| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/13/2001 | WO2001095352A2 Apparatus and method for accelerating electrons in a plasma reactor |
| 12/13/2001 | WO2001004611A3 Method and apparatus for enhancing yield of secondary ions |
| 12/13/2001 | US20010051435 Chemical-organic planarization process for atomically smooth interfaces |
| 12/13/2001 | US20010051317 Slit in tube; dividing eddy current zone |
| 12/13/2001 | US20010051216 Corrosion resistant coating |
| 12/13/2001 | US20010050836 Electrostatic chuck for ion injector |
| 12/13/2001 | US20010050343 Apparatus using charged particle beam |
| 12/13/2001 | US20010050338 Scanning charged particle microscope, and focal distance adjusting method and astigmatism correction method thereof |
| 12/13/2001 | US20010050267 Method for allowing a stable power transmission into a plasma processing chamber |
| 12/13/2001 | US20010050265 Reduction of metal oxide in a dual frequency etch chamber |
| 12/13/2001 | US20010050226 Integrated copper fill process |
| 12/13/2001 | US20010050225 Unbalanced plasma generating apparatus having cylindrical symmetry |
| 12/13/2001 | US20010050223 Sputtering target having an annular vault |
| 12/13/2001 | US20010050220 Using ionization metal plasma |
| 12/13/2001 | US20010050147 Plasma etching system |
| 12/13/2001 | US20010050144 Plasma processing apparatus |
| 12/13/2001 | US20010050143 Method and apparatus for semiconductor wafer process monitoring |
| 12/13/2001 | US20010050059 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate |
| 12/13/2001 | US20010050058 Plasma process apparatus |
| 12/13/2001 | US20010050057 Plasma CVD device and discharge electrode |
| 12/13/2001 | US20010050051 Gas delivering device |
| 12/12/2001 | EP1162647A2 Cathode electrode for plasma source and plasma source for a vacuum coating system |
| 12/12/2001 | EP1162646A2 Plasma treatment apparatus and method |
| 12/12/2001 | EP1162645A2 Specimen inspection instrument |
| 12/12/2001 | EP1161574A1 Method and apparatus for arc deposition |
| 12/12/2001 | EP1161309A1 A method for a repetitive ion beam processing with a by carbon containing ion beam |
| 12/11/2001 | US6330708 Method for preparing command files for photomask production |
| 12/11/2001 | US6329826 Method and apparatus for inspecting integrated circuit pattern |
| 12/11/2001 | US6329769 Electron beam irradiation device |
| 12/11/2001 | US6329665 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 12/11/2001 | US6329664 Ion implantation apparatus for wafers |
| 12/11/2001 | US6329659 Correction device for correcting the lens defects in particle-optical apparatus |
| 12/11/2001 | US6329650 Space charge neutralization of an ion beam |
| 12/11/2001 | US6329297 Dilute remote plasma clean |
| 12/11/2001 | US6328858 For semiconductor processing apparatus |
| 12/11/2001 | US6328857 Method for forming coating on substrate and sputtering apparatus used for the method |
| 12/11/2001 | US6328856 Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device |
| 12/11/2001 | US6328847 Downstream plasma reactor system incorporating a plasma-resistant blocking member |
| 12/11/2001 | US6328845 Plasma-processing method and an apparatus for carrying out the same |
| 12/11/2001 | US6328805 Equipment for processing a container using a low-pressure plasma having an improved vacuum circuit |
| 12/11/2001 | US6328803 Method and apparatus for controlling rate of pressure change in a vacuum process chamber |
| 12/11/2001 | US6328802 Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof |
| 12/11/2001 | US6328473 Static air-bearing and stage apparatus using the bearing and optical apparatus using the stage apparatus |
| 12/11/2001 | US6328041 Universal cleaning wafer for a plasma chamber |
| 12/06/2001 | WO2001093646A2 Integrated resonator and amplifier system |
| 12/06/2001 | WO2001093322A1 Plasma processing device and processing method |
| 12/06/2001 | WO2001093315A2 Methods and apparatus for plasma processing |
| 12/06/2001 | WO2001093304A1 Method and apparatus for particle detection using a sensor structure having a moveable portion |
| 12/06/2001 | WO2001093303A2 High throughput multipass printing with lithographic quality |
| 12/06/2001 | WO2001093293A1 Plasma ion source and method |
| 12/06/2001 | WO2001092595A1 Unbalanced plasma generating apparatus having cylindrical symmetry |
| 12/06/2001 | WO2001035439A3 Plural foils shaping intensity profile of ion beams |
| 12/06/2001 | WO1999062099A9 Gas distributor for a semiconductor process chamber |
| 12/06/2001 | US20010049196 Apparatus for improving etch uniformity and methods therefor |
| 12/06/2001 | US20010048981 High speed plasma vapor deposition; exhaustion ventilation gas |
| 12/06/2001 | US20010048076 Surface analyzing apparatus |
| 12/06/2001 | US20010048075 Particle beam apparatus |
| 12/06/2001 | US20010047933 Direct current power supply to improve yield at sputter deposition of a material layer onto a substrate, improve electrical integrity of magnetron sputtering apparatus and of said power supply |
| 12/06/2001 | US20010047849 Apparatus and method for fabricating semiconductor device |
| 12/06/2001 | US20010047760 Apparatus and method for multi-zone high-density inductively-coupled plasma generation |
| 12/06/2001 | DE10027120A1 Probenträger für Massenspektrometer Sample carriers for mass spectrometer |
| 12/05/2001 | EP1160826A2 Coating, modification and etching of substrate surface with particle beam irradiation |
| 12/05/2001 | EP1160825A1 Particle beam apparatus |
| 12/05/2001 | EP1160824A2 Illumination system for charged-particle lithography apparatus |
| 12/05/2001 | EP1160192A1 Micromanipulation method |
| 12/05/2001 | EP1159754A1 Schottky and field emission electron guns with enhanced angular intensity |
| 12/05/2001 | EP1159465A1 Processing chamber for atomic layer deposition processes |
| 12/05/2001 | EP0811236B1 Apparatus and method for filtering macroparticles from a plasma beam |
| 12/05/2001 | CN2463950Y Superconducting high-charge state ECR ion source |
| 12/05/2001 | CN1325131A Ion-beam injector with function of removing dirts at home position |
| 12/04/2001 | US6326798 Electric beam tester and image processing apparatus |
| 12/04/2001 | US6326794 Method and apparatus for in-situ monitoring of ion energy distribution for endpoint detection via capacitance measurement |
| 12/04/2001 | US6326783 Method of measuring axially symmetric electromagnetic fields |
| 12/04/2001 | US6326635 Minimization of electron fogging in electron beam lithography |
| 12/04/2001 | US6326634 E-beam shape aperature incorporating lithographically defined heater element |
| 12/04/2001 | US6326633 Device fabrication methods using charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects |
| 12/04/2001 | US6326632 Particle-optical imaging system for lithography purposes |
| 12/04/2001 | US6326631 Ion implantation device arranged to select neutral ions from the ion beam |
| 12/04/2001 | US6326630 Ion implanter |
| 12/04/2001 | US6326629 Projection lithography device utilizing charged particles |
| 12/04/2001 | US6326619 Crystal phase identification |
| 12/04/2001 | US6326584 Methods and apparatus for RF power delivery |
| 12/04/2001 | US6326574 Sleeve for an adapter flange of the gasonics L3510 etcher |
| 12/04/2001 | US6326185 Method for decontaminating yeast |
| 12/04/2001 | US6325018 Flat antenna having openings provided with conductive materials accommodated therein and plasma processing apparatus using the flat antenna |
| 11/29/2001 | WO2001091164A2 Plasma reactor with a tri-magnet plasma confinement apparatus |
| 11/29/2001 | WO2001090438A1 A process and apparatus for plasma activated deposition in a vacuum |
| 11/29/2001 | WO2001090437A2 Configurable vacuum system and method |
| 11/29/2001 | US20010046769 Waferless seasoning process |
| 11/29/2001 | US20010046631 Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same |
| 11/29/2001 | US20010046566 Apparatus and method for direct current plasma immersion ion implantation |
| 11/29/2001 | US20010046043 Method and apparatus employing external light source for endpoint detection |
| 11/29/2001 | US20010045705 Sealing mechanism for sealing a vacuum chamber |
| 11/29/2001 | US20010045528 Electrostatic deflector for electron beam exposure apparatus |
| 11/29/2001 | US20010045526 Stage device for an exposure apparatus and semiconductor device manufacturing method wich uses said stage device |
| 11/29/2001 | US20010045525 Shaped and low density focused ion beams |
| 11/29/2001 | US20010045515 Analysis electron microscope |
| 11/29/2001 | US20010045514 Charge amplifier with bias compensation |
| 11/29/2001 | US20010045352 Controlling thickness |
| 11/29/2001 | DE10024883A1 Plasmaätzanlage Plasma etching |