| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/17/2002 | WO2002005339A1 Plasma processing apparatus |
| 01/17/2002 | WO2002005315A2 System and method for improving thin films by gas cluster ion be am processing |
| 01/17/2002 | WO2002005310A1 Particle radiation device comprising a particle source that is operated in an ultrahigh vacuum and a cascade pump assembly for a particle radiation device of this type |
| 01/17/2002 | WO2002005309A1 Detector for variable pressure areas and an electron microscope comprising a corresponding detector |
| 01/17/2002 | WO2002005308A2 A plasma reactor having a symmetric parallel conductor coil antenna |
| 01/17/2002 | WO2002005305A1 Hot electron emission array for e-beam photolithography and display screens |
| 01/17/2002 | WO2002004696A1 Improving effectiveness of artificial hip by gcib |
| 01/17/2002 | WO2002004691A2 Systems and methods for remote plasma clean |
| 01/17/2002 | US20020006563 Calculating exposure dose at specified regions of the sensitive substrate to determine expected proximity effects at the specified regions; mathematical equations; making microelectronics |
| 01/17/2002 | US20020006476 Apparatus and method for forming a deposited film by means of plasma CVD |
| 01/17/2002 | US20020005676 System and method for adjusting the properties of a device by GCIB processing |
| 01/17/2002 | US20020005494 Charged-particle-beam microlithography apparatus and methods including proximity-effect correction |
| 01/17/2002 | US20020005492 Sample holder, sample mount and sample mount jig for use in electron microscope |
| 01/17/2002 | US20020005491 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 01/17/2002 | US20020005484 Apparatus and method for defect detection using charged particle beam |
| 01/17/2002 | US20020005392 Systems and methods for variable mode plasma enhanced processing of semiconductor wafers |
| 01/17/2002 | US20020005348 Sputtering method to generate ionized metal plasma using electron beams and magnetic field |
| 01/17/2002 | US20020005253 Modular device of tubular plasma source |
| 01/17/2002 | US20020005252 Plasma etching apparatus and plasma etching method |
| 01/17/2002 | US20020005169 Thin film electrostatic shield for inductive plasma processing |
| 01/17/2002 | DE10032979A1 Inspection instrument for extreme UV lithographic masks and multi-layer mirrors, includes mirror deflecting primary EUV beam normally onto object |
| 01/16/2002 | EP1172838A2 Biased shield in a magnetron sputter reactor |
| 01/16/2002 | EP1172837A2 Electron beam lithography method and electron-optical lithography device |
| 01/16/2002 | EP1172458A2 Components peripheral to the pedestal in the gas flow path within a chemical vapor deposition chamber |
| 01/16/2002 | EP1171901A1 Multi-column fib for nanofabrication applications |
| 01/16/2002 | EP1171900A1 Large area atmospheric-pressure plasma jet |
| 01/16/2002 | EP1171645A1 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 01/16/2002 | CN1331836A Hollow cathode array for plasma generation |
| 01/15/2002 | US6339297 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus |
| 01/15/2002 | US6339206 Apparatus and method for adjusting density distribution of a plasma |
| 01/15/2002 | US6338781 Magnetron sputtering cathode with magnet disposed between two yoke plates |
| 01/15/2002 | US6338779 The cathode arc source for depositing a coating |
| 01/15/2002 | US6338313 System for the plasma treatment of large area substrates |
| 01/15/2002 | US6338312 Integrated ion implant scrubber system |
| 01/15/2002 | CA2119561C Apparatus for rapid plasma treatments and method |
| 01/10/2002 | WO2002003763A2 Vacuum plasma processor apparatus and method |
| 01/10/2002 | WO2002003441A1 Operation monitoring method for treatment apparatus |
| 01/10/2002 | WO2002003440A1 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
| 01/10/2002 | WO2002003429A2 Integrated electronic hardware for wafer processing control and diagnostic |
| 01/10/2002 | WO2002003419A2 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams |
| 01/10/2002 | WO2002003416A2 Integrated electronic hardware for wafer processing control and diagnostic |
| 01/10/2002 | WO2002003415A2 Switched uniformity control |
| 01/10/2002 | WO2002003402A1 Device for orienting the direction of magnetization of magnetic layers |
| 01/10/2002 | WO2001063000A3 Method and apparatus for depositing films |
| 01/10/2002 | WO2000048435A9 Method of plasma enhanced chemical vapor deposition of diamond |
| 01/10/2002 | US20020004309 Processes used in an inductively coupled plasma reactor |
| 01/10/2002 | US20020004283 Method of forming an alignment feature in or on a multi-layered semiconductor structure |
| 01/10/2002 | US20020003215 High efficiency scanning in ion implanters |
| 01/10/2002 | US20020003213 Electron spin analyzer |
| 01/10/2002 | US20020003212 Scattering target-holding mechanism and an electron spin analyzer |
| 01/10/2002 | US20020003208 Space charge neutralization of an ion beam |
| 01/10/2002 | US20020002949 PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 01/10/2002 | US20020002948 Plasma processing apparatus having an evacuating arrangement to evacuate gas from a gas-introducing part of a process chamber |
| 01/10/2002 | US20020002947 Inductive coupling plasma processing apparatus |
| 01/10/2002 | DE10129019A1 Targetmarke, Verfahren zu deren Herstellung und Elektronenstrahl-Belichtungsvorrichtung Target mark, to processes for their preparation and to electron beam exposure apparatus |
| 01/10/2002 | CA2382984A1 Device for forming nanostructures on the surface of a semiconductor wafer by means of ion beams |
| 01/09/2002 | EP1170778A2 Scanning and high resolution electron spectroscopy and imaging |
| 01/09/2002 | EP1170777A2 Multi-purpose processing chamber with removable chamber liner |
| 01/09/2002 | EP1170776A2 Vacuum arc evaporation source and film formation apparatus using the same |
| 01/09/2002 | EP1170775A1 Method and apparatus for ion implantation |
| 01/09/2002 | EP1170774A1 Method and apparatus for ion implantation |
| 01/09/2002 | EP1170773A1 Coaxial laser and ECR ion beam source device and process for coating and/or implanting in matter and/or human or animal tissues |
| 01/09/2002 | EP1169726A1 Object carrier for a particle-optical apparatus |
| 01/09/2002 | CN1330507A Radio frequency plasma generator |
| 01/08/2002 | US6337486 Electron beam drawing process and electron beam drawing apparatus |
| 01/08/2002 | US6337485 Electron beam exposure apparatus and its control method |
| 01/08/2002 | US6337292 Vapor deposition of silicon oxide layer |
| 01/08/2002 | US6337220 Ion implanter vacuum integrity check process and apparatus |
| 01/08/2002 | US6337164 Charged-particle-beam microlithography methods exhibiting improved pattern-feature accuracy, and device manufacturing methods comprising same |
| 01/08/2002 | US6337110 Heating substrate; creating plasma from ionized, gaseous mixture, for a magnetic field value corresponding to electron cyclotron resonance of organic molecules, creating a positive potential difference between plasma and substrate, diffusing |
| 01/08/2002 | US6337001 Generating plasma in gap, flowing gas transverse to sectional plane, sputtering off material from opposite surfaces, transporting by gas flowing towards workpiece. |
| 01/08/2002 | US6336423 Apparatus for forming a deposited film by plasma chemical vapor deposition |
| 01/03/2002 | WO2002001927A1 Plasma-chemical reactor |
| 01/03/2002 | WO2002001597A1 Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus |
| 01/03/2002 | WO2002001596A1 Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus |
| 01/03/2002 | WO2002001595A2 Photosensor with a photocathode in reflective mode |
| 01/03/2002 | WO2002000960A1 Magnetron sputtering device |
| 01/03/2002 | WO2001048794A3 Enhanced etching/smoothing of dielectric surfaces |
| 01/03/2002 | US20020001976 Chamber for constructing a film on a semiconductor wafer |
| 01/03/2002 | US20020000819 High resolution analytical probe station |
| 01/03/2002 | US20020000779 Constricted glow discharge plasma source |
| 01/03/2002 | US20020000766 Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 01/03/2002 | US20020000524 Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same |
| 01/03/2002 | US20020000523 Ion implantation with improved ion source life expectancy |
| 01/03/2002 | US20020000522 Ion beam milling system and method for electron microscopy specimen preparation |
| 01/03/2002 | US20020000374 Sputtering apparatus |
| 01/03/2002 | US20020000368 Vacuum treatment chamber and method for treating surfaces |
| 01/03/2002 | US20020000298 Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks |
| 01/03/2002 | US20020000201 Plasma chemical vapor deposition apparatus |
| 01/03/2002 | US20020000198 The dome: shape and temperature controlled surfaces |
| 01/03/2002 | US20020000029 Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 01/03/2002 | DE10024573C1 Apparatus for coating substrates in a plasma CVD coating process has metallic electrically conducting elements with a predetermined electrical potential arranged in the dark chamber between the substrate and the plasma |
| 01/02/2002 | EP1168427A1 Method of plasma depositing silicon nitride |
| 01/02/2002 | EP1168415A2 Power supply antenna and power supply method |
| 01/02/2002 | EP1167572A2 Lid assembly for a semiconductor processing chamber |
| 01/02/2002 | EP1167571A2 Showerhead for semiconductor processing chamber |
| 01/02/2002 | EP1166325A1 Method for carrying out a plasma etching process |
| 01/02/2002 | EP1166324A2 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 01/02/2002 | EP1166323A1 Method and apparatus for compensating non-uniform wafer processing in plasma processing |
| 01/02/2002 | EP1166322A1 Plasma processing method and apparatus with control of rf bias |