| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/05/2002 | US6344419 Pulsed-mode RF bias for sidewall coverage improvement |
| 02/05/2002 | US6344151 Gas purge protection of sensors and windows in a gas phase processing reactor |
| 02/05/2002 | US6344115 Pattern forming method using charged particle beam process and charged particle beam processing system |
| 02/05/2002 | US6344114 Magnetron sputtering cathode with magnet disposed between two yoke plates |
| 02/05/2002 | US6344105 Techniques for improving etch rate uniformity |
| 02/05/2002 | US6343565 Flat antenna having rounded slot openings and plasma processing apparatus using the flat antenna |
| 02/05/2002 | CA2193709C Method and apparatus for ion beam transport |
| 02/05/2002 | CA2191115C Method and apparatus for capturing and removing contaminant particles from an interior region of an ion implanter |
| 01/31/2002 | WO2002009241A2 Electrode for plasma processing system |
| 01/31/2002 | WO2002009198A1 Etching apparatus having a confinement and guide object for gas flow of plasma and method for using same |
| 01/31/2002 | WO2002009172A1 Workpiece holding mechanism |
| 01/31/2002 | WO2002009166A1 Method for manufacturing semiconductor device, substrate treater, and substrate treatment system |
| 01/31/2002 | WO2002009142A1 Electronic microscope observation system and observation method |
| 01/31/2002 | WO2002009141A2 Automated electrode replacement apparatus for a plasma processing system |
| 01/31/2002 | WO2002009135A2 Immersion lens with magnetic shield for charged particle beam system |
| 01/31/2002 | WO2002008774A1 Probe driving method, and probe apparatus |
| 01/31/2002 | WO2002008486A2 Electrode apparatus and method for plasma processing |
| 01/31/2002 | WO2001071765A3 Plasma reactor with overhead rf electrode tuned to the plasma |
| 01/31/2002 | WO2001056056A3 Objective lens for a charged particle beam device |
| 01/31/2002 | WO2001047009A3 Method and apparatus for detecting the endpoint of a photoresist stripping process |
| 01/31/2002 | WO2001006536A3 Scanning beam instruments |
| 01/31/2002 | WO2000019481A9 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 01/31/2002 | US20020013930 Method and system for producing semiconductor devices |
| 01/31/2002 | US20020012860 Method and apparatus for emission lithography using patterned emitter |
| 01/31/2002 | US20020012853 Electron beam writing pattern; transfer pattern high resolution |
| 01/31/2002 | US20020011574 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 01/31/2002 | US20020011566 Thin-film phase plate, phase-contrast electron microscope using same, and method of preventing charging of phase plate |
| 01/31/2002 | US20020011565 Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system |
| 01/31/2002 | US20020011464 Method of plasma etching |
| 01/31/2002 | US20020011310 Downstream sapphire elbow joint for remote plasma generator |
| 01/31/2002 | US20020011282 Anhysteretic magnetic permeability of 15,000 or higher at 0.35 Oe and yield stress of 24 kgf/mm2 or more. |
| 01/31/2002 | US20020011215 Plasma treatment apparatus and method of manufacturing optical parts using the same |
| 01/31/2002 | US20020011214 Remote plasma mixer |
| 01/31/2002 | US20020011212 Plasma cvd apparatus |
| 01/31/2002 | US20020011210 Semiconductor-processing device provided with a remote plasma source for self-cleaning |
| 01/31/2002 | DE10130129A1 Zerstäubungsvorrichtung Sputtering |
| 01/31/2002 | DE10122678A1 Mask data correction device with graphic correction stage generates transfer mask pattern shape for use in manufacturing process so as to prevent faults anticipated during manufacture |
| 01/31/2002 | DE10010016C1 Vorrichtung und Verfahren zur plasmagestützten Oberflächenbehandlung von Substraten im Vakuum Apparatus and method for plasma-enhanced surface treatment of substrates in vacuum |
| 01/30/2002 | EP1176625A2 Sputtering apparatus |
| 01/30/2002 | EP1176624A2 Method and system for microwave excitation of plasma in an ion beam guide |
| 01/30/2002 | EP1176623A2 Waveguide for microwave excitation of plasma in an ion beam guide |
| 01/30/2002 | EP1175695A1 Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
| 01/30/2002 | CN1333917A Chamber liner for semiconductor process chambers |
| 01/30/2002 | CN1333482A Emission photoetching method and device using transmitter with pattern |
| 01/30/2002 | CN1333466A Semiconductor device test method and apparatus |
| 01/30/2002 | CN1078742C Plasma processing apparatus for dry etching of semiconductor wafers |
| 01/30/2002 | CN1078740C Electronic beam unit projection stamp mark system |
| 01/29/2002 | US6342702 Ultraviolet ray irradiation apparatus |
| 01/29/2002 | US6342139 Sputtering system |
| 01/29/2002 | US6342135 Gas baffles, disk, sputtering |
| 01/29/2002 | US6341574 Plasma processing systems |
| 01/24/2002 | WO2002007184A2 Adjustable segmented electrode apparatus and method |
| 01/24/2002 | WO2002006557A1 Gcib size diagnostics and workpiece processing |
| 01/24/2002 | WO2002006556A1 Gcib size diagnostics and workpiece processing |
| 01/24/2002 | WO2001078102A3 Plasma energy control by inducing plasma instability |
| 01/24/2002 | WO2001046993A3 Reduction of plasma charge-induced damage in microfabricated devices |
| 01/24/2002 | WO2001046677A3 Irradiating device with highly flexible membrane bellows |
| 01/24/2002 | WO2001031682A8 Method and apparatus for low voltage plasma doping using dual pulses |
| 01/24/2002 | WO2001026133A8 High transmission, low energy beamline apparatus for ion implanter |
| 01/24/2002 | US20020010906 Circuit pattern design method,exposure method, charged-particle beam exposure system |
| 01/24/2002 | US20020010905 Circuit pattern design method, circuit pattern design system, and recording medium |
| 01/24/2002 | US20020009901 Charged-particle beam exposure apparatus and device manufacturing method |
| 01/24/2002 | US20020009883 Method and apparatus for forming interconnect |
| 01/24/2002 | US20020009830 Method of and apparatus for performing circuit-processing, method of and apparatus for controlling the motion of the circuit-processing performing apparatus, and information storage medium |
| 01/24/2002 | US20020009560 Container for treating with corrosive-gas and plasma and method for manufacturing the same |
| 01/24/2002 | US20020009546 Method and apparatus for deposited film |
| 01/24/2002 | US20020008480 Plasma treatment apparatus and plasma treatment method |
| 01/24/2002 | US20020008451 Plasma Source |
| 01/24/2002 | US20020008213 Electron beam system for treating filamentary workpiece, and method of fabricating optical fibers |
| 01/24/2002 | US20020008209 Electron-beam sources exhibiting reduced spherical aberration, and microlithography apparatus comprising same |
| 01/24/2002 | US20020008208 Ion beam apparatus and sample processing method |
| 01/24/2002 | US20020008207 Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method |
| 01/24/2002 | US20020008201 Specimen inspection instrument |
| 01/24/2002 | US20020008200 Correction method of scanning electron microscope |
| 01/24/2002 | US20020008088 Plasma processing apparatus having permeable window covered with light shielding film |
| 01/24/2002 | US20020008082 Local etching apparatus and local etching method |
| 01/24/2002 | US20020008017 Self ionized sputtering using a high density plasma source |
| 01/24/2002 | US20020007915 Plasma processing apparatus |
| 01/24/2002 | US20020007914 Etching and cleaning apparatus |
| 01/24/2002 | US20020007796 Filtered cathodic arc deposition method and apparatus |
| 01/24/2002 | US20020007795 Temperature control system for plasma processing apparatus |
| 01/24/2002 | US20020007794 Plasma processing apparatus |
| 01/24/2002 | US20020007793 Plasma deposition device for forming thin film |
| 01/24/2002 | US20020007792 Cathode with wide band gaps |
| 01/24/2002 | DE19848861A1 Herstellungsprozeß einer Halbleitervorrichtung durch Elektronenstrahllithographie Manufacturing process of a semiconductor device by electron beam lithography |
| 01/24/2002 | DE10134241A1 Pattern checking of a semiconductor wafer uses a master pattern automatically positioned above wafer |
| 01/24/2002 | DE10034412A1 Verfahren zur Elektronenstrahl-Lithographie und elektronen-optisches Lithographiesystem A method of electron beam lithography and electron-optical lithography system |
| 01/24/2002 | DE10034028A1 High power microwave circulator has coaxial coupled cavities in single block |
| 01/24/2002 | DE10032607A1 Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät Particle beam with a to be operated in an ultrahigh vacuum and particle cascade pumping arrangement for such a particle beam |
| 01/24/2002 | DE10014034C2 Plasma-Beschleuniger-Anordnung Plasma accelerator configuration |
| 01/23/2002 | EP1174902A2 Coaxial electromagnet in a magnetron sputtering reactor |
| 01/23/2002 | EP1174901A2 Integrated power oscillator RF source for plasma immersion ion implantation system |
| 01/23/2002 | EP1173629A1 Wear resistant coating |
| 01/23/2002 | CN1332266A Vacuum arc evaporation source and film-forming device using it |
| 01/22/2002 | US6340863 Microwave plasma generator and system for decomposing organic halide |
| 01/22/2002 | US6340860 Method of manufacturing electron beam emitter having an electron beam emitting axis coincided with crystal axis |
| 01/22/2002 | US6340788 Multijunction photovoltaic cells and panels using a silicon or silicon-germanium active substrate cell for space and terrestrial applications |
| 01/22/2002 | US6340639 Plasma process apparatus and plasma process method for substrate |
| 01/22/2002 | US6340416 Process and system for operating magnetron discharges |
| 01/22/2002 | US6339997 Plasma processing apparatus |