| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/06/2002 | EP1183722A1 Apparatus and method for reducing differential sputter rates |
| 03/06/2002 | EP1183716A1 Substrate support for plasma processing |
| 03/06/2002 | EP1183713A1 Wafer orientation sensor |
| 03/06/2002 | EP1183709A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production |
| 03/06/2002 | EP1183708A1 Method and apparatus for real-time correction of resist heating in lithography |
| 03/06/2002 | EP1183707A1 Apparatus and methods for secondary electron emission microscopy with dual beam |
| 03/06/2002 | EP1183706A1 Method and apparatus for electron beam irradiation |
| 03/06/2002 | EP1183527A1 Electrically-charged particle energy analysers |
| 03/06/2002 | EP1016118B1 Apparatus and method for improved scanning efficiency in an ion implanter |
| 03/06/2002 | EP0631711B1 System for characterizing ac properties of a processing plasma |
| 03/06/2002 | CN1080145C Workpiece treating method and apparatus |
| 03/05/2002 | US6353922 Automatic generation of one dimensional data compaction commands for electron beam lithography |
| 03/05/2002 | US6353231 Pinhole detector for electron intensity distribution |
| 03/05/2002 | US6353222 Determining defect depth and contour information in wafer structures using multiple SEM images |
| 03/05/2002 | US6353206 Plasma system with a balanced source |
| 03/05/2002 | US6353201 Discharge electrode, RF plasma generation apparatus using the same, and power supply method |
| 03/05/2002 | US6352799 Charged-particle-beam pattern-transfer methods and apparatus including beam-drift measurement and correction, and device manufacturing methods comprising same |
| 03/05/2002 | US6352629 Coaxial electromagnet in a magnetron sputtering reactor |
| 03/05/2002 | US6352627 Method and device for PVD coating |
| 03/05/2002 | US6352626 Sputter ion source for boron and other targets |
| 03/05/2002 | US6352611 Ceramic composition for an apparatus and method for processing a substrate |
| 03/05/2002 | US6352050 Remote plasma mixer |
| 03/05/2002 | US6352049 Plasma assisted processing chamber with separate control of species density |
| 02/28/2002 | WO2002017346A2 Optical coupling to gated photocathodes |
| 02/28/2002 | WO2002016667A2 Sputtering targets |
| 02/28/2002 | WO2002016664A1 Method and device for continuous cold plasma deposition of metal coatings |
| 02/28/2002 | WO2001055475A3 System and method for deposition of coatings on a substrate |
| 02/28/2002 | US20020026628 Pattern defect checking method and device |
| 02/28/2002 | US20020026251 System and method for monitoring and controlling gas plasma processes |
| 02/28/2002 | US20020025686 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield |
| 02/28/2002 | US20020025685 Endpoint control for small open area by RF source parameter Vdc |
| 02/28/2002 | US20020025682 Apparatus and method for preventing etch chamber contamination |
| 02/28/2002 | US20020025681 Semiconductor etching apparatus and method of etching semiconductor devices using same |
| 02/28/2002 | US20020025677 Dry etching method and apparatus |
| 02/28/2002 | US20020025388 Apparatus includes a chamber, a wafer support, antennae, a control module for controlling the antennae and responsive to associated detectors, which are located in or adjacent the wafer |
| 02/28/2002 | US20020024300 Photosensor with a photocathode in reflective mode |
| 02/28/2002 | US20020024023 Method and apparatus for testing a substrate |
| 02/28/2002 | US20020024022 Charged particle beam irradiation apparatus and irradiation method using the apparatus |
| 02/28/2002 | US20020024021 Method and apparatus for inspecting patterns of a semiconductor device with an electron beam |
| 02/28/2002 | US20020024020 Electron-beam drawing appraratus electron-beam drawing method |
| 02/28/2002 | US20020024019 Mask defect checking method and device for electron beam exposure |
| 02/28/2002 | US20020024014 Scanning electron microscope |
| 02/28/2002 | US20020024013 Collection of secondary electrons through the objective lens of a scanning electron microscope |
| 02/28/2002 | US20020024012 Electron microscope |
| 02/28/2002 | US20020024011 Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same |
| 02/28/2002 | US20020023899 Transmission line based inductively coupled plasma source with stable impedance |
| 02/28/2002 | US20020023896 Plasma etching method and apparatus |
| 02/28/2002 | US20020023837 Method and apparatus for bias deposition in a modulating electric field |
