| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/21/2002 | US20020020498 Plasma processing apparatus and plasma processing method |
| 02/21/2002 | US20020020497 Plasma processing apparatus and plasma processing method |
| 02/21/2002 | US20020020494 Plasma processing system and method |
| 02/21/2002 | US20020020429 Systems and methods for remote plasma clean |
| 02/21/2002 | US20020020357 Apparatus and process for forming a deposited film |
| 02/21/2002 | US20020020356 Vacuum arc evaporation source and film formation apparatus using the same |
| 02/21/2002 | US20020020354 Electrostatic deflector for electron beam exposure apparatus |
| 02/21/2002 | US20020020353 Gas panel |
| 02/21/2002 | US20020020189 Temperature adjustment apparatus |
| 02/20/2002 | EP1180785A2 Means for directing a flow of gas in a substrate processing chamber |
| 02/20/2002 | EP1180784A2 Method and apparatus for charged particle beam exposure |
| 02/20/2002 | EP1180783A2 Magnet for generating a magnetic field in an ion source |
| 02/20/2002 | EP0948671B1 Method for preparation of metal intercalated fullerene-like metal chalcogenides |
| 02/20/2002 | EP0818052A4 Combined scanning probe and scanning energy microscope |
| 02/20/2002 | CN1336965A Magnet device with high target utilization ratio used for sputtering target with conical butt |
| 02/20/2002 | CN1336542A Mechanism for fixing scattering target, and electron self-rotating analyzer |
| 02/19/2002 | US6348690 Method and an apparatus of an inspection system using an electron beam |
| 02/19/2002 | US6348689 Focused ion beam apparatus |
| 02/19/2002 | US6348238 Thin film fabrication method and thin film fabrication apparatus |
| 02/19/2002 | US6348237 Jet plasma process for deposition of coatings |
| 02/19/2002 | US6348158 Electron beam is injected into a plasma to a control an electron energy distribution; semiconductor etching |
| 02/19/2002 | US6348126 Externally excited torroidal plasma source |
| 02/19/2002 | US6347602 Plasma processing apparatus |
| 02/19/2002 | US6347601 Film forming apparatus |
| 02/14/2002 | WO2002013580A1 Ferrogmagnetic resonance excitation and its use for heating substrates that are filled with particles |
| 02/14/2002 | WO2002013250A1 Radial antenna and plasma device using it |
| 02/14/2002 | WO2002013249A1 Radial antenna and plasma processing apparatus comprising the same |
| 02/14/2002 | WO2002013227A1 Sheet beam test apparatus |
| 02/14/2002 | WO2002013226A2 Spatial light modulator driven photocathode source electron beam pattern generator |
| 02/14/2002 | WO2002013225A2 Plasma processing method and apparatus |
| 02/14/2002 | WO2002013222A1 Improved apparatus and method for forming a high pressure plasma discharge column |
| 02/14/2002 | WO2002012972A2 Direct temperature control for a component of a substrate processing chamber |
| 02/14/2002 | WO2002012591A1 Method and device for plasma treatment of moving metal substrates |
| 02/14/2002 | WO2002012587A2 Processing apparatus and cleaning method |
| 02/14/2002 | WO2002011732A1 Novel bicyclic and tricyclic pyrrolidine derivatives as gnrh antagonists |
| 02/14/2002 | WO2001062053A3 Active control of electron temperature in an electrostatically shielded radio frequency plasma source |
| 02/14/2002 | WO2001044540A3 Method and device for monitoring etching chambers |
| 02/14/2002 | WO2001005197A3 High-speed symmetrical plasma treatment system |
| 02/14/2002 | US20020019144 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 02/14/2002 | US20020019141 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
| 02/14/2002 | US20020018599 Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure |
| 02/14/2002 | US20020018025 Power supply antenna and power supply method |
| 02/14/2002 | US20020017910 Substrate processing device and method |
| 02/14/2002 | US20020017619 Processing/observing instrument |
| 02/14/2002 | US20020017614 Energy filter |
| 02/14/2002 | US20020017606 Scanning type charged particle beam microscope |
| 02/14/2002 | US20020017455 Surface smoothing the femoral heads and/or the surfaces of the acetabular cups to reduce frictional wear at the interface of the bearing surfaces |
| 02/14/2002 | US20020017364 Systems and methods for two-sided etch of a semiconductor substrate |
| 02/14/2002 | DE10038145A1 Device for treating workpieces with electron beams has at least electron beam generating unit and process chambers that can be evacuated independently of each other |
| 02/14/2002 | DE10037883A1 Ferromagnetische Resonanzanregung und ihre Verwendung zur Erwärmung teilchengefüllter Substrate Ferromagnetic resonance excitation and their use for heating teilchengefüllter substrates |
| 02/14/2002 | CA2423138A1 Method and device for plasma treatment of moving metal substrates |
| 02/13/2002 | EP1179834A2 Plasma processing apparatus and performance validation system therefor |
| 02/13/2002 | EP1179833A2 Particle detector |
| 02/13/2002 | EP1179217A1 Secondary electron spectroscopy method and system |
| 02/13/2002 | EP0868836A4 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher |
| 02/12/2002 | US6346915 Plasma processing method and apparatus |
| 02/12/2002 | US6346768 Low energy ion gun having multiple multi-aperture electrode grids with specific spacing requirements |
| 02/12/2002 | US6346481 Polishing sharp corners of heater; forming protective coating; high temperature vapor depositing film on heated substrate; corrosion resistance |
| 02/12/2002 | US6346354 Dividing a region to-be-exposed into smaller regions; shifting coordinates; computing optimum dose; accurate correction |
| 02/12/2002 | US6345588 Use of variable RF generator to control coil voltage distribution |
| 02/07/2002 | WO2002011187A2 Method and apparatus for depositing a tantalum-containing layer on a substrate |
| 02/07/2002 | WO2002011176A1 Magnetron sputtering |
| 02/07/2002 | WO2002011175A1 Methods to predict and correct resist heating during lithography |
| 02/07/2002 | WO2002011174A1 Single tilt rotation cryotransfer holder for electron microscopes |
| 02/07/2002 | WO2002011150A1 Method and device for checking and examining the inside surface of nuclear and thermonuclear assemblies |
| 02/07/2002 | WO2002010475A1 Ring-shaped high-density plasma source and method |
| 02/07/2002 | WO2002010471A1 Low temperature cathodic magnetron sputtering |
| 02/07/2002 | WO2001082329A3 Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 02/07/2002 | WO2001075189A3 Cleaning of a plasma processing system silicon roof |
| 02/07/2002 | WO2001065895A3 Electrically controlled plasma uniformity in a high density plasma source |
| 02/07/2002 | WO2001065588A3 Method and apparatus for performing highly ionized, low energy physical vapor deposition |
| 02/07/2002 | WO2001046990A3 Microwave plasma reactor and method |
| 02/07/2002 | WO2001045134A3 Method and apparatus for producing uniform process rates |
| 02/07/2002 | US20020016079 Enhanced etching/smoothing of dielectric surfaces |
| 02/07/2002 | US20020016068 Method and its apparatus for detecting floating particles in a plasma processing chamber and an apparatus for processing a semiconductor device |
| 02/07/2002 | US20020016046 Simox using controlled water vapor for oxygen implants |
| 02/07/2002 | US20020016015 Microelectronic-device fabrication method |
| 02/07/2002 | US20020015849 Tetracarbon |
| 02/07/2002 | US20020015787 Vacuum deposition; medical equipment |
| 02/07/2002 | US20020015143 Multi-beam multi-column electron beam inspection system |
| 02/07/2002 | US20020014839 Device and method for two-dimensional detection of particles or electromagnetic radiation |
| 02/07/2002 | US20020014597 Appartus for surface modification of polymer, metal and ceramic materials using ion beam |
| 02/07/2002 | US20020014587 Method and system for ion beam containment in an ion beam guide |
| 02/07/2002 | US20020014471 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 02/07/2002 | US20020014407 For reducing the surface roughness (smoothing) and improving the thickness uniformity of, top silicon film of silicon-on-insulator wafer or similar thin-film electronic or photonic workpiecies |
| 02/07/2002 | US20020014402 For forming thin films on substrates |
| 02/07/2002 | US20020014308 Plasma etching apparatus |
| 02/07/2002 | DE10034895A1 Recognizing flashovers in pulsed plasmas in vacuum comprises measuring ignition voltage of plasma discharge, and comparing measured value with value of ignition voltage for normal plasma discharge |
| 02/06/2002 | EP1178517A1 An ion beam apparatus |
| 02/06/2002 | EP1178513A2 Ionization chamber |
| 02/06/2002 | EP1178134A1 Process and apparatus for the continuous plasma treatment of metallic substrates |
| 02/06/2002 | EP1178133A2 Method of extending life of a recyclable process kit |
| 02/06/2002 | EP1177327A2 Electron beam physical vapor deposition apparatus |
| 02/06/2002 | EP1177112A1 Remote plasma generator |
| 02/06/2002 | CN1334885A Large area plasma source |
| 02/06/2002 | CN1334694A Plasma processing apparatus and method |
| 02/05/2002 | USRE37537 Method and apparatus for altering material |
| 02/05/2002 | US6344750 Voltage contrast method for semiconductor inspection using low voltage particle beam |
| 02/05/2002 | US6344655 Multicolumn charged-particle beam lithography system |
| 02/05/2002 | US6344420 Plasma processing method and plasma processing apparatus |