| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/29/2001 | DE10024699A1 Plasmaätzanlage Plasma etching |
| 11/29/2001 | DE10023946A1 Device for anisotropically etching a substrate has an aperture arranged between the plasma source and the substrate with openings arranged in such a way that the ions from the plasma vertically hit the surface of the substrate |
| 11/29/2001 | CA2410352A1 Configurable vacuum system and method |
| 11/28/2001 | EP1158565A2 Toroidal plasma source for plasma processing |
| 11/28/2001 | EP1158564A2 An electron spin analyzer |
| 11/28/2001 | EP1158563A1 Particle beam system |
| 11/28/2001 | EP1157598A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source |
| 11/28/2001 | EP1157454A1 Power supply with flux-controlled transformer |
| 11/28/2001 | EP0786145A4 Field emission environmental scanning electron microscope |
| 11/28/2001 | EP0680075B1 Electrode for generating plasma and method for manufacturing the electrode |
| 11/28/2001 | CN1324093A Ion source operation method, and ion beam radiation device |
| 11/28/2001 | CN1323917A Film deposition equipment, film deposition art, vacuum system and leakage judging method |
| 11/27/2001 | US6323595 High frequency discharging method and apparatus, and high frequency processing apparatus |
| 11/27/2001 | US6323500 Electron-beam exposure system |
| 11/27/2001 | US6323499 Electron beam exposure apparatus and method, and device manufacturing method |
| 11/27/2001 | US6323498 Charged particle beam irradiation apparatus and irradiation method using the apparatus |
| 11/27/2001 | US6323497 Method and apparatus for controlling ion implantation during vacuum fluctuation |
| 11/27/2001 | US6323496 Apparatus for reducing distortion in fluid bearing surfaces |
| 11/27/2001 | US6323494 Vertical direction force transducer |
| 11/27/2001 | US6323493 Increased ion beam throughput with reduced beam divergence in a dipole magnet |
| 11/27/2001 | US6323485 Electron microscope equipped with energy filter |
| 11/27/2001 | US6323484 Method and apparatus for sample current spectroscopy surface measurement |
| 11/27/2001 | US6323483 High bandwidth recoiless microactuator |
| 11/27/2001 | US6323133 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 11/27/2001 | US6322716 Method for conditioning a plasma etch chamber |
| 11/27/2001 | US6322679 Planar magnetron with moving magnet assembly |
| 11/27/2001 | US6322672 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 11/27/2001 | US6322662 Plasma treatment system |
| 11/27/2001 | US6322661 Method and apparatus for controlling the volume of a plasma |
| 11/27/2001 | US6322660 Apparatus and method for remote endpoint detection |
| 11/27/2001 | US6321681 Method and apparatus to produce large inductive plasma for plasma processing |
| 11/22/2001 | WO2001088971A1 Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism |
| 11/22/2001 | WO2001088966A2 Method of adjusting the thickness of an electrode in a plasma processing system |
| 11/22/2001 | WO2001088962A1 Plasma etching equipment |
| 11/22/2001 | WO2001088950A1 Plasma etching system |
| 11/22/2001 | WO2001088949A2 High efficiency scanning in ion implanters |
| 11/22/2001 | WO2001088948A2 Through-the-lens sample neutralizing electron beam for focused ion beam system |
| 11/22/2001 | WO2001088947A1 Control system for indirectly heated cathode ion source |
| 11/22/2001 | WO2001088946A1 Cathode assembly for indirectly heated cathode ion source |
| 11/22/2001 | WO2001088514A1 Apparatus for inspection of semiconductor wafers and masks using a low energy electron micoscope with two illuminating beams |
| 11/22/2001 | WO2001088221A1 Plasma cvd apparatus and method |
| 11/22/2001 | WO2001061725B1 Emission electron microscope |
| 11/22/2001 | WO2001032297A3 Modular chemical treatment system |
| 11/22/2001 | US20010043040 Cathode assembly for indirectly heated cathode ion source |
| 11/22/2001 | US20010042836 Control system for indirectly heated cathode ion source |
| 11/22/2001 | US20010042830 Holography transmission electron microscope |
| 11/22/2001 | US20010042827 Dose monitor for plasma doping system |
| 11/22/2001 | US20010042799 Showerhead apparatus for radical-assisted deposition |
| 11/22/2001 | US20010042595 Plasma processing apparatus and method |
| 11/22/2001 | US20010042594 Process chamber having improved temperature control |
| 11/22/2001 | US20010042554 Used in semiconductor manufacturing, a plate-shaped protector made of dielectric and having similar electrical properties as the deposited film; removing thin film deposited on inner face of vacuum vessel |