| 02/28/2002 | US20020023832 Plasma vapor deposition with coil sputtering |
| 02/28/2002 | US20020023720 Apparatus for processing samples |
| 02/28/2002 | US20020023718 RF matching unit |
| 02/28/2002 | US20020023716 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield |
| 02/28/2002 | US20020023589 Plasma generating apparatus |
| 02/28/2002 | DE10114226A1 Regler für einen Linearbeschleuniger Controller for a linear accelerator |
| 02/28/2002 | CA2420243A1 Method and device for continuous cold plasma deposition of metal coatings |
| 02/27/2002 | EP1182686A2 Method of hot switching a plasma tuner |
| 02/27/2002 | EP1182685A1 Plasma polisher with grazing angle ion collision(GAPP) |
| 02/27/2002 | EP1182684A2 Lithographic apparatus |
| 02/27/2002 | EP1182508A2 Method of exposing a layout comprising several levels on a wafer |
| 02/27/2002 | EP1182505A2 Device and process for exposing a radiation-sensitive coating using charged particles and mask therefor |
| 02/27/2002 | EP1182272A1 Process and apparatus for continuous cold plasma deposition of metallic layers |
| 02/27/2002 | EP1182271A2 Apparatus and method for coating substrate |
| 02/27/2002 | EP0835518B1 Low inductance large area coil for an inductively coupled plasma source |
| 02/27/2002 | CN1079843C Deposited film forming apparatus and electrode for use in it |
| 02/26/2002 | US6351683 System and method for monitoring and controlling gas plasma processes |
| 02/26/2002 | US6351075 Plasma processing apparatus having rotating magnets |
| 02/26/2002 | US6351041 Stage apparatus and inspection apparatus having stage apparatus |
| 02/26/2002 | US6350992 Charged particle beam exposure method and charged particle beam exposure device |
| 02/26/2002 | US6350991 Ion implanter with vacuum piston counterbalance |
| 02/26/2002 | US6350961 Method and device for improving surfaces |
| 02/26/2002 | US6350701 Etching system |
| 02/26/2002 | US6350497 Plasma processing method |
| 02/26/2002 | US6350356 Linear magnetron arc evaporation or sputtering source |
| 02/26/2002 | US6350353 Apparatus comprising processing chamber, substrate support member disposed in the processing chamber having first power source coupled thereto, target disposed in the processing chamber, second power source, electromagnetic field source |
| 02/26/2002 | US6350347 Plasma processing apparatus |
| 02/26/2002 | US6350320 Heater for processing chamber |
| 02/26/2002 | US6350317 Linear drive system for use in a plasma processing system |
| 02/26/2002 | US6350097 Method and apparatus for processing wafers |
| 02/26/2002 | US6349670 Plasma treatment equipment |
| 02/21/2002 | WO2002015650A2 Externally excited torroidal plasma source |
| 02/21/2002 | WO2002015649A2 Close coupled match structure for rf drive electrode |
| 02/21/2002 | WO2002015236A2 Wafer area pressure control |
| 02/21/2002 | WO2002015225A2 Multiple chamber plasma reactor |
| 02/21/2002 | WO2002015224A1 Environmental scanning electron microscope |
| 02/21/2002 | WO2002015223A1 An electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance |
| 02/21/2002 | WO2002015222A2 Use of pulsed voltage in a plasma reactor |
| 02/21/2002 | WO2002014952A2 Scan butting error reduction in a raster scan pattern generation system |
| 02/21/2002 | WO2002014810A2 Method and apparatus for tuning a plasma reactor chamber |
| 02/21/2002 | WO2002014571A2 High purity sputter targets with target end-of-life indication and method of manufacture |
| 02/21/2002 | WO2001075523A3 Method and apparatus for multi-pass, interleaved imaging with offline rasterization |
| 02/21/2002 | WO2001067502A3 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 02/21/2002 | US20020021428 Charged-particle-beam microlithography stage including actuators for moving a reticle or substrate relative to the stage, and associated methods |
| 02/21/2002 | US20020021427 Cantilever reticle stage for electron beam projection lithography system |
| 02/21/2002 | US20020021118 Controller for a linear accelerator |
| 02/21/2002 | US20020020824 Electron beam drawing apparatus and method of the same |
| 02/21/2002 | US20020020823 Deflection lens device for electron beam lithography |
| 02/21/2002 | US20020020822 Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method |
| 02/21/2002 | US20020020820 Electron beam exposure apparatus and device manufacturing method |
| 02/21/2002 | US20020020691 Methods and apparatus for plasma processing |
| 02/21/2002 | US20020020499 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |