matching system and method |
| 11/06/2001 | US6313583 Plasma processing apparatus and method |
| 11/06/2001 | US6313476 Charged beam lithography system |
| 11/06/2001 | US6313475 Acceleration and analysis architecture for ion implanter |
| 11/06/2001 | US6313474 Method for measuring distribution of beams of charged particles and methods relating thereto |
| 11/06/2001 | US6313461 Scanning-aperture electron microscope for magnetic imaging |
| 11/06/2001 | US6313428 Apparatus and method for reducing space charge of ion beams and wafer charging |
| 11/06/2001 | US6313023 Method of fabricating deflection aperture array for electron beam exposure apparatus, wet etching method and apparatus for fabricating the aperture array, and electron beam exposure apparatus having the aperture array |
| 11/06/2001 | US6312574 Target, magnetron source with said target and process for producing said target |
| 11/06/2001 | US6312556 Beat frequency modulation for plasma generation |
| 11/06/2001 | US6312555 Thin film electrostatic shield for inductive plasma processing |
| 11/06/2001 | US6312554 Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber |
| 11/06/2001 | US6312524 Plasma CVD apparatus |
| 11/06/2001 | US6311638 Plasma processing method and apparatus |
| 11/01/2001 | WO2001082330A1 Electron/ion gun for electron or ion beams with high monochromasy or high current density |
| 11/01/2001 | WO2001082329A2 Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 11/01/2001 | WO2001082328A2 Magnetic barrier for plasma in chamber exhaust |
| 11/01/2001 | WO2001082327A2 Collection of secondary electrons through the objective lens of a scanning electron microscope |
| 11/01/2001 | WO2001081999A1 Active reticle, method for making same, ion projecting lithography method using same and equipment therefor |
| 11/01/2001 | WO2001081998A1 Ceramic supports and methods |
| 11/01/2001 | WO2001081864A1 Measuring device using electron beam |
| 11/01/2001 | WO2001081863A1 Electron beam length measuring instrument and length measuring method |
| 11/01/2001 | WO2001081862A1 Electron beam length measuring instrument and length measuring method |
| 11/01/2001 | US20010037487 Method of extracting characters and computer-readable recording medium |
| 11/01/2001 | US20010036744 Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface |
| 11/01/2001 | US20010036741 Local etching apparatus and local etching method |
| 11/01/2001 | US20010036588 Mask carrier having masks having different aperture patterns to be imaged onto respective areas of the substrate, and mask assembly projects different patterns at different times; partitioning into sub-areas allows smaller exposure fields |
| 11/01/2001 | US20010036465 With P2O5 |
| 11/01/2001 | US20010035499 Organic field ionization source |
| 11/01/2001 | US20010035495 Scanning electron microscope and method of controlling the same |
| 11/01/2001 | US20010035348 Target array for an arc vapor deposition chamber including arc vapor deposition source and target plates thereof |
| 11/01/2001 | US20010035132 Electrical coupling between chamber parts in electronic device processing equipment |
| 11/01/2001 | US20010035130 Plasma processing apparatus |
| 10/31/2001 | EP1150332A2 Integration of remote plasma generator with semiconductor processing chamber |
| 10/31/2001 | EP1150331A2 Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate |
| 10/31/2001 | EP1150330A2 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 10/31/2001 | EP1150329A2 A scattering target-holding mechanism and an electron spin analyzer |
| 10/31/2001 | EP1150328A2 Vacuum system for film formation apparatus and process, leak judgement method, and computer-readable recording medium with recorded leak-judgment-executable program |
| 10/31/2001 | EP1150327A1 Multi beam charged particle device |
| 10/31/2001 | EP1149403A1 Perforated plasma confinement ring in plasma reactors |
| 10/31/2001 | EP0878020B1 Electromagnetic high-frequency or microwave apparatus |
| 10/31/2001 | DE10020382A1 Strahlerzeugungssystem für Elektronen oder Ionenstrahlen hoher Monochromasie oder hoher Stromdichte Beam generating system for electron or ion beams of high monochromaticity or high current density |
| 10/31/2001 | CN1319683A Apparatus for treatment plasma |
| 10/30/2001 | US6310577 Plasma processing system with a new inductive antenna and hybrid coupling of electronagnetic power |
| 10/30/2001 | US6310342 Optical microscope stage for scanning probe microscope |
| 10/30/2001 | US6310341 Projecting type charged particle microscope and projecting type substrate inspection system |
| 10/30/2001 | US6309978 Beat frequency modulation for plasma generation |
| 10/30/2001 | US6309525 Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation |
| 10/30/2001 | US6309516 Method and apparatus for metal allot sputtering |
| 10/30/2001 | US6308654 Inductively coupled parallel-plate plasma reactor with a conical dome |
| 10/30/2001 | CA2227233C Plasma treatment apparatus for large area substrates |
| 10/25/2001 | WO2001080297A1 Plasma processing apparatus |
| 10/25/2001 | WO2001080290A2 A method of operating a dual chamber reactor with neutral density decoupled from ion density |
| 10/25/2001 | WO2001080280A1 Method for observing surface of sample, method for observing surface of sample by electron microscope, electron microscope, and method for manufacturing semiconductor device |
| 10/25/2001 | WO2001080279A1 Method and apparatus for electron beam irradiation |