| 11/22/2001 | US20010042513 Apparatus for improved remote microwave plasma source for use with substrate processing systems |
| 11/22/2001 | US20010042511 Reduction of plasma edge effect on plasma enhanced CVD processes |
| 11/22/2001 | DE10122598A1 Method for ionizing working gas for surface treatment of semi-products, involves applying pulsating basic voltage between anode and cathode for forming pulsed electrical field |
| 11/21/2001 | EP1156516A1 Method and apparatus for plasma processing |
| 11/21/2001 | EP1156511A1 Remote plasma CVD apparatus |
| 11/21/2001 | EP1156130A1 Plasma processing container internal member and production method therefor |
| 11/21/2001 | EP1155600A1 Method for the excitation of a plasma and a use of the method |
| 11/21/2001 | EP1155599A1 Atmospheric steady-state glow-discharge plasma |
| 11/21/2001 | EP1062679B1 Plasma etching installation |
| 11/21/2001 | CN1323444A Semiconductor process chamber electrode and method for making the same |
| 11/20/2001 | US6320334 Controller for a linear accelerator |
| 11/20/2001 | US6320321 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 11/20/2001 | US6320320 Method and apparatus for producing uniform process rates |
| 11/20/2001 | US6320319 Charged particle generating apparatus |
| 11/20/2001 | US6320316 Apparatus for coupling power into a body of gas |
| 11/20/2001 | US6320198 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 11/20/2001 | US6320195 Exposure apparatus, method of making the apparatus, exposure method, and device and manufacturing method of the device |
| 11/20/2001 | US6320194 Portable high resolution scanning electron microscope column using permanent magnet electron lenses |
| 11/20/2001 | US6320187 Magnification and rotation calibration patterns for particle beam projection system |
| 11/20/2001 | US6320154 Plasma processing method |
| 11/20/2001 | US6319838 Lever arm for a scanning microscope |
| 11/20/2001 | US6319642 Analyzing pattern data to determine stripes of pattern to be successively lithographed; successively, for each determined stripe: extracting part of pattern data corresponding to stripe; dividing extracted part of pattern data; distribution |
| 11/20/2001 | US6319372 Permanent magnet linear microwave plasma source |
| 11/20/2001 | US6319369 Ignition means for a cathodic arc source |
| 11/20/2001 | US6319367 Plasma treatment for producing electron emitters |
| 11/20/2001 | US6319355 Plasma processor with coil responsive to variable amplitude rf envelope |
| 11/20/2001 | US6319326 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 11/15/2001 | WO2001086697A2 Inductive plasma loop enhancing magnetron sputtering |
| 11/15/2001 | WO2001086688A1 Measuring plasma uniformity in-situ at wafer level |
| 11/15/2001 | WO2001086687A1 Apparatus for evaluating plasma polymerized polymer layer using uv spectrometer |
| 11/15/2001 | WO2001086649A1 Electron-beam lithography |
| 11/15/2001 | WO2001031080A3 Electron beam physical vapor deposition apparatus |
| 11/15/2001 | WO2000079568A3 Plasma reactor with multiple small internal inductive antennas |
| 11/15/2001 | US20010041375 Reduction of plasma charge-induced damage in microfabricated devices |
| 11/15/2001 | US20010041296 Patterning methods and systems using reflected interference patterns |
| 11/15/2001 | US20010040221 Method and apparatus for forming a curved polyline on a radiation-sensitive resist |
| 11/15/2001 | US20010040220 Methods and apparatus for operating high energy accelerator in low energy mode |
| 11/15/2001 | US20010040215 Apparatus for producing a flux of charge carriers |
| 11/15/2001 | US20010040091 Method and apparatus for sputter etch conditioning a ceramic body |
| 11/15/2001 | US20010040009 Plasma processing apparatus and method |
| 11/15/2001 | US20010039921 Method and apparatus for controlling rate of pressure change in a vacuum process chamber |
| 11/14/2001 | EP1154466A1 Method and apparatus for plasma processing |
| 11/14/2001 | EP1154459A2 Plasma source |
| 11/14/2001 | EP1154040A2 Reduction of plasma edge effect on plasma enhanced CVD processes |
| 11/14/2001 | EP1153425A1 Method for plasma etching with pulsed substrate electrode power |
| 11/14/2001 | EP1153411A1 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes |
| 11/14/2001 | EP0896732B1 Sputtering installation with two longitudinally placed magnetrons |
| 11/14/2001 | EP0871795A4 A scalable helicon wave plasma processing device with a non-cylindrical source chamber |
| 11/14/2001 | EP0793855B1 Plasma processor for large workpieces